SEMICONDUCTOR MEMORY DEVICE AND MANUFACTURING METHOD THEREOF
    23.
    发明申请
    SEMICONDUCTOR MEMORY DEVICE AND MANUFACTURING METHOD THEREOF 有权
    半导体存储器件及其制造方法

    公开(公告)号:US20120241828A1

    公开(公告)日:2012-09-27

    申请号:US13336069

    申请日:2011-12-23

    Applicant: Seung Hyun LEE

    Inventor: Seung Hyun LEE

    Abstract: A method for manufacturing a semiconductor memory device includes forming a magnetic tunnel junction layer on a lower electrode, forming a spacer having an annular shape on the magnetic tunnel junction layer, forming upper electrodes on both sidewall surfaces of the annular shaped spacer, removing the spacer, and etching the magnetic tunnel junction layer by using the upper electrodes as an etch mask.

    Abstract translation: 一种制造半导体存储器件的方法包括在下电极上形成磁性隧道结层,在磁性隧道结层上形成具有环形形状的间隔物,在环形间隔物的两个侧壁表面上形成上电极, ,并通过使用上电极作为蚀刻掩模蚀刻磁性隧道结层。

    SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
    24.
    发明申请
    SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME 有权
    半导体器件及其制造方法

    公开(公告)号:US20110127611A1

    公开(公告)日:2011-06-02

    申请号:US12842598

    申请日:2010-07-23

    Applicant: Seung Hyun LEE

    Inventor: Seung Hyun LEE

    Abstract: A semiconductor device comprises an active region having an upper portion and a sidewall portion which are protruded from the top surface of a device isolation region, and a silicide film disposed in the upper portion and the sidewall portion of the active region, thereby effectively reducing resistance in a source/drain region of the semiconductor device. As a result, the entire resistance of the semiconductor device comprising a fin-type gate can be reduced to improve characteristics of the semiconductor device.

    Abstract translation: 半导体器件包括具有从器件隔离区的顶表面突出的上部和侧壁部分的有源区和设置在有源区的上部和侧壁部分中的硅化物膜,从而有效地降低电阻 在半导体器件的源/漏区中。 结果,可以减少包括鳍型栅极的半导体器件的整个电阻,以改善半导体器件的特性。

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