公开(公告)号：US20140141545A1

公开(公告)日：2014-05-22

申请号：US14085021

申请日：2013-11-20

Applicant: Samsung Display Co., Ltd.

Inventor： Dong-Min Lee ,  Young-Sik Yoon ,  Chang-Mo Park

IPC: H01L51/56 ,  H01L29/66

CPC classification number: H01L51/56 ,  H01L27/1266 ,  H01L51/003 ,  H01L2227/326

Abstract: A method for manufacturing a display device includes: forming a deformed layer on a support substrate by a silane coupling agent; performing UV treatment on the deformed layer; forming a thin film substrate on the deformed layer; forming a pixel and an encapsulation member on the thin film substrate; and separating the support substrate from the thin film substrate.

Abstract translation: 一种显示装置的制造方法包括：通过硅烷偶联剂在支撑基板上形成变形层; 对变形层进行紫外线处理; 在变形层上形成薄膜基板; 在所述薄膜基板上形成像素和封装构件; 以及将所述支撑基板与所述薄膜基板分离。

公开(公告)号：US11380544B2

公开(公告)日：2022-07-05

申请号：US16997454

申请日：2020-08-19

Applicant: Samsung Display Co., Ltd.

Inventor： Dong-Min Lee ,  Ji-Hwan Kim ,  Jongoh Seo ,  Byung Soo So

IPC: H01L21/02 ,  H01L21/67 ,  H01L21/268

Abstract: A laser annealing device includes a stage, a laser generator, and a reflective member. The stage supports a substrate with a thin film formed thereon to be processed, and may be moved in a first direction at a set or predetermined speed. The laser generator irradiates a first area of the thin film with a laser beam while the stage is moved. The reflective member reflects a part of the laser beam, which is reflected from the first area of the thin film, to a second area of the thin film. The first area and the second area are spaced apart from each other.

公开(公告)号：US10411133B2

公开(公告)日：2019-09-10

申请号：US15948097

申请日：2018-04-09

Applicant: Samsung Display Co., Ltd.

Inventor： Jong Oh Seo ,  Byung Soo So ,  Dong-Min Lee ,  Dong-Sung Lee

IPC: H01L27/14 ,  H01L29/786 ,  H01L27/12 ,  H01L21/02 ,  H01L29/66

Abstract: A manufacturing method of a polysilicon layer of a thin film transistor of a display device, includes: irradiating a first excimer laser beam having a first energy density to an amorphous silicon layer including an oxidation layer thereon, to form a first polysilicon layer including thereon portions of the oxidation layer at grain boundaries of the first polysilicon layer; removing the portions of the oxidation layer at the grain boundaries of the first polysilicon layer; and irradiating a second excimer laser beam having a second energy density of 80% to 100% of the first energy density to the first polysilicon layer from which the portions of the oxidation layer at the grain boundaries thereof are removed, to form a second polysilicon layer as the polysilicon layer of the thin film transistor.

公开(公告)号：US09748283B2

公开(公告)日：2017-08-29

申请号：US14664232

申请日：2015-03-20

Applicant: Samsung Display Co., LTD.

Inventor： Su-Kyoung Yang ,  Sang-Won Shin ,  Hyun-Eok Shin ,  Chan-Woo Yang ,  Dong-Min Lee

IPC: H01L21/28 ,  H01L27/12 ,  H01L29/66 ,  H01L29/49 ,  H01L29/423 ,  H01L29/45 ,  C23C14/02 ,  C23C14/58 ,  C23C14/54 ,  H01J37/34

CPC classification number: H01L27/1259 ,  C23C14/02 ,  C23C14/541 ,  C23C14/5806 ,  H01J37/34 ,  H01L21/28008 ,  H01L29/42356 ,  H01L29/42372 ,  H01L29/42384 ,  H01L29/45 ,  H01L29/4908 ,  H01L29/495 ,  H01L29/66742

Abstract: In a method of manufacturing a thin film transistor substrate, a first metal layer is formed on a first surface of a base substrate. The base substrate is cooled by contacting the first metal layer with a first cooling plate and by contacting a second surface of the base substrate with a second cooling plate. The first and second surfaces of the base substrate face opposite directions. A gate electrode is formed by patterning the first metal layer. A source electrode and a drain electrode are formed. The source electrode is spaced apart from the drain electrode. The source and drain electrodes partially overlap the gate electrode. A pixel electrode electrically connected to the drain electrode is formed.

公开(公告)号：US20140065393A1

公开(公告)日：2014-03-06

申请号：US13802385

申请日：2013-03-13

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Dong-Min Lee ,  Young-Sik Yoon ,  Mu-Gyeom Kim ,  Mu-Jin Kim ,  Jae-Hyun Park

IPC: H01L21/673 ,  H01L33/52

CPC classification number: H01L21/6835 ,  C03C17/32 ,  C03C2217/20 ,  C03C2218/116 ,  C03C2218/365 ,  H01L21/673 ,  H01L27/3244 ,  H01L33/52 ,  H01L51/003 ,  H01L2221/6835 ,  H01L2221/68377 ,  H01L2221/68381 ,  H01L2227/326 ,  H01L2251/5338 ,  Y10T428/24942 ,  Y10T428/24975

Abstract: A carrier substrate includes: a base substrate; a first coating layer on a first surface of the base substrate; and a second coating layer on a second surface of the base substrate. The thermal expansion coefficients of the first coating layer and the second coating layer are greater than a thermal expansion coefficient of the base substrate, and a thickness of the first coating layer is different from a thickness of the second coating layer.

Abstract translation: 载体基板包括：基底; 在所述基底基板的第一表面上的第一涂层; 以及在所述基底基板的第二表面上的第二涂层。 第一涂层和第二涂层的热膨胀系数大于基底基板的热膨胀系数，第一涂层的厚度与第二涂层的厚度不同。

公开(公告)号：US20140051192A1

公开(公告)日：2014-02-20

申请号：US13749909

申请日：2013-01-25

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Dong-Min Lee ,  Chang-Mo Park ,  Mu-Gyeom Kim ,  Young-Sik Yoon

IPC: H01L51/56 ,  B32B17/10 ,  H01L33/56 ,  B32B17/06

CPC classification number: H01L51/56 ,  B32B17/064 ,  B32B17/10798 ,  H01L27/1266 ,  H01L33/56 ,  H01L51/003 ,  H01L2227/326 ,  Y10T428/265 ,  Y10T428/31623

Abstract: A method of manufacturing a display device, the method including forming a first layer on a rigid glass substrate, the first layer having a hydrophobic surface; forming a second layer to be bonded to a rigid thin glass substrate on the first layer to prepare a carrier substrate; bonding the rigid thin glass substrate onto the second layer; forming and encapsulating a display portion on an upper surface of the rigid thin glass substrate; and irradiating a laser beam to delaminate the first layer and detaching the rigid thin glass substrate from the rigid glass substrate.

Abstract translation: 一种制造显示装置的方法，所述方法包括在刚性玻璃基板上形成第一层，所述第一层具有疏水性表面; 在所述第一层上形成要结合到刚性薄玻璃基板的第二层以制备载体基板; 将刚性薄玻璃基板结合到第二层上; 在刚性薄玻璃基板的上表面上形成并封装显示部分; 并照射激光束以使第一层分层并将刚性薄玻璃基板从刚性玻璃基板分离。