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公开(公告)号:US20210159873A1
公开(公告)日:2021-05-27
申请号:US16692774
申请日:2019-11-22
Applicant: QUALCOMM Incorporated
Inventor: Je-Hsiung LAN , Jonghae KIM , Ranadeep DUTTA
Abstract: Certain aspects provide an integrated circuit (IC) including a resonator. One example IC generally includes a substrate, a first oxide region disposed above the substrate, and a resonator. The resonator may include a piezoelectric layer, a second oxide region disposed below the piezoelectric layer and bonded to the first oxide region, and a cavity in the second oxide region, wherein at least a portion of the second oxide region is below the cavity.
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公开(公告)号:US20210151428A1
公开(公告)日:2021-05-20
申请号:US16686377
申请日:2019-11-18
Applicant: QUALCOMM Incorporated
Inventor: Ranadeep DUTTA , Je-Hsiung LAN , Jonghae KIM
Abstract: A semiconductor device having heterogeneous transistors integrated on a diamond substrate with a carbonized layer. An example semiconductor device generally includes a first semiconductor die and a second semiconductor die. The first semiconductor die includes a diamond substrate, a carbonized layer disposed above the diamond substrate, and a first transistor disposed above the carbonized layer, the first transistor comprising gallium nitride. The second semiconductor die is disposed above the first semiconductor die, where the second semiconductor die includes a second transistor comprising a different semiconductor material than the first transistor.
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公开(公告)号:US20210098319A1
公开(公告)日:2021-04-01
申请号:US17017407
申请日:2020-09-10
Applicant: QUALCOMM Incorporated
Inventor: Je-Hsiung LAN , Ranadeep DUTTA , Jonghae KIM
IPC: H01L23/15 , H01L21/768 , H01L21/321 , H01L21/48 , H01L23/522 , H01L23/373 , H01L27/06 , C04B35/111 , C04B37/02 , H03H9/10 , H03H3/10
Abstract: Disclosed are devices and methods for semiconductor devices including a ceramic substrate. Aspects disclosed include semiconductor device including an electrical component, an alumina ceramic substrate and a substrate-film. The substrate-film is deposited on the alumina ceramic substrate. The substrate-film has a planar substrate-film surface opposite the alumina ceramic substrate. The electrical component is formed on the substrate-film surface of the substrate-film on the alumina ceramic substrate.
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公开(公告)号:US20200105941A1
公开(公告)日:2020-04-02
申请号:US16149505
申请日:2018-10-02
Applicant: QUALCOMM Incorporated
Inventor: Ranadeep DUTTA
IPC: H01L29/786
Abstract: Certain aspects of the present disclosure generally relate to a transistor having an implant region for reducing a net doping concentration below an edge of a gate region of the transistor. One example transistor generally includes a first semiconductor region, a second semiconductor region, and a third semiconductor region, the first semiconductor region being between and having a different doping type than the second semiconductor region and the third semiconductor region. In certain aspects, the transistor also includes a gate dielectric layer disposed above the first semiconductor region, a non-insulative region disposed above the gate dielectric layer, and an implant region disposed above the second semiconductor region, the implant region having a different doping type than the second semiconductor region.
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公开(公告)号:US20190181251A1
公开(公告)日:2019-06-13
申请号:US15834100
申请日:2017-12-07
Applicant: QUALCOMM Incorporated
Inventor: Ranadeep DUTTA
IPC: H01L29/737 , H01L29/08 , H01L29/10
Abstract: In certain aspects, a heterojunction bipolar transistor (HBT) comprises a collector mesa, a base mesa on the collector mesa, and an emitter mesa on the base mesa. The emitter mesa has a plurality of openings. The HBT further comprises a plurality of base metals in the plurality of openings connected to the base mesa.
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公开(公告)号:US20180233604A1
公开(公告)日:2018-08-16
申请号:US15431623
申请日:2017-02-13
Applicant: QUALCOMM Incorporated
Inventor: Shiqun GU , Gengming TAO , Richard HAMMOND , Ranadeep DUTTA , Matthew Michael NOWAK , Francesco CAROBOLANTE
IPC: H01L29/93 , H01L29/20 , H01L29/22 , H01L29/47 , H01L29/737 , H01L29/66 , H01L27/06 , H01L21/822 , H01L23/00 , H01L23/66 , H03H11/34 , H03H11/04
CPC classification number: H01L29/93 , H01L21/8221 , H01L23/66 , H01L24/13 , H01L27/0629 , H01L27/0688 , H01L29/20 , H01L29/22 , H01L29/47 , H01L29/66174 , H01L29/66242 , H01L29/7371 , H01L2224/13025 , H03H11/04 , H03H11/342
Abstract: A tunable capacitor may include a first terminal having a first semiconductor component with a first polarity. The tunable capacitor may also include a second terminal having a second semiconductor component with a second polarity. The second component may be adjacent to the first semiconductor component. The tunable capacitor may further include a first conductive material electrically coupled to a first depletion region at a first sidewall of the first semiconductor component.
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公开(公告)号:US20250096116A1
公开(公告)日:2025-03-20
申请号:US18468536
申请日:2023-09-15
Applicant: QUALCOMM Incorporated
Inventor: Jonghae KIM , Je-Hsiung LAN , Ranadeep DUTTA
IPC: H01L23/522 , H01F17/00 , H01L23/66
Abstract: A device is described, in which the device includes a substrate. The device includes a multiturn inductor coupled to the substrate. The device also includes a patterned ground shield on a periphery of the multiturn inductor and coupled to the substrate.
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公开(公告)号:US20250096093A1
公开(公告)日:2025-03-20
申请号:US18468533
申请日:2023-09-15
Applicant: QUALCOMM Incorporated
Inventor: Ranadeep DUTTA , Jonghae KIM , Je-Hsiung LAN
IPC: H01L23/498 , H01L23/00 , H01L23/13 , H01L25/065
Abstract: A package comprising an interposer comprising a silicon substrate comprising a porous portion; and a plurality of via interconnects extending through the porous portion of the silicon substrate. The package includes a first integrated device coupled to the interposer through a first plurality of solder interconnects.
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公开(公告)号:US20250096090A1
公开(公告)日:2025-03-20
申请号:US18468493
申请日:2023-09-15
Applicant: QUALCOMM Incorporated
Inventor: Ranadeep DUTTA , Jonghae KIM , Je-Hsiung LAN
IPC: H01L23/498 , H01L23/00 , H01L23/31 , H01L25/065
Abstract: An integrated device comprising a die substrate comprising a porous portion; a plurality of through substrate vias extending through the porous portion of the die substrate; and a die interconnection portion coupled to the die substrate.
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公开(公告)号:US20240243036A1
公开(公告)日:2024-07-18
申请号:US18153663
申请日:2023-01-12
Applicant: QUALCOMM Incorporated
Inventor: Je-Hsiung LAN , Jonghae KIM , Ranadeep DUTTA
IPC: H01L23/48 , H01L21/768 , H01L23/522 , H03H7/01
CPC classification number: H01L23/481 , H01L21/76898 , H01L23/5223 , H01L23/5227 , H03H7/0115 , H03H7/0153 , H03H2210/025
Abstract: Disclosed is a cavity embedded tunable filter integrated with high-quality and high capacitance tuning ratio varactor, metal-insulator-metal (MIM) capacitors, and 3D inductors with through alumina ceramic substrate vias. The varactor and the MIM capacitor die is embedded into a blind alumina cavity (BAC) of an alumina ceramic substrate.
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