RESONATOR DEVICE
    21.
    发明申请

    公开(公告)号:US20210159873A1

    公开(公告)日:2021-05-27

    申请号:US16692774

    申请日:2019-11-22

    Abstract: Certain aspects provide an integrated circuit (IC) including a resonator. One example IC generally includes a substrate, a first oxide region disposed above the substrate, and a resonator. The resonator may include a piezoelectric layer, a second oxide region disposed below the piezoelectric layer and bonded to the first oxide region, and a cavity in the second oxide region, wherein at least a portion of the second oxide region is below the cavity.

    TRANSISTOR WITH LIGHTLY DOPED DRAIN (LDD) COMPENSATION IMPLANT

    公开(公告)号:US20200105941A1

    公开(公告)日:2020-04-02

    申请号:US16149505

    申请日:2018-10-02

    Inventor: Ranadeep DUTTA

    Abstract: Certain aspects of the present disclosure generally relate to a transistor having an implant region for reducing a net doping concentration below an edge of a gate region of the transistor. One example transistor generally includes a first semiconductor region, a second semiconductor region, and a third semiconductor region, the first semiconductor region being between and having a different doping type than the second semiconductor region and the third semiconductor region. In certain aspects, the transistor also includes a gate dielectric layer disposed above the first semiconductor region, a non-insulative region disposed above the gate dielectric layer, and an implant region disposed above the second semiconductor region, the implant region having a different doping type than the second semiconductor region.

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