公开(公告)号：US20190198293A1

公开(公告)日：2019-06-27

申请号：US16228824

申请日：2018-12-21

Applicant: NuFlare Technology, Inc.

Inventor： Munehiro OGASAWARA

IPC: H01J37/317 ,  H01J37/147 ,  H01J37/12 ,  H01J37/06

Abstract: A charged particle beam lithography apparatus, includes a plurality of multiple-beam sets, each of which including a plurality of irradiation sources each generating an independent charged particle beam, a plurality of objective deflectors, each arranged for a corresponding charged particle beam, and configured to deflect the corresponding charged particle beam to a desired position on a substrate, and a plurality of electrostatic or electromagnetic lens fields each to focus the corresponding charged particle beam on the target object; a plurality of common deflection amplifiers, arranged for each multiple-beam set, and each of the plurality of common deflection amplifiers being configured to commonly control the plurality of objective deflectors arranged in a same multiple-beam set; a plurality of individual ON/OFF mechanisms configured to individually turn ON/OFF a beam irradiated from each irradiation source; and one or more multiple-beam clusters including the plurality of multiple-beam sets.

公开(公告)号：US20190080879A1

公开(公告)日：2019-03-14

申请号：US16126105

申请日：2018-09-10

Applicant: NUFLARE TECHNOLOGY, INC.

Inventor： Nobuo MIYAMOTO ,  Munehiro OGASAWARA

IPC: H01J37/07 ,  H01J37/317 ,  H01J37/063 ,  H01J37/09

Abstract: A charged-particle beam apparatus is provided with a cathode to emit charged particle beams, an anode to propagate the charged particle beams emitted from the cathode in a sample surface direction, an aperture to propagate a charged particle beam passing through an opening at a predetermined position and of a predetermined shape, among the charged particle beams passing through the anode, in the sample surface direction, and a first electrode that is disposed between the anode and the aperture, and is set at a first electric potential of a polarity repelling a polarity of an ion generated due to collision of a charged particle beam.

公开(公告)号：US20170243715A1

公开(公告)日：2017-08-24

申请号：US15434618

申请日：2017-02-16

Applicant: NuFlare Technology, Inc.

Inventor： Munehiro OGASAWARA

IPC: H01J37/244 ,  H01J37/26 ,  H01J37/20 ,  H01J37/29

CPC classification number: H01J37/244 ,  H01J37/20 ,  H01J37/263 ,  H01J37/28 ,  H01J37/29 ,  H01J2237/043 ,  H01J2237/2449 ,  H01J2237/24495 ,  H01J2237/24592 ,  H01J2237/2804 ,  H01J2237/2806 ,  H01J2237/2817

Abstract: According to one embodiment, an inspection apparatus includes an irradiation device irradiating an inspection target substrate with multiple beams, a detector detecting each of a plurality of charged particle beams formed by charged particles emitted from the inspection target substrate as an electrical signal, and a comparison processing circuitry performing pattern inspection by comparing image data of a pattern formed on the inspection target substrate, the pattern being reconstructed in accordance with the detected electrical signals, and reference image data. The detector includes a plurality of detection elements that accumulate charges, and a detection circuit that reads out the accumulated charges. The plurality of detection elements are grouped into a plurality of groups. The detection circuit operates in a manner of, during a period in which the charged particle beams are applied to the detection elements included in one group, reading out the charges accumulated in the detection elements included in one or more other groups.

公开(公告)号：US20160071692A1

公开(公告)日：2016-03-10

申请号：US14797714

申请日：2015-07-13

Applicant: NuFlare Technology, Inc.

Inventor： Munehiro OGASAWARA

IPC: H01J37/302 ,  H01J37/317 ,  H01J37/04 ,  G06F17/50

CPC classification number: H01J37/3026 ,  H01J37/3177

Abstract: In one embodiment, a data generating apparatus generates data including an irradiation amount of a beam in each pixel for an energy beam writing apparatus. The data generating apparatus includes a target irradiation amount calculating section configured to calculate a first irradiation amount in each pixel, an irradiation amount rounding section configured to round the first irradiation amount based on an irradiation amount control unit and calculate a second irradiation amount, a difference calculating section configured to calculate a first difference between the first irradiation amount and the second irradiation amount, a difference sum calculating section configured to calculate a sum of the first differences in a first group of a plurality of adjacent pixels, and an allocating section configured to allocate an irradiation amount based on the irradiation amount control unit and the sum to a pixel in the first group.

Abstract translation: 在一个实施例中，数据生成装置生成包括用于能量束写入装置的每个像素中的光束的照射量的数据。 数据生成装置包括：目标照射量计算部，被配置为计算每个像素中的第一照射量;照射量舍入部，其被配置为基于照射量控制单元舍入第一照射量，并计算第二照射量，差 计算部，被配置为计算第一照射量和第二照射量之间的第一差;差分和计算部，被配置为计算多个相邻像素的第一组中的第一差的和;以及分配部，被配置为 基于照射量控制单元分配照射量，并将和量分配给第一组中的像素。

公开(公告)号：US20250149290A1

公开(公告)日：2025-05-08

申请号：US19009276

申请日：2025-01-03

Applicant: NuFlare Technology, Inc.

Inventor： Koichi ISHII ,  Munehiro OGASAWARA ,  Yosuke ITO ,  Atsushi ANDO

IPC: H01J37/317 ,  H01J37/147 ,  H01J37/20 ,  H01J37/22 ,  H01J37/244

Abstract: A multiple-beam image acquisition apparatus includes a stage to mount thereon a target object, a mark member, arranged on the stage, to include a base body having at least a surface made from the first material, plural isolated patterns, formed on the base body, having the same positional relationship as plural irradiation positions, flush in height with the surface of the target object, of plural beams having been determined previously in multiple primary electron beams, and being made from a material different from the first material, and an alignment mark, an electron optical system to irradiate the mark member with the multiple primary electron beams in the state where alignment of the multiple primary electron beams has been performed using the alignment mark, and a multi-detector to detect multiple secondary electron beams emitted from the mark member because the mark member is irradiated with the multiple primary electron beams.

公开(公告)号：US20230102715A1

公开(公告)日：2023-03-30

申请号：US17897267

申请日：2022-08-29

Applicant: NuFlare Technology, Inc.

Inventor： Kazuhiko INOUE ,  Munehiro OGASAWARA

IPC: H01J37/141 ,  H01J37/244 ,  G01N23/2251

Abstract: A multi-electron beam image acquisition apparatus includes: a first electromagnetic lens configured to focus the multiple primary electron beams to form an image on the substrate; and a second electromagnetic lens configured to be able to variably adjust a peak position of a magnetic field distribution in a direction of a trajectory central axis of the multiple secondary electron beams, and to focus the multiple secondary electron beams to form an image on either one of a detection surface of the detector and a position conjugate to the detection surface, wherein the first electromagnetic lens focuses, to form an image, the multiple secondary electron beams in a state before being separated from the multiple primary electron beams, and the second electromagnetic lens is arranged between the separator and an image forming point on which the multiple secondary electron beams are focused by the first electromagnetic lens.

公开(公告)号：US20230077403A1

公开(公告)日：2023-03-16

申请号：US18056810

申请日：2022-11-18

Applicant: NuFlare Technology, Inc.

Inventor： Kazuhiko INOUE ,  Munehiro OGASAWARA

IPC: H01J37/317 ,  H01J37/141 ,  H01J37/05 ,  H01J37/244

Abstract: A multi-electron beam image acquisition apparatus includes a multiple-beam forming mechanism to form multiple primary electron beams, a primary-electron optical system to irradiate 1a sample with the multiple primary electron beams, a beam separator, arranged at a position conjugate to an image plane of each of the multiple primary electron beams, to form an electric field and a magnetic field to be mutually perpendicular, to separate multiple secondary electron beams, emitted from the sample due to irradiation with the multiple primary electron beams, from the multiple primary electron beams by using actions of the electric field and the magnetic field, and to have a lens action on the multiple secondary electron beams in at least one of the electric field and the magnetic field, a multi-detector to detect the multiple secondary electron beams, and a secondary-electron optical system to lead the multiple secondary electron beams to the multi-detector.

公开(公告)号：US20220230837A1

公开(公告)日：2022-07-21

申请号：US17646883

申请日：2022-01-04

Applicant: NuFlare Technology, Inc.

Inventor： Kazuhiko INOUE ,  Munehiro OGASAWARA ,  Atsushi ANDO

IPC: H01J37/145 ,  H01J37/285

Abstract: According to one aspect of the present invention, a multi-beam image acquisition apparatus, includes: an objective lens configured to image multiple primary electron beams on a substrate by using the multiple primary electron beams; a separator configured to have two or more electrodes for forming an electric field and two or more magnetic poles for forming a magnetic field and configured to separate multiple secondary electron beams emitted due to the substrate being irradiated with the multiple primary electron beams from trajectories of the multiple primary electron beams by the electric field and the magnetic field formed; a deflector configured to deflect the multiple secondary electron beams separated; a lens arranged between the objective lens and the deflector and configured to image the multiple secondary electron beams at a deflection point of the deflector; and a detector configured to detect the deflected multiple secondary electron beams.

公开(公告)号：US20190096632A1

公开(公告)日：2019-03-28

申请号：US16104210

申请日：2018-08-17

Applicant: NuFlare Technology, Inc.

Inventor： Munehiro OGASAWARA

IPC: H01J37/30 ,  H01J37/317 ,  H01J37/141

Abstract: According to one aspect of the present invention, a charged particle beam irradiation apparatus includes: a plurality of electrodes arranged in a magnetic field space of an electromagnetic lens and also arranged so as to surround a space on an outer side of a passing region of a charged particle beam; and a potential control circuit configured to control potentials of the plurality of electrodes so as to generate plasma in the space surrounded by the plurality of electrodes and so as to control movement of positive ions or electrons and negative ions generated by the plasma, wherein positive ions, electrons and negative ions, or active species are emitted from the space of the plasma.

公开(公告)号：US20180342366A1

公开(公告)日：2018-11-29

申请号：US15943745

申请日：2018-04-03

Applicant: NuFlare Technology, Inc.

Inventor： Munehiro OGASAWARA ,  Takanao TOUYA

IPC: H01J37/141 ,  H01J37/24 ,  H01J37/20 ,  H01J37/153

Abstract: A charged particle beam writing method includes forming an aperture image by making a charged particle beam pass through an aperture substrate, changing, in the state where a plurality of crossover positions of the charged particle beam and positions of all of one or more intermediate images of the aperture image are adjusted to matching positions with respect to the aperture image with the first magnification, magnification of the aperture image from the first magnification to the second magnification by using a plurality of lenses while maintaining the last crossover position of the charged particle beam and the position of the last intermediate image of the aperture image to be fixed, and forming, using an objective lens, the aperture image whose magnification has been changed to the second magnification on the surface of the target object, and writing the aperture image.