公开(公告)号：US10372044B2

公开(公告)日：2019-08-06

申请号：US15856133

申请日：2017-12-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Nicolaas Ten Kate ,  Raymond Wilhelmus Louis Lafarre

IPC: G03F7/20

Abstract: A table for a lithographic apparatus, the table having a catchment opening formed in an upper surface of the table, the catchment opening in fluid communication through the table with the environment of the table at a drain opening in a surface of the table other than the upper surface.

公开(公告)号：US10254660B2

公开(公告)日：2019-04-09

申请号：US15994492

申请日：2018-05-31

Applicant: ASML NETHERLANDS B.V.

Inventor： Raymond Wilhelmus Louis Lafarre ,  Nicolaas Ten Kate ,  Nina Vladimirovna Dziomkina ,  Yogesh Pramod Karade

IPC: G03B27/52 ,  G03B27/42 ,  G03F7/20 ,  H01L21/687 ,  C23C16/44

Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of an electronic component such as a thin film electronic component. The planarization layer may be provided in multiple sub layers. The planarization layer may smooth over roughness caused by removal of material from a blank to form burls on the substrate holder.

公开(公告)号：US10203611B2

公开(公告)日：2019-02-12

申请号：US15818232

申请日：2017-11-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Thibault Simon Mathieu Laurent ,  Gerardus Adrianus Antonius Maria Kusters ,  Bastiaan Andreas Wilhelmus Hubertus Knarren ,  Raymond Wilhelmus Louis Lafarre ,  Koen Steffens ,  Takeshi Kaneko ,  Robbert Jan Voogd ,  Gregory Martin Mason Corcoran ,  Ruud Hendrikus Martinus Johannes Bloks ,  Johan Gertrudis Cornelis Kunnen ,  Ramin Badie

IPC: G03F7/20

Abstract: A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.

公开(公告)号：US10120292B2

公开(公告)日：2018-11-06

申请号：US15297001

申请日：2016-10-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Raymond Wilhelmus Louis Lafarre ,  Adrianus Hendrik Koevoets ,  Sjoerd Nicolaas Lambertus Donders ,  Menno Fien ,  Antonius Franciscus Johannes De Groot ,  Christiaan Alexander Hoogendam ,  Johannes Henricus Wilhelmus Jacobs ,  Nicolaas Ten Kate ,  Martijn Houben ,  Jan Steven Christiaan Westerlaken ,  Jim Vincent Overkamp ,  Maarten Van Beijnum

IPC: G03B27/32 ,  G03F7/20

Abstract: A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of liquid is retained on the projection and in contact with an object supported on the object holder.

公开(公告)号：US09737934B2

公开(公告)日：2017-08-22

申请号：US15296968

申请日：2016-10-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Raymond Wilhelmus Louis Lafarre ,  Sjoerd Nicolaas Lambertus Donders ,  Nicolaas Ten Kate ,  Nina Vladimirovna Dziomkina ,  Yogesh Pramod Karade ,  Elisabeth Corinne Rodenburg

IPC: G03B27/58 ,  B22F7/06 ,  G03F7/20 ,  B23Q3/18 ,  B05D3/06 ,  B05D5/00 ,  B23K26/00 ,  B23K26/342 ,  B33Y10/00 ,  B33Y80/00 ,  B22F3/105

CPC classification number: B22F7/062 ,  B05D3/06 ,  B05D5/00 ,  B22F3/1055 ,  B23K26/342 ,  B23K26/354 ,  B23Q3/18 ,  B33Y10/00 ,  B33Y80/00 ,  G03F7/20 ,  G03F7/70341 ,  G03F7/70416 ,  G03F7/707 ,  G03F7/70708 ,  G03F7/70716 ,  G03F7/70733 ,  G03F7/708

Abstract: An object holder for a lithographic apparatus has a main body having a surface. A plurality of burls to support an object is formed on the surface or in apertures of a thin-film stack. At least one of the burls is formed by laser-sintering. At least one of the burls formed by laser-sintering may be a repair of a damaged burl previously formed by laser-sintering or another method.

公开(公告)号：US09507274B2

公开(公告)日：2016-11-29

申请号：US14373291

申请日：2013-01-17

Applicant: ASML Netherlands B.V.

Inventor： Raymond Wilhelmus Louis Lafarre ,  Sjoerd Nicolaas Lambertus Donders ,  Nicolaas Ten Kate ,  Nina Vladimirovna Dziomkina ,  Yogesh Pramod Karade ,  Elisabeth Corinne Rodenburg

IPC: G03B27/58 ,  G03F7/20 ,  B23Q3/18 ,  B05D3/06 ,  B05D5/00 ,  B23K26/00

CPC classification number: B22F7/062 ,  B05D3/06 ,  B05D5/00 ,  B22F3/1055 ,  B23K26/342 ,  B23K26/354 ,  B23Q3/18 ,  B33Y10/00 ,  B33Y80/00 ,  G03F7/20 ,  G03F7/70341 ,  G03F7/70416 ,  G03F7/707 ,  G03F7/70708 ,  G03F7/70716 ,  G03F7/70733 ,  G03F7/708

Abstract: An object holder (100) for a lithographic apparatus has a main body (400) having a surface (400a). A plurality of burls (406) to support an object are formed on the surface or in apertures of a thin-film stack (410, 440, 450). At least one of the burls is formed by laser-sintering. At least one of the burls formed by laser-sintering may be a repair of a damaged burl previously formed by laser-sintering or another method.

Abstract translation: 用于光刻设备的物体保持器（100）具有具有表面（400a）的主体（400）。 在薄膜堆叠（410,440,450）的表面上或孔中形成有用于支撑物体的多个毛刺（406）。 通过激光烧结形成至少一个毛刺。 通过激光烧结形成的毛刺中的至少一个可以是先前通过激光烧结形成的损坏的隆起的修复或其他方法。

公开(公告)号：US09410796B2

公开(公告)日：2016-08-09

申请号：US13687524

申请日：2012-11-28

Applicant: ASML Netherlands B.V.

Inventor： Ruud Antonius Catharina Maria Beerens ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Theodorus Petrus Maria Cadee ,  Raymond Wilhelmus Louis Lafarre

IPC: G03F7/20 ,  G01B11/14

CPC classification number: G01B11/14 ,  G03F7/70008 ,  G03F7/70775

Abstract: A displacement measurement system comprising at least one retro reflector and a diffraction grating. Said displacement measurement system is constructed and arranged to measure a displacement by providing a first beam of radiation to the measurement system, wherein the diffraction grating is arranged to diffract the first beam of radiation a first time to form diffracted beams. The at least one retro reflector is arranged to subsequently redirect the diffracted beams to diffract a second time on the diffraction grating. The at least one retro reflector is arranged to redirect the diffraction beams to diffract at least a third time on the diffraction grating before the diffracted beams are being recombined to form a second beam. And the displacement system is provided with a sensor configured to receive the second beam and determine the displacement from an intensity of the second beam.

Abstract translation: 一种位移测量系统，包括至少一个回射反射器和衍射光栅。 所述位移测量系统被构造和布置成通过向测量系统提供第一辐射束来测量位移，其中衍射光栅被布置成第一次衍射第一辐射束以形成衍射光束。 所述至少一个回射反射器被布置成随后重定向衍射光束以在衍射光栅上第二次衍射。 所述至少一个回射反射器被布置成在衍射光束被重新组合以形成第二光束之前将衍射光束重定向至少在衍射光栅上衍射至少三次。 并且位移系统设置有被配置为接收第二光束并且从第二光束的强度确定位移的传感器。

公开(公告)号：US11454895B2

公开(公告)日：2022-09-27

申请号：US17313054

申请日：2021-05-06

Applicant: ASML NETHERLANDS B.V.

Inventor： Raymond Wilhelmus Louis Lafarre ,  Nicolaas Ten Kate ,  Nina Vladimirovna Dziomkina ,  Yogesh Pramod Karade

IPC: G03F7/20 ,  H01L21/687 ,  C23C16/44

Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of an electronic component such as a thin film electronic component. The planarization layer may be provided in multiple sub layers. The planarization layer may smooth over roughness caused by removal of material from a blank to form burls on the substrate holder.

公开(公告)号：US10747125B2

公开(公告)日：2020-08-18

申请号：US16177585

申请日：2018-11-01

Applicant: ASML NETHERLANDS B.V.

Inventor： Raymond Wilhelmus Louis Lafarre ,  Adrianus Hendrik Koevoets ,  Sjoerd Nicolaas Lambertus Donders ,  Menno Fien ,  Antonius Franciscus Johannes De Groot ,  Christiaan Alexander Hoogendam ,  Johannes Henricus Wilhelmus Jacobs ,  Nicolaas Ten Kate ,  Martijn Houben ,  Jan Steven Christiaan Westerlaken ,  Jim Vincent Overkamp ,  Maarten Van Beijnum

IPC: G03F7/20

Abstract: A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of liquid is retained on the projection and in contact with an object supported on the object holder.

公开(公告)号：US10649346B2

公开(公告)日：2020-05-12

申请号：US16271303

申请日：2019-02-08

Applicant: ASML NETHERLANDS B.V.

Inventor： Takeshi Kaneko ,  Joost Jeroen Ottens ,  Raymond Wilhelmus Louis Lafarre

IPC: G03B27/58 ,  G03F7/20

Abstract: A table for a lithographic apparatus, the table having an encoder plate located on the table, a gap between the encoder plate and a top surface of the table, the gap located radially inward of the encoder plate relative to the periphery of the table, and a fluid extraction system with an opening in the surface of the gap to extract liquid from the gap.