公开(公告)号：US20240096592A1

公开(公告)日：2024-03-21

申请号：US17945338

申请日：2022-09-15

Applicant: APPLIED MATERIALS ISRAEL LTD.

Inventor： Yehuda Zur

IPC: H01J37/317 ,  C23C14/22 ,  H01J37/147

CPC classification number: H01J37/3178 ,  C23C14/221 ,  H01J37/1474 ,  H01J2237/006 ,  H01L21/28568

Abstract: A gas injection nozzle that includes an elongated gas conduit that comprises: a first gas conduit segment configured to be coupled with a gas reservoir; a second gas conduit segment fluidly coupled to the first gas conduit segment and defining a downward curve of the elongated gas conduit; a third gas conduit segment defining an upward curve of the elongated gas conduit that extends to a sealed end and is disposed in a mirrored relationship with at least a portion of the second gas conduit; and a central gas conduit segment coupled between the second and third gas conduit segments, the central gas conduit segment having a first aperture formed in an upper surface of the central gas conduit and a second aperture, larger than the first aperture, formed in a lower surface of the central gas conduit directly across from the first aperture, wherein the elongated gas conduit has a first diameter along a portion of its length that includes at least the second, third and central gas conduit segments and wherein the central gas conduit segment includes a substantially horizontal portion that extends on each side of the first and second apertures for a distance that is at least twice the first diameter of the gas conduit.

公开(公告)号：US20230023396A1

公开(公告)日：2023-01-26

申请号：US17385459

申请日：2021-07-26

Applicant: Applied Materials Israel Ltd.

Inventor： Yehuda Zur

IPC: H01J37/317 ,  H01J37/147 ,  H01J37/20 ,  H01J37/28 ,  H01L21/285 ,  C23C16/48 ,  C23C16/16

Abstract: A method of depositing material over a sample in a deposition region of the sample with a charged particle beam column, the method comprising: positioning a sample within a vacuum chamber such that the deposition region is under a field of view of the charged particle beam column; cooling the deposition region by contacting the sample with a cyro-nanomanipulator tool in an area adjacent to the deposition region; injecting a deposition precursor gas into the vacuum chamber at a location adjacent to the deposition region; generating a charged particle beam with a charged particle beam column and focusing the charged particle beam on the sample; and scanning the focused electron beam across the localized region of the sample to activate molecules of the deposition gas that have adhered to the sample surface in the deposition region and deposit material on the sample within the deposition region

公开(公告)号：US20220397540A1

公开(公告)日：2022-12-15

申请号：US17347441

申请日：2021-06-14

Applicant: Applied Materials Israel Ltd.

Inventor： Yehuda Zur

IPC: G01N23/2252 ,  H01J37/04

Abstract: A method of performing x-ray spectroscopy surface material analysis of a region of interest of a sample with an evaluation system that includes a scanning electron microscope (SEM) column, an x-ray detector and an x-ray polarizer, comprising: positioning a sample within a field of view of the scanning electron microscope; generating an electron beam having a landing energy about equal to an ionization energy of the materials within the region of interest of the sample; scanning the region of interest with the electron beam set to collide with the sample thereby generating x-rays emitted from near a surface of the sample, the x-rays including characteristic x-rays and Bremsstrahlung radiation; and detecting x-rays generated while the region of interest is scanned by the electron after the x-rays pass through the x-ray polarizer that blocks a higher percentage of the Bremsstrahlung radiation than the characteristic x-rays.

公开(公告)号：US20220351937A1

公开(公告)日：2022-11-03

申请号：US17243478

申请日：2021-04-28

Applicant: Applied Materials Israel Ltd.

Inventor： Yehuda Zur ,  Igor Petrov

IPC: H01J37/28 ,  H01J37/244 ,  H01J37/20 ,  H01J37/18

Abstract: A method of evaluating a region of a sample, the method comprising: positioning a sample within a vacuum chamber; generating an electron beam with a scanning electron microscope (SEM) column that includes an electron gun at one end of the column and a column cap at an opposite end of the column; focusing the electron beam on the sample and scanning the focused electron beam across the region of the sample, while the SEM column is operated in tilted mode, thereby generating secondary electrons and backscattered electrons from within the region; and during the scanning, collecting backscattered electrons with one or more detectors while applying a negative bias voltage to the column cap to alter a trajectory of the secondary electrons preventing the secondary electrons from reaching the one or more detectors.

公开(公告)号：US20220254598A1

公开(公告)日：2022-08-11

申请号：US17173016

申请日：2021-02-10

Applicant: APPLIED MATERIALS ISRAEL LTD.

Inventor： Yehuda Zur

IPC: H01J37/28 ,  H01J37/244 ,  H01J37/22 ,  G01N23/2252

Abstract: A method of performing x-ray spectroscopy surface material analysis of a region of interest of a sample with an evaluation system that includes a scanning electron microscope (SEM) column and an x-ray detector, the method comprising: identifying an element expected to be within the region of interest; selecting a landing energy for a charged particle beam generated by the SEM column based on the identified element; scanning the region of interest with a charged particle beam set to the selected landing energy; detecting x-rays generated while the region of interest is scanned by the charged particle beam; and generating a two-dimensional image of the scanned region of interest based on the detected x-rays.

公开(公告)号：US11315754B2

公开(公告)日：2022-04-26

申请号：US16859974

申请日：2020-04-27

Applicant: APPLIED MATERIALS ISRAEL LTD.

Inventor： Ilya Blayvas ,  Gal Bruner ,  Yehuda Zur ,  Alexander Mairov ,  Ron Davidescu ,  Kfir Dotan ,  Alon Litman

IPC: G01N1/32 ,  H01J37/305

Abstract: A method of evaluating a region of a sample that includes alternating layers of different material. The method includes milling, with a focused ion beam, a portion of the sample that includes the alternating layers of different material; reducing the milling area; and repeating the milling and reducing steps multiple times during the delayering process until the process is complete.

公开(公告)号：US20210082664A1

公开(公告)日：2021-03-18

申请号：US16573139

申请日：2019-09-17

Applicant: Applied Materials Israel Ltd.

Inventor： Yehuda Zur

IPC: H01J37/302 ,  H01J37/305

Abstract: A miller, a non-transitory computer readable medium, and a method. The miller may include an ion beam column that may be configured to form a vertical surface in an object by applying a milling process that may include forming a vertical surface by irradiating, for a certain period of time, an area of an upper surface of an object by a defocused ion beam that comprises multiple rays. During the certain period of time and at a plane of the upper surface of the object, a majority of the multiple rays are closer to an edge of the defocused ion beam than to a center of the defocused ion beam. The focal plane of the defocused ion beam is located below the upper surface of the object.

公开(公告)号：US20240234085A9

公开(公告)日：2024-07-11

申请号：US17972427

申请日：2022-10-24

Applicant: APPLIED MATERIALS ISRAEL LTD.

Inventor： Yehuda Zur

IPC: H01J37/305 ,  H01J37/147 ,  H01J37/28 ,  H01L21/263 ,  H01L21/304

CPC classification number: H01J37/305 ,  H01J37/1474 ,  H01J37/28 ,  H01L21/263 ,  H01L21/304 ,  H01J2237/0475 ,  H01J2237/31745 ,  H01J2237/31749

Abstract: A method of milling a diagonal cut in a region of a sample, the method comprising: positioning the sample in a processing chamber having a charged particle beam column; moving the region of the sample under a field of view of the charged particle column; generating a charged particle beam with the charged particle beam column and scanning the charged particle beam over the region of the sample along scan lines arranged parallel to a slope of the diagonal cut; and repeating the generating and scanning step a plurality of times to mill the diagonal cut in the region of the sample; wherein, for each iteration of the generating and scanning steps, a velocity of the charged particle beam is slower when the beam is near a deep end of the diagonal cut than when the beam is near a shallow end of the diagonal cut.

公开(公告)号：US20240136150A1

公开(公告)日：2024-04-25

申请号：US17972427

申请日：2022-10-23

Applicant: APPLIED MATERIALS ISRAEL LTD.

Inventor： Yehuda Zur

IPC: H01J37/305 ,  H01J37/147 ,  H01J37/28 ,  H01L21/263 ,  H01L21/304

CPC classification number: H01J37/305 ,  H01J37/1474 ,  H01J37/28 ,  H01L21/263 ,  H01L21/304 ,  H01J2237/0475 ,  H01J2237/31745 ,  H01J2237/31749

Abstract: A method of milling a diagonal cut in a region of a sample, the method comprising: positioning the sample in a processing chamber having a charged particle beam column; moving the region of the sample under a field of view of the charged particle column; generating a charged particle beam with the charged particle beam column and scanning the charged particle beam over the region of the sample along scan lines arranged parallel to a slope of the diagonal cut; and repeating the generating and scanning step a plurality of times to mill the diagonal cut in the region of the sample; wherein, for each iteration of the generating and scanning steps, a velocity of the charged particle beam is slower when the beam is near a deep end of the diagonal cut than when the beam is near a shallow end of the diagonal cut.

公开(公告)号：US11694934B2

公开(公告)日：2023-07-04

申请号：US17531643

申请日：2021-11-19

Applicant: Applied Materials Israel Ltd.

Inventor： Yehuda Zur

IPC: H01L21/66 ,  H01J37/305 ,  H01J37/302 ,  H01J37/30 ,  H01J49/40

CPC classification number: H01L22/26 ,  H01J37/3005 ,  H01J37/3026 ,  H01J37/3056 ,  H01J49/40

Abstract: A method of milling a sample that includes a first layer formed over a second layer, where the first and second layers are different materials, the method comprising: milling the region of the sample by scanning a focused ion beam over the region a plurality of iterations in which, for each iteration, the focused ion beam removes material from the sample generating byproducts from the milled region; detecting, during the milling, the partial pressures of one or more byproducts with a residual gas analyzer positioned to have a direct line of sight to the milled region; generating, in real-time, an output detection signal from the residual gas analyzer indicative of an amount of the one or more byproducts detected; and stopping the milling based on the output signal.