公开(公告)号：US08349934B2

公开(公告)日：2013-01-08

申请号：US13139847

申请日：2009-12-10

Applicant: Katsumi Murofushi ,  Nobuaki Ishii ,  Shigeru Yamaki ,  Hideo Miyata ,  Yotaro Hattori

Inventor： Katsumi Murofushi ,  Nobuaki Ishii ,  Shigeru Yamaki ,  Hideo Miyata ,  Yotaro Hattori

IPC: C08K3/04 ,  C08F236/00

CPC classification number: C08F2/44 ,  C08F220/08 ,  C08F222/1006 ,  C08F292/00 ,  C08L33/06 ,  Y10T428/2991 ,  Y10T428/2995 ,  C08L2666/04 ,  C08F220/18

Abstract: The present invention is directed to a hardening composition comprising silica fine particles (a), a (meth)acrylate (b) having two or more ethylenically unsaturated groups and being free from cyclic structure, a (meth)acrylate (c) having an ethylenically unsaturated group and having an alicyclic structure, a polymerization initiator (d) and black inorganic fine particles (e), wherein the silica fine particles (a) are surface-treated with a silane compound (f) represented by the following general formula (1) and a silane compound (g) represented by the following general formula (2): (in the formula (1), R1 represents a hydrogen atom or a methyl group, R2 represents an alkyl group having 1 to 3 carbon atoms or a phenyl group, R3 represents a hydrogen atom or a hydrocarbon group having 1 to 10 carbon atoms; q represents an integer of 1 to 6; and r represents an integer of 0 to 2, (in the formula (2), R4 is an alkyl group having 1 to 3 carbon atoms or a phenyl group which may have a substituent; R5 is a hydrogen atom or a hydrocarbon group having 1 to 10 carbon atoms; s is an integer of 0 to 6; and t is an integer of 0 to 2.

Abstract translation: 本发明涉及一种包含二氧化硅细颗粒（a），具有两个或更多个烯属不饱和基团并且不含环状结构的（甲基）丙烯酸酯（b））的硬化组合物，具有烯键式 不饱和基团和具有脂环结构的聚合引发剂（d）和黑色无机细颗粒（e），其中二氧化硅微粒（a）用下述通式（1）表示的硅烷化合物（f）进行表面处理 ）和由以下通式（2）表示的硅烷化合物（g）：（式（1）中，R 1表示氢原子或甲基，R 2表示碳原子数1〜3的烷基或苯基 基团，R 3表示氢原子或碳原子数1〜10的烃基; q表示1〜6的整数，r表示0〜2的整数，（式（2）中，R 4表示烷基 具有1至3个碳原子的苯基或可具有取代基的苯基 ent R5是氢原子或碳原子数1〜10的烃基; s为0〜6的整数; t为0〜2的整数。

公开(公告)号：US07714032B2

公开(公告)日：2010-05-11

申请号：US12179727

申请日：2008-07-25

Applicant: Hirotoshi Kamata ,  Mina Onishi ,  Katsumi Murofushi

Inventor： Hirotoshi Kamata ,  Mina Onishi ,  Katsumi Murofushi

IPC: A61L27/34 ,  C08G59/42

CPC classification number: C07C323/52 ,  C07C2603/18 ,  G03F7/0007 ,  G03F7/031 ,  H05K3/0076 ,  H05K3/287

Abstract: The present invention relates to a thiol compound represented by formula (1): wherein R1, R2 and n have the same meanings as in the specification, method for producing the compound, and to a photosensitive composition and a black matrix resist composition using the same which have high sensitivity and excellent property of retaining a line width in fine line patterns at the time of alkaline development, that is, being excellent in development latitude.

Abstract translation: 本发明涉及由式（1）表示的硫醇化合物：其中R1，R2和n具有与说明书中相同的含义，该化合物的制备方法以及使用该化合物的光敏组合物和黑矩阵抗蚀剂组合物 其在碱性显影时具有高的灵敏度和保持细线图案的线宽的优异性能，即显影性能优异。

公开(公告)号：US07579066B2

公开(公告)日：2009-08-25

申请号：US11666905

申请日：2005-10-31

Applicant: Kaneo Nozawa ,  Katsutoshi Morinaka ,  Toru Sasaki ,  Katsumi Murofushi

Inventor： Kaneo Nozawa ,  Katsutoshi Morinaka ,  Toru Sasaki ,  Katsumi Murofushi

IPC: C07C263/10 ,  C07C265/04 ,  C08F299/00

CPC classification number: C07C265/04 ,  B33Y70/00 ,  C07C271/16 ,  C07C271/34 ,  C07C275/22 ,  C07C275/24 ,  C07C275/30 ,  C07C333/04 ,  C07C2601/14 ,  C07C2603/18 ,  C07C2603/74 ,  C08F222/1006 ,  C08F222/22 ,  G03F7/027 ,  H05K3/287 ,  Y10T428/24917

Abstract: There are provided a novel ethylenically unsaturated group-containing isocyanate compound, a process for producing the same, and a reactive monomer produced from the isocyanate compound, a reactive polymer and its use. The ethylenically unsaturated group-containing isocyanate compound according to the present invention is represented by formula (I).

Abstract translation: 提供了一种新颖的含烯键式不饱和基团的异氰酸酯化合物，其制备方法以及由异氰酸酯化合物，反应性聚合物及其用途制备的反应性单体。 本发明的含烯属不饱和基团的异氰酸酯化合物由式（I）表示。

公开(公告)号：US20080139688A1

公开(公告)日：2008-06-12

申请号：US11666223

申请日：2005-10-25

Applicant: Hirotoshi Kamata ,  Mina Onishi ,  Katsumi Murofushi

Inventor： Hirotoshi Kamata ,  Mina Onishi ,  Katsumi Murofushi

IPC: C08F2/46 ,  C07C323/56

CPC classification number: C07C323/52 ,  C07C2603/18 ,  G03F7/0007 ,  G03F7/031 ,  H05K3/0076 ,  H05K3/287

Abstract: The present invention relates to a thiol compound represented by formula (1): wherein R1, R2 and n have the same meanings as in the specification, method for producing the compound, and to a photosensitive composition and a black matrix resist composition using the same which have high sensitivity and excellent property of retaining a line width in fine line patterns at the time of alkaline development, that is, being excellent in development latitude.

Abstract translation: 本发明涉及由式（1）表示的硫醇化合物：其中R 1，R 2和n具有与说明书中相同的含义， 化合物，以及使用它们的光敏组合物和使用该组合物的黑矩阵抗蚀剂组合物，其具有在碱性显影时保持细线图案中线宽的高灵敏度和优异性能，即显影性能优异。

公开(公告)号：US20050258406A1

公开(公告)日：2005-11-24

申请号：US11128167

申请日：2005-05-13

Applicant: Mina Onishi ,  Masanao Kamijo ,  Katsumi Murofushi

Inventor： Mina Onishi ,  Masanao Kamijo ,  Katsumi Murofushi

IPC: C09D11/02 ,  F21V9/00 ,  G02B5/20 ,  G02F1/1335 ,  G03F7/00 ,  G03F7/004 ,  G03F7/027

CPC classification number: G03F7/0043 ,  C08L33/10 ,  C09D11/037 ,  C09J133/14 ,  G02F1/133512 ,  G03F7/0007 ,  G03F7/0047

Abstract: The present invention relates to a black resist composition for color filter which contains titanium black (A) with an average primary particle size of 100 nm, carbon black (B) with an average primary particle size of 60 nm or less, an acrylic copolymer dispersant (C) with an amino group and/or a quaternary ammonium salt, an organic solvent (D) and a binder resin (E) with a carboxyl group and an ethylenic unsaturated group, where the ratio in mass between the titanium black (A) and the titanium black (B) is 100:5 to 1000. According to the black resist composition for color filter of the present invention, patterns can readily be formed by photolithography, and the composition has high light resistance and high insulation property, and can be made into a thin film to attain sufficient sensitivity and resolution property.

Abstract translation: 本发明涉及一种含有平均一次粒径为100nm的钛黑（A），平均一次粒径为60nm以下的炭黑（B），丙烯酸共聚物分散剂 （C）与氨基和/或季铵盐，有机溶剂（D）和具有羧基和烯属不饱和基团的粘合剂树脂（E），其中钛黑（A） 钛黑（B）为100:5〜1000。根据本发明的滤色器用黑色抗蚀剂组合物，可以通过光刻法容易地形成图案，该组合物具有高耐光性和高绝缘性，并且可以 制成薄膜以获得足够的灵敏度和分辨率。

公开(公告)号：US5846682A

公开(公告)日：1998-12-08

申请号：US799212

申请日：1997-02-13

Applicant: Katsumi Murofushi ,  Yoshikazu Hosada

Inventor： Katsumi Murofushi ,  Yoshikazu Hosada

IPC: C09D11/00 ,  G03G9/09 ,  G03G9/097 ,  C08K5/55

CPC classification number: C09D11/50 ,  C09B1/325 ,  C09B11/12 ,  C09B11/24 ,  C09B11/28 ,  C09B13/02 ,  C09B15/00 ,  C09B19/00 ,  C09B21/00 ,  C09B23/005 ,  C09B23/0058 ,  C09B23/04 ,  C09B23/06 ,  C09B23/102 ,  C09B23/105 ,  C09B23/107 ,  C09B23/145 ,  C09B5/002 ,  C09B57/008 ,  G03G9/0926 ,  G03G9/0975 ,  G03G9/09775

Abstract: A light decolorizable recording material comprising a colored dye having absorptions in the visible light region and a boron compound represented by the general formula (1), ##STR1## wherein R.sub.1, R.sub.2, R.sub.3 and R.sub.4 each independently represents an alkyl, aryl, allyl, aralkyl, alkenyl, alkynyl, silyl, heterocyclic, substituted alkyl, substituted aryl, substituted allyl, substituted aralkyl, substituted alkenyl, substituted alkynyl or substituted silyl group, and Z.sup.+ represents a quaternary ammonium, quaternary pyridinium, quaternary quinolinium or phosphonium cation.

Abstract translation: 一种光可脱色记录材料，其包含在可见光区域具有吸收的着色染料和由通式（1）表示的硼化合物，其中R 1，R 2，R 3和R 4各自独立地表示烷基，芳基 烯丙基，芳烷基，烯基，炔基，甲硅烷基，杂环，取代的烷基，取代的芳基，取代的烯丙基，取代的芳烷基，取代的烯基，取代的炔基或取代的甲硅烷基，Z +代表季铵，季吡啶鎓，季喹啉或鏻阳离子 。

公开(公告)号：US08283095B2

公开(公告)日：2012-10-09

申请号：US12438098

申请日：2007-08-14

Applicant: Haruhiko Ikeda ,  Hideo Miyata ,  Yotaro Hattori ,  Katsumi Murofushi

Inventor： Haruhiko Ikeda ,  Hideo Miyata ,  Yotaro Hattori ,  Katsumi Murofushi

IPC: C07C333/04 ,  C07C333/08 ,  G03F7/027 ,  G03F7/029 ,  G03C1/73

CPC classification number: C08F2/50 ,  C07C333/04 ,  C07C333/08 ,  G03F7/0007 ,  G03F7/027 ,  G03F7/031

Abstract: It is an object of the present invention to provide a photopolymerization initiator composition having high sensitivity and excellent storage properties, a photosensitive composition containing the photopolymerization initiator composition, and a thiourethane compound preferable for the photopolymerization initiator composition. The thiourethane compound of the present invention has 2 to 6 units each of which contains a moiety represented by the following formula (i) and a moiety represented by the following formula (ii). wherein R1 is a hydrogen atom or a methyl group, and R2 is —CO—, —COO— or —COOR3— (wherein R3 is an alkylene group of 2 to 6 carbon atoms).

Abstract translation: 本发明的目的是提供具有高灵敏度和优异储存性能的光聚合引发剂组合物，含有光聚合引发剂组合物的光敏组合物和优选用于光聚合引发剂组合物的硫代氨基甲酸酯化合物。 本发明的硫代氨基甲酸酯化合物具有2〜6个单元，每个单元含有由下式（i）表示的部分和由下式（ii）表示的部分。 其中R1是氢原子或甲基，R2是-CO-，-COO-或-COOR3-（其中R3是2-6个碳原子的亚烷基）。

公开(公告)号：US08053167B2

公开(公告)日：2011-11-08

申请号：US12515214

申请日：2007-11-15

Applicant: Katsumi Murofushi ,  Haruhiko Ikeda ,  Hideo Miyata ,  Yotaro Hattori

Inventor： Katsumi Murofushi ,  Haruhiko Ikeda ,  Hideo Miyata ,  Yotaro Hattori

IPC: G03F7/004 ,  C08F2/44 ,  G02B5/20

CPC classification number: G03F7/0275 ,  B33Y70/00 ,  G03F7/0007

Abstract: Curable compositions have high sensitivity and excellent developability, and further have good storage properties as required. The compositions include a hydroxythiol compound represented by Formula (1) below and a compound with an ethylenically unsaturated double bond: wherein R1 and R2 are each independently a hydrogen atom, a C1-10 alkyl group or an aromatic ring; X is an aliphatic group, an aromatic ring-containing group or a heterocyclic ring-containing group; Y is an ester bond; k and l are each an integer ranging from 1 to 20; m is an integer of 0, 1 or 2; and n is 0 or 1.

Abstract translation: 可固化组合物具有高灵敏度和优异的显影性，并且根据需要还具有良好的储存性能。 组合物包括由下式（1）表示的羟基硫醇化合物和具有烯键式不饱和双键的化合物：其中R1和R2各自独立地为氢原子，C1-10烷基或芳香环; X是脂族基团，含芳香环基团或含杂环基团; Y是酯键; k和l各自为1至20的整数; m是0,1或2的整数; n为0或1。

公开(公告)号：US20110227239A1

公开(公告)日：2011-09-22

申请号：US13131961

申请日：2009-11-19

Applicant: Shigeru Yamaki ,  Hideo Miyata ,  Nobuyuki Mitarai ,  Nobuaki Ishii ,  Katsumi Murofushi ,  Kunio Yoshida

Inventor： Shigeru Yamaki ,  Hideo Miyata ,  Nobuyuki Mitarai ,  Nobuaki Ishii ,  Katsumi Murofushi ,  Kunio Yoshida

IPC: B29D11/00

CPC classification number: B29C43/021 ,  B29C2035/0822 ,  B29C2035/0827 ,  B29C2035/0838 ,  B29C2043/025 ,  B29C2043/046 ,  B29C2043/3634 ,  B29C2043/525 ,  B29C2059/023 ,  B29D11/00365 ,  B29K2105/0002 ,  B29L2011/0016 ,  C08F230/08 ,  C08G77/20 ,  C08F2230/085 ,  C08F2222/1026

Abstract: There is provided a method of molding which is capable of more highly precisely molding a molded article to be molded such as a lens than conventional technologies.A molded article such as a lens array and a mold for nanoimprinting is molded by repeating multiple times a transfer step including: a transformation step of bringing a light curable composition containing a compound having a polymerizable functional group and a polymerization initiator into contact with a transfer member 62 on which a transfer shape portion shaped equally to or reversely to an aspherical lens portion 312 is formed to transform the light curable composition to the transfer shape of the transfer member 62; a curing step of irradiating at least a transformed portion of the transformed light curable composition with light by a light irradiation unit 60 to cure the light curable composition; and a separation step of separating the cured light curable composition and the transfer member.

Abstract translation: 提供了一种成型方法，其能够比传统技术更高精度地模制诸如透镜的模制品的模制品。 通过重复多次转印步骤来模制诸如透镜阵列和纳米压印模具的模制品，其包括：将含有具有聚合性官能团的化合物和聚合引发剂的光固化性组合物与转印剂接触的转化步骤 形成与非球面透镜部分312相等或相反形状的转印形状部分的构件62将光固化组合物转变成转印部件62的转印形状; 固化步骤，通过光照射单元60用光照射至少所述转化的可光固化组合物的转化部分以固化所述光固化组合物; 以及分离固化的光固化性组合物和转印体的分离工序。

公开(公告)号：US20110077334A1

公开(公告)日：2011-03-31

申请号：US12993745

申请日：2009-05-20

Applicant: Hiroko OI ,  Yotaro Hattori ,  Nobuaki Ishii ,  Katsumi Murofushi

Inventor： Hiroko OI ,  Yotaro Hattori ,  Nobuaki Ishii ,  Katsumi Murofushi

IPC: C09D133/12 ,  C08F120/10 ,  C08K3/34 ,  C08K7/18 ,  C09D1/00 ,  C09J133/12

CPC classification number: C08F220/36 ,  C08F2220/343 ,  C08G18/6229 ,  C08G18/6254 ,  C08G18/672 ,  C08G18/8116 ,  C08L75/04 ,  C08L2666/20 ,  C09D133/14 ,  C09J4/06 ,  C09J133/14 ,  C09J175/14 ,  C08F2220/346

Abstract: It is an object of the present invention to provide a curable composition capable of forming a heat-resistant cured film which is excellent in surface hardness, is good in flexibility and bending properties, and has strength and flexibility that are compatible with each other, and a cured product (film) of the composition. The curable composition includes a reactive (meth)acrylate polymer (A) having a monomer unit represented by the following formula (1), a polymerization initiator (B) and a reactive monomer(C): wherein R1 is a hydrogen atom, a methyl group or an ethyl group, R2 is a hydrogen atom or a methyl group, X1 is a straight-chain or branched hydrocarbon group of 2 to 6 carbon atoms or an alcohol residue of polyethylene glycol, polypropylene glycol or caprolactone-modified both-terminal diol, n is an integer of 2 to 4, and m is an integer of 1 to 5.

Abstract translation: 本发明的目的是提供一种能够形成表面硬度优异，柔软性和弯曲性好的耐热性固化膜的固化性组合物，具有彼此相容的强度和柔软性， 该组合物的固化产物（膜）。 可固化组合物包括具有由下式（1）表示的单体单元，聚合引发剂（B）和反应性单体（C）的反应性（甲基）丙烯酸酯聚合物（A）：其中R1是氢原子，甲基 基或乙基，R 2为氢原子或甲基，X 1为2〜6个碳原子的直链或支链烃基或聚乙二醇，聚丙二醇或己内酯改性的双末端二醇的醇残基 n为2〜4的整数，m为1〜5的整数。