公开(公告)号：US11536654B2

公开(公告)日：2022-12-27

申请号：US17092397

申请日：2020-11-09

Applicant: ASML Netherlands B.V.

Inventor： Maxim Pisarenco ,  Nitesh Pandey ,  Alessandro Polo

IPC: G01N21/95 ,  G01N29/06 ,  G03F7/20 ,  G01N21/956 ,  G01N21/47 ,  G01N29/44

Abstract: An acoustic scatterometer has an acoustic source operable to project acoustic radiation onto a periodic structure and formed on a substrate. An acoustic detector is operable to detect the −1st acoustic diffraction order diffracted by the periodic structure and while discriminating from specular reflection (0th order). Another acoustic detector is operable to detect the +1st acoustic diffraction order diffracted by the periodic structure, again while discriminating from the specular reflection (0th order). The acoustic source and acoustic detector may be piezo transducers. The angle of incidence of the projected acoustic radiation and location of the detectors and are arranged with respect to the periodic structure and such that the detection of the −1st and +1st acoustic diffraction orders and discriminates from the 0th order specular reflection.

公开(公告)号：US20220406563A1

公开(公告)日：2022-12-22

申请号：US17897080

申请日：2022-08-26

Applicant: ASML Netherlands B.V.

Inventor： Laura DEL TIN ,  Almut Johanna STEGEMANN ,  German AKSENOV ,  Diego MARTINEZ NEGRETE GASQUE ,  Pieter Lucas BRANDT

IPC: H01J37/317 ,  H01J37/12 ,  H01J37/28 ,  H01J37/09 ,  H01J37/20

Abstract: Disclosed herein is an multi-array lens configured in use to focus a plurality of beamlets of charged particles along a multi-beam path, wherein each lens in the array comprises: an entrance electrode; a focusing electrode and a support. The focusing electrode is down beam of the entrance electrode along a beamlet path and is configured to be at a potential different from the entrance electrode. The support is configured to support the focusing electrode relative to the entrance electrode. The focusing electrode and support are configured so that in operation the lens generates a rotationally symmetrical field around the beamlet path.

公开(公告)号：US11531280B2

公开(公告)日：2022-12-20

申请号：US17271684

申请日：2019-08-22

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Tamer Mohamed Tawfik Ahmed Mohamed Elazhary ,  Justin Lloyd Kreuzer ,  Franciscus Godefridus Casper Bijnen ,  Krishanu Shome

IPC: G03F9/00 ,  G03F7/20

Abstract: An apparatus and system for determining alignment of a substrate in which a periodic alignment mark is illuminated with spatially coherent radiation which is then provided to a compact integrated optical device to create self images of the alignment mark which may be manipulated (e.g., mirrored, polarized) and combined to obtain information on the position of the mark and distortions within the mark. Also disclosed is a system for determining alignment of a substrate in which a periodic alignment mark is illuminated with spatially coherent radiation which is then provided to an optical fiber arrangement to obtain information such as the position of the mark and distortions within the mark.

公开(公告)号：US20220397830A1

公开(公告)日：2022-12-15

申请号：US17776369

申请日：2020-10-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Yang-Shan HUANG ,  Nicolaas TEN KATE

IPC: G03F7/20

Abstract: A fluid handling system that includes a liquid confinement structure configured to confine immersion liquid to a space between at least a part of the liquid confinement structure and a surface of a substrate. The fluid handling system also includes a mechanism configured to vibrate a vibration component in contact with the immersion liquid.

公开(公告)号：US20220392743A1

公开(公告)日：2022-12-08

申请号：US17891983

申请日：2022-08-19

Applicant: ASML Netherlands B.V.

Inventor： Marco Jan-Jaco WIELAND

IPC: H01J37/28 ,  H01J37/12 ,  H01J37/317

Abstract: A charged-particle assessment tool comprising: a condenser lens array, a collimator, a plurality of objective lenses and an electric power source. The condenser lens array configured to divide a beam of charged particles into a plurality of sub-beams and to focus each of the sub-beams to a respective intermediate focus. The collimator being at each intermediate focus and configured to deflect a respective sub-beam so that it is incident on the sample substantially normally. The plurality of objective lenses, each configured to project one of the plurality of charged-particle beams onto a sample. Each objective lens comprises: a first electrode; and a second electrode that is between the first electrode and the sample. The electric power source configured to apply first and second potentials to the first and second electrodes respectively such that the respective charged-particle beam is decelerated to be incident on the sample with a desired landing energy.

公开(公告)号：US20220390850A1

公开(公告)日：2022-12-08

申请号：US17775361

申请日：2020-10-16

Applicant: ASML NETHERLANDS B.V.

Inventor： Ruud Antonius Catharina Maria BEERENS ,  Koen Gerhardus WINKELS ,  Dirk Willem HARBERTS ,  Lucas Henricus Johannes STEVENS ,  Dennis Dominic VAN DER VOORT ,  Edwin Johannes Cornelis BOS ,  George Alois Leonie LEENKNEGT ,  Nicolaas TEN KATE

IPC: G03F7/20 ,  H01L21/687 ,  H01L21/67

Abstract: A substrate support is configured to support a substrate. The substrate support comprises a plurality of burls protruding from a base surface of the substrate support. The burls have distal ends in a plane for supporting a lower surface of the substrate with a gap between the base surface of the substrate support and the lower surface of the substrate. The substrate support comprises a liquid supply channel for supplying a conductive liquid to the gap so as to bridge the gap between the base surface of the substrate support and the lower surface of the substrate, thereby allowing charge to pass between the substrate support and the substrate. The substrate support has a controlled electrical potential such that charge distribution at the lower surface of the substrate can be manipulated.

公开(公告)号：US11521826B2

公开(公告)日：2022-12-06

申请号：US16650840

申请日：2018-09-21

Applicant: ASML Netherlands B.V.

Inventor： Jian Zhang ,  Zhiwen Kang ,  Yixiang Wang

IPC: H01J37/22 ,  G01C3/08 ,  G02B27/42

Abstract: An optical height detection system in a charged particle beam inspection system. The optical height detection system includes a projection unit including a modulated illumination source, a projection grating mask including a projection grating pattern, and a projection optical unit for projecting the projection grating pattern to a sample; and a detection unit including a first detection grating mask including a first detection grating pattern, a second detection grating mask including a second detection grating pattern, and a detection optical system for forming a first grating image from the projection grating pattern onto the first detection grating mask and forming a second grating image from the projection grating pattern onto the second detection grating masks. The first and second detection grating patterns at least partially overlap the first and second grating images, respectively.

公开(公告)号：US20220382175A1

公开(公告)日：2022-12-01

申请号：US17782570

申请日：2020-11-16

Applicant: ASML Netherlands B.V.

Inventor： Sergei SOKOLOV ,  Filippo ALPEGGIANI ,  Sebastianus Adrianus GOORDEN ,  Simeon Reinaid HUISMAN

IPC: G03F9/00

Abstract: Disclosed is a method for determining a stage position or correction therefor in a lithographic process. The method comprises obtaining transmission data describing the transmission of alignment radiation onto the substrate; obtaining position data relating to a stage position of said stage and/or a sensor position of said sensor. A weighting is determined for the position data based on said transmission data. The position based on said transmission data, position data and weighting.

公开(公告)号：US20220382163A1

公开(公告)日：2022-12-01

申请号：US17885491

申请日：2022-08-10

Applicant: ASML Netherlands B.V.

Inventor： Marleen KOOIMAN

IPC: G03F7/20 ,  G06T7/00 ,  G06V10/44 ,  G06V10/22

Abstract: An image analysis method for identifying features in an image of a part of an array of features formed by a multi-step process, the method comprising: analyzing variations in features visible in the image; and associating features of the image with steps of the multi-step process based at least in part on results of the analyzing.

公开(公告)号：US20220375716A1

公开(公告)日：2022-11-24

申请号：US17713189

申请日：2022-04-04

Applicant: ASML Netherlands B.V.

Inventor： Yongxin WANG ,  Weiming REN ,  Zhonghua DONG ,  Zhongwei CHEN

IPC: H01J37/244 ,  H01J37/28 ,  G01N23/2251

Abstract: Systems and methods are provided for charged particle detection. The detection system can comprise a signal processing circuit configured to generate a set of intensity gradients based on electron intensity data received from a plurality of electron sensing elements. The detection system can further comprise a beam spot processing module configured to determine, based on the set of intensity gradients, at least one boundary of a beam spot; and determine, based on the at least one boundary, that a first set of electron sensing elements of the plurality of electron sensing elements is within the beam spot. The beam spot processing module can further be configured to determine an intensity value of the beam spot based on the electron intensity data received from the first set of electron sensing elements and also generate an image of a wafer based on the intensity value.