Electron gun arrangement
    12.
    发明授权
    Electron gun arrangement 有权
    电子枪安排

    公开(公告)号:US08957390B2

    公开(公告)日:2015-02-17

    申请号:US14179283

    申请日:2014-02-12

    Inventor: Pavel Adamec

    CPC classification number: H01J37/063 H01J3/027 H01J37/073 H01J2237/022

    Abstract: A gun arrangement configured for generating a primary electron beam for a wafer imaging system is described. The arrangement includes a controller configured for switching between a normal operation and a cleaning operation, a field emitter having an emitter tip adapted for providing electrons and emitting an electron beam along an optical axis, an extractor electrode adapted for extracting the electron beam from the emitter tip electrode, a suppressor electrode, and at least one auxiliary emitter electrode arranged radially outside the suppressor electrode, and provided as a thermal electron emitter for thermally emitting electrons towards the optical axis.

    Abstract translation: 描述了构造成用于产生用于晶片成像系统的一次电子束的枪装置。 该装置包括配置用于在正常操作和清洁操作之间切换的控制器,具有适于提供电子并沿光轴发射电子束的发射极尖端的场发射器,适于从发射器提取电子束的提取器电极 尖端电极,抑制电极,以及设置在抑制电极的径向外侧的至少一个辅助发射极,并且被设置为用于向光轴发射电子的热电子发射器。

    Imaging energy filter for electrons and other electrically charged particles and method for energy filtration of the electrons and other electrically charged particles with the imaging energy filter in electro-optical devices
    13.
    发明授权
    Imaging energy filter for electrons and other electrically charged particles and method for energy filtration of the electrons and other electrically charged particles with the imaging energy filter in electro-optical devices 有权
    电子和其他带电粒子的成像能量过滤器和电子和其他带电粒子的能量过滤方法与电光器件中的成像能量过滤器

    公开(公告)号:US07126117B2

    公开(公告)日:2006-10-24

    申请号:US11168728

    申请日:2005-06-28

    CPC classification number: H01J37/05 H01J49/484 H01J2237/151

    Abstract: An imaging energy filter for electrons and other charged particles filters an object formed by these particles at the filter inlet by means of an energetic selection of charged particles in the region of a dispersion aperture. The filter includes two concentric and spherical electrodes, which produce an electrostatic field that deflects the charged particles at an angle α that is greater than π and less than 2π. The deflector, operating as a deflecting element that generates a deflection field, is disposed at an intersection point of the inlet axis and the outlet axis and in a plane of symmetry of the angle α, wherein the plane of symmetry simultaneously is an electro-optical plane. The deflection field generated by the deflecting element deflects the charged particles by an angle π−α/2, leading to a total deflection angle of 2π and co-linearity of the inlet axis and outlet axis.

    Abstract translation: 用于电子和其他带电粒子的成像能量过滤器通过在分散孔径区域中的带电粒子的能量选择来过滤由过滤器入口处的这些颗粒形成的物体。 滤波器包括两个同心和球形电极,其产生静电场,该电场以大于pi且小于2pi的角度α偏转带电粒子。 作为产生偏转场的偏转元件运行的偏转器设置在入口轴线和出口轴线的交点和角度α的对称平面中,其中对称平面同时为电光 飞机 由偏转元件产生的偏转磁场将带电粒子偏转一个角度pi-α/ 2,导致2π的总偏转角和入口轴线和出口轴线的共线性。

    Charged particle beam apparatus
    14.
    发明授权
    Charged particle beam apparatus 失效
    带电粒子束装置

    公开(公告)号:US3937958A

    公开(公告)日:1976-02-10

    申请号:US563330

    申请日:1975-03-31

    CPC classification number: H01J37/08 G21K1/087 H01J37/063

    Abstract: A charged particle beam (e.g., ions or electrons) apparatus including two electrostatic focusing lenses and an electrode having a diameter limiting aperture positioned between the lenses is further provided with two electrode assemblies which interact with an extractor electrode and with a source of charged particles such that the trajectories of the particles in the beam passing through the second of the two assemblies are substantially parallel. This feature and other disclosed improvements facilitate the production of a substantially monoenergetic beam which under a first set of conditions can be focused to provide a small-diameter, spherical-aberration limited beam and which under another set of conditions, can be focused to provide a high current beam.

    Abstract translation: 包括两个静电聚焦透镜和位于透镜之间的具有直径限制孔的电极的带电粒子束(例如,离子或电子)装置还设置有两个电极组件,其与提取器电极和带电粒子源 通过两个组件中的第二个组件的束中的颗粒的轨迹基本上平行。 该特征和其他公开的改进有助于生产基本单能束,其在第一组条件下可以被聚焦以提供小直径的球面像差受限束,并且在另一组条件下可以聚焦以提供 高电流束。

    Triode electron gun for electron beam machines
    15.
    发明授权
    Triode electron gun for electron beam machines 失效
    电子束机三通电子枪

    公开(公告)号:US3835327A

    公开(公告)日:1974-09-10

    申请号:US42024073

    申请日:1973-11-29

    Inventor: LAWRENCE G

    CPC classification number: H01J37/3005 B23K15/0013 H01J37/063 H01J37/065

    Abstract: A high power electron beam machine for operating on a workpiece is disclosed in which the beam focus is automatically maintained constant without the necessity of lens current variation regardless of changes in beam current. The electron gun assembly for the machine consists of a Rogowski gun having a square ribbon filament recessed from an enlarged filament aperture, and a pin type anode with a reduced height and an increased gap from the bias electrode. The electron gun produces a stationary image or apparent source of electrons even though the beam current or the high voltage operating level of the electron gun is varied. Increased life of the ribbon filament is obtained by using a ribbon filament consistng of tungsten with 3 percent rhenium added thereto.

    Abstract translation: 公开了一种用于在工件上操作的高功率电子束机器,其中束束聚焦自动保持恒定,而不需要透镜电流变化,而不管射束电流的变化如何。 用于机器的电子枪组件由具有从放大的灯丝孔凹入的方形丝带灯丝的罗戈夫斯基枪和具有降低的高度的引脚型阳极和与偏置电极的间隙增加。 即使电子束的射束电流或高电压工作电平发生变化,电子枪也会产生静止的图像或电子源。 通过使用由添加了3%铼的钨组成的丝带来获得带状丝的寿命。

    Electron emission system
    16.
    发明授权
    Electron emission system 失效
    电子发射系统

    公开(公告)号:US3814975A

    公开(公告)日:1974-06-04

    申请号:US15876871

    申请日:1971-07-01

    Applicant: GEN ELECTRIC

    Abstract: A storage system for the mass recording and readout of digital data with ultra high resolution. An electron beam structure is provided for forming a beam of extremely small focused spot diameter, on the order of 0.1 microns, and high current density capability, on the order of 1,000 amperes per sq. cm., which records data by scanning over defined areas of the storage medium surface and micromachining elemental portions of said medium as a function of beam modulation. Readout may be subsequently accomplished by similarly scanning the beam at reduced power density and detecting electrons that have been transmitted by or reflected from the storage medium.

    Abstract translation: 一种用于以超高分辨率大量记录和读出数字数据的存储系统。 提供电子束结构,用于形成约0.1微米的极小聚焦光点直径和高电流密度能力的光束,其数量级为每平方厘米1000安培,其通过在限定区域上扫描记录数据 作为光束调制的函数的所述介质的存储介质表面和微加工元素部分。 可以随后通过以降低的功率密度类似地扫描光束并检测已经由存储介质传输或从存储介质反射的电子来实现读出。

    Electron gun with anode segments for beam position detection
    17.
    发明授权
    Electron gun with anode segments for beam position detection 失效
    电子枪与阳极部分用于光束位置检测

    公开(公告)号:US3694687A

    公开(公告)日:1972-09-26

    申请号:US3694687D

    申请日:1970-08-12

    CPC classification number: H01J37/063 H01J3/10 H01J37/065

    Abstract: In an electron gun, an anode structure in which the electron beam aperture is defined by four mutually insulated anode segments which may be energized to provide beam centering. In a preferred embodiment, the anode segments are shaped to intercept the beam if it is off-center, and are returned to ground potential through respective resistors thereby being operative automatically to center the beam.

    Abstract translation: 在电子枪中,阳极结构中电子束孔由四个相互绝缘的阳极段限定,阳极段可被激励以提供光束对中。 在一个优选实施例中,如果阳极段偏心,则阳极段被成形为截取光束,并且通过相应的电阻器返回到接地电位,从而自动地使光束中心。

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