公开(公告)号：US20140212815A1

公开(公告)日：2014-07-31

申请号：US13756178

申请日：2013-01-31

Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.

Inventor： Jimmy Hsiao ,  Ming-Zhang Kuo ,  Ping-Lin Yang ,  Cheng-Chung Lin ,  Osamu Takahashi ,  Sang Hoo Dhong

IPC: H01J29/60 ,  H01J29/62

CPC classification number: H01J29/62 ,  H01J3/12 ,  H01J3/16 ,  H01J3/18 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/31789

Abstract: A system includes an integrated circuit (IC) design data base having a feature, a source configured to generate a radiation beam, a pattern generator (PG) including a mirror array plate and an electrode plate disposed over the mirror array plate, wherein the electrode plate includes a lens let having a first dimension and a second dimension perpendicular to the first dimension with the first dimension larger than the second dimension so that the lens let modifies the radiation beam to form the long shaped radiation beam, and a stage configured secured the substrate. The system further includes an electric field generator connecting the minor array plate. The mirror array plate includes a mirror. The mirror absorbs or reflects the radiation beam. The radiation beam includes electron beam or ion beam. The second dimension is equal to a minimum dimension of the feature.

Abstract translation: 一种系统包括具有特征的集成电路（IC）设计数据库，被配置为产生辐射束的源，包括反射镜阵列板的图案发生器（PG）和设置在所述反射镜阵列板上的电极板，其中所述电极 板包括透镜，其具有垂直于第一尺寸的第一尺寸和第二尺寸，其第一尺寸大于第二尺寸，使得透镜使得辐射束修改以形成长形辐射束，并且被配置为将 基质。 该系统还包括连接小阵列板的电场发生器。 镜阵列板包括镜子。 镜子吸收或反射辐射束。 辐射束包括电子束或离子束。 第二个维度等于该特征的最小尺寸。

公开(公告)号：US20140151570A1

公开(公告)日：2014-06-05

申请号：US14004845

申请日：2012-03-14

Applicant: Takahisa Kato ,  Yutaka Setomoto

Inventor： Takahisa Kato ,  Yutaka Setomoto

IPC: H01J37/12

CPC classification number: H01J37/12 ,  H01J2237/04924 ,  H01J2237/1205 ,  H01J2237/1207 ,  H01J2237/31774

Abstract: An electrostatic charged particle beam lens includes an electrode including a flat plate having a first surface having a normal line extending in a direction of an optical axis and a second surface opposite to the first surface, the electrode having a through-hole extending from the first surface to the second surface. When an opening cross section is defined as a cross section of the through-hole taken along a plane perpendicular to the normal line and a representative diameter is defined as a diameter of a circle obtained by performing regression analysis of the opening cross section, a representative diameter of the opening cross section in a first region that is on the first surface side and a representative diameter of the opening cross section in a second region that is on the second surface side are smaller than a representative diameter of the opening cross section in a third region that is a region in the electrode disposed between the first surface and the second surface.

Abstract translation: 静电带电粒子束透镜包括：电极，其包括平板，该平板具有沿光轴方向延伸的法线的第一表面和与该第一表面相对的第二表面，该电极具有从第一表面延伸的通孔 表面到第二表面。 当开口横截面被定义为沿着垂直于法线的平面截取的通孔的横截面，并且代表性直径被定义为通过对开口横截面进行回归分析而获得的圆的直径时，代表 在第一表面侧的第一区域中的开口横截面的直径和位于第二表面侧的第二区域中的开口横截面的代表性直径小于开口横截面的代表性直径 第三区域，其是设置在第一表面和第二表面之间的电极中的区域。

公开(公告)号：US08716671B2

公开(公告)日：2014-05-06

申请号：US13722774

申请日：2012-12-20

Applicant: Johan Joost Koning ,  Stijn Willem Herman Karel Steenbrink ,  Bart Schipper

Inventor： Johan Joost Koning ,  Stijn Willem Herman Karel Steenbrink ,  Bart Schipper

IPC: H01J37/12

CPC classification number: H01J3/26 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/12 ,  H01J37/3177 ,  H01J2237/04924 ,  H01J2237/1205 ,  H01J2237/121 ,  Y10T29/49002

Abstract: The present invention relates to a projection lens assembly module for directing a multitude of charged particle beamlets onto an image plane located in a downstream direction, and a method for assembling such a projection lens assembly. In particular the present invention discloses a modular projection lens assembly with enhanced structural integrity and/or increased placement precision of its most downstream electrode.

Abstract translation: 本发明涉及一种用于将多个带电粒子子束引导到位于下游方向的图像平面上的投影透镜组合模块，以及用于组装这种投影透镜组件的方法。 特别地，本发明公开了一种具有增强的结构完整性和/或其最下游电极的放置精度提高的模块化投影透镜组件。

公开(公告)号：US20140014852A1

公开(公告)日：2014-01-16

申请号：US14027697

申请日：2013-09-16

Applicant: Mapper Lithography IP B.V.

Inventor： Marco Jan Jaco WIELAND ,  Bert Jan KAMPHERBEEK ,  Alexander Hendrik VAN VEEN ,  Pieter KRUIT ,  Stijn Willem STEENBRINK

IPC: H01J37/317

CPC classification number: H01J37/3175 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/12 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/1205 ,  H01J2237/121 ,  H01J2237/151 ,  H01J2237/31774

Abstract: A projection lens arrangement for a charged particle multi-beamlet system, the projection lens arrangement including one or more plates and one or more arrays of projection lenses. Each plate has an array of apertures formed in it, with projection lenses formed at the locations of the apertures. The arrays of projection lenses form an array of projection lens systems, each projection lens system comprising one or more of the projection lenses formed at corresponding points of the one or more arrays of projection lenses.

Abstract translation: 一种用于带电粒子多子束系统的投影透镜装置，所述投影透镜装置包括一个或多个板和一个或多个投影透镜阵列。 每个板具有形成在其中的孔阵列，其中投影透镜形成在孔的位置处。 投影透镜的阵列形成投影透镜系统的阵列，每个投影透镜系统包括一个或多个投影透镜，其形成在一个或多个投影透镜阵列的对应点处。

公开(公告)号：US08466430B2

公开(公告)日：2013-06-18

申请号：US13633477

申请日：2012-10-02

Applicant: Canon Kabushiki Kaisha

Inventor： Kazuhiro Sando

IPC: H01J3/18 ,  H01J49/22 ,  H01J37/12 ,  H01J29/62 ,  G21K1/08

CPC classification number: H01J3/18 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/12 ,  H01J37/3177 ,  H01J2237/0213 ,  H01J2237/022 ,  H01J2237/03 ,  H01J2237/1205

Abstract: An electrostatic lens includes multiple electrodes each having a through hole, and an insulating spacer that is provided between the electrodes and that fixes an interval between the electrodes. Both surfaces of the spacer are bonded with the electrodes opposing each other so that the spacer is integral with both the electrodes. A protective film is disposed on both surfaces of each of the electrodes. The protective film is present on the interior wall of the through hole and in a region around the through hole on the surface of the electrode. The region extends continuously from the interior wall to an end portion of the electrode. The protective film is not present at an interface between the electrode and the spacer.

Abstract translation: 静电透镜包括各自具有通孔的多个电极和设置在电极之间并且固定电极之间的间隔的绝缘间隔物。 间隔物的两个表面与彼此相对的电极接合，使得间隔物与两个电极成一体。 在每个电极的两个表面上设置保护膜。 保护膜存在于通孔的内壁和电极表面上的通孔周围的区域中。 该区域从内壁连续延伸到电极的端部。 保护膜不存在于电极和间隔物之间​​的界面处。

公开(公告)号：US08461030B2

公开(公告)日：2013-06-11

申请号：US12947078

申请日：2010-11-16

Applicant: Anthony Renau ,  Ludovic Godet ,  Timothy J. Miller ,  Joseph C. Olson ,  Vikram Singh ,  James Buonodono ,  Deepak A. Ramappa ,  Russell J. Low ,  Atul Gupta ,  Kevin M. Daniels

Inventor： Anthony Renau ,  Ludovic Godet ,  Timothy J. Miller ,  Joseph C. Olson ,  Vikram Singh ,  James Buonodono ,  Deepak A. Ramappa ,  Russell J. Low ,  Atul Gupta ,  Kevin M. Daniels

IPC: H01L21/26 ,  H01L21/42

CPC classification number: B01J19/081 ,  H01J37/3171 ,  H01J37/32357 ,  H01J37/32422 ,  H01J37/32623 ,  H01J2237/0453 ,  H01J2237/1205 ,  H01L21/2236 ,  H01L31/022425 ,  H01L31/068 ,  H01L31/08 ,  H01L31/1804 ,  Y02E10/547 ,  Y02P70/521

Abstract: A plasma processing apparatus comprises a plasma source configured to produce a plasma in a plasma chamber, such that the plasma contains ions for implantation into a workpiece. The apparatus also includes a focusing plate arrangement having an aperture arrangement configured to modify a shape of a plasma sheath of the plasma proximate the focusing plate such that ions exiting an aperture of the aperture arrangement define focused ions. The apparatus further includes a processing chamber containing a workpiece spaced from the focusing plate such that a stationary implant region of the focused ions at the workpiece is substantially narrower that the aperture. The apparatus is configured to create a plurality of patterned areas in the workpiece by scanning the workpiece during ion implantation.

公开(公告)号：US20130087717A1

公开(公告)日：2013-04-11

申请号：US13633477

申请日：2012-10-02

Applicant: CANON KABUSHIKI KAISHA

Inventor： Kazuhiro Sando

IPC: H01J3/18

CPC classification number: H01J3/18 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/12 ,  H01J37/3177 ,  H01J2237/0213 ,  H01J2237/022 ,  H01J2237/03 ,  H01J2237/1205

Abstract: An electrostatic lens includes multiple electrodes each having a through hole, and an insulating spacer that is provided between the electrodes and that fixes an interval between the electrodes. Both surfaces of the spacer are bonded with the electrodes opposing each other so that the spacer is integral with both the electrodes. A protective film is disposed on both surfaces of each of the electrodes. The protective film is present on the interior wall of the through hole and in a region around the through hole on the surface of the electrode. The region extends continuously from the interior wall to an end portion of the electrode. The protective film is not present at an interface between the electrode and the spacer.

Abstract translation: 静电透镜包括各自具有通孔的多个电极和设置在电极之间并且固定电极之间的间隔的绝缘间隔物。 间隔物的两个表面与彼此相对的电极接合，使得间隔物与两个电极成一体。 在每个电极的两个表面上设置保护膜。 保护膜存在于通孔的内壁和电极表面上的通孔周围的区域中。 该区域从内壁连续延伸到电极的端部。 保护膜不存在于电极和间隔物之间​​的界面处。

公开(公告)号：US20120305798A1

公开(公告)日：2012-12-06

申请号：US13484231

申请日：2012-05-30

Applicant: Aernout Christiaan Zonnevylle ,  Pieter Kruit

Inventor： Aernout Christiaan Zonnevylle ,  Pieter Kruit

IPC: G21K5/04 ,  H01J3/26 ,  H01J3/18 ,  H01J3/14

CPC classification number: H01J37/3007 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/04924 ,  H01J2237/1205 ,  H01J2237/15 ,  H01J2237/1532

Abstract: The invention relates to a method and a device for manipulation of one or more charged particle beams of a plurality of charged particle beamlets in a charged particle multi-beamlet apparatus. The manipulator device comprises a planar substrate comprising an array of through openings in the plane of the substrate, each of these through openings is arranged for passing the at least one charged particle beamlet there through, wherein each of the through openings is provided with one or more electrodes arranged around the through opening, and a electronic control circuit for providing control signals to the one or more electrodes of each through opening, wherein the electronic control circuit is arranged for providing the one or more electrodes of each individual through opening with an at least substantially analog adjustable voltage.

Abstract translation: 本发明涉及一种用于在带电粒子多子束装置中操纵多个带电粒子束的一个或多个带电粒子束的方法和装置。 所述操纵器装置包括平面基板，所述平面基板包括在所述基板的平面中的通孔的阵列，这些通孔中的每一个布置成使所述至少一个带电粒子束通过，其中每个所述通孔具有一个或 布置在通孔周围的更多电极和用于向每个通孔的一个或多个电极提供控制信号的电子控制电路，其中电子控制电路被布置用于通过开口提供每个个体的一个或多个电极， 最小的模拟可调电压。

公开(公告)号：US08294117B2

公开(公告)日：2012-10-23

申请号：US12885380

申请日：2010-09-17

Applicant: Pieter Kruit ,  Aernout Christiaan Zonnevylle

Inventor： Pieter Kruit ,  Aernout Christiaan Zonnevylle

IPC: G21K1/08

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/12 ,  H01J37/1477 ,  H01J2237/0435 ,  H01J2237/04924 ,  H01J2237/1205

Abstract: The invention relates to a multiple beam charged particle optical system comprising: a charged particle source for generating a plurality of charged particle beamlets, and charged particle optics for directing the charged particle beamlets from the charged particle source towards a target, wherein each charged particle beamlet defines a beamlet center line, said charged particle optics comprising one or more electrostatic lens arrays, each comprising two or more array electrodes for generating a plurality of electrostatic lenslets, wherein each lenslet is arranged for focusing a corresponding charged particle beamlet, and wherein each lenslet defines a lenslet optical axis, wherein at least one of said one or more electrostatic lens arrays comprises one or more off-axis electrostatic lenslets, wherein the beamlet center line of the corresponding charged particle beamlet passes through said off-axis electrostatic lenslet at a distance from its lenslet optical axis.

Abstract translation: 本发明涉及一种多光束带电粒子光学系统，包括：用于产生多个带电粒子子束的带电粒子源和用于将带电粒子子束从带电粒子源引向靶的带电粒子光学器件，其中每个带电粒子子束 定义了子束中心线，所述带电粒子光学器件包括一个或多个静电透镜阵列，每个静电透镜阵列包括用于产生多个静电小透镜的两个或更多个阵列电极，其中每个小透镜被布置用于聚焦相应的带电粒子子束，并且其中每个小透镜 限定了小透镜光轴，其中所述一个或多个静电透镜阵列中的至少一个包括一个或多个离轴静电小透镜，其中相应带电粒子子束的子束中心线以一定距离穿过离轴静电透镜 从其小透镜光轴。

公开(公告)号：US08183543B2

公开(公告)日：2012-05-22

申请号：US12178153

申请日：2008-07-23

Applicant: Elmar Platzgummer

Inventor： Elmar Platzgummer

IPC: A61N5/00 ,  G21G5/00

CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/12 ,  H01J37/3007 ,  H01J2237/0437 ,  H01J2237/0453 ,  H01J2237/04928 ,  H01J2237/1205 ,  H01J2237/1501 ,  H01J2237/151 ,  H01J2237/3045

Abstract: A multi-beam source for generating a plurality of beamlets of energetic electrically charged particles. The multi-beam source includes an illumination system generating an illuminating beam of charged particles and a beam-forming system being arranged after the illumination system as seen in the direction of the beam, adapted to form a plurality of telecentric or homocentric beamlets out of the illuminating beam. The beam forming system includes a beam-splitter and an electrical zone device, the electrical zone having a composite electrode composed of a plurality of substantially planar partial electrodes, adapted to be applied different electrostatic potentials and thus influencing the beamlets.

Abstract translation: 一种用于产生能量带电粒子的多个子束的多光束源。 多光束源包括产生带电粒子的照明光束的照明系统，以及沿着光束的方向被布置在照明系统之后的束形成系统，适于在多个远心或同心圆的子束之外形成 照明光束。 束形成系统包括分光器和电区装置，电区具有由多个基本上平面的部分电极组成的复合电极，其适于施加不同的静电电势并因此影响子束。