METHOD FOR COLLECTING INFORMATION BY ELECTRONIC DEVICE AND ELECTRONIC DEVICE THEREFOR
    16.
    发明申请
    METHOD FOR COLLECTING INFORMATION BY ELECTRONIC DEVICE AND ELECTRONIC DEVICE THEREFOR 有权
    用于通过电子设备收集信息的方法及其电子设备

    公开(公告)号:US20150237515A1

    公开(公告)日:2015-08-20

    申请号:US14626476

    申请日:2015-02-19

    Abstract: A method of an electronic device and a method of a server are provided. The method of the electronic device includes receiving a broadcast signal broadcast by another electronic device via a wireless communication; determining, based on the received broadcast signal, a number of times the another electronic device has been detected; and sending a request for information to the another electronic device, based on the determined number of times the another electronic device has been detected. The method of the server includes receiving information from a first electronic device; receiving, from a second electronic device, an information request message relating to the first electronic device which has been detected a threshold number of times or more by the second electronic device; and transmitting information registered by the first electronic device to the second electronic device.

    Abstract translation: 提供一种电子设备的方法和服务器的方法。 电子设备的方法包括:经由无线通信接收由另一电子设备广播的广播信号; 基于所接收的广播信号确定已经检测到另一电子设备的次数; 并且基于确定的另一电子设备被检测到的次数向另一电子设备发送信息请求。 服务器的方法包括从第一电子设备接收信息; 从所述第二电子设备接收与所述第二电子设备已经检测到阈值次数以上的所述第一电子设备相关的信息请求消息; 以及将由所述第一电子设备登记的信息发送到所述第二电子设备。

    SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME
    17.
    发明申请
    SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME 有权
    半导体器件及其制造方法

    公开(公告)号:US20140225198A1

    公开(公告)日:2014-08-14

    申请号:US13829703

    申请日:2013-03-14

    CPC classification number: H01L27/0922 H01L21/823871

    Abstract: A semiconductor device includes a substrate having a first region and a second region, first and second gate electrodes disposed on the first and second regions, respectively, and first and second source/drain regions disposed on at least one side of the first and second gate electrodes, respectively. The device further includes first and second silicide regions in the first and second source/drain regions, respectively. A contact area between the first silicide region and the first source/drain region is differs in size from a contact area between the second silicide region and the second source/drain region. Methods of fabricating such devices are also provided.

    Abstract translation: 半导体器件包括具有第一区域和第二区域的衬底,分别设置在第一和第二区域上的第一和第二栅极电极以及设置在第一和第二栅极的至少一侧上的第一和第二源极/漏极区域 电极。 该器件还分别包括第一和第二源极/漏极区域中的第一和第二硅化物区域。 第一硅化物区域和第一源极/漏极区域之间的接触区域的大小与第二硅化物区域和第二源极/漏极区域之间的接触面积不同。 还提供了制造这种装置的方法。

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