公开(公告)号：US20140179041A1

公开(公告)日：2014-06-26

申请号：US13973954

申请日：2013-08-22

Applicant: Samsung Display Co., Ltd.

Inventor： Myung-Soo Huh ,  Jeong-Ho Yi ,  Yong-Suk Lee

IPC: H01L33/52

CPC classification number: H01L33/52 ,  B05D1/60 ,  B05D1/62 ,  H01L21/67207 ,  H01L51/5253 ,  H01L51/5256 ,  H01L51/56

Abstract: An apparatus and method for manufacturing a thin film encapsulation includes: a first cluster configured to form a first inorganic layer on a display substrate using a sputtering process; a second cluster configured to form a first organic layer on the first inorganic layer on the display substrate using a monomer deposition process; and a third cluster configured to form a second inorganic layer on the first organic layer on the display substrate using a chemical vapor deposition (CVD) process or a plasma enhanced chemical vapor deposition (PECVD) process.

Abstract translation: 一种用于制造薄膜封装的装置和方法包括：第一簇，其被配置为使用溅射工艺在显示基板上形成第一无机层; 第二簇，其被配置为使用单体沉积工艺在所述显示基板上的所述第一无机层上形成第一有机层; 以及第三簇，其被配置为使用化学气相沉积（CVD）工艺或等离子体增强化学气相沉积（PECVD）工艺在所述显示衬底上的所述第一有机层上形成第二无机层。

公开(公告)号：US20140134768A1

公开(公告)日：2014-05-15

申请号：US14078422

申请日：2013-11-12

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Cheol-Min Jang ,  Myung-Soo Huh ,  Suk-Won Jung ,  Jae-Hyun Kim ,  Sung-Chul Kim ,  Jin-Kwang Kim ,  Chang-Woo Shim ,  Sung-Hun Key ,  In-Kyo Kim

IPC: H01L33/52

CPC classification number: C23C16/45544 ,  C23C16/403 ,  C23C16/4412 ,  C23C16/45519 ,  C23C16/45563 ,  H01L27/3244 ,  H01L51/001 ,  H01L51/0011 ,  H01L51/50 ,  H01L51/56

Abstract: A vapor deposition apparatus for depositing a thin film on a substrate, by which a deposition process is efficiently performed and deposition film characteristics are easily improved, and a vapor deposition apparatus including: a stage onto which a substrate is disposed; and a supply unit disposed to face the substrate and having a main body member and a nozzle member disposed on one surface of the main body member facing the substrate, to sequentially supply a plurality of gases towards the substrate, and a method of manufacturing an organic light-emitting display apparatus using the same.

Abstract translation: 一种用于在基板上沉积薄膜的气相沉积设备，通过该气相沉积设备有效地进行沉积工艺并容易地改善沉积膜特性;以及气相沉积设备，包括：设置有基板的平台; 以及供给单元，其配置成面对基板，具有主体部件和喷嘴部件，所述主体部件和喷嘴部件配置在与所述基板相对的所述主体部件的一个表面上，以顺序向所述基板供给多个气体;以及制造有机物的方法 发光显示装置。

公开(公告)号：US10038169B2

公开(公告)日：2018-07-31

申请号：US14020848

申请日：2013-09-08

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Myung-Soo Huh ,  Suk-Won Jung ,  Jin-Kwang Kim ,  In-Kyo Kim ,  Choel-Min Jang

IPC: H01J37/00 ,  H01L51/56 ,  C23C16/452 ,  H01J37/32

CPC classification number: H01L51/56 ,  C23C16/452 ,  H01J37/32357

Abstract: A vapor deposition apparatus for forming a deposition layer on a substrate, the vapor deposition apparatus includes a supply unit configured to receive a first source gas, a reaction space connected to the supply unit, a plasma generator in the reaction space, a first injection unit configured to inject a deposition source material to the substrate, the deposition source material including the first source gas, and a filament unit in the reaction space, the filament unit being connected to a power source.

公开(公告)号：US09799849B2

公开(公告)日：2017-10-24

申请号：US15358807

申请日：2016-11-22

Applicant: Samsung Display Co., Ltd.

Inventor： Sung-Chul Kim ,  Myung-Soo Huh ,  Chang-Woo Shim

IPC: H01L29/08 ,  H01L35/24 ,  H01L51/00 ,  H01L51/52 ,  H01L51/56 ,  H01L27/32

CPC classification number: H01L51/5256 ,  H01L27/3246 ,  H01L27/3258 ,  H01L27/3262 ,  H01L27/3274 ,  H01L51/0034 ,  H01L51/004 ,  H01L51/5218 ,  H01L51/56 ,  H01L2227/323 ,  H01L2251/303 ,  H01L2251/5338 ,  H01L2251/558

Abstract: In an aspect, an organic light-emitting display apparatus and a method of manufacturing the same are provided. The organic light-emitting display apparatus may include a substrate; a display unit formed on the substrate; and a thin film encapsulating layer encapsulating the display unit. The thin film encapsulating layer may include a plurality of organic layers and inorganic layers that are laminated alternately. At least one of the plurality of the inorganic films may include a first layer formed of a first material, a second layer formed of a second material other than the first material, and an intermediate layer provided between the first and second layers.

公开(公告)号：US09620738B2

公开(公告)日：2017-04-11

申请号：US14872978

申请日：2015-10-01

Applicant: SAMSUNG DISPLAY CO., LTD

Inventor： Sung-Joong Joo ,  Myung-Soo Huh ,  Suk-Won Jung

IPC: H01L51/50 ,  H05B33/04 ,  H01L51/52 ,  H05B33/10

CPC classification number: H01L51/5256 ,  H05B33/04 ,  H05B33/10

Abstract: A flat panel display device provides a sealing structure for comprising and sealing a display unit disposed in a first region on a substrate. The display unit includes the first region and a second region, and a barrier is disposed in the first region on the substrate, on an outer side of the display unit, and adjacent to the second region. The sealing structure contacts the barrier, and includes at least one first layer of an inorganic material and at least one second layer of an organic material. A method of manufacturing the flat panel display device is also disclosed.

公开(公告)号：US09219254B2

公开(公告)日：2015-12-22

申请号：US13975259

申请日：2013-08-23

Applicant: Samsung Display Co., Ltd.

Inventor： Myung-Soo Huh ,  Suk-Won Jung ,  Tae-Wook Kang

IPC: H01L51/56 ,  C23C14/06 ,  C23C14/08 ,  C23C14/34 ,  C23C14/35 ,  H01L51/52

CPC classification number: H01L51/56 ,  C23C14/0688 ,  C23C14/08 ,  C23C14/3464 ,  C23C14/352 ,  H01L51/5253

Abstract: A method of forming nanocrystals includes loading a substrate into a chamber, applying a first voltage to a first target to form a thin film including a first metal compound on the substrate by sputtering, and applying a second voltage to a second target and forming nanocrystals in the thin film by sputtering.

Abstract translation: 形成纳米晶体的方法包括将衬底加载到腔室中，向第一靶施加第一电压以通过溅射在衬底上形成包括第一金属化合物的薄膜，以及向第二靶施加第二电压并在第 该薄膜通过溅射。

公开(公告)号：US09184180B2

公开(公告)日：2015-11-10

申请号：US14162465

申请日：2014-01-23

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Myung-Soo Huh ,  Sung-Chul Kim ,  Suk-Won Jung

IPC: H01L27/12 ,  H01L29/786

CPC classification number: H01L27/1218 ,  H01L27/1266 ,  H01L29/78603 ,  H01L29/78684

Abstract: A method of manufacturing a flexible display apparatus includes: preparing a support substrate; forming a first graphene oxide layer having a first electrical charge on the support substrate; forming a second graphene oxide layer having a second electrical charge on the first graphene oxide layer; forming a flexible substrate on the second graphene oxide layer; forming a display unit on the flexible substrate; and separating the support substrate and the flexible substrate from each other.

Abstract translation: 柔性显示装置的制造方法包括：准备支撑基板; 在所述支撑基板上形成具有第一电荷的第一石墨烯氧化物层; 在所述第一石墨烯氧化物层上形成具有第二电荷的第二石墨烯氧化物层; 在第二石墨烯氧化物层上形成柔性基板; 在柔性基板上形成显示单元; 并将支撑基板和柔性基板彼此分离。

公开(公告)号：US09142415B2

公开(公告)日：2015-09-22

申请号：US14269175

申请日：2014-05-04

Applicant: Samsung Display Co., Ltd.

Inventor： Myung-Soo Huh ,  Suk-Won Jung ,  Sung-Chul Kim ,  Sang-Hyuk Hong ,  Choel-Min Jang

IPC: H01L21/285 ,  H01L21/02 ,  H01L51/56 ,  H01L51/00

CPC classification number: H01L21/28506 ,  C23C16/452 ,  C23C16/45565 ,  C23C16/45578 ,  C23C16/458 ,  C23C16/509 ,  H01J37/32357 ,  H01J37/3244 ,  H01L21/02274 ,  H01L51/001 ,  H01L51/56

Abstract: A deposition apparatus for performing a deposition process on a substrate includes: an injection unit including a plasma generating member which receives a raw material gas and converts the raw material gas to a deposition source material in a radical form; and a plasma processor disposed adjacent to the injection unit and facing a side of the injection unit, wherein the plasma processor performs a plasma process in a direction facing the substrate.

Abstract translation: 用于在基板上进行沉积处理的沉积装置包括：注入单元，其包括等离子体产生元件，该等离子体产生元件接纳原料气体，并将原料气体以基本形式转化为沉积源材料; 以及等离子体处理器，其与所述注入单元相邻并且面向所述注入单元的一侧，其中所述等离子体处理器在面向所述基板的方向上执行等离子体处理。

公开(公告)号：US20150144062A1

公开(公告)日：2015-05-28

申请号：US14590491

申请日：2015-01-06

Applicant: Samsung Display Co., Ltd.

Inventor： Choel-Min Jang ,  Myung-Soo Huh ,  Jeong-Ho Yi ,  Cheol-Rae Jo ,  Sang-Joon Seo ,  Seung-Hun Kim ,  Jin-Kwang Kim

IPC: C23C16/46 ,  C23C16/458 ,  C23C16/455

CPC classification number: C23C16/46 ,  C23C16/45551 ,  C23C16/45563 ,  C23C16/4583

Abstract: A vapor deposition apparatus includes a stage on which a substrate is mounted; a heater unit that is disposed at a side of the stage and includes a first heater and a second heater, wherein the first heater and the second heater are movable so that the first heater and the second heater are spaced apart from each other or are disposed adjacent to each other; and a nozzle unit that is disposed at a side opposite to the side at which the heater unit is disposed about the stage and includes one or more nozzles.

Abstract translation: 蒸镀装置包括：载置基板的载物台; 加热器单元，其设置在所述台的一侧并且包括第一加热器和第二加热器，其中所述第一加热器和所述第二加热器可移动，使得所述第一加热器和所述第二加热器彼此间隔开或布置 相邻; 以及喷嘴单元，其设置在与所述加热器单元围绕所述台架配置的一侧相对的一侧，并且包括一个或多个喷嘴。

公开(公告)号：US20150101535A1

公开(公告)日：2015-04-16

申请号：US14188017

申请日：2014-02-24

Applicant: Samsung Display Co., Ltd.

Inventor： Sung-Yong Lee ,  Sung-Hun Key ,  In-Kyo Kim ,  Cheol-Min Jang ,  Myung-Soo Huh

IPC: C23C16/455 ,  C23C16/50 ,  C23C16/52

CPC classification number: C23C16/45563 ,  C23C16/452 ,  C23C16/45536 ,  C23C16/45551

Abstract: A vapor deposition apparatus includes a substrate mount unit on which a substrate is mounted, a plurality of first nozzle units which injects a first raw material in a direction of the substrate mount unit, a plurality of second nozzle units which is alternately disposed with the plurality of first nozzle units and injects a second raw material in the direction of the substrate mount unit, and a plasma module unit which supplies the second raw material to the plurality of second nozzle units. The second raw material is a radical, and the substrate mount unit includes an electrostatic generation part.

Abstract translation: 一种气相沉积设备，包括：基板安装单元，其上安装有基板;多个第一喷嘴单元，其在所述基板安装单元的方向上注入第一原料;多个第二喷嘴单元，其与所述多个第一喷嘴单元交替布置; 的第一喷嘴单元，并且在所述基板安装单元的方向上注入第二原料;以及等离子体模块单元，其将所述第二原料供给到所述多个第二喷嘴单元。 第二原料是自由基，基板安装单元包括静电发生部。