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公开(公告)号：US20180081193A1
公开(公告)日：2018-03-22
申请号：US15829111
申请日：2017-12-01
Applicant: KLA-Tencor Corporation
Inventor： Vladimir Levinski , Yuri Paskover , Daniel Kandel
CPC classification number: G02B27/60 , G01B11/02 , G01B11/25 , G03F7/70616
Abstract: Metrology targets and methods are provided, which provide self-Moiré measurements of unresolved target features, i.e., interaction of electromagnetic fields re-scattered off elements within a single target layer provides signals with Moiré pitches that are measurable, although the actual target pitches are unresolved and possibly device-like. Targets comprise cell(s) with interlaced lines of elements having different device-like pitches which are selected to yield resolved Moiré pitch(es). Different target designs are presented for scatterometry and imaging metrology measurements, as well as for critical dimension, dose and focus, and pitch walk measurements—of device-like targets.
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公开(公告)号：US09903711B2
公开(公告)日：2018-02-27
申请号：US15090389
申请日：2016-04-04
Applicant: KLA-Tencor Corporation
Inventor： Ady Levy , Daniel Kandel , Michael E. Adel , Leonid Poslavsky , John Robinson , Tal Marciano , Barak Bringoltz , Tzahi Grunzweig , Dana Klein , Tal Itzkovich , Nadav Carmel , Nuriel Amir , Vidya Ramanathan , Janay Camp , Mark Wagner
IPC: G01B11/14 , G01B11/27 , G01N21/95 , G03F7/20 , G01N21/21 , G01N21/31 , G01N21/41 , G01N21/47 , G01N21/64
CPC classification number: G01B11/272 , G01N21/211 , G01N21/31 , G01N21/41 , G01N21/4738 , G01N21/4788 , G01N21/6489 , G01N21/9501 , G01N2021/213 , G03F7/705 , G03F7/70525 , G03F7/70533 , G03F7/70616
Abstract: A metrology performance analysis system includes a metrology tool including one or more detectors and a controller communicatively coupled to the one or more detectors. The controller is configured to receive one or more metrology data sets associated with a metrology target from the metrology tool in which the one or more metrology data sets include one or more measured metrology metrics and the one or more measured metrology metrics indicate deviations from nominal values. The controller is further configured to determine relationships between the deviations from the nominal values and one or more selected semiconductor process variations, and determine one or more root causes of the deviations from the nominal values based on the relationships between values of the one or more metrology metrics and the one or more selected semiconductor process variations.
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公开(公告)号：US20170146810A1
公开(公告)日：2017-05-25
申请号：US15112819
申请日：2016-05-19
Applicant: KLA-Tencor Corporation
Inventor： Vladimir Levinski , Yuri Paskover , Daniel Kandel
CPC classification number: G02B27/60 , G01B11/02 , G01B11/25 , G03F7/70616
Abstract: Metrology targets and methods are provided, which provide self-Moiré measurements of unresolved target features, i.e., interaction of electromagnetic fields re-scattered off elements within a single target layer provides signals with Moiré pitches that are measurable, although the actual target pitches are unresolved and possibly device-like. Targets comprise cell(s) with interlaced lines of elements having different device-like pitches which are selected to yield resolved Moiré pitch(es). Different target designs are presented for scatterometry and imaging metrology measurements, as well as for critical dimension, dose and focus, and pitch walk measurements—of device-like targets.
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公开(公告)号：US09581430B2
公开(公告)日：2017-02-28
申请号：US14057827
申请日：2013-10-18
Applicant: KLA-Tencor Corporation
Inventor： Amnon Manassen , Ohad Bachar , Daria Negri , Boris Golovanevsky , Barak Bringoltz , Daniel Kandel , Yoel Feler , Noam Sapiens , Paykin Irina , Alexander Svizher , Meir Aloni , Guy Ben Dov , Hadar Shalmoni , Vladimir Levinski
CPC classification number: G01B9/0209 , G01B9/02027 , G01B9/02043 , G01B9/02087 , G01N21/45
Abstract: Systems and methods are provided which derive target characteristics from interferometry images taken at multiple phase differences between target beams and reference beams yielding the interferometry images. The illumination of the target and the reference has a coherence length of less than 30 microns to enable scanning the phase through the coherence length of the illumination. The interferometry images are taken at the pupil plane and/or in the field plane to combine angular and spectroscopic scatterometry data that characterize and correct target topography and enhance the performance of metrology systems.
Abstract translation: 提供了系统和方法，其从在目标光束和参考光束之间的多个相位差处拍摄的产生干涉测量图像的干涉测量图像中导出目标特征。 目标和参考物的照明具有小于30微米的相干长度，以使得能够通过照明的相干长度扫描相位。 在瞳孔平面和/或场平面中拍摄干涉测量图像，以组合表征和校正目标地形的角度和光谱散射数据，并增强计量系统的性能。
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15.发明授权Method and system for providing a target design displaying high sensitivity to scanner focus change 有权用于提供对扫描仪焦点变化显示高灵敏度的目标设计的方法和系统公开(公告)号：US09454072B2
公开(公告)日：2016-09-27
申请号：US14074412
申请日：2013-11-07
Applicant: KLA-Tencor Corporation
Inventor： Vladimir Levinski , Yoel Feler , Daniel Kandel
CPC classification number: G03F1/38 , G01B11/14 , G03F1/70 , G03F7/70641 , G03F7/70683
Abstract: A segmented mask includes a set of cell structures, wherein each cell structure includes a set of features having an unresolvable segmentation pitch along a first direction, wherein the unresolvable segmentation pitch along the first direction is smaller than the illumination of the lithography printing tool, wherein the plurality of cell structures have a pitch along a second direction perpendicular to the first direction, wherein the unresolvable segmentation pitch is suitable for generating a printed pattern for shifting the best focus position of the lithography tool by a selected amount to achieve a selected level of focus sensitivity.
Abstract translation: 分割的掩模包括一组单元结构，其中每个单元结构包括沿着第一方向具有不可解析的分割间距的一组特征，其中沿着第一方向的不可解析的分割间距小于光刻印刷工具的照明，其中 所述多个单元结构具有沿着垂直于所述第一方向的第二方向的间距，其中所述不可分辨的分割间距适于产生用于将所述光刻工具的最佳聚焦位置移动所选量的印刷图案，以实现所选择的等级 聚焦灵敏度。
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Patent Agency Ranking
公开(公告)号：US20160103946A1
公开(公告)日：2016-04-14
申请号：US14974732
申请日：2015-12-18
Applicant: KLA-Tencor Corporation
Inventor： Mohamed El Kodadi , Nuriel Amir , Roie Volkovich , Vladimir Levinski , Yoel Feler , Daniel Kandel , Nadav Gutman , Stilian Pandev , Dzimtry Sanko
CPC classification number: G06F17/5081 , G01N21/4785 , G03F7/70641 , G03F7/70683 , G06F17/5072
Abstract: Target designs and methods are provided, which relate to periodic structures having elements recurring with a first pitch in a first direction. The elements are periodic with a second pitch along a second direction that is perpendicular to the first direction and are characterized in the second direction by alternating, focus-sensitive and focus-insensitive patterns with the second pitch. In the produced targets, the first pitch may be about the device pitch and the second pitch may be several times larger. The first, focus-insensitive pattern may be produced to yield a first critical dimension and the second, focus-sensitive pattern may be produced to yield a second critical dimension that may be equal to the first critical dimension only when specified focus requirements are satisfied, or provide scatterometry measurements of zeroth as well as first diffraction orders, based on the longer pitch along the perpendicular direction.
Abstract translation: 提供了目标设计和方法，其涉及具有在第一方向上以第一间距重复的元件的周期性结构。 这些元件沿着与第一方向垂直的第二方向具有第二间距周期性，并且通过具有第二间距的交替的，聚焦敏感的和不对焦的图案在第二方向上表征。 在所产生的目标中，第一节距可以是关于装置间距，而第二节距可以是数倍。 可以产生第一个不对焦模式以产生第一临界尺寸，并且可以产生第二焦点敏感图案以仅在满足指定的焦点要求时产生可等于第一临界尺寸的第二临界尺寸， 或者基于沿着垂直方向的较长的间距来提供零和第一衍射级的散射测量。
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公开(公告)号：US09255895B2
公开(公告)日：2016-02-09
申请号：US14500162
申请日：2014-09-29
Applicant: KLA-Tencor Corporation
Inventor： Daniel Kandel , Vladimir Levinski , Noam Sapiens
IPC: G01N21/956 , G01B11/14 , G01B11/24 , G03F7/20
CPC classification number: G01N21/95607 , G01B11/14 , G01B11/24 , G01B2210/56 , G03F7/70633
Abstract: A method for determining an overlay offset may include, but is not limited to: obtaining a first anti-symmetric differential signal (ΔS1) associated with a first scatterometry cell; obtaining a second anti-symmetric differential signal (ΔS2) associated with a second scatterometry cell and computing an overlay offset from the first anti-symmetric differential (ΔS1) signal associated with the first scatterometry cell and the second anti-symmetric differential signal (ΔS2) associated with the second scatterometry cell.
Abstract translation: 用于确定覆盖偏移的方法可以包括但不限于：获得与第一散射测量单元相关联的第一反对称差分信号（＆Dgr; S1）; 获得与第二散射测量单元相关联的第二反对称差分信号（＆Dgr; S2），并计算与第一散射测量单元和第二反对称差分相关联的第一反对称差分（＆Dgr; S1）信号的叠加偏移 与第二散射测量单元相关联的信号（＆Dgr; S2）。
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公开(公告)号：US09080971B2
公开(公告)日：2015-07-14
申请号：US14516540
申请日：2014-10-16
Applicant: KLA-Tencor Corporation
Inventor： Daniel Kandel , Vladimir Levinski , Alexander Svizher , Joel Seligson , Andrew Hill , Ohad Bachar , Amnon Manassen , Yung-Ho Alex Chuang , Ilan Sela , Moshe Markowitz , Daria Negri , Efraim Rotem
CPC classification number: G01N21/47 , G01B11/02 , G01B11/0641 , G01B2210/56 , G01N21/211 , G01N21/9501 , G01N21/956 , G01N2021/4792 , G01N2201/06113 , G01N2201/105 , G03F7/70625 , G03F7/70633
Abstract: Various metrology systems and methods are provided. One metrology system includes a light source configured to produce a diffraction-limited light beam, an apodizer configured to shape the light beam in the entrance pupil of illumination optics, and optical elements configured to direct the diffraction-limited light beam from the apodizer to an illumination spot on a grating target on a wafer and to collect scattered light from the grating target. The metrology system further includes a field stop and a detector configured to detect the scattered light that passes through the field stop. In addition, the metrology system includes a computer system configured to determine a characteristic of the grating target using output of the detector.
Abstract translation: 提供了各种计量系统和方法。 一个计量系统包括被配置为产生衍射受限光束的光源，被配置为使照明光学器件的入射光瞳中的光束成形的变迹器，以及被配置为将来自变迹器的衍射受限光束引导到 在晶片上的光栅目标上的照明点并且收集来自光栅目标的散射光。 测量系统还包括场停止器和检测器，其被配置为检测通过场停止器的散射光。 此外，计量系统包括被配置为使用检测器的输出来确定光栅目标的特性的计算机系统。
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公开(公告)号：US10591406B2
公开(公告)日：2020-03-17
申请号：US15092329
申请日：2016-04-06
Applicant: KLA-Tencor Corporation
Inventor： Barak Bringoltz , Daniel Kandel , Yoel Feler , Noam Sapiens , Paykin Irina , Alexander Svizher , Meir Aloni , Guy Ben Dov , Hadar Shalmoni , Vladimir Levinski
Abstract: Metrology methods, systems and targets are provided, which implement a side by side paradigm. Adjacent cells with periodic structures are used to extract the overlay error, e.g., by introducing controllable phase shifts or image shifts which enable algorithmic computation of the overlay. The periodic structures are designed to exhibit a rotational symmetry to support the computation and reduce errors.
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公开(公告)号：US10203247B2
公开(公告)日：2019-02-12
申请号：US15369560
申请日：2016-12-05
Applicant: KLA-Tencor Corporation
Inventor： Gregory R. Brady , Andrei V. Shchegrov , Lawrence D. Rotter , Derrick A. Shaughnessy , Anatoly Shchemelinin , Ilya Bezel , Muzammil A. Arain , Anatoly A. Vasiliev , James Andrew Allen , Oleg Shulepov , Andrew V. Hill , Ohad Bachar , Moshe Markowitz , Yaron Ish-Shalom , Ilan Sela , Amnon Manassen , Alexander Svizher , Maxim Khokhlov , Avi Abramov , Oleg Tsibulevsky , Daniel Kandel , Mark Ghinovker
IPC: H01J65/04 , G01J3/02 , G01J3/10 , F21V13/08 , F21V13/00 , F21V13/12 , G02B6/35 , G02B6/293 , G01J3/12
Abstract: A system for providing illumination to a measurement head for optical metrology is configured to combine illumination beams from a plurality of illumination sources to deliver illumination at one or more selected wavelengths to the measurement head. The intensity and/or spatial coherence of illumination delivered to the measurement head is controlled. Illumination at one or more selected wavelengths is delivered from a broadband illumination source configured for providing illumination at a continuous range of wavelengths.
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