公开(公告)号：US07847416B2

公开(公告)日：2010-12-07

申请号：US12498913

申请日：2009-07-07

Applicant: Hyun-Soo Chung ,  In-Young Lee ,  Son-Kwan Hwang ,  Dong-Ho Lee ,  Seong-Deok Hwang

Inventor： Hyun-Soo Chung ,  In-Young Lee ,  Son-Kwan Hwang ,  Dong-Ho Lee ,  Seong-Deok Hwang

IPC: H01L23/48 ,  H01L23/52 ,  H01L29/40

CPC classification number: H01L25/50 ,  H01L21/76898 ,  H01L25/0657 ,  H01L29/0657 ,  H01L2224/0401 ,  H01L2224/05548 ,  H01L2224/05567 ,  H01L2224/0557 ,  H01L2224/06181 ,  H01L2224/13025 ,  H01L2224/94 ,  H01L2225/06513 ,  H01L2225/06541 ,  H01L2225/06555 ,  H01L2225/06586 ,  H01L2924/0002 ,  H01L2924/01006 ,  H01L2924/01024 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01038 ,  H01L2924/01047 ,  H01L2924/01074 ,  H01L2924/01079 ,  H01L2924/01093 ,  H01L2224/11 ,  H01L2224/05552

Abstract: Wafer level packages and methods of fabricating the same are provided. In one embodiment, one of the methods comprises forming semiconductor chips having a connection pad on a wafer, patterning a bottom surface of the wafer to form a trench under the connection pad, patterning a bottom surface of the trench to form a via hole exposing the bottom surface of the connection pad, and forming a connecting device connected to the connection pad through the via hole. The invention provides a wafer level package having reduced thickness, lower fabrication costs, and increased reliability compared to conventional packages.

Abstract translation: 提供了晶片级封装及其制造方法。 在一个实施例中，方法之一包括形成在晶片上具有连接焊盘的半导体芯片，图案化晶片的底表面以在连接焊盘下方形成沟槽，图案化沟槽的底表面以形成通孔， 并且通过通孔形成连接到连接垫的连接装置。 本发明提供了与传统封装相比，具有减小的厚度，较低的制造成本和增加的可靠性的晶片级封装。

公开(公告)号：US07830017B2

公开(公告)日：2010-11-09

申请号：US11950251

申请日：2007-12-04

Applicant: In-Young Lee ,  Dong-Ho Lee ,  Nam-Seog Kim ,  Hyun-Soo Chung ,  Ho-Jin Lee ,  Myeong-Soo Park

Inventor： In-Young Lee ,  Dong-Ho Lee ,  Nam-Seog Kim ,  Hyun-Soo Chung ,  Ho-Jin Lee ,  Myeong-Soo Park

IPC: H01L23/48 ,  H01L23/52

CPC classification number: H01L23/525 ,  H01L23/3114 ,  H01L24/11 ,  H01L24/12 ,  H01L24/16 ,  H01L2224/05001 ,  H01L2224/05008 ,  H01L2224/05026 ,  H01L2224/05124 ,  H01L2224/05147 ,  H01L2224/05166 ,  H01L2224/05548 ,  H01L2224/05569 ,  H01L2224/056 ,  H01L2224/05647 ,  H01L2224/05666 ,  H01L2224/11334 ,  H01L2224/1147 ,  H01L2224/13099 ,  H01L2224/13144 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/16 ,  H01L2924/01013 ,  H01L2924/01022 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01047 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/014 ,  H01L2924/351 ,  H01L2924/00 ,  H01L2924/00014 ,  H01L2924/013

Abstract: Provided are a wafer level chip scale package in which a redistribution process is applied at a wafer level, a manufacturing method thereof, and a semiconductor chip module including the wafer level chip scale package. The wafer level chip scale package includes a semiconductor chip having a bonding pad, a first insulating layer disposed on the semiconductor chip so as to expose the bonding pad, a redistribution line disposed on the exposed bonding pad and the first insulating layer, a sacrificial layer disposed below a redistribution pad of the redistribution line, a second insulating layer disposed on the redistribution line so as to expose the redistribution pad and including a crack inducement hole disposed beside the sacrificial layer, and an external connection terminal attached to the redistribution pad.

Abstract translation: 提供了其中在晶片级应用再分配处理的晶片级芯片级封装，其制造方法以及包括晶片级芯片级封装的半导体芯片模块。 晶片级芯片级封装包括具有接合焊盘的半导体芯片，设置在半导体芯片上以暴露焊盘的第一绝缘层，设置在暴露的焊盘和第一绝缘层上的再分配线，牺牲层 设置在所述再分配线的再分配衬垫的下方，设置在所述再分配线上的第二绝缘层，以暴露所述再分配衬垫并且包括设置在所述牺牲层旁边的裂纹诱导孔，以及附接到所述再分布衬垫的外部连接端子。

公开(公告)号：US07777345B2

公开(公告)日：2010-08-17

申请号：US12132925

申请日：2008-06-04

Applicant: Ho-Jin Lee ,  Nam-Seog Kim ,  Yong-Chai Kwon ,  Hyun-Soo Chung ,  In-Young Lee ,  Son-Kwan Hwang

Inventor： Ho-Jin Lee ,  Nam-Seog Kim ,  Yong-Chai Kwon ,  Hyun-Soo Chung ,  In-Young Lee ,  Son-Kwan Hwang

IPC: H01L23/48

CPC classification number: H01L24/05 ,  H01L23/481 ,  H01L24/03 ,  H01L24/06 ,  H01L24/13 ,  H01L24/32 ,  H01L25/0657 ,  H01L2224/02372 ,  H01L2224/034 ,  H01L2224/036 ,  H01L2224/0401 ,  H01L2224/05009 ,  H01L2224/05011 ,  H01L2224/05552 ,  H01L2224/05559 ,  H01L2224/05561 ,  H01L2224/05624 ,  H01L2224/05639 ,  H01L2224/05644 ,  H01L2224/05647 ,  H01L2224/06136 ,  H01L2224/06181 ,  H01L2224/08146 ,  H01L2224/32145 ,  H01L2225/06513 ,  H01L2225/06517 ,  H01L2225/06541 ,  H01L2924/0002 ,  H01L2924/01013 ,  H01L2924/01014 ,  H01L2924/0102 ,  H01L2924/01022 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01047 ,  H01L2924/0105 ,  H01L2924/01074 ,  H01L2924/01075 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/014 ,  H01L2924/19041 ,  H01L2924/00014

Abstract: A semiconductor device having a through electrode and a method of fabricating the same are disclosed. In one embodiment, a semiconductor device includes a first insulating layer formed on a semiconductor substrate. A wiring layer having a first aperture to expose a portion of the first insulating layer is formed on the first insulating layer. A second insulating layer is formed on an upper portion of the wiring layer and in the first aperture. A conductive pad having a second aperture to expose a portion of the second insulating layer is formed on the second insulating layer. A through hole with a width narrower than widths of the first and second apertures is formed through the first and second insulating layers and an upper portion of the semiconductor substrate. A through electrode is formed in the through hole.

Abstract translation: 公开了一种具有通孔的半导体器件及其制造方法。 在一个实施例中，半导体器件包括形成在半导体衬底上的第一绝缘层。 具有用于露出第一绝缘层的一部分的第一孔的布线层形成在第一绝缘层上。 第二绝缘层形成在布线层的上部和第一孔中。 具有第二孔径以暴露第二绝缘层的一部分的导电焊盘形成在第二绝缘层上。 通过第一和第二绝缘层和半导体衬底的上部形成宽度比第一和第二孔的宽度窄的通孔。 在通孔中形成贯通电极。

公开(公告)号：US20080150089A1

公开(公告)日：2008-06-26

申请号：US11979562

申请日：2007-11-06

Applicant: Yong-Chai Kwon ,  Dong-Ho Lee ,  In-Young Lee

Inventor： Yong-Chai Kwon ,  Dong-Ho Lee ,  In-Young Lee

IPC: H01L23/48 ,  H01L21/4763

CPC classification number: H01L21/76898 ,  H01L25/0657 ,  H01L25/50 ,  H01L2224/05001 ,  H01L2224/05009 ,  H01L2224/05025 ,  H01L2224/0557 ,  H01L2224/13025 ,  H01L2224/16145 ,  H01L2224/16225 ,  H01L2225/06513 ,  H01L2225/06541 ,  H01L2924/00014 ,  H01L2924/15311 ,  H01L2224/05599 ,  H01L2224/05099

Abstract: A method of fabricating a semiconductor device is provided. The method may include forming an insulating layer on a wafer. The wafer may have an active surface and an inactive surface which face each other, and the insulating layer may be formed on the active surface. A pad may be formed on the insulating layer, and a first hole may be formed in the insulating layer. A first hole insulating layer may then be formed on an inner wall of the first hole. A second hole may be formed under the first hole. The second hole may be formed to extend from the first hole into the wafer. A second hole insulating layer may be formed on an inner wall of the second hole. The semiconductor device fabricated according to the method may also be provided.

Abstract translation: 提供一种制造半导体器件的方法。 该方法可以包括在晶片上形成绝缘层。 晶片可以具有彼此面对的有源表面和非活性表面，并且绝缘层可以形成在有源表面上。 可以在绝缘层上形成焊盘，并且可以在绝缘层中形成第一孔。 然后可以在第一孔的内壁上形成第一孔绝缘层。 可以在第一孔下方形成第二孔。 第二孔可以形成为从第一孔延伸到晶片。 第二孔绝缘层可以形成在第二孔的内壁上。 还可以提供根据该方法制造的半导体器件。

公开(公告)号：US20070269931A1

公开(公告)日：2007-11-22

申请号：US11752219

申请日：2007-05-22

Applicant: Hyun-Soo Chung ,  In-Young Lee ,  Son-Kwan Hwang ,  Dong-Ho Lee ,  Seong-Deok Hwang

Inventor： Hyun-Soo Chung ,  In-Young Lee ,  Son-Kwan Hwang ,  Dong-Ho Lee ,  Seong-Deok Hwang

IPC: H01L21/00

CPC classification number: H01L25/50 ,  H01L21/76898 ,  H01L25/0657 ,  H01L29/0657 ,  H01L2224/0401 ,  H01L2224/05548 ,  H01L2224/05567 ,  H01L2224/0557 ,  H01L2224/06181 ,  H01L2224/13025 ,  H01L2224/94 ,  H01L2225/06513 ,  H01L2225/06541 ,  H01L2225/06555 ,  H01L2225/06586 ,  H01L2924/0002 ,  H01L2924/01006 ,  H01L2924/01024 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01038 ,  H01L2924/01047 ,  H01L2924/01074 ,  H01L2924/01079 ,  H01L2924/01093 ,  H01L2224/11 ,  H01L2224/05552

Abstract: Wafer level packages and methods of fabricating the same are provided. In one embodiment, one of the methods comprises forming semiconductor chips having a connection pad on a wafer, patterning a bottom surface of the wafer to form a trench under the connection pad, patterning a bottom surface of the trench to form a via hole exposing the bottom surface of the connection pad, and forming a connecting device connected to the connection pad through the via hole. The invention provides a wafer level package having reduced thickness, lower fabrication costs, and increased reliability compared to conventional packages.

Abstract translation: 提供了晶片级封装及其制造方法。 在一个实施例中，方法之一包括形成在晶片上具有连接焊盘的半导体芯片，图案化晶片的底表面以在连接焊盘下方形成沟槽，图案化沟槽的底表面以形成通孔， 并且通过通孔形成连接到连接垫的连接装置。 本发明提供了与传统封装相比，具有减小的厚度，较低的制造成本和增加的可靠性的晶片级封装。

公开(公告)号：US20050127508A1

公开(公告)日：2005-06-16

申请号：US10897124

申请日：2004-07-23

Applicant: In-Young Lee ,  Gu-Sung Kim ,  Se-Young Jeong ,  Sun-Young Park

Inventor： In-Young Lee ,  Gu-Sung Kim ,  Se-Young Jeong ,  Sun-Young Park

IPC: H01L23/52 ,  H01L21/60 ,  H01L23/485 ,  H05K3/34 ,  H01L21/44 ,  H01L29/40

CPC classification number: H01L24/13 ,  H01L24/11 ,  H01L2224/05001 ,  H01L2224/05026 ,  H01L2224/05124 ,  H01L2224/05572 ,  H01L2224/05647 ,  H01L2224/05655 ,  H01L2224/05671 ,  H01L2224/13099 ,  H01L2224/131 ,  H01L2224/13111 ,  H01L2224/13113 ,  H01L2224/13116 ,  H01L2224/13139 ,  H01L2224/13144 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/13164 ,  H01L2224/13169 ,  H01L2224/136 ,  H01L2224/13611 ,  H01L2224/13613 ,  H01L2224/13616 ,  H01L2224/13639 ,  H01L2224/13644 ,  H01L2224/13647 ,  H01L2224/13655 ,  H01L2224/16 ,  H01L2924/0001 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01024 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01046 ,  H01L2924/01047 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/014 ,  H01L2924/14 ,  H01L2924/351 ,  H05K3/3436 ,  H05K2201/0367 ,  H05K2203/0465 ,  Y02P70/613 ,  H01L2924/00014 ,  H01L2924/00

Abstract: A solder bump structure may have a metal stud formed on a chip pad of a semiconductor chip. Surfaces of the metal stud may be plated with a solder. The metal stud may be located on a substrate pad of the substrate. The substrate pad may have a pre-solder applied thereto. After a solder reflow, the solder bump may have a concave shape.

Abstract translation: 焊料凸块结构可以具有形成在半导体芯片的芯片焊盘上的金属螺柱。 金属螺柱的表面可以镀有焊料。 金属螺柱可以位于衬底的衬底焊盘上。 衬底垫可以具有施加到其上的预焊料。 在焊料回流之后，焊料凸点可以具有凹形。

公开(公告)号：US06504450B2

公开(公告)日：2003-01-07

申请号：US09798908

申请日：2001-03-06

Applicant: Duk-Yong Kim ,  Yoon-Bae Lee ,  Gyu-Sang Hwang ,  In-Young Lee ,  Sang-Wook Bang ,  Chang-Yun Seo ,  Kyoung-Ho Lee ,  Sung-Soo Lee ,  Yoon-Yong Kim ,  Taek-Dong Kim

Inventor： Duk-Yong Kim ,  Yoon-Bae Lee ,  Gyu-Sang Hwang ,  In-Young Lee ,  Sang-Wook Bang ,  Chang-Yun Seo ,  Kyoung-Ho Lee ,  Sung-Soo Lee ,  Yoon-Yong Kim ,  Taek-Dong Kim

IPC: H01P118

CPC classification number: H01P1/184

Abstract: A signal process apparatus of the present invention is capable of shifting phases of signals inputted thereto and attenuating the signals, simultaneously. The signal process apparatus includes a dielectric member provided with a first and a second portions, a plurality of transmission lines positioned opposite the dielectric member for transmitting the signals and means for rotating the dielectric member to an axis perpendicular to a surface of the dielectric member which is parallel to the transmission lines. In the signal process apparatus, a dielectric constant of the first portion is different from that of the second portion. Each of the signals is inputted to a corresponding transmission line. After each of the signals is passing through the corresponding transmission line, it has a phase shifted by rotating the dielectric member.

公开(公告)号：US10767248B2

公开(公告)日：2020-09-08

申请号：US15553688

申请日：2016-02-24

Applicant: In-Young Lee

Inventor： In-Young Lee ,  Kang-Hyung Kim ,  Hyun-Seok Jeon

IPC: C22C23/04 ,  C22C1/02 ,  C22C23/06

Abstract: Disclosed is a magnesium alloy that has high thermal conductivity and flame retardancy and facilitates plastic working, wherein magnesium is added with 0.5 to 5 wt % of zinc (Zn) and 0.3 to 2.0 wt % of at least one of yttrium (Y) and mischmetal, with, as necessary, 1.0 wt % or less of at least one selected from among calcium (Ca), silicon (Si), manganese (Mn) and tin (Sn), the total amount of alloy elements being 2.5 to 6 wt %. A method of manufacturing the same is also provided, including preparing a magnesium-zinc alloy melt in a melting furnace, adding high-melting-point elements in the form of a master alloy and melting them, and performing mechanical stirring during cooling of a cast material in a continuous casting mold containing the magnesium alloy melt, thus producing a magnesium alloy cast material having low segregation, after which a chill is removed from the cast material or diffusion annealing is performed, followed by molding through a tempering process such as rolling, extrusion or forging. This magnesium alloy is improved in ductility by the action of alloy elements for inhibiting the formation of lamella precipitates due to a low-melting-point eutectic phase in a magnesium matrix structure, can be extruded even at a pressure of 1,000 kgf/cm2 or less due to the increased plasticity thereof, and can exhibit thermal conductivity of 100 W/m·K or more and flame retardancy satisfying the requirements for aircraft materials and is thus suitable for use in fields requiring fire safety, thereby realizing wide application thereof as a heat sink or a structural material for portable appliances, vehicles and aircraft components and contributing to weight reduction.

公开(公告)号：US08088648B2

公开(公告)日：2012-01-03

申请号：US12840656

申请日：2010-07-21

Applicant: Cha-Jea Jo ,  Myung-Kee Chung ,  Nam-Seog Kim ,  In-Young Lee ,  Seok-Ho Kim ,  Ho-Jin Lee ,  Ju-Il Choi ,  Chang-Woo Shin

Inventor： Cha-Jea Jo ,  Myung-Kee Chung ,  Nam-Seog Kim ,  In-Young Lee ,  Seok-Ho Kim ,  Ho-Jin Lee ,  Ju-Il Choi ,  Chang-Woo Shin

IPC: H01L21/50 ,  H01L21/60

CPC classification number: H01L23/3128 ,  H01L21/76898 ,  H01L23/481 ,  H01L25/0657 ,  H01L25/50 ,  H01L2224/05001 ,  H01L2224/05009 ,  H01L2224/05025 ,  H01L2224/05124 ,  H01L2224/05166 ,  H01L2224/05181 ,  H01L2224/05184 ,  H01L2224/05644 ,  H01L2224/05647 ,  H01L2224/05655 ,  H01L2224/13025 ,  H01L2224/16145 ,  H01L2225/06513 ,  H01L2225/06527 ,  H01L2225/06541 ,  H01L2924/00014 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/04941 ,  H01L2924/15311 ,  H01L2224/05599

Abstract: A chip stack package includes a substrate, a plurality of chips, a plurality of adhesive layers and a plug. The substrate has a wiring pattern and a seed layer formed on the wiring pattern. Each of the chips has an electrode pad and a first through-hole that penetrates the electrode pad. The chips are stacked such that the first through-holes are aligned on the seed layer of the substrate. The adhesive layers are interposed between the substrate and one of the chips, as well as between the chips. Each of the adhesive layers has a second through-hole connected to the first through-hole. The plug fills up the first through-holes and the second through-holes and electrically connects the electrode pads to the wiring pattern of the substrate. A cross-sectional area of the plug in the second through-holes may be larger than that of the plug in the first through-holes.

Abstract translation: 芯片堆叠封装包括基板，多个芯片，多个粘合剂层和插头。 基板具有形成在布线图案上的布线图案和种子层。 每个芯片具有电极焊盘和穿过电极焊盘的第一通孔。 芯片被堆叠，使得第一通孔在衬底的籽晶层上排列。 粘合层介于基片和芯片之一之间以及芯片之间。 每个粘合层具有连接到第一通孔的第二通孔。 插头填充第一通孔和第二通孔，并将电极焊盘电连接到衬底的布线图案。 第二通孔中的插塞的横截面面积可以大于第一通孔中的插头的横截面面积。

公开(公告)号：US07732319B2

公开(公告)日：2010-06-08

申请号：US11875713

申请日：2007-10-19

Applicant: Se-Young Jeong ,  Sung-Min Sim ,  Soon-Bum Kim ,  In-Young Lee ,  Young-Hee Song

Inventor： Se-Young Jeong ,  Sung-Min Sim ,  Soon-Bum Kim ,  In-Young Lee ,  Young-Hee Song

IPC: H01L21/44

CPC classification number: H01L24/05 ,  H01L23/3192 ,  H01L24/03 ,  H01L24/11 ,  H01L24/12 ,  H01L2224/0401 ,  H01L2224/05008 ,  H01L2224/05018 ,  H01L2224/05556 ,  H01L2224/05558 ,  H01L2224/05571 ,  H01L2224/05572 ,  H01L2224/05624 ,  H01L2224/05647 ,  H01L2224/13099 ,  H01L2224/131 ,  H01L2224/16 ,  H01L2924/0002 ,  H01L2924/01005 ,  H01L2924/01013 ,  H01L2924/01014 ,  H01L2924/01015 ,  H01L2924/01028 ,  H01L2924/01029 ,  H01L2924/0103 ,  H01L2924/01033 ,  H01L2924/01074 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/014 ,  H01L2924/05042 ,  H01L2924/14 ,  H01L2924/00014 ,  H01L2924/00012 ,  H01L2224/05552

Abstract: An interconnection structure includes an integrated circuit (IC) chip having internal circuitry and a terminal to electrically connect the internal circuitry to an external circuit, a passivation layer disposed on a top surface of the IC chip, the passivation layer configured to protect the internal circuitry and to expose the terminal, an input/output (I/O) pad, where the I/O pad includes a first portion in contact with the terminal and a second portion that extends over the passivation layer, and an electroless plating layer disposed on the I/O pad.

Abstract translation: 互连结构包括具有内部电路的集成电路（IC）芯片和用于将内部电路电连接到外部电路的端子，设置在IC芯片的顶表面上的钝化层，钝化层被配置为保护内部电路 以及使所述终端暴露于所述I / O焊盘包括与所述端子接触的第一部分和在所述钝化层上延伸的第二部分的输入/输出（I / O）焊盘，以及设置在所述钝化层上的无电镀层 I / O板。