公开(公告)号：US20150076362A1

公开(公告)日：2015-03-19

申请号：US14396769

申请日：2013-04-18

Applicant: Hitachi High-Technologies Corporation

Inventor： Yasunari Sohda ,  Tasuku Yano ,  Muneyuki Fukuda ,  Noritsugu Takahashi ,  Hajime Kawano ,  Hiroyuki Ito

IPC: H01J37/141 ,  H01J37/147 ,  H01J37/28

CPC classification number: H01J37/141 ,  H01J37/147 ,  H01J37/1475 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/1405 ,  H01J2237/1532 ,  H01J2237/1536

Abstract: In order to provide a charged particle beam apparatus enabling reduction of deflecting coma aberration in cases such as where wide field-of-view scanning is carried out, a charged particle beam apparatus is provided with an electromagnetic objective lens and a stage on which a sample is placed, wherein the electromagnetic objective lens is provided with the following: a plurality of magnetic paths; an objective lens coil; an opening disposed so as to face the sample; an inner lens deflector disposed more on the objective lens coil side than the end of the opening.

Abstract translation: 为了提供在诸如进行宽视场扫描的情况下能够减少偏转彗形像差的带电粒子束装置，带电粒子束装置设置有电磁物镜和在其上具有样品 放置，其中电磁物镜设置有：多个磁路; 物镜线圈; 设置成面向样品的开口; 设置在比开口端部更靠物镜线圈侧的内透镜偏转器。

公开(公告)号：US09159533B2

公开(公告)日：2015-10-13

申请号：US14334837

申请日：2014-07-18

Applicant: Hitachi High-Technologies Corporation

Inventor： Muneyuki Fukuda ,  Naomasa Suzuki ,  Tomoyasu Shojo ,  Noritsugu Takahashi

IPC: A61N5/00 ,  G21G5/00 ,  H01J37/28 ,  H01J37/145 ,  G01N23/225

CPC classification number: H01J37/28 ,  G01N23/225 ,  H01J37/145 ,  H01J2237/21 ,  H01J2237/28

Abstract: A lower pole piece of an electromagnetic superposition type objective lens is divided into an upper magnetic path and a lower magnetic path. A voltage nearly equal to a retarding voltage is applied to the lower magnetic path. An objective lens capable of acquiring an image with a higher resolution and a higher contrast than a conventional image is provided. An electromagnetic superposition type objective lens includes a magnetic path that encloses a coil, a cylindrical or conical booster magnetic path that surrounds an electron beam, a control magnetic path that is interposed between the coil and sample, an accelerating electric field control unit that accelerates the electron beam using a booster power supply, a decelerating electric field control unit that decelerates the electron beam using a stage power supply, and a suppression unit that suppresses electric discharge of the sample using a control magnetic path power supply.

Abstract translation: 电磁叠加型物镜的下极片分为上磁路和下磁路。 几乎等于延迟电压的电压被施加到下磁路。 提供了能够获得具有比常规图像更高分辨率和更高对比度的图像的物镜。 电磁叠加型物镜包括包围线圈的磁路，围绕电子束的圆柱形或锥形增强器磁路，介于线圈和样品之间的控制磁路，加速电场控制单元，其加速 使用升压电源的电子束，使用级电源减速电子束的减速电场控制部，以及抑制使用控制磁路电源对样品进行放电的抑制部。

公开(公告)号：US08859962B2

公开(公告)日：2014-10-14

申请号：US14215209

申请日：2014-03-17

Applicant: Hitachi High-Technologies Corporation

Inventor： Noritsugu Takahashi ,  Muneyuki Fukuda ,  Manabu Yano ,  Hirohiko Kitsuki ,  Kazunari Asao ,  Tomoyasu Shojo

IPC: G01N23/00 ,  H01J37/28 ,  H01J37/10

CPC classification number: H01J37/28 ,  H01J37/10 ,  H01J37/145 ,  H01J37/21 ,  H01J2237/2817

Abstract: A charged-particle-beam device is characterized in having a control value for an aligner coil (29) being determined by: a coil current and an electrode applied-voltage at a control value for objectives (30, 31), which is an electromagnetic-field superposition lens; a control value for image-shift coils (27, 28); and the acceleration voltage of the charged-particle-beam. By doing this, it has become possible to avoid image disturbances that occur on images to be displayed at boundaries between charged areas and non-charged areas, and provide a charged-particle-beam device that obtains clear images without any unevenness in brightness.

Abstract translation: 带电粒子束装置的特征在于具有对准线圈（29）的控制值，通过以下方式确定：线圈电流和用于物镜（30,31）的控制值的电极施加电压，其为电磁 场叠加透镜; 图像转换线圈（27,28）的控制值; 和带电粒子束的加速电压。 通过这样做，可以避免在充电区域和非充电区域之间的边界处显示图像上出现的图像干扰，并且提供获得清晰图像而没有任何亮度不均匀的带电粒子束装置。

公开(公告)号：US09892887B2

公开(公告)日：2018-02-13

申请号：US15292832

申请日：2016-10-13

Applicant: Hitachi High-Technologies Corporation

Inventor： Muneyuki Fukuda ,  Yoshinori Momonoi ,  Akihiro Miura ,  Fumihiro Sasajima ,  Hiroaki Mito

IPC: H01J37/00 ,  H01J37/22 ,  H01J37/28

CPC classification number: H01J37/22 ,  H01J37/21 ,  H01J37/28 ,  H01J2237/024 ,  H01J2237/216 ,  H01J2237/2817

Abstract: The invention has an object to provide a charged particle beam device in which it is possible to perform proper beam adjustment while suppressing a decrease in MAM time, with a simple configuration without adding a lens, a sensor, or the like. In order to achieve the above object, according to the invention, there is provided a charged particle beam device including: an optical element which adjusts a charged particle beam emitted from a charged particle source; an adjustment element which adjusts an incidence condition of the charged particle beam with respect to the optical element; and a control device which controls the adjustment element, wherein the control device determines a difference between a first feature amount indicating a state of the optical element based on the condition setting of the optical element, and a second feature amount indicating a state where the optical element reaches based on the condition setting and executes adjustment by the adjustment element when the difference is greater than or equal to a predetermined value.

公开(公告)号：US20140339425A1

公开(公告)日：2014-11-20

申请号：US14364392

申请日：2012-11-26

Applicant: Hitachi High-technologies Corporation

Inventor： Tasuku Yano ,  Yasunari Sohda ,  Muneyuki Fukuda ,  Katsunori Onuki ,  Hajime Kawano ,  Naomasa Suzuki

IPC: G01B15/00 ,  H01J37/244 ,  H01J37/21

CPC classification number: G01B15/00 ,  G01B2210/56 ,  H01J37/21 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/20 ,  H01J2237/281 ,  H01L22/12

Abstract: A scanning electron beam device having: a deflector (5) for deflecting an electron beam (17) emitted from an electron source (1); an objective lens (7) for causing the electron beam to converge; a retarding electrode; a stage (9) for placing a wafer (16); and a controller (15); wherein the stage can be raised and lowered. In the low acceleration voltage region, the controller performs rough adjustment and fine adjustment of the focus in relation to the variation in the height of the wafer using electromagnetic focusing performed through excitation current adjustment of the objective lens. In the high acceleration voltage region, the controller performs rough adjustment of the focus in relation to the variation in the height of the wafer by mechanical focusing performed through raising and lowering of the stage, and performs fine adjustment by electrostatic focusing performed through adjustment of the retarding voltage. It thereby becomes possible to provide a scanning electron beam device that measures, in a highly accurate manner, both the upper part and the bottom part of a groove or a hole having a high aspect ratio.

Abstract translation: 一种扫描电子束装置，具有：用于偏转从电子源（1）发射的电子束（17）的偏转器（5）。 用于使电子束会聚的物镜（7）; 延迟电极; 用于放置晶片（16）的平台（9）; 和控制器（15）; 其中可以升高和降低载物台。 在低加速度电压区域中，控制器使用通过物镜的激励电流调节执行的电磁聚焦，相对于晶片的高度变化而进行粗略调整和微调。 在高加速电压区域中，控制器通过机架上升和下降进行机械聚焦，进行相对于晶片高度变化的聚焦的粗略调整，通过调整 延迟电压。 从而可以提供一种以高度准确的方式测量具有高纵横比的凹槽或孔的上部和底部两者的扫描电子束装置。