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公开(公告)号:US10361065B2
公开(公告)日:2019-07-23
申请号:US15760994
申请日:2015-09-25
Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
Inventor: Kengo Asai , Toru Iwaya , Hisayuki Takasu , Hiroyasu Shichi
Abstract: To provide an ion milling system that can suppress an orbital shift of an observation electron beam emitted from an electron microscope column, the ion milling system includes: a Penning discharge type ion gun 100 that includes a permanent magnet 114 and that generates ions for processing a sample; and a scanning electron microscope for observing the sample, in which a magnetic shield 172 for reducing a leakage magnetic field from the permanent magnet 114 to the electron microscope column is provided.
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公开(公告)号:US09640360B2
公开(公告)日:2017-05-02
申请号:US14351559
申请日:2012-10-10
Applicant: Hitachi High-Technologies Corporation
Inventor: Hiroyasu Shichi , Shinichi Matsubara , Yoichi Ose , Yoshimi Kawanami , Noriaki Arai
CPC classification number: H01J27/022 , H01J37/08 , H01J37/26 , H01J37/28 , H01J2237/0216 , H01J2237/0807
Abstract: Provided is a charged particle beam microscope which has a small mechanical vibration amplitude of a distal end of an emitter tip, is capable of obtaining an ultra-high resolution sample observation image and removing shaking or the like of the sample observation image. A gas field ion source includes: an emitter tip configured to generate ions; an emitter-base mount configured to support the emitter tip; a mechanism configured to heat the emitter tip; an extraction electrode installed to face the emitter tip; and a mechanism configured to supply a gas to the vicinity of the emitter tip, wherein the emitter tip heating mechanism is a mechanism of heating the emitter tip by electrically conducting a filament connecting at least two terminals, the terminals are connected by a V-shaped filament, an angle of the V shape is an obtuse angle, and the emitter tip is connected to a substantial center of the filament.
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公开(公告)号:US09111716B2
公开(公告)日:2015-08-18
申请号:US14397466
申请日:2013-04-24
Applicant: Hitachi High-Technologies Corporation
Inventor: Shinichi Matsubara , Yoshimi Kawanami , Hiroyuki Tanaka , Hiroyasu Shichi , Yoichi Ose
CPC classification number: H01J37/08 , H01J37/28 , H01J2237/002 , H01J2237/006 , H01J2237/0807
Abstract: The ionized gas supplied to the emitter tip of a gas field ionization ion source is cooled and purified to enable supplying a reliable and stable ion beam. Impurities contained in the ionized gas destabilize the field ionization ion source. The invention is configured to include a first heat exchanger thermally connected to a part of the field ionization ion source, a cryocooler capable of cooling a second gas line and a cold head, the second gas line being connected to the first heat exchanger and circulating a refrigerant, and a second heat exchanger that cools the first and second gas lines and is connected to the cold head.
Abstract translation: 供给到气田电离离子源的发射极尖端的电离气体被冷却和净化,以提供可靠和稳定的离子束。 包含在电离气体中的杂质使场电离离子源稳定化。 本发明被构造成包括与场电离离子源的一部分热连接的第一热交换器,能够冷却第二气体管线和冷头的低温冷却器,第二气体管线连接到第一热交换器并循环 制冷剂和冷却第一和第二气体管线并连接到冷头的第二热交换器。
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