LASER MACHINING METHOD
    11.
    发明公开

    公开(公告)号:US20240033859A1

    公开(公告)日:2024-02-01

    申请号:US18268383

    申请日:2021-12-20

    CPC classification number: B23K26/38 B23K37/00

    Abstract: A laser processing method includes a first step of preparing a wafer including a plurality of functional elements disposed to be adjacent to each other via a street, a second step of, after the first step, forming a modified region in the wafer along a line passing through the street, and a third step of, after the second step, irradiating the street with laser light such that a surface layer of the street is removed, and a fracture extending from the modified region reaches a bottom surface of a recess formed by removing the surface layer, along the line.

    LASER MACHINING METHOD AND METHOD FOR MANUFACTURING SEMICONDUCTOR MEMBER

    公开(公告)号:US20230249285A1

    公开(公告)日:2023-08-10

    申请号:US18015558

    申请日:2021-07-01

    Inventor: Takeshi SAKAMOTO

    CPC classification number: B23K26/0648 B23K26/38 B23K26/062

    Abstract: A laser processing method includes a laser processing step of converging laser light to an object including a first surface and a second surface opposite to the first surface using the first surface as an incident surface to form a converging spot of the laser light, while relatively moving the converging spot with respect to the object, thereby performing laser processing in the object, the object being provided with a grinding planned area along the incident surface, and the laser processing step including a first forming step of relatively moving, while setting a position of the converging spot in a Z direction intersecting with the incident surface at a first Z position, the converging spot along a line extended in an X direction along the incident surface, thereby forming a first modified region and a first fracture extended from the first modified region in the object.

    LASER MACHINING APPARATUS, LASER MACHINING METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR MEMBER

    公开(公告)号:US20230219172A1

    公开(公告)日:2023-07-13

    申请号:US18014495

    申请日:2021-03-29

    Inventor: Takeshi SAKAMOTO

    CPC classification number: B23K26/53 B23K26/40 B23K2101/40

    Abstract: A laser processing device includes: a light source configured to output laser light; a space light modulator for modulating the laser light output from the light source in accordance with a modulation pattern and outputting the modulated laser light; a converging lens for converging the laser light output from the space light modulator to an object, and forming a converging spot on the object; a movement unit for relatively moving the converging spot with respect to the object; and a control unit for relatively moving, while setting a position of the converging spot in a Z direction intersecting with an incident surface of the laser light on the object at a first Z position, the converging spot along a line extended in an X direction along the incident surface by controlling at least the space light modulator and the movement unit.

    INSPECTION DEVICE AND INSPECTION METHOD
    14.
    发明公开

    公开(公告)号:US20230154774A1

    公开(公告)日:2023-05-18

    申请号:US17916837

    申请日:2021-03-31

    CPC classification number: H01L21/67253 H01L22/12 H01L22/24 B23K26/53

    Abstract: An inspection device includes: a laser irradiation unit; an imaging unit; and a control unit. The control unit is configured to execute a processing process of controlling the laser irradiation unit according to a recipe set such that a plurality of modified regions are formed inside a wafer by irradiating the wafer with a laser beam and a full-cut state where cracks extending from the modified regions have reached a back surface and a surface is attained; an identification process of identifying a state of the crack on the back surface extending from the modified region, and a state of at least one of the modified regions and the cracks inside the wafer, based on a signal; and a determination process of determining whether or not a dicing force applied to the wafer according to the recipe is proper, based on information identified in the identification process.

    INSPECTION DEVICE AND INSPECTION METHOD

    公开(公告)号:US20230113051A1

    公开(公告)日:2023-04-13

    申请号:US17908293

    申请日:2021-03-03

    Abstract: This inspection device includes: a laser irradiation unit that irradiates a wafer having a back surface and a front surface with a laser beam from the back surface side of the wafer; an imaging unit that outputs light having permeability to the wafer and detects the light propagating through the wafer; and a control part configured to perform a first process of controlling the laser irradiation unit so that a modified region is formed inside the wafer by irradiating the wafer with the laser beam and a second process of deriving a position of the modified region on the basis of a signal output from the imaging unit that detects the light and deriving a thickness of the wafer on the basis of the derived position of the modified region and a set recipe.

    LASER PROCESSING DEVICE AND LASER PROCESSING METHOD

    公开(公告)号:US20230086426A1

    公开(公告)日:2023-03-23

    申请号:US17795309

    申请日:2021-01-18

    Abstract: A laser processing apparatus emits a laser light with a part of a focusing region being on an object to form a modified region along a virtual plane inside the object. The laser processing apparatus includes a support portion, an emission portion that emits the laser light onto the object, a moving mechanism that moves at least one of the support portion and the emission portion so that the part of the focusing region moves along the virtual plane inside the object, and a controller. The emission portion includes a shaping portion that shapes the laser light such that the shape of the part of the focusing region in a plane perpendicular to an optical axis of the laser light has a longitudinal direction. The longitudinal direction is a direction intersecting the direction of movement of the part of the focusing region.

    LASER PROCESSING DEVICE AND LASER PROCESSING METHOD

    公开(公告)号:US20220001494A1

    公开(公告)日:2022-01-06

    申请号:US17288841

    申请日:2019-10-30

    Abstract: A laser processing apparatus includes an irradiation portion, and a controller. The irradiation portion includes a shaping portion configured to shape the laser light. The controller includes: a determination portion configured to determine a first and a second orientation; a processing controller configured to perform a first process of forming the modified region along a first region and stopping formation of the modified region other than the first region, and a second process of forming the modified region along a second region and stopping formation of the modified region other than the second region; and an adjustment portion configured to adjust the orientation of the longitudinal direction to be the first orientation when the first process is performed, and to adjust the orientation of the longitudinal direction to be the second orientation when the second process is performed.

    LASER MACHINING DEVICE
    18.
    发明申请

    公开(公告)号:US20210402516A1

    公开(公告)日:2021-12-30

    申请号:US17289011

    申请日:2019-10-30

    Abstract: A laser processing apparatus includes a support portion, a laser processing head, a vertical movement mechanism, a horizontal movement mechanism, and a controller. The controller controls starting and stopping of emission of a laser light from the laser processing head based on rotation information in a state where a focusing point is positioned at a position along a circumferential edge of an effective region in a target, while rotating the support portion, to perform a circumferential edge process for forming a modified region along the circumferential edge of the effective region in the target.

    LASER PROCESSING METHOD
    19.
    发明申请

    公开(公告)号:US20210398856A1

    公开(公告)日:2021-12-23

    申请号:US17288613

    申请日:2019-10-30

    Abstract: A laser processing method includes a laser light emitting step of emitting a pulsed laser light along a line from a back surface of a target having a functional element layer on side of a front surface. The laser light emitting step includes: a first step of irradiating the functional element layer with a first pulsed laser light along the line, to form a weakened region in the functional element layer along the line; and a second step of emitting a second pulsed laser light into the target to follow the first pulsed laser light along the line, to form a crack reaching the front surface along the line in the target. The first pulsed laser light has a pulse width that is shorter than a pulse width of the second pulsed laser light.

    LASER MACHINING HEAD AND LASER MACHINING DEVICE

    公开(公告)号:US20210394303A1

    公开(公告)日:2021-12-23

    申请号:US17288821

    申请日:2019-10-30

    Abstract: A laser processing head includes: a housing; an entrance portion; an adjustment portion; and a condensing portion. A distance between a third wall portion and a fourth wall portion facing each other in a second direction is shorter than a distance between a first wall portion and a second wall portion facing each other in a first direction. The housing is configured to be attached to an attachment portion of a laser processing apparatus, with at least one of the first wall portion, the second wall portion, the third wall portion, and a fifth wall portion disposed on the side of the attachment portion. The condensing portion is disposed on a sixth wall portion, and is offset toward the fourth wall portion in the second direction.

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