公开(公告)号：US20150245457A1

公开(公告)日：2015-08-27

申请号：US14707990

申请日：2015-05-08

Applicant: GIGAPHOTON INC.

Inventor： Toshihiro NISHISAKA ,  Yukio WATANABE ,  Osamu WAKABAYASHI ,  Kouji KAKIZAKI ,  Michio SHINOZAKI

IPC: H05G2/00 ,  G03F7/20

CPC classification number: G03F7/70033 ,  G03F7/70975 ,  H05G2/00 ,  H05G2/003 ,  H05G2/008

Abstract: An EUV light source apparatus by which detachment of a chamber or a part of the chamber, movement to a maintenance area, and highly accurate placement relative to projection optics can be performed easily for maintenance of the EUV light source apparatus. The EUV light source apparatus is an apparatus for generating plasma by applying a laser beam to a target material within a chamber and entering EUV light radiated from the plasma into projection optics of exposure equipment, and includes a positioning mechanism for positioning the chamber or a maintenance unit of the chamber in a predetermined location where an optical axis of the collected extreme ultraviolet light and an optical axis of the projection optics of the exposure equipment are aligned, and a movement mechanism for moving the chamber or the maintenance unit of the chamber between the predetermined location and a maintenance area.

Abstract translation: EUV光源装置能够容易地进行EUV光源装置的维护，EUV光源装置能够容易地进行腔室或腔室的一部分的移动，到维护区域的移动以及相对于投影光学元件的高精度放置。 EUV光源装置是通过将激光束施加到室内的目标材料并且将从等离子体辐射的EUV光输入到曝光设备的投影光学器件中来产生等离子体的装置，并且包括用于定位腔室或维护的定位机构 在所述收集的极紫外光的光轴和所述曝光设备的投影光学元件的光轴对准的预定位置处的所述室的单元，以及用于将所述室或所述室的维护单元移动到所述室 预定位置和维护区域。

公开(公告)号：US20150226935A1

公开(公告)日：2015-08-13

申请号：US14697260

申请日：2015-04-27

Applicant: GIGAPHOTON INC.

Inventor： Hiroshi SOMEYA ,  Yukio WATANABE ,  Katsuhiko WAKANA ,  Osamu WAKABAYASHI

IPC: G02B7/18 ,  G02B5/10 ,  G02B5/08

CPC classification number: G02B7/181 ,  G02B5/0891 ,  G02B5/10 ,  G03F7/70033 ,  G03F7/70175

Abstract: A mirror device may include: a mirror including a base plate, a reflective film on a first surface of the base plate, and a plurality of first protrusions on a second surface of the base plate; a plurality of support parts for respectively supporting the plurality of the first protrusions, each support part having a groove formed therein for guiding the first protrusion; and a plurality of clamps for respectively pressing the plurality of the first protrusions against the respective grooves in the plurality of the support parts.

Abstract translation: 反射镜装置可以包括：反射镜，包括基板，在基板的第一表面上的反射膜，以及在基板的第二表面上的多个第一突起; 多个用于分别支撑多个第一突起的支撑部分，每个支撑部分具有形成在其中的槽，用于引导第一突起; 以及多个夹具，用于分别将多个第一突起抵靠在多个支撑部分中的相应凹槽上。

公开(公告)号：US20140001369A1

公开(公告)日：2014-01-02

申请号：US13958112

申请日：2013-08-02

Applicant: Gigaphoton Inc.

Inventor： Toshihiro NISHISAKA ,  Yukio WATANABE ,  Tamotsu ABE ,  Osamu WAKABAYASHI

IPC: H05G2/00

CPC classification number: H05G2/008 ,  G03B27/54 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70916 ,  H05G2/003

Abstract: A chamber apparatus used with an external apparatus having an obscuration region may include: a chamber in which extreme ultraviolet light is generated; a collector mirror provided in the chamber for collecting the extreme ultraviolet light; a support for securing the collector mirror to the chamber; and an output port provided to the chamber for allowing the extreme ultraviolet light collected by the collector mirror to be introduced therethrough into the external apparatus.

Abstract translation: 与具有遮蔽区域的外部设备一起使用的室设备可以包括：产生极紫外光的室; 设置在室中的用于收集极紫外光的收集器反射镜; 用于将收集器镜固定到腔室的支撑件; 以及设置到室的输出端口，用于允许由集光镜收集的极紫外光通过其引入外部设备。

公开(公告)号：US20240027920A1

公开(公告)日：2024-01-25

申请号：US18322131

申请日：2023-05-23

Applicant: GIGAPHOTON INC.

Inventor： Yusuke HOSHINO ,  Yukio WATANABE

IPC: G03F7/20

CPC classification number: G03F7/7065 ,  G03F7/70258 ,  G03F7/70033 ,  H05G2/008

Abstract: An EUV light generation apparatus includes a chamber having internal pressure maintained below atmospheric pressure; a first bellows pipe having one end connected to the chamber; a first cover member which seals the other end under atmospheric pressure; a holder connected to the first cover member and arranged inside the chamber in a state of holding an optical element; a stage mechanism connected to the first cover member outside the chamber and configured to change at least either a position or an angle of the optical element with respect to the EUV light; a fixing member which fixes the stage mechanism to the chamber; and a cancellation mechanism which is connected to the holder to be movable in accordance with change of at least either the position or the angle, and transmits, to the holder, a second load opposite to a first load applied to the first cover member.

公开(公告)号：US20210364927A1

公开(公告)日：2021-11-25

申请号：US17228000

申请日：2021-04-12

Applicant: Gigaphoton Inc.

Inventor： Tsukasa HORI ,  Yutaka SHIRAISHI ,  Toshihiro NISHISAKA ,  Hiroshi SOMEYA ,  Yukio WATANABE

IPC: G03F7/20 ,  H05G2/00

Abstract: A target supply device may include a first container configured to contain a target substance, a second container configured to contain the target substance supplied from the first container, a first valve disposed between the first container and the second container, a first pipe connected to the second container and configured to supply pressurized gas to the second container, a third container configured to contain the target substance supplied from the second container, a second valve disposed between the second container and the third container, a second pipe connected to the third container and configured to supply pressurized gas to the third container, and a nozzle configured to output the target substance supplied from the third container.

公开(公告)号：US20190113765A1

公开(公告)日：2019-04-18

申请号：US16209631

申请日：2018-12-04

Applicant: GIGAPHOTON INC.

Inventor： Kenshiro NAGAHAMA ,  Yukio WATANABE

IPC: G02B27/14 ,  H05G2/00 ,  G02B7/182 ,  G03F7/20

Abstract: An optical element angle adjustment device includes a first hinge that is an elastic hinge configured to connect a first plate and a second plate with each other, an optical element holding part attached to at least one of the first plate and the second plate, and a first adjusting screw configured to apply force in a direction of closing the first hinge to adjust a tilt angle of at least one of the first plate and the second plate. An end in an axis direction of the first adjusting screw is provided with a first press member configured to slidably abut on one of the first plate and the second plate. At least one of a first press member side abutting portion and a first hinge side abutting portion on which the first press member abuts has a curved surface in a curved surface shape.

公开(公告)号：US20140332700A1

公开(公告)日：2014-11-13

申请号：US14339172

申请日：2014-07-23

Applicant: GIGAPHOTON INC.

Inventor： Miwa IGARASHI ,  Yukio WATANABE ,  Kouji ASHIKAWA ,  Norio IWAI ,  Osamu WAKABAYASHI

IPC: H05G2/00 ,  G21K5/10

CPC classification number: H05G2/008 ,  G21K5/10 ,  H05G2/003

Abstract: An apparatus for generating extreme ultraviolet light may include a reference member, a chamber fixed to the reference member, the chamber including at least one window, a laser beam introduction optical system configured to introduce an externally supplied laser beam into the chamber through the at least one window, and a positioning mechanism configured to position the laser beam introduction optical system to the reference member.

Abstract translation: 用于产生极紫外光的装置可以包括参考构件，固定到参考构件的腔室，所述腔室包括至少一个窗口，激光束引入光学系统，其配置成通过至少一个外部供应的激光束 一个窗口，以及配置成将激光束引入光学系统定位到参考构件的定位机构。

公开(公告)号：US20140131587A1

公开(公告)日：2014-05-15

申请号：US14158710

申请日：2014-01-17

Applicant: GIGAPHOTON INC.

Inventor： Yukio WATANABE ,  Osamu WAKABAYASHI ,  Miwa IGARASHI

IPC: H05G2/00

CPC classification number: H05G2/008 ,  G03F7/70033 ,  G03F7/70916 ,  G21K1/04 ,  H05G2/003 ,  H05G2/005

Abstract: An extreme ultraviolet light source apparatus for supplying extreme ultraviolet light to a processing unit for performing processing by using the extreme ultraviolet light. The extreme ultraviolet light source apparatus includes: a chamber in which the extreme ultraviolet light to be supplied to the processing unit is generated; a collector mirror for collecting the extreme ultraviolet light generated in the chamber to output the extreme ultraviolet light to the processing unit; and an optical path connection module for defining a route of the extreme ultraviolet light between the chamber and the processing unit and isolating the route of the extreme ultraviolet light from outside.

Abstract translation: 一种用于向处理单元提供极紫外光的极紫外光源装置，用于通过使用极紫外光进行处理。 所述极紫外光源装置具有：向所述处理单元供给所述极紫外光的室， 收集器反射镜，用于收集在室中产生的极紫外光，以将极紫外光输出到处理单元; 以及光路连接模块，其用于限定所述室与所述处理单元之间的所述极紫外光的路线，并将所述极紫外光的路径与外部隔离。