SEMICONDUCTOR DEVICE
    11.
    发明申请

    公开(公告)号:US20250118357A1

    公开(公告)日:2025-04-10

    申请号:US18892187

    申请日:2024-09-20

    Abstract: Provided is a semiconductor device including a substrate, a first transistor on the substrate, an interlayer insulating layer covering the first transistor, a second transistor on the interlayer insulating layer, and a storage node contact passing through the interlayer insulating layer, and connecting any one of source/drain electrodes of the first transistor and a gate electrode of the second transistor, wherein a first channel pattern of the first transistor may include an n-type oxide transistor, and a second channel pattern of the second transistor may include an p-type oxide transistor.

    SEMICONDUCTOR DEVICE
    15.
    发明申请
    SEMICONDUCTOR DEVICE 有权
    半导体器件

    公开(公告)号:US20160260653A1

    公开(公告)日:2016-09-08

    申请号:US14872868

    申请日:2015-10-01

    CPC classification number: H01L23/467

    Abstract: Provided is a semiconductor device. The semiconductor device includes a substrate including a cantilever configured to generate a flow of cooling media through dynamic movement, an active area on the substrate which an electronic device is provided on, an insulation layer disposed to be spaced apart from the active area on the substrate, a lower electrode on the insulation layer, a piezoelectric film on the lower electrode, and an upper electrode on the piezoelectric film.

    Abstract translation: 提供一种半导体器件。 该半导体器件包括:基板,其包括悬臂,该悬臂构造成通过动态移动产生冷却介质流;基板上的有源区域,设置有电子器件;绝缘层,设置成与基板上的有源区间隔开; 绝缘层上的下电极,下电极上的压电薄膜和压电薄膜上的上电极。

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