Display panel and display device
    12.
    发明授权

    公开(公告)号:US12020642B2

    公开(公告)日:2024-06-25

    申请号:US17771073

    申请日:2021-02-19

    CPC classification number: G09G3/3233

    Abstract: This disclosure provides a display panel and a display device. The display panel includes a light-transmitting area, a first transitional display area, a first main display area and a second main display area, and further includes a first light-emitting unit in the light-transmitting area, a first pixel driving circuit in the first transitional display area for providing a driving current to the first light-emitting unit, a first signal line extending along the column direction in the first main display area, a second signal line extending along the column direction in the second main display area, and a third signal line. The third signal line and the first signal line are in different conductive layers, the third signal line and the second signal line are in different conductive layers, and the third signal line is connected with the first signal line and the second signal line through via holes respectively.

    Method for preparing array substrate

    公开(公告)号:US11251207B2

    公开(公告)日:2022-02-15

    申请号:US16846888

    申请日:2020-04-13

    Abstract: The present disclosure discloses a method for preparing an array substrate, an array substrate and a display panel, wherein the method comprises: forming a buffer layer on a substrate in a first region and a second region, wherein the buffer layer has a groove located in the second region; forming a first indium oxide thin film on the buffer layer in the first region; forming a second indium oxide thin film in the groove; performing a reduction process on the second indium oxide thin film to obtain indium particles; forming an amorphous silicon thin film in the groove, and inducing the amorphous silicon of the amorphous silicon thin film to form microcrystalline silicon at a preset temperature by using the indium particles; and removing the indium particles in the microcrystalline silicon to form a microcrystalline silicon semiconductor layer of the microcrystalline silicon thin film transistor.

    Oxide thin film transistor, array substrate, and preparation methods thereof

    公开(公告)号:US20200185535A1

    公开(公告)日:2020-06-11

    申请号:US16528622

    申请日:2019-08-01

    Abstract: An oxide thin film transistor, an array substrate, and preparation methods thereof are disclosed. The method for preparing an oxide thin film transistor comprises a step of forming a pattern comprising an oxide semiconductor active layer on a substrate, wherein the step comprises: forming an amorphous oxide semiconductor thin film on the substrate; performing an excimer laser annealing, at least at a position in the amorphous oxide semiconductor thin film corresponding to a channel region of oxide semiconductor active layer to be formed, such that the amorphous oxide semiconductor material at the laser-annealed position is crystallized, to form a crystalline oxide semiconductor material; and forming the pattern comprising the oxide semiconductor active layer.

    Display substrate and display device

    公开(公告)号:US12211858B2

    公开(公告)日:2025-01-28

    申请号:US18435073

    申请日:2024-02-07

    Abstract: The display substrate includes: a display area and a bezel area, the display area including a first display area and a second display area; first light emitting devices in the first display area and second light emitting devices in the second display area; first pixel drive circuits in the bezel area and second pixel drive circuits in the second display area, the first pixel drive circuits are connected to the first light emitting devices, and the second pixel drive circuits are connected to the second light emitting devices; and shift registers in the bezel area, one shift register is connected with the first pixel driving circuits connected with one row of the first light emitting devices and the second pixel driving circuits connected with one row of the second light emitting devices.

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