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公开(公告)号：US11092902B2
公开(公告)日：2021-08-17
申请号：US16624609
申请日：2018-05-17
Applicant: ASML Netherlands B.V.
Inventor： Johannes Franciscus Martinus D'Achard Van Enschut , Tamara Druzhinina , Nitish Kumar , Sarathi Roy , Yang-Shan Huang , Arie Jeffrey Den Boef , Han-Kwang Nienhuys , Pieter-Jan Van Zwol , Sander Bas Roobol
Abstract: Disclosed is a method and associated inspection apparatus for detecting variations on a surface of a substrate. The method comprises providing patterned inspection radiation to a surface of a substrate. The inspection radiation is patterned such that an amplitude of a corresponding enhanced field is modulated in a manner corresponding to the patterned inspection radiation. The scattered radiation resultant from interaction between the enhanced field and the substrate surface is received and variations on the surface of the substrate are detected based on the interaction between the enhanced field and the substrate surface. Also disclosed is a method of detecting any changes to at least one characteristic of received radiation, the said changes being induced by the generation of a surface plasmon at said surface of the optical element.
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公开(公告)号：US09389518B2
公开(公告)日：2016-07-12
申请号：US13686854
申请日：2012-11-27
Applicant: ASML Netherlands B.V.
Inventor： Antonius Franciscus Johannes De Groot , Raymond Wilhelmus Louis Lafarre , Yang-Shan Huang , Sander Christiaan Broers , Peter Laurentius Maria Ros
CPC classification number: G03F7/70758 , G03B27/58 , G03F7/70775
Abstract: A movable stage system is configured to support an object. The stage system comprises an object table configured to support the object and an object table support defining an object table support surface configured to support the object table. The object table support comprises at least one first actuator to drive the object table support in a first driving direction substantially parallel to the object table support surface. In a projection on a plane parallel to the object table support surface the at least one actuator is spaced with respect to the object table in a direction perpendicular to the first driving direction such that the risk on slip between the object table support and the object table supported thereon is decreased.
Abstract translation: 可移动台系统被配置为支撑物体。 舞台系统包括被配置为支撑对象的对象表和定义被配置为支持对象表的对象表支持表面的对象表支持。 物体台支撑件包括至少一个第一致动器，以在基本上平行于物体台支撑表面的第一驱动方向上驱动物体台支撑件。 在与物体台支撑表面平行的平面上的突起中，至少一个致动器在垂直于第一驱动方向的方向上相对于物体台间隔开，使得物体台支撑件和物体台之间的滑动风险 支撑在其上。
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公开(公告)号：US11961698B2
公开(公告)日：2024-04-16
申请号：US17344446
申请日：2021-06-10
Applicant: ASML Netherlands B.V.
Inventor： Christiaan Otten , Peter-Paul Crans , Marc Smits , Laura Del Tin , Christan Teunissen , Yang-Shan Huang , Stijn Wilem Herman Karel Steenbrink , Xuerang Hu , Qingpo Xi , Xinan Luo , Xuedong Liu
IPC: H01J37/15 , H01J37/02 , H01J37/14 , H01J37/147 , H01J37/18 , H01J37/244 , H01J37/28 , H01J37/20 , H01J37/317
CPC classification number: H01J37/15 , H01J37/023 , H01J37/14 , H01J37/1477 , H01J37/18 , H01J37/244 , H01J37/28 , H01J37/20 , H01J37/3177 , H01J2237/2006 , H01J2237/20214 , H01J2237/2817
Abstract: Disclosed herein is a module for supporting a device configured to manipulate charged particle paths in a charged particle apparatus, the module comprising: a support arrangement configured to support the device, wherein the device is configured to manipulate a charged particle path within the charged particle apparatus; and a support positioning system configured to move the support arrangement within the module; wherein the module is arranged to be field replaceable in the charged particle apparatus.
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Patent Agency Ranking
公开(公告)号：US11175596B2
公开(公告)日：2021-11-16
申请号：US16633419
申请日：2018-07-18
Applicant: ASML Netherlands B.V. , ASML Holding N.V.
Inventor： Han-Kwang Nienhuys , Ronald Peter Albright , Jacob Brinkert , Yang-Shan Huang , Hendrikus Gijsbertus Schimmel , Antonie Hendrik Verweij
Abstract: Designs are provided to reduce the possibility of contaminant particles with a large range of sizes, materials, travel speeds and angles of incidence reaching a particle-sensitive environment. According to an aspect of the disclosure, there is provided an object stage comprising first and second chambers, a first structure having a first surface, and a second structure. The second structure is configured to support an object in the second chamber, movable relative to the first structure. The second structure comprises a second surface opposing the first surface of the first structure thereby defining a gap between the first structure and the second structure that extends between the first chamber and the second chamber. The second structure further comprises a third surface within the first chamber. The object stage further comprises a trap disposed on at least a portion of the third surface, the trap comprising a plurality of baffles.
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公开(公告)号：US11003095B2
公开(公告)日：2021-05-11
申请号：US16332002
申请日：2017-08-31
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： Krijn Frederik Bustraan , Yang-Shan Huang , Antonius Franciscus Johannes De Groot , Minkyu Kim , Jasper Anne Frido Marikus Simons , Theo Anjes Maria Ruijl , Ronald Josephus Maria Lamers
IPC: G03F7/20
Abstract: A positioning system for positioning an object. The positioning system includes a stage, a balance mass and an actuator system. The stage is for holding the object. The actuator system is arranged to drive the stage in a first direction while driving the balance mass in a second direction opposite to the first direction. The stage is moveable in the first direction in a movement range. When the stage is moving in the first direction and is at an end of the movement range, the positioning system is arranged to collide the stage frontally into the balance mass.
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公开(公告)号：US20200117097A1
公开(公告)日：2020-04-16
申请号：US16716568
申请日：2019-12-17
Applicant: ASML NETHERLANDS B.V.
Inventor： Andre Bernardus JEUNINK , Laurentius Johannes Adrianus Van Bokhoven , Stan Henricus Van Der Meulen , Yang-Shan Huang , Federico La Torre , Bearrach Moest , Stefan Carolus Jacobus Antonius Keij , Enno Van Den Brink , Christine Henriette Schouten , Hoite Pieter Theodoor Tolsma
Abstract: A lithographic apparatus comprising a support structure constructed to support a patterning device and associated pellicle, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, and a projection system configured to project the patterned radiation beam onto a target portion of a substrate, wherein the support structure is located in a housing and wherein pressure sensors are located in the housing.
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公开(公告)号：US10571814B2
公开(公告)日：2020-02-25
申请号：US16318191
申请日：2017-06-29
Applicant: ASML NETHERLANDS B.V.
Inventor： Andre Bernardus Jeunink , Laurentius Johannes Adrianus Van Bokhoven , Stan Henricus Van Der Meulen , Yang-Shan Huang , Federico La Torre , Bearrach Moest , Stefan Carolus Jacobus Antonius Keij , Enno Van Den Brink , Christine Henriette Schouten , Hoite Pieter Theodoor Tolsma
Abstract: A lithographic apparatus has a support structure constructed to support a patterning device and associated pellicle, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, and a projection system configured to project the patterned radiation beam onto a target portion of a substrate, wherein the support structure is located in a housing and wherein pressure sensors are located in the housing.
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公开(公告)号：US09811005B2
公开(公告)日：2017-11-07
申请号：US15003768
申请日：2016-01-21
Applicant: ASML Netherlands B.V.
Inventor： Yang-Shan Huang , Theodorus Petrus Maria Cadee
IPC: G03F7/20
CPC classification number: G03F7/70775 , G03F7/70725 , G03F7/70758
Abstract: A substrate stage is used in a lithographic apparatus. The substrate stage includes a substrate table constructed to hold a substrate and a positioning device for in use positioning the substrate table relative to a projection system of the lithographic apparatus. The positioning device includes a first positioning member mounted to the substrate table and a second positioning member co-operating with the first positioning member to position the substrate table. The second positioning member is mounted to a support structure. The substrate stage further comprises an actuator that is arranged to exert a vertical force on a bottom surface of the substrate table at a substantially fixed horizontal position relative to the support structure.
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