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    Method and apparatus for generating radiation
    17.
    发明授权
    Method and apparatus for generating radiation 有权
    用于产生辐射的方法和装置

    公开(公告)号：US09442380B2

    公开(公告)日：2016-09-13

    申请号：US14439476

    申请日：2013-10-03

    Applicant: ASML Netherlands B.V.

    Inventor： Ramin Badie ,  Vadim Yevgenyevich Banine ,  Johan Frederik Dijksman ,  Antonius Theodorus Wilhelmus Kempen ,  Andrei Mikhailovich Yakunin ,  Hendrikus Robertus Marie Van Greevenbroek ,  Koen Gerhardus Winkels

    IPC: G03F7/20 ,  H05G2/00

    CPC classification number: G03F7/70033 ,  H05G2/003 ,  H05G2/006 ,  H05G2/008

    Abstract: A radiation source (e.g., LPP—laser produced plasma source) for generation of extreme UV (EUV) radiation has at least two fuel particle streams having different trajectories. Each stream is directed to cross the path of an excitation (laser) beam focused at a plasma formation region, but the trajectories are spaced apart at the plasma formation region, and the streams phased, so that only one stream has a fuel particle in the plasma formation region at any time, and so that when a fuel particle from one stream is generating plasma and EUV radiation at the plasma generation region, other fuel particles are sufficiently spaced so as to be substantially unaffected by the plasma. The arrangement permits potential doubling of the radiation intensity achievable for a particular fuel particle size.

    Abstract translation: 用于产生极端UV（EUV）辐射的辐射源（例如，LPP激光产生的等离子体源）具有至少两个具有不同轨迹的燃料粒子流。 每个流被引导以跨过等离子体形成区域聚焦的激发（激光）束的路径，但是轨迹在等离子体形成区域处被间隔开，并且流被相位化，使得仅一条流在 等离子体形成区域，并且使得当来自一个流的燃料粒子在等离子体产生区域产生等离子体和EUV辐射时，其它燃料颗粒被充分间隔开，以致基本上不受等离子体的影响。 该布置允许对于特定燃料粒子尺寸可实现的辐射强度的潜在加倍。

    Lithographic Apparatus
    18.
    发明申请
    Lithographic Apparatus 审中-公开
    平版印刷设备

    公开(公告)号：US20150286145A1

    公开(公告)日：2015-10-08

    申请号：US14438482

    申请日：2013-09-23

    Applicant: ASML NETHERLANDS B.V.

    Inventor： Andrey Nikipelov ,  Vadim Yevgenyevich Banine ,  Andrei Mikhailovich Yakunin

    IPC: G03F7/20 ,  H05G2/00

    CPC classification number: G03F7/70033 ,  G02B17/0657 ,  G02B17/0808 ,  G03F7/70041 ,  G03F7/7005 ,  H05G2/006 ,  H05G2/008

    Abstract: A radiation source for a lithographic apparatus uses a plurality of fiber lasers to ignite a fuel droplet at an ignition location to generate EUV radiation. The fiber lasers may be provided to emit parallel to an optical axis and a telescopic optical system is provided to focus the lasers at the ignition location, or the lasers may be directed towards the optical axis with a final focus lens being used to reduce beam waist. The lasers may be provided in two or more groups to allow them to be independently controlled and some of the lasers may be focused at a different location to provide a pre-pulse. Radiation from fiber lasers may also be combined using dichroic mirrors.

    Abstract translation: 用于光刻设备的辐射源使用多个光纤激光器在点火位置点燃燃料液滴以产生EUV辐射。 可以将光纤激光器设置成平行于光轴发射，并且提供伸缩光学系统以将激光器聚焦在点火位置，或者激光器可以被引导到光轴，最终聚焦透镜用于减小光束腰部 。 激光器可以以两个或更多个组提供，以允许它们被独立控制，并且一些激光器可以聚焦在不同的位置以提供预脉冲。 光纤激光器的辐射也可以使用二向色镜来组合。

    RADIATION SOURCE
    19.
    发明申请
    RADIATION SOURCE 有权
    辐射源

    公开(公告)号：US20150146182A1

    公开(公告)日：2015-05-28

    申请号：US14400773

    申请日：2013-04-29

    Applicant: ASML Netherlands B.V.

    Inventor： Jan Bernard Plechelmus Van Schoot ,  Antonius Theodorus Wilhelmus Kempen ,  Hermanus Kreuwel ,  Andrei Mikhailovich Yakunin

    IPC: H05G2/00 ,  G03F7/20

    CPC classification number: H05G2/008 ,  G03F7/70033 ,  H05G2/005 ,  H05G2/006

    Abstract: A radiation source for generating EUV radiation includes a laser configured to fire laser pulses at a target area to which is supplied a stream of fuel droplets, which may be tin droplets that emit EUV radiation when excited by the laser beam. The EUV radiation is collected by a collector. The tin droplets may be pre-conditioned by a laser pre-pulse before the main laser pulse to change the shape of the droplets so that the droplets are in an optimum condition for receiving the main laser pulse. Embodiments of the invention take into account the effect of the vaporization of one fuel droplet on succeeding droplets and allow the timing of the main and/or pre-pulse to be adjusted to take into account any delay in arrival of the subsequent droplet or oscillations in the shape of the subsequent droplet which may be caused by vaporization of the preceding droplet.

    Abstract translation: 用于产生EUV辐射的辐射源包括激光器，其被配置为在被供应燃料液滴流的目标区域发射激光脉冲，所述燃料液滴流可以是当被激光束激发时发射EUV辐射的锡液滴。 EUV辐射由收集器收集。 锡液滴可以在主激光脉冲之前通过激光预脉冲进行预调节，以改变液滴的形状，使得液滴处于用于接收主激光脉冲的最佳状态。 本发明的实施例考虑了一个燃料液滴对随后的液滴的蒸发的影响，并允许调整主和/或预脉冲的定时，以考虑随后的液滴或振荡到达的任何延迟 可能由先前液滴汽化引起的后续液滴的形状。

    Grazing Incidence Reflectors, Lithographic Apparatus, Methods for Manufacturing a Grazing Incidence Reflector and Methods for Manufacturing a Device
    20.
    发明申请
    Grazing Incidence Reflectors, Lithographic Apparatus, Methods for Manufacturing a Grazing Incidence Reflector and Methods for Manufacturing a Device 有权
    放射入射反射器，平版印刷设备，制造放射入射反射器的方法和制造器件的方法

    公开(公告)号：US20140078486A1

    公开(公告)日：2014-03-20

    申请号：US13983214

    申请日：2012-01-18

    Applicant: ASML Netherlands B.V.

    Inventor： Andrei Mikhailovich Yakunin ,  Vadim Yevgenyevich Banine ,  Olav Waldemar Vladimir Frijns

    IPC: G03F7/20 ,  G02B5/08

    CPC classification number: G03F7/702 ,  B82Y10/00 ,  G02B5/0891 ,  G03F7/70058 ,  G21K1/062 ,  G21K2201/061

    Abstract: A grazing incidence reflector (300) for EUV radiation includes a first mirror layer (310) and a multilayer mirror structure (320) beneath the first mirror layer. The first mirror layer reflects at least partially EUV radiation incident on the reflector with grazing incidence angles in a first range, and the first mirror layer transmits EUV radiation in a second range of incidence angles, which overlaps and extends beyond the first range of incidence angles. The multilayer mirror structure reflects EUV radiation that is incident on the reflector with grazing incidence angles in a second range that penetrates through the first mirror layer. A grazing incidence reflector can be used in a lithographic apparatus and in manufacturing a device by a lithographic process.

    Abstract translation: 用于EUV辐射的掠入射反射器（300）包括第一镜层下面的第一镜层（310）和多层反射镜结构（320）。 第一镜层反射入射在反射器上的至少一部分EUV辐射，其具有在第一范围内的掠入射角，并且第一镜层在与入射角的第一范围重叠并延伸超过入射角的第二范围内传输EUV辐射 。 多层反射镜结构反射入射在反射器上的EUV辐射，其中掠射入射角在穿过第一镜层的第二范围内。 掠入射反射器可以用在光刻设备中并且通过光刻工艺制造器件。

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