公开(公告)号：US09864279B2

公开(公告)日：2018-01-09

申请号：US13812844

申请日：2011-06-14

申请人： Catharinus De Schiffart ,  Michael Jozef Mathijs Renkens ,  Gerard Van Schothorst ,  Andre Bernardus Jeunink ,  Gregor Edward Van Baars ,  Sander Frederik Wuister ,  Yvonne Wendela Kruijt-Stegeman ,  Norbert Erwin Therenzo Jansen ,  Toon Hardeman ,  George Arie Jan De Fockert ,  Johan Frederik Dijksman

发明人： Catharinus De Schiffart ,  Michael Jozef Mathijs Renkens ,  Gerard Van Schothorst ,  Andre Bernardus Jeunink ,  Gregor Edward Van Baars ,  Sander Frederik Wuister ,  Yvonne Wendela Kruijt-Stegeman ,  Norbert Erwin Therenzo Jansen ,  Toon Hardeman ,  George Arie Jan De Fockert ,  Johan Frederik Dijksman

IPC分类号： G03B27/04 ,  G03F7/20 ,  B29C43/02 ,  B29C43/14 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/00 ,  B29C43/04

CPC分类号： G03F7/7035 ,  B29C43/021 ,  B29C43/04 ,  B29C43/14 ,  B29C2043/142 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/70775 ,  G03F7/70825 ,  G03F7/7085 ,  G03F7/709 ,  G03F9/7042

摘要： An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.

公开(公告)号：US20130128246A1

公开(公告)日：2013-05-23

申请号：US13810384

申请日：2011-07-18

申请人： Adrìanus Hendrik Koevoets ,  Michael Jozef Mathijs Renkens ,  Sander Frederik Wuister

发明人： Adrìanus Hendrik Koevoets ,  Michael Jozef Mathijs Renkens ,  Sander Frederik Wuister

IPC分类号： G03F7/00

CPC分类号： G03F7/70875 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/70783

摘要： In an embodiment, a lithography method is disclosed that includes providing a providing a first heat load to a first area of an object, and providing a second heat load to a second area of the object, wherein the second heat load is configured to ensure a deformation of the first area of the object caused by providing both the first heat load and the second heat load is smaller than a deformation of the first area of the object caused by providing only the first heat load.

摘要翻译： 在一个实施例中，公开了一种光刻方法，其包括提供向物体的第一区域提供第一热负荷并且向物体的第二区域提供第二热负荷，其中第二热负荷被配置为确保 通过提供第一热负荷和第二热负荷而引起的物体的第一区域的变形小于由仅提供第一热负荷引起的物体的第一区域的变形。

公开(公告)号：US20120147355A1

公开(公告)日：2012-06-14

申请号：US13398890

申请日：2012-02-17

申请人： Hans BUTLER ,  Martinus Agnes Willem CUIJPERS ,  Christiaan Alexander HOOGENDAM ,  Robertus Johannes Marinus DE JONGH ,  Michael Jozef Mathijs RENKENS ,  Marc Wilhelmus Maria VAN DER WIJST ,  Maurice Willem Jozef Etiënne WIJCKMANS ,  Robertus Leonardus TOUSAIN ,  Ronald Petrus Hendricus FAASSEN ,  Adrianus Hendrik KOEVOETS

发明人： Hans BUTLER ,  Martinus Agnes Willem CUIJPERS ,  Christiaan Alexander HOOGENDAM ,  Robertus Johannes Marinus DE JONGH ,  Michael Jozef Mathijs RENKENS ,  Marc Wilhelmus Maria VAN DER WIJST ,  Maurice Willem Jozef Etiënne WIJCKMANS ,  Robertus Leonardus TOUSAIN ,  Ronald Petrus Hendricus FAASSEN ,  Adrianus Hendrik KOEVOETS

IPC分类号： G03B27/58

CPC分类号： G03F7/709 ,  G03F7/70758 ,  G03F7/70766

摘要： A positioning system to position a table within a base frame of a lithographic apparatus, the positioning system including first and second actuators and a controller. The first actuator exerting an actuation force on the table. The first actuator being connected to a balance mass constructed and arranged to absorb a reaction force of the first actuator. The controller and second actuator constructed and arranged to exert a compensation force and/or torque to compensate a torque caused by the actuation force exerted by the first actuator on the balance mass.

摘要翻译： 一种定位系统，用于将平台定位在光刻设备的基架内，所述定位系统包括第一和第二致动器以及控制器。 第一执行器在桌子上施加致动力。 第一致动器连接到构造和布置成吸收第一致动器的反作用力的平衡块。 控制器和第二致动器构造和布置成施加补偿力和/或扭矩以补偿由第​​一致动器施加在平衡块上的致动力引起的扭矩。

公开(公告)号：US08144310B2

公开(公告)日：2012-03-27

申请号：US12409919

申请日：2009-03-24

申请人： Hans Butler ,  Martinus Agnes Willem Cuijpers ,  Christiaan Alexander Hoogendam ,  Robertus Johannes Marinus De Jongh ,  Michael Jozef Mathijs Renkens ,  Marc Wilhelmus Maria Van Der Wijst ,  Maurice Willem Jozef Etiënne Wijckmans ,  Robertus Leonardus Tousain ,  Ronald Petrus Hendricus Faassen ,  Adrianus Hendrik Koevoets

发明人： Hans Butler ,  Martinus Agnes Willem Cuijpers ,  Christiaan Alexander Hoogendam ,  Robertus Johannes Marinus De Jongh ,  Michael Jozef Mathijs Renkens ,  Marc Wilhelmus Maria Van Der Wijst ,  Maurice Willem Jozef Etiënne Wijckmans ,  Robertus Leonardus Tousain ,  Ronald Petrus Hendricus Faassen ,  Adrianus Hendrik Koevoets

IPC分类号： G03B27/58 ,  G03B27/42

CPC分类号： G03F7/709 ,  G03F7/70758 ,  G03F7/70766

摘要： A positioning system to position a table within a base frame of a lithographic apparatus, the positioning system including first and second actuators and a controller. The first actuator exerting an actuation force on the table. The first actuator being connected to a balance mass constructed and arranged to absorb a reaction force of the first actuator. The controller and second actuator constructed and arranged to exert a compensation force and/or torque to compensate a torque caused by the actuation force exerted by the first actuator on the balance mass.

摘要翻译： 一种定位系统，用于将平台定位在光刻设备的基架内，所述定位系统包括第一和第二致动器以及控制器。 第一执行器在桌子上施加致动力。 第一致动器连接到构造和布置成吸收第一致动器的反作用力的平衡块。 控制器和第二致动器构造和布置成施加补偿力和/或扭矩以补偿由第​​一致动器施加在平衡块上的致动力引起的扭矩。

公开(公告)号：US20090262325A1

公开(公告)日：2009-10-22

申请号：US12409919

申请日：2009-03-24

申请人： Hans Butler ,  Martinus Agnes Willem Cuijpers ,  Christiaan Alexander Hoogendam ,  Robertus Johannes Marinus De Jongh ,  Michael Jozef Mathijs Renkens ,  Marc Wilhelmus Maria Van Der Wijst ,  Maurice Willem Jozef Etienne Wijckmans ,  Robertus Leonardus Tousain ,  Ronald Petrus Hendricus Faassen ,  Adrianus Hendrik Koevoets

发明人： Hans Butler ,  Martinus Agnes Willem Cuijpers ,  Christiaan Alexander Hoogendam ,  Robertus Johannes Marinus De Jongh ,  Michael Jozef Mathijs Renkens ,  Marc Wilhelmus Maria Van Der Wijst ,  Maurice Willem Jozef Etienne Wijckmans ,  Robertus Leonardus Tousain ,  Ronald Petrus Hendricus Faassen ,  Adrianus Hendrik Koevoets

IPC分类号： G03B27/58 ,  H05K7/02

CPC分类号： G03F7/709 ,  G03F7/70758 ,  G03F7/70766

摘要： A positioning system to position a table within a base frame of a lithographic apparatus, the positioning system including first and second actuators and a controller. The first actuator exerting an actuation force on the table. The first actuator being connected to a balance mass constructed and arranged to absorb a reaction force of the first actuator. The controller and second actuator constructed and arranged to exert a compensation force and/or torque to compensate a torque caused by the actuation force exerted by the first actuator on the balance mass.

摘要翻译： 一种定位系统，用于将平台定位在光刻设备的基架内，所述定位系统包括第一和第二致动器以及控制器。 第一执行器在桌子上施加致动力。 第一致动器连接到构造和布置成吸收第一致动器的反作用力的平衡块。 控制器和第二致动器构造和布置成施加补偿力和/或扭矩以补偿由第​​一致动器施加在平衡块上的致动力引起的扭矩。

公开(公告)号：US07426015B2

公开(公告)日：2008-09-16

申请号：US11654037

申请日：2007-01-17

申请人： Hendricus Johannes Maria Meijer ,  Michael Jozef Mathijs Renkens

发明人： Hendricus Johannes Maria Meijer ,  Michael Jozef Mathijs Renkens

IPC分类号： G03B27/42 ,  G03B27/54

CPC分类号： G03F7/70933 ,  G03F7/70841 ,  G03F7/70858

摘要： A device manufacturing method includes bringing pressure within a vacuum chamber of a lithographic projection apparatus to a temperature stabilizing pressure range; keeping the pressure within the vacuum chamber within the temperature stabilizing pressure range for a period of time so as to stabilize the temperature in the vacuum chamber; decreasing the pressure within the vacuum chamber to a production pressure range; generating a beam of radiation with a radiation system; patterning the beam of radiation; and projecting the patterned beam of radiation through the vacuum chamber onto a target portion of a layer of radiation-sensitive material on a substrate.

摘要翻译： 一种装置的制造方法，其特征在于，使光刻投影装置的真空室内的压力达到温度稳定化压力范围; 将真空室内的压力保持在温度稳定压力范围内一段时间，以稳定真空室中的温度; 将真空室内的压力降低到生产压力范围; 用辐射系统产生辐射束; 图案化辐射束; 并将图案化的辐射束通过真空室投射到基底上的辐射敏感材料层的目标部分上。