公开(公告)号：US07985528B2

公开(公告)日：2011-07-26

申请号：US12548866

申请日：2009-08-27

Applicant: Tsunehiro Nishi ,  Takeshi Kinsho ,  Masaki Ohashi ,  Koji Hasegawa ,  Masashi Iio

Inventor： Tsunehiro Nishi ,  Takeshi Kinsho ,  Masaki Ohashi ,  Koji Hasegawa ,  Masashi Iio

IPC: G03F7/004 ,  G03F7/30

CPC classification number: G03F7/0397 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0395 ,  G03F7/2041 ,  Y10S430/108 ,  Y10S430/111

Abstract: A positive resist composition comprises (A) a resin component which becomes soluble in an alkaline developer under the action of an acid and (B) an acid generator. The resin (A) is a polymer comprising recurring units containing a non-leaving hydroxyl group represented by formula (1) wherein R1 is H, methyl or trifluoromethyl, m is 1 or 2, and the hydroxyl group attaches to a tertiary carbon atom. The composition is improved in resolution when processed by lithography.

Abstract translation: 正型抗蚀剂组合物包含（A）在酸的作用下变得可溶于碱性显影剂的树脂组分和（B）酸产生剂。 树脂（A）是包含由式（1）表示的不含离去羟基的重复单元的聚合物，其中R 1是H，甲基或三氟甲基，m是1或2，羟基连​​接到叔碳原子上。 当通过光刻处理时，组合物的分辨率得到改善。

公开(公告)号：US20100316955A1

公开(公告)日：2010-12-16

申请号：US12815787

申请日：2010-06-15

Applicant: Keiichi Masunaga ,  Akinobu Tanaka ,  Daisuke Domon ,  Satoshi Watanabe ,  Youichi Ohsawa ,  Masaki Ohashi

Inventor： Keiichi Masunaga ,  Akinobu Tanaka ,  Daisuke Domon ,  Satoshi Watanabe ,  Youichi Ohsawa ,  Masaki Ohashi

IPC: G03F7/004 ,  G03F7/20

CPC classification number: G03F7/0392 ,  G03F7/0045

Abstract: A polymer comprising a high proportion of aromatic ring structure-containing units and containing an aromatic sulfonic acid sulfonium salt on a side chain is used to form a chemically amplified positive photoresist composition which is effective in forming a resist pattern having high etch resistance. The polymer overcomes the problems of dissolution in solvents for polymerization and purification and in resist solvents.

Abstract translation: 使用包含高比例的含芳环结构的单元并在侧链上含有芳族磺酸锍盐的聚合物形成化学放大的正性光致抗蚀剂组合物，该组合物有效地形成具有高耐蚀刻性的抗蚀剂图案。 该聚合物克服了用于聚合和纯化的溶剂溶解和抗蚀剂溶剂中的问题。

公开(公告)号：US20100143830A1

公开(公告)日：2010-06-10

申请号：US12630559

申请日：2009-12-03

Applicant: Masaki OHASHI ,  Takeshi KINSHO ,  Satoshi WATANABE ,  Youichi OHSAWA

Inventor： Masaki OHASHI ,  Takeshi KINSHO ,  Satoshi WATANABE ,  Youichi OHSAWA

IPC: G03F1/00 ,  C07C69/753 ,  C07J3/00 ,  C07C69/76 ,  G03F7/20

CPC classification number: C07J3/00 ,  C07C309/12 ,  C07C381/12 ,  C07C2601/14 ,  C07C2603/74 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/0397

Abstract: A sulfonium salt has formula (1) wherein R1 is a monovalent hydrocarbon group except vinyl and isopropenyl, R2, R3, and R4 are alkyl, alkenyl, oxoalkyl, aryl, aralkyl or aryloxoalkyl or may bond together to form a ring with the sulfur atom, and n is 1 to 3. A chemically amplified resist composition comprising the sulfonium salt is capable of forming a fine feature pattern of good profile after development due to high resolution, improved focal latitude, and minimized line width variation and profile degradation upon prolonged PED.

Abstract translation: 锍盐具有式（1），其中R 1是除乙烯基和异丙烯基之外的一价烃基，R 2，R 3和R 4是烷基，烯基，氧代烷基，芳基，芳烷基或芳氧基烷基，或者可以键合在一起形成与硫原子的环 ，并且n为1至3.包含锍盐的化学放大抗蚀剂组合物由于高分辨率，改善的焦点纬度以及在延长的PED处的线宽变化和轮廓退化最小化而能够在显影后形成良好轮廓的精细特征图案 。

公开(公告)号：US20100099042A1

公开(公告)日：2010-04-22

申请号：US12580953

申请日：2009-10-16

Applicant: Masaki OHASHI ,  Youichi OHSAWA ,  Takeshi KINSHO ,  Jun HATAKEYAMA ,  Selichiro TACHIBANA

Inventor： Masaki OHASHI ,  Youichi OHSAWA ,  Takeshi KINSHO ,  Jun HATAKEYAMA ,  Selichiro TACHIBANA

IPC: G03F7/20 ,  G03F7/004 ,  C07C69/753 ,  C07D307/77 ,  C08F24/00

CPC classification number: C07D307/77 ,  C07C309/12 ,  C07C381/12 ,  C08F2220/303 ,  C08F2220/382 ,  G03F7/0045 ,  G03F7/0397 ,  G03F7/2041 ,  Y10S430/108 ,  Y10S430/111 ,  Y10S430/143

Abstract: A polymerizable anion-containing sulfonium salt having formula (1) is provided wherein R1 is H, F, methyl or trifluoromethyl, R2, R3 and R4 are C1-C10 alkyl, alkenyl or oxoalkyl or C6-C18 aryl, aralkyl or aryloxoalkyl, or two of R2, R3 and R4 may bond together to form a ring with S, A is a C2-C20 hydrocarbon group having cyclic structure, and n is 0 or 1. The sulfonium salt generates a very strong sulfonic acid upon exposure to high-energy radiation. A resist composition comprising a polymer derived from the sulfonium salt is also provided.

Abstract translation: 提供了具有式（1）的可聚合阴离子的锍盐，其中R 1是H，F，甲基或三氟甲基，R 2，R 3和R 4是C 1 -C 10烷基，烯基或氧代烷基或C 6 -C 18芳基，芳烷基或芳氧基烷基，或 R 2，R 3和R 4中的两个可以键合在一起形成具有S的环，A是具有环状结构的C 2 -C 20烃基，n是0或1.锍盐在暴露于高温下时产生非常强的磺酸， 能量辐射。 还提供了包含衍生自锍盐的聚合物的抗蚀剂组合物。

公开(公告)号：US07682237B2

公开(公告)日：2010-03-23

申请号：US10947064

申请日：2004-09-22

Applicant: Hiromu Ueshima ,  Masaki Ohashi

Inventor： Hiromu Ueshima ,  Masaki Ohashi

IPC: A63F13/10 ,  G10H3/00 ,  G10F1/08 ,  A63F13/08

CPC classification number: A63F13/814 ,  A63F13/08 ,  A63F13/10 ,  A63F13/245 ,  A63F13/44 ,  A63F13/533 ,  A63F2300/1062 ,  A63F2300/303 ,  A63F2300/638 ,  A63F2300/8047

Abstract: Indication objects are displayed on a television monitor at the intervals in agreement with the rhythm of music, such that the player can generate musical tones in synchronization with music by striking the strike surface of a music game console in the appropriate timing as indicated by indication objects. In this case, the tone quality of the strike sound changes in the progress of music on the basis of strike sound indicating information.

Abstract translation: 指示对象以与音乐节奏一致的间隔显示在电视监视器上，使得玩家可以通过在指示对象所指示的适当时机中敲击音乐游戏控制台的撞击表面而与音乐同步地产生乐音 。 在这种情况下，在打击声指示信息的基础上，打击声音的音质在音乐的进行中改变。

公开(公告)号：US20100062380A1

公开(公告)日：2010-03-11

申请号：US12549792

申请日：2009-08-28

Applicant: Katsuya Takemura ,  Tsunehiro Nishi ,  Jun Hatakeyama ,  Masaki Ohashi ,  Takeshi Kinsho

Inventor： Katsuya Takemura ,  Tsunehiro Nishi ,  Jun Hatakeyama ,  Masaki Ohashi ,  Takeshi Kinsho

IPC: G03F7/20

CPC classification number: G03F7/40 ,  G03F7/0035 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/322

Abstract: A double pattern is formed by coating a first positive resist composition onto a substrate, patternwise exposure to radiation, and development with alkaline developer to form a first resist pattern; applying heat and/or radiation to render the first resist pattern insoluble in a second solvent and in a second developer; coating a second resist composition on the first resist pattern, patternwise exposure to radiation, and development with second developer to form a second resist pattern. The resin in the first resist composition comprises recurring units of formula (1) wherein R1 is H, CH3 or CF3, m=1 or 2, n=0 or 1.

Abstract translation: 通过将第一正性抗蚀剂组合物涂布在基材上，图案地暴露于辐射并用碱性显影剂显影以形成第一抗蚀剂图案形成双重图案; 施加热和/或辐射以使第一抗蚀剂图案不溶于第二溶剂和第二显影剂; 在第一抗蚀剂图案上涂覆第二抗蚀剂组合物，图案地暴露于辐射，并用第二显影剂显影以形成第二抗蚀剂图案。 第一抗蚀剂组合物中的树脂包含式（1）的重复单元，其中R 1是H，CH 3或CF 3，m = 1或2，n = 0或1。

公开(公告)号：US20090233223A1

公开(公告)日：2009-09-17

申请号：US12404245

申请日：2009-03-13

Applicant: Seiichiro TACHIBANA ,  Jun Hatakeyama ,  Youichi Ohsawa ,  Masaki Ohashi

Inventor： Seiichiro TACHIBANA ,  Jun Hatakeyama ,  Youichi Ohsawa ,  Masaki Ohashi

IPC: G03F7/20 ,  C08F214/18 ,  G03F7/004

CPC classification number: G03F7/0045 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/2041 ,  Y10S430/111

Abstract: A polymer comprising recurring units of a sulfonium salt represented by formula (1) is provided as well as a chemically amplified resist composition comprising the same. R1 is H, F, methyl or trifluoromethyl, R2 to R4 are C1-C10 alkyl or alkoxy, R5 is C1-C30 alkyl or C6-C14 aryl, k, m and n are 0 to 3. The recurring units generate a sulfonic acid upon exposure to high-energy radiation so as to facilitate effective scission of acid labile groups in the resist composition. The resist composition exhibits excellent resolution and a pattern finish with minimal LER.

Abstract translation: 提供了包含由式（1）表示的锍盐的重复单元的聚合物以及包含该聚合物的化学放大抗蚀剂组合物。 R 1是H，F，甲基或三氟甲基，R 2至R 4是C 1 -C 10烷基或烷氧基，R 5是C 1 -C 30烷基或C 6 -C 14芳基，k，m和n是0至3.重复单元产生磺酸 暴露于高能量辐射下，以促进抗蚀剂组合物中酸不稳定基团的有效断裂。 抗蚀剂组合物以最小的LER显示出优异的分辨率和图案光洁度。

公开(公告)号：US20090202943A1

公开(公告)日：2009-08-13

申请号：US12370652

申请日：2009-02-13

Applicant: Youichi Ohsawa ,  Takeshi Kinsho ,  Masaki Ohashi ,  Seiichiro Tachibana ,  Takeru Watanabe ,  Jun Hatakeyama

Inventor： Youichi Ohsawa ,  Takeshi Kinsho ,  Masaki Ohashi ,  Seiichiro Tachibana ,  Takeru Watanabe ,  Jun Hatakeyama

IPC: G03F7/00 ,  C08F228/02 ,  C08F24/00

CPC classification number: G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/2041 ,  Y10S430/108 ,  Y10S430/111 ,  Y10S430/143

Abstract: A positive resist composition comprises a polymer comprising recurring units having a sulfonium salt incorporated therein as a base resin which becomes soluble in alkaline developer under the action of acid. The polymer generates a strong sulfonic acid upon exposure to high-energy radiation so as to facilitate effective scission of acid labile groups in the resist composition.

Abstract translation: 正型抗蚀剂组合物包含含有其中掺入其中的锍盐作为基础树脂的重复单元的聚合物，其在酸的作用下变得可溶于碱性显影剂。 聚合物在暴露于高能量辐射时产生强烈的磺酸，以促进抗蚀剂组合物中酸不稳定基团的有效断裂。

公开(公告)号：US20090061358A1

公开(公告)日：2009-03-05

申请号：US12204685

申请日：2008-09-04

Applicant: Masaki OHASHI ,  Youichi Ohsawa ,  Takeru Watanabe ,  Takeshi Kinsho

Inventor： Masaki OHASHI ,  Youichi Ohsawa ,  Takeru Watanabe ,  Takeshi Kinsho

IPC: G03F7/004 ,  G03F7/20 ,  C07J5/00 ,  C07J43/00

CPC classification number: C07J31/006 ,  C07J41/0055 ,  C07J43/003 ,  G03F7/0045 ,  G03F7/0397 ,  G03F7/2041 ,  Y10S430/114

Abstract: Photoacid generators generate sulfonic acids of formula (1a) or (1c) upon exposure to high-energy radiation. R1—COOCH(CF3)CF2SO3+H+  (1a) R1—O—COOCH(CF3)CF2SO3−H+  (1c) R1 is a C20-C50 hydrocarbon group having a steroid structure. The photoacid generators are compatible with resins and can control acid diffusion and are thus suited for use in chemically amplified resist compositions.

Abstract translation: 光生酸发生剂在暴露于高能量辐射时产生式（1a）或（1c）的磺酸。 <？in-line-formula description =“In-line formula”end =“lead”？> R1-COOCH（CF3）CF2SO3 + H +（1a）<？in-line-formula description =“In-line Formulas”end =“tail”？> <？in-line-formula description =“In-line Formulas”end =“lead”？> R1-O-COOCH（CF3）CF2SO3-H +（1c） =“内联式”末端=“尾”→R1是具有类固醇结构的C20-C50烃基。 光致酸产生剂与树脂相容并且可以控制酸扩散，因此适用于化学增幅抗蚀剂组合物。

公开(公告)号：US20080008965A1

公开(公告)日：2008-01-10

申请号：US11822441

申请日：2007-07-05

Applicant: Masaki Ohashi ,  Takeshi Kinsho ,  Takeru Watanabe

Inventor： Masaki Ohashi ,  Takeshi Kinsho ,  Takeru Watanabe

IPC: G03C1/79 ,  C07C53/00 ,  C07C69/66 ,  C07C69/74 ,  C07D307/00 ,  G03C5/38 ,  C07D307/02 ,  C07D311/96 ,  C08G59/42

CPC classification number: G03F7/0395 ,  C07D307/20 ,  C07D307/77 ,  C07D309/10 ,  C08F20/26 ,  C08F20/28 ,  C08F222/06 ,  C08F232/04 ,  G03F7/0046 ,  G03F7/0397 ,  Y10S430/111

Abstract: Novel ester compounds having formulae (1) to (4) wherein A1 is a polymerizable functional group having a carbon-carbon double bond, A2 is oxygen, methylene or ethylene, R1 is a monovalent hydrocarbon group, R2 is H or a monovalent hydrocarbon group, any pair of R1 and/or R2 may form an aliphatic hydrocarbon ring, R3 is a monovalent hydrocarbon group, and n is 0 to 6 are polymerizable into polymers. Resist compositions comprising the polymers as a base resin are thermally stable and sensitive to high-energy radiation, have excellent sensitivity and resolution, and lend themselves to micropatterning with electron beam or deep-UV.

Abstract translation: 具有式（1）〜（4）的新型酯化合物，其中A 1为具有碳 - 碳双键的聚合性官能团，A 2为氧，亚甲基或亚乙基 R 1是一价烃基，R 2是H或一价烃基，任何一对R 1和/或R 1， SUP> 2可以形成脂族烃环，R 3是一价烃基，n是0-6，可聚合成聚合物。 包含作为基础树脂的聚合物的抗蚀剂组合物是热稳定的并且对高能量辐射敏感，具有优异的灵敏度和分辨率，并且借助于电子束或深紫外线来进行微图案化。