公开(公告)号：US08368020B2

公开(公告)日：2013-02-05

申请号：US13247995

申请日：2011-09-28

Applicant: Hubert Mantz ,  Rainer Arnold ,  Michael Albiez

Inventor： Hubert Mantz ,  Rainer Arnold ,  Michael Albiez

IPC: H01J37/26 ,  H01J37/244 ,  H01J37/10

CPC classification number: H01J37/28 ,  H01J37/05 ,  H01J37/222 ,  H01J37/244 ,  H01J37/256

Abstract: A particle beam system comprises a particle beam source 5 for generating a primary particle beam 13, an objective lens 19 for focusing the primary particle beam 13 in an object plane 23; a particle detector 17; and an X-ray detector 47 arranged between the objective lens and the object plane. The X-ray detector comprises plural semiconductor detectors, each having a detection surface 51 oriented towards the object plane. A membrane is disposed between the object plane and the detection surface of the semiconductor detector, wherein different semiconductor detectors have different membranes located in front, the different membranes differing with respect to a secondary electron transmittance.

公开(公告)号：US08368019B2

公开(公告)日：2013-02-05

申请号：US13247979

申请日：2011-09-28

Applicant: Hubert Mantz ,  Rainer Arnold ,  Michael Albiez

Inventor： Hubert Mantz ,  Rainer Arnold ,  Michael Albiez

IPC: H01J37/26 ,  H01J37/244 ,  H01J37/10

CPC classification number: H01J37/28 ,  H01J37/05 ,  H01J37/222 ,  H01J37/244 ,  H01J37/256

Abstract: A particle beam system comprises a particle beam source 5 for generating a primary particle beam 13, an objective lens 19 for focusing the primary particle beam 13 in an object plane 23; a particle detector 17; and an X-ray detector 47 arranged between the objective lens and the object plane. The X-ray detector comprises plural semiconductor detectors, each having a detection surface 51 oriented towards the object plane. A membrane is disposed between the object plane and the detection surface of the semiconductor detector, wherein different semiconductor detectors have different membranes located in front, the different membranes differing with respect to a secondary electron transmittance.

Abstract translation: 粒子束系统包括用于产生一次粒子束13的粒子束源5，用于将一次粒子束13聚焦在物平面23中的物镜19; 粒子检测器17; 以及布置在物镜和物平面之间的X射线检测器47。 X射线检测器包括多个半导体检测器，每个半导体检测器具有朝向物体平面的检测表面51。 膜位于物体平面和半导体检测器的检测表面之间，其中不同的半导体检测器具有位于前面的不同的膜，不同的膜相对于二次电子透射率不同。

公开(公告)号：US08344336B2

公开(公告)日：2013-01-01

申请号：US13208581

申请日：2011-08-12

Applicant: Shunpei Yamazaki ,  Toshiji Hamatani ,  Koichiro Tanaka

Inventor： Shunpei Yamazaki ,  Toshiji Hamatani ,  Koichiro Tanaka

IPC: H01J37/317

CPC classification number: H01J37/05 ,  H01J37/08 ,  H01J37/147 ,  H01J37/3171 ,  H01J37/32412 ,  H01J37/32752 ,  H01J2237/057 ,  H01J2237/0817 ,  H01J2237/304 ,  H01L21/26506 ,  H01L21/26513 ,  H01L21/26586

Abstract: There is proposed an apparatus for doping a material to be doped by generating plasma (ions) and accelerating it by a high voltage to form an ion current is proposed, which is particularly suitable for processing a substrate having a large area. The ion current is formed to have a linear sectional configuration, and doping is performed by moving a material to be doped in a direction substantially perpendicular to the longitudinal direction of a section of the ion current.

公开(公告)号：US08294093B1

公开(公告)日：2012-10-23

申请号：US13089875

申请日：2011-04-19

Applicant: David Tuggle ,  N. William Parker

Inventor： David Tuggle ,  N. William Parker

IPC: H01J49/00

CPC classification number: H01J37/05 ,  H01J2237/31749

Abstract: An E×B Wien mass filter provides an independently-adjustable electric field combined with the dipole electric field required for mass separation. The independently adjustable electric field can be used provide a larger optical aperture, to correct astigmatism and to deflect the beam in direction parallel and/or perpendicular to the magnetic field.

Abstract translation: E×B维恩质量过滤器提供独立可调的电场与质量分离所需的偶极电场相结合。 可独立调节的电场可以提供更大的光学孔径，以校正散光并使光束在与磁场平行和/或垂直的方向上偏转。

公开(公告)号：US20120261571A1

公开(公告)日：2012-10-18

申请号：US13389923

申请日：2010-08-31

Applicant: Dietmar Funnemann

Inventor： Dietmar Funnemann

IPC: H01J49/06

CPC classification number: H01J37/05 ,  H01J37/252 ,  H01J2237/053 ,  H01J2237/0535 ,  H01J2237/24485

Abstract: The present invention concerns an imaging energy filter for electrically charged particles with a toroidal energy analyser, preferably with a hemispherical analyser, with an entrance plane and an exit plane. To provide an imaging energy filter and a spectroscope having such an imaging energy filter, which has a higher degree of position and angle resolution and which can be operated with a greater acceptance angle, it is proposed according to the invention that a mirror element for electrically charged particles is provided and is so arranged that charged particles which leave the toroidal energy analyser by way of the exit plane are reflected back into the toroidal energy analyser by the mirror element so that the charged particles pass through the toroidal energy analyser a further time in the opposite travel direction.

Abstract translation: 本发明涉及具有环形能量分析器的带电粒子的成像能量过滤器，优选地具有半球形分析器，具有入射面和出射平面。 为了提供具有成像能量过滤器的成像能量过滤器和具有更高程度的位置和角度分辨率并且可以以更大的接受角度操作的成像能量过滤器，根据本发明提出了一种用于电气 带电粒子被设置成使得通过出射平面离开环形能量分析器的带电粒子被反射镜元件反射回到环形能量分析器中，使得带电粒子再次通过环形能量分析器 相反的行进方向。

公开(公告)号：US20120261566A1

公开(公告)日：2012-10-18

申请号：US13089991

申请日：2011-04-19

Applicant: David Tuggle ,  N. William Parker ,  Mark W. Utlaut

Inventor： David Tuggle ,  N. William Parker ,  Mark W. Utlaut

IPC: H01J49/20 ,  H01J49/22 ,  H01J49/10

CPC classification number: H01J37/05 ,  H01J37/317 ,  H01J2237/053 ,  H01J2237/055 ,  H01J2237/057 ,  H01J2237/31749

Abstract: A mass filter for an ion beam system includes at least two stages and reduces chromatic aberration. One embodiment includes two symmetrical mass filter stages, the combination of which reduces or eliminates chromatic aberration, and entrance and exit fringing field errors. Embodiments can also prevent neutral particles from reaching the sample surface and avoid crossovers in the beam path. In one embodiment, the filter can pass a single species of ion from a source that produces multiple species. In other embodiments, the filter can pass a single ion species with a range of energies and focus the multi-energetic ions at the same point on the substrate surface.

Abstract translation: 用于离子束系统的质量过滤器包括至少两个级并且减少色差。 一个实施例包括两个对称质量过滤器级，其组合减少或消除色差，以及入射和退出边缘场误差。 实施例还可以防止中性粒子到达样品表面，并避免光束路径中的交叉。 在一个实施例中，过滤器可以从产生多种物质的源传递单种离子。 在其他实施例中，滤光器可以通过具有一定能量范围的单个离子种类并将多能量离子聚焦在衬底表面上的相同点。

公开(公告)号：US08274046B1

公开(公告)日：2012-09-25

申请号：US13111851

申请日：2011-05-19

Applicant: Weiming Ren ,  Zhongwei Chen

Inventor： Weiming Ren ,  Zhongwei Chen

IPC: G21K1/08 ,  H01J37/21 ,  H01J37/20

CPC classification number: H01J37/28 ,  G21K1/093 ,  H01J37/05 ,  H01J2237/049 ,  H01J2237/057 ,  H01J2237/153

Abstract: This invention provides a monochromator for reducing energy spread of a primary charged particle beam in charged particle apparatus, which comprises a beam adjustment element, two Wien-filter type dispersion units and an energy-limit aperture. In the monochromator, a double symmetry in deflection dispersion and fundamental trajectory along a straight optical axis is formed, which not only fundamentally avoids incurring off-axis aberrations that actually cannot be compensated but also ensures the exit beam have a virtual crossover which is stigmatic, dispersion-free and inside the monochromator. Therefore, using the monochromator in SEM can reduce chromatic aberrations without additionally incurring adverse impacts, so as to improve the ultimate imaging resolution. The improvement of the ultimate imaging resolution will be more distinct for Low-Voltage SEM and the related apparatuses which are based on LVSEM principle, such as the defect inspection and defect review in semiconductor yield management. The present invention also provides two ways to build a monochromator into a SEM, one is to locate a monochromator between the electron source and the condenser, and another is to locate a monochromator between the beam-limit aperture and the objective. The former provides an additional energy-angle depending filtering, and obtains a smaller effective energy spread.

Abstract translation: 本发明提供一种用于减少带电粒子装置中的初级带电粒子束的能量扩散的单色仪，其包括光束调节元件，两个维恩滤波器型色散单元和能量限制孔径。 在单色仪中，形成沿着直线光轴的偏转色散和基本轨迹的双重对称性，其不仅从根本上避免了实际上不能被补偿的偏轴像差，而且还确保出射光束具有虚拟的虚拟交叉， 无色分离和单色仪内部。 因此，在SEM中使用单色仪可以减少色差，而不会产生不利影响，从而提高最终的成像分辨率。 对于低电压SEM和基于LVSEM原理的相关设备，如半导体产量管理中的缺陷检查和缺陷检查，最终成像分辨率的提高将会更加明显。 本发明还提供了在扫描电镜中构建单色仪的两种方法，一种是在电子源和电容器之间定位单色仪，另一种是在光束极限孔径和物镜之间定位单色仪。 前者提供额外的能量角取决于滤波，并获得较小的有效能量扩展。

公开(公告)号：US08237135B2

公开(公告)日：2012-08-07

申请号：US12357973

申请日：2009-01-22

Applicant: Bo H. Vanderberg ,  William F. DiVergilio

Inventor： Bo H. Vanderberg ,  William F. DiVergilio

IPC: A61N5/00 ,  G21G5/00

CPC classification number: H01J37/3171 ,  H01J37/026 ,  H01J37/05 ,  H01J2237/0041 ,  H01J2237/055

Abstract: An ion implantation method and system that incorporate beam neutralization to mitigate beam blowup, which can be particularly problematic in low-energy, high-current ion beams. The beam neutralization component can be located in the system where blowup is likely to occur. The neutralization component includes a varying energizing field generating component that generates plasma that neutralizes the ion beam and thereby mitigates beam blowup. The energizing field is generated with varying frequency and/or field strength in order to maintain the neutralizing plasma while mitigating the creation of plasma sheaths that reduce the effects of the neutralizing plasma.

Abstract translation: 一种离子注入方法和系统，其结合光束中和以减轻光束吹胀，这在低能量，高电流离子束中可能是特别有问题的。 光束中和组件可以位于可能发生喷射的系统中。 中和组件包括变化的激励场产生组件，其产生中和离子束的等离子体，从而减轻光束吹胀。 产生具有变化的频率和/或场强的激励场，以便维持中和等离子体，同时减轻等离子体护套的产生，从而降低中和等离子体的影响。

公开(公告)号：US20120186973A1

公开(公告)日：2012-07-26

申请号：US13434701

申请日：2012-03-29

Applicant: Marshall Medoff

Inventor： Marshall Medoff

IPC: B01J19/12 ,  B01J19/10

CPC classification number: B01J19/081 ,  B01J19/085 ,  B01J19/10 ,  B01J19/12 ,  B01J2219/0879 ,  B01J2219/12 ,  C10L1/02 ,  C10L5/44 ,  C10L9/00 ,  C10L2200/0469 ,  C10L2290/26 ,  C10L2290/36 ,  C12P3/00 ,  C12P7/02 ,  H01J37/04 ,  H01J37/05 ,  Y02E50/30

Abstract: Materials such as biomass (e.g., plant biomass, animal biomass, and municipal waste biomass) and hydrocarbon-containing materials are processed to produce useful products, such as fuels. For example, systems are described that can use feedstock materials, such as cellulosic and/or lignocellulosic materials and/or starchy materials, or oil sands, oil shale, tar sands, bitumen, and coal to produce altered materials such as fuels (e.g., ethanol and/or butanol). The processing includes exposing the materials to an ion beam.

Abstract translation: 诸如生物质（例如，植物生物量，动物生物质和城市废物生物质）和含烃材料的材料被加工以产生有用的产品，例如燃料。 例如，描述了可以使用诸如纤维素和/或木质纤维素材料和/或淀粉质材料或油砂，油页岩，焦油砂，沥青和煤的原料的材料来生产改变的材料例如燃料（例如， 乙醇和/或丁醇）。 该处理包括将材料暴露于离子束。

公开(公告)号：US20120168622A1

公开(公告)日：2012-07-05

申请号：US12981002

申请日：2010-12-29

Applicant: Victor M. Benveniste ,  Frank Sinclair ,  Svetlana Radovanov ,  Bon-Woong Koo

Inventor： Victor M. Benveniste ,  Frank Sinclair ,  Svetlana Radovanov ,  Bon-Woong Koo

IPC: H01J49/30

CPC classification number: H01J37/3171 ,  H01J37/05 ,  H01J37/20 ,  H01J49/30 ,  H01J2237/055 ,  H01J2237/057 ,  H01J2237/20221

Abstract: An implantation system includes an ion extraction plate having a set of apertures configured to extract ions from an ion source to form a plurality of beamlets. A magnetic analyzer is configured to provide a magnetic field to deflect ions in the beamlets in a first direction that is generally perpendicular to a principle axis of the beamlets. A mass analysis plate includes a set of apertures wherein first ion species having a first mass/charge ratio are transmitted through the mass analysis plate and second ion species having a second mass/charge ratio are blocked by the mass analysis plate. A workpiece holder is configured to move with respect to the mass analysis plate in a second direction perpendicular to the first direction, wherein a pattern of ions transmitted through the mass analysis plate forms a continuous ion beam current along the first direction at the substrate.

Abstract translation: 植入系统包括具有一组孔口的离子提取板，其被配置为从离子源提取离子以形成多个子束。 磁分析器被配置为提供磁场，以在大体上垂直于子束的主轴的第一方向上偏转子束中的离子。 质量分析板包括一组孔，其中具有第一质量/荷率的第一离子种类通过质量分析板传输，具有第二质量/荷重比的第二离子种被质量分析板阻挡。 工件保持器构造成在与第一方向垂直的第二方向上相对于质量分析板移动，其中通过质量分析板传输的离子图案在衬底处沿着第一方向形成连续的离子束电流。