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    Silacyclohexane compound, a method of preparing it and a liquid crystal composition containing it
    102.
    发明授权
    Silacyclohexane compound, a method of preparing it and a liquid crystal composition containing it 失效
    硅环己烷化合物，其制备方法和含有它的液晶组合物

    公开(公告)号：US5679746A

    公开(公告)日：1997-10-21

    申请号：US576619

    申请日：1995-12-21

    申请人： Takaaki Shimizu ,  Tsutomu Ogihara ,  Kazuyuki Asakura ,  Takeshi Kinsho ,  Tatsushi Kaneko ,  Mutsuo Nakashima

    发明人： Takaaki Shimizu ,  Tsutomu Ogihara ,  Kazuyuki Asakura ,  Takeshi Kinsho ,  Tatsushi Kaneko ,  Mutsuo Nakashima

    IPC分类号： C07F7/08 ,  C07F7/12 ,  C09K19/40 ,  C09K19/34

    CPC分类号： C07F7/0818 ,  C07F7/0896 ,  C07F7/12 ,  C09K19/406

    摘要： A silacyclohexane compound represented by the following general formula (I): ##STR1## wherein R denotes a mono- or di-fluoroalkyl group with 1-10 carbons: ##STR2## denotes a trans-1-silacyclohexylene or a trans-4-silacyclohexylene group whose silicon at position 1 or position 4 has a substitutional group of H, F, Cl or CH.sub.3 ; X denotes a CN, F, Cl, CF.sub.3, CF.sub.2 Cl, CHFCl, OCF.sub.3, OCHF.sub.2, OCF.sub.2 Cl, OCHFCl, (O).sub.3 CY.sub.1 .dbd.CX.sub.1 X.sub.2 (X.sub.1 and Y.sub.1 denote H, F or Cl, and X.sub.2 denotes F or Cl) (O).sub.3 C.sub.p H.sub.q F.sub.r (p denotes 2, 3 or 4, and q and r are integers which satisfy the equation q+r=2p+1, and s denotes 0 or 1), the aforementioned R, or an alkyl or alkoxy group with 1-5 carbons; Y denotes H or F; and Z denotes H or F; and process of manufacturing same.

    摘要翻译： 由以下通式（I）表示的硅环己烷化合物：其中R表示具有1-10个碳的单 - 或二 - 氟烷基：表示反式-1-硅杂环己烯或反式-4-硅杂环己烯 其位置1或位置4的硅具有H，F，Cl或CH 3的取代基; X表示CN，F，Cl，CF 3，CF 2 Cl，CHFCl，OCF 3，OCHF 2，OCF 2 Cl，OCHFCl，（O）3CY 1 = CX 1 X 2（X 1和Y 1表示H，F或Cl，X2表示F或Cl）（O） 3CpHqFr（p表示2,3或4，q和r是满足方程式q + r = 2p + 1，s表示0或1的整数），上述R 1或具有1-5个碳原子的烷基或烷氧基 碳; Y表示H或F; Z表示H或F; 和制造过程相同。

    Silacyclohexane carbaldehyde compounds and processes for preparing silacyclohexane-based liquid crystal compounds from the carbaldehyde compound
    105.
    发明授权
    Silacyclohexane carbaldehyde compounds and processes for preparing silacyclohexane-based liquid crystal compounds from the carbaldehyde compound 失效
    硅环己烷甲醛化合物和由甲醛化合物制备硅环己烷基液晶化合物的方法

    公开(公告)号：US5527490A

    公开(公告)日：1996-06-18

    申请号：US434814

    申请日：1995-05-04

    申请人： Takeshi Kinsho ,  Takaaki Shimizu ,  Tsutomu Ogihara ,  Tatsushi Kaneko ,  Mutsuo Nakashima

    发明人： Takeshi Kinsho ,  Takaaki Shimizu ,  Tsutomu Ogihara ,  Tatsushi Kaneko ,  Mutsuo Nakashima

    IPC分类号： C07F7/08 ,  C07F7/10 ,  C07F7/12 ,  C07F7/18 ,  C09K19/40 ,  C09K19/30 ,  G02F1/13

    CPC分类号： C09K19/406 ,  C07F7/0818 ,  C07F7/0896

    摘要： A silacyclohexane carbaldehyde compound of the following formula (I) ##STR1## wherein Ar represents a phenyl group or a tolyl group, and R represents a phenyl group, a tolyl group, a linear alkyl group, a mono or difluoroalkyl group, a branched alkyl group, an alkoxyalkyl group or an alkenyl group. Processes for preparing a silacyclohexane-based liquid crystal compound of the following formula (II) or (III) from the silacyclohexane carbaldehyde are also described ##STR2## wherein X represents CN, F, Cl, CF.sub.3, CClF.sub.2, CHClF, OCF.sub.3, OCClF.sub.2, OCHF.sub.2, OCHClF, (O).sub.m CT=CX.sub.1 X.sub.2, O(CH.sub.2).sub.r (CF.sub.2).sub.s X.sub.3, R or OR wherein m is a value of 0 or 1, T and X.sub.1 independently represent H, F or Cl, X.sub.2 represents F or Cl, r and s are, respectively, a value of 0, 1 or 2 provided that r+s=2, 3 or 4, X.sub.3 represents H, F or Cl, and R has the same meaning as defined before, Y and Z independently represent a halogen or a methyl group, i and j are independently a value of 0, 1 or 2.

    摘要翻译： 下式（I）的硅环己烷甲醛化合物其中Ar表示苯基或甲苯基，R表示苯基，甲苯基，直链烷基，单或二氟烷基， 支链烷基，烷氧基烷基或烯基。 还描述了从硅环己烷甲醛制备下式（II）或（III）的硅杂环己烷系液晶化合物的方法，其中X表示CN，F，Cl， CF 3，CClF 2，CHClF，OCF 3，OCClF 2，OCHF 2，OCHClF，（O）mCT = CX1X2，O（CH2）r（CF2）sX3，R或OR，其中m为0或1，T和X1独立地表示H ，F或Cl，X2表示F或Cl，r和s分别为0,1或2的值，条件是r + s = 2,3或4，X3表示H，F或Cl，并且R具有 与前述相同，Y和Z独立地表示卤素或甲基，i和j独立地为0,1或2的值。

    Process for preparing silacyclohexane compounds
    106.
    发明授权
    Process for preparing silacyclohexane compounds 失效
    硅环己烷化合物的制备方法

    公开(公告)号：US5523439A

    公开(公告)日：1996-06-04

    申请号：US511816

    申请日：1995-08-07

    申请人： Tsutomu Ogihara ,  Takaaki Shimizu ,  Takeshi Kinsho ,  Tatsushi Kaneko

    发明人： Tsutomu Ogihara ,  Takaaki Shimizu ,  Takeshi Kinsho ,  Tatsushi Kaneko

    IPC分类号： C07F7/08 ,  C09K19/40 ,  C07F7/18

    CPC分类号： C09K19/406 ,  C07F7/0896

    摘要： Processes for selectively preparing silacyclohexane compounds of a trans form from diarylsilacyclohexane compounds of the general formula ##STR1## wherein Ar and Ar' independently represent a phenyl group or a tolyl group, and Q represents a group of the type indicated below ##STR2## The diarylsilacyclohexanes are converted to dihalosilacyclohexanes and then to hydrohalosilacyclohexanes directly or via dialkoxylation and/or reduction step. The hydrohalosilacyclohexane are finally reacted with organometallic compounds having a group, Q', of the type indicated below ##STR3## to obtain silacyclohexane compounds of the general formula ##STR4## wherein Q' and Q have, respectively, the groups indicated hereinabove.

    摘要翻译： 从通式“IMAGE”的二芳基硅烷环己烷化合物选择性地制备反式的硅环己烷化合物的方法，其中Ar和Ar'独立地表示苯基或甲苯基，Q表示下述的基团。 二甲基环己烷转化为二卤代环己烷，然后直接转化为氢卤代环己烷，或通过二烷氧基化和/或还原步骤。 最后使氢卤代二环己烷与具有下文所示类型Q'的有机金属化合物反应，得到通式“IMAGE”的硅环己烷化合物，其中Q'和Q分别具有上述基团。

    Cyclohexane carbaldehyde compounds and processes for preparing silacyclohexane-based liquid crystal compounds from the carbaldehyde
    107.
    发明授权
    Cyclohexane carbaldehyde compounds and processes for preparing silacyclohexane-based liquid crystal compounds from the carbaldehyde 失效
    环己烷甲醛化合物和从甲醛制备硅环己烷基液晶化合物的方法

    公开(公告)号：US5519156A

    公开(公告)日：1996-05-21

    申请号：US501524

    申请日：1995-07-12

    申请人： Takeshi Kinsho ,  Takaaki Shimizu ,  Tsutomu Ogihara ,  Tatsushi Kaneko ,  Mutsuo Nakashima

    发明人： Takeshi Kinsho ,  Takaaki Shimizu ,  Tsutomu Ogihara ,  Tatsushi Kaneko ,  Mutsuo Nakashima

    IPC分类号： C07F7/08 ,  C09K19/40 ,  C07F7/18

    CPC分类号： C09K19/406 ,  C07F7/0818 ,  C07F7/0896

    摘要： A cyclohexane carbaldehyde compound of the following formula (I) ##STR1## wherein Ar represents a phenyl group or a tolyl group, and R represents a phenyl group, a tolyl group, a linear alkyl group, a mono or difiuoroalkyl group, a branched alkyl group or an alkoxyalkyl group. Processes for preparing a silacyclohexane-based liquid crystal compound of the following formula (II) or (III) from the cyclohexane carbaldehyde are also described ##STR2## wherein R represents a phenyl group, a tolyl group, a linear alkyl group, a mono or difiuoroalkyl group, a branched alkyl group or an alkoxyalkyl group, X represents R or OR, in which R has the same meaning as defined above, CN, F, C1, Br, CF.sub.3, OCF.sub.3, OCHFCL, OCF.sub.2 Cl, CF.sub.2 Cl, (O).sub.m CY.sub.1 =CX.sub.1 X.sub.2, O(CH.sub.2).sub.r (CF.sub.2).sub.s X.sub.3, wherein m is a value of 0 or 1, Y.sub.1 and X.sub.1 independently represent H, F or Cl, X.sub.2 represents F or Cl, r and s are, respectively, a value of 0, 1 or 2 provided that r+s=2, 3 or 4, and X.sub.3 represents H, F or Cl, Y represents a halogen or a methyl group, Z represents a halogen or CH.sub.3, i is a value of 0, 1 or 2, and j is a value of 0, 1 or 2.

    摘要翻译： 下式（I）的环己烷甲醛化合物其中Ar表示苯基或甲苯基，R表示苯基，甲苯基，直链烷基，单或二氟烷基， 支链烷基或烷氧基烷基。 还描述了从环己烷甲醛制备下式（II）或（III）的硅环己烷基液晶化合物的方法，其中苯基，甲苯基，直链烷基，单或二氟烷基，支链 烷基或烷氧基烷基，X表示R或OR，其中R的定义同上，CN，F，C1，Br，CF3，OCF3，OCHFCL，OCF2Cl，CF2Cl，（O）mCY1 = CX1X2，O （CH 2）r（CF 2）s X 3，其中m为0或1，Y1和X1独立地表示H，F或Cl，X2表示F或Cl，r和s分别为0,1或 2，条件是r + s = 2,3或4，X3表示H，F或Cl，Y表示卤素或甲基，Z表示卤素或CH3，i表示0,1或2， j是0，1或2的值。

    Resist underlayer film composition and patterning process using the same
    109.
    发明授权
    Resist underlayer film composition and patterning process using the same 有权
    抗蚀剂下层膜组合物和使用其的图案化工艺

    公开(公告)号：US08877422B2

    公开(公告)日：2014-11-04

    申请号：US13269290

    申请日：2011-10-07

    申请人： Tsutomu Ogihara ,  Daisuke Kori ,  Yusuke Biyajima ,  Toshihiko Fujii ,  Takeru Watanabe ,  Takeshi Kinsho

    发明人： Tsutomu Ogihara ,  Daisuke Kori ,  Yusuke Biyajima ,  Toshihiko Fujii ,  Takeru Watanabe ,  Takeshi Kinsho

    IPC分类号： G03F7/004 ,  G03F7/26 ,  G03F7/09

    CPC分类号： G03F7/091 ,  G03F7/094

    摘要： There is disclosed a resist underlayer film composition, wherein the composition contains a polymer obtained by condensation of, at least, one or more compounds represented by the following general formula (1-1) and/or (1-2), and one or more kinds of compounds and/or equivalent bodies thereof represented by the following general formula (2). There can be provided an underlayer film composition, especially for a trilayer resist process, that can form an underlayer film having reduced reflectance, namely, an underlayer film having optimum n-value and k-value, excellent filling-up properties, high pattern-antibending properties, and not causing line fall or wiggling after etching especially in a high aspect line that is thinner than 60 nm, and a patterning process using the same.

    摘要翻译： 公开了一种抗蚀剂下层膜组合物，其中组合物含有通过至少一种或多种下列通式（1-1）和/或（1-2）表示的化合物缩合得到的聚合物，以及一种或多种 更多种由下列通式（2）表示的化合物和/或其等价物。 可以提供一种特别用于三层抗蚀剂工艺的下层膜组合物，其可以形成具有降低的反射率的下层膜，即具有最佳n值和k值的底层膜，优异的填充性， 抗蚀性能，并且特别是在比60nm薄的高方位线中，特别是在蚀刻后不会引起线下落或摆动，以及使用其的图案化工艺。