公开(公告)号：US20210083118A1

公开(公告)日：2021-03-18

申请号：US16571879

申请日：2019-09-16

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Chung-Chiang Wu ,  Po-Cheng Chen ,  Kuo-Chan Huang ,  Hung-Chin Chung ,  Hsien-Ming Lee ,  Chien-Hao Chen

IPC: H01L29/78 ,  H01L27/088 ,  H01L29/423 ,  H01L29/49 ,  H01L29/66 ,  H01L29/40 ,  H01L21/8234

Abstract: A device includes a semiconductor fin, and a gate stack on sidewalls and a top surface of the semiconductor fin. The gate stack includes a high-k dielectric layer, a work-function layer overlapping a bottom portion of the high-k dielectric layer, and a blocking layer overlapping a second bottom portion of the work-function layer. A low-resistance metal layer overlaps and contacts the work-function layer and the blocking layer. The low-resistance metal layer has a resistivity value lower than second resistivity values of both of the work-function layer and the blocking layer. A gate spacer contacts a sidewall of the gate stack.

公开(公告)号：US20240162349A1

公开(公告)日：2024-05-16

申请号：US18421681

申请日：2024-01-24

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Chung-Chiang Wu ,  Po-Cheng Chen ,  Kuo-Chan Huang ,  Hung-Chin Chung ,  Hsien-Ming Lee ,  Chien-Hao Chen

IPC: H01L29/78 ,  H01L21/8234 ,  H01L27/088 ,  H01L29/40 ,  H01L29/423 ,  H01L29/49 ,  H01L29/66

CPC classification number: H01L29/7851 ,  H01L21/823431 ,  H01L27/0886 ,  H01L29/401 ,  H01L29/42372 ,  H01L29/4966 ,  H01L29/66545

Abstract: A device includes a semiconductor fin, and a gate stack on sidewalls and a top surface of the semiconductor fin. The gate stack includes a high-k dielectric layer, a work-function layer overlapping a bottom portion of the high-k dielectric layer, and a blocking layer overlapping a second bottom portion of the work-function layer. A low-resistance metal layer overlaps and contacts the work-function layer and the blocking layer. The low-resistance metal layer has a resistivity value lower than second resistivity values of both of the work-function layer and the blocking layer. A gate spacer contacts a sidewall of the gate stack.

公开(公告)号：US11855015B2

公开(公告)日：2023-12-26

申请号：US17468871

申请日：2021-09-08

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Chen-Chi Huang ,  Chang-Yao Huang ,  Po-Cheng Chen

IPC: H01L23/00 ,  G03F7/00

CPC classification number: H01L24/02 ,  G03F7/70925 ,  H01L24/03 ,  H01L24/04 ,  H01L24/05 ,  H01L24/11 ,  H01L24/13 ,  H01L2224/0215 ,  H01L2224/02141 ,  H01L2224/02145 ,  H01L2224/0362 ,  H01L2224/0401 ,  H01L2224/05569 ,  H01L2224/05573 ,  H01L2224/11462 ,  H01L2224/13005 ,  H01L2224/1357 ,  H01L2224/13147 ,  H01L2224/141 ,  H01L2924/07025 ,  H01L2924/2064 ,  H01L2924/20752 ,  H01L2924/20753 ,  H01L2924/20754

Abstract: A structure includes a controlled polyimide profile. A method for forming such a structure includes depositing, on a substrate, a photoresist containing polyimide and performing a first anneal at a first temperature. The method further includes exposing the photoresist to a radiation source through a photomask having a pattern associated with a shape of a polyimide opening. The method further includes performing a second anneal at a second temperature and removing a portion of the photoresist to form the polyimide opening. The method further includes performing a third anneal at a third temperature and cleaning the polyimide opening by ashing.

公开(公告)号：US20220238715A1

公开(公告)日：2022-07-28

申请号：US17658708

申请日：2022-04-11

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Chung-Chiang Wu ,  Po-Cheng Chen ,  Kuo-Chan Huang ,  Hung-Chin Chung ,  Hsien-Ming Lee ,  Chien-Hao Chen

IPC: H01L29/78 ,  H01L27/088 ,  H01L29/423 ,  H01L21/8234 ,  H01L29/66 ,  H01L29/40 ,  H01L29/49

Abstract: A device includes a semiconductor fin, and a gate stack on sidewalls and a top surface of the semiconductor fin. The gate stack includes a high-k dielectric layer, a work-function layer overlapping a bottom portion of the high-k dielectric layer, and a blocking layer overlapping a second bottom portion of the work-function layer. A low-resistance metal layer overlaps and contacts the work-function layer and the blocking layer. The low-resistance metal layer has a resistivity value lower than second resistivity values of both of the work-function layer and the blocking layer. A gate spacer contacts a sidewall of the gate stack.

公开(公告)号：US12183629B2

公开(公告)日：2024-12-31

申请号：US17813806

申请日：2022-07-20

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Chung-Chiang Wu ,  Po-Cheng Chen ,  Kuo-Chan Huang ,  Pin-Hsuan Yeh ,  Wei-Chin Lee ,  Hsien-Ming Lee ,  Chien-Hao Chen ,  Chi On Chui

IPC: H01L21/768 ,  H01L29/423 ,  H01L29/78

Abstract: A method includes forming a gate electrode on a semiconductor region, recessing the gate electrode to generate a recess, performing a first deposition process to form a first metallic layer on the gate electrode and in the recess, wherein the first deposition process is performed using a first precursor, and performing a second deposition process to form a second metallic layer on the first metallic layer using a second precursor different from the first precursor. The first metallic layer and the second metallic layer comprise a same metal. The method further incudes forming a dielectric hard mask over the second metallic layer, and forming a gate contact plug penetrating through the dielectric hard mask. The gate contact plug contacts a top surface of the second metallic layer.

公开(公告)号：US20240387257A1

公开(公告)日：2024-11-21

申请号：US18788514

申请日：2024-07-30

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Chung-Chiang Wu ,  Po-Cheng Chen ,  Kuo-Chan Huang ,  Pin-Hsuan Yeh ,  Wei-Chin Lee ,  Hsien-Ming Lee ,  Chien-Hao Chen ,  Chi On Chui

IPC: H01L21/768 ,  H01L29/423 ,  H01L29/78

Abstract: A method includes forming a gate electrode on a semiconductor region, recessing the gate electrode to generate a recess, performing a first deposition process to form a first metallic layer on the gate electrode and in the recess, wherein the first deposition process is performed using a first precursor, and performing a second deposition process to form a second metallic layer on the first metallic layer using a second precursor different from the first precursor. The first metallic layer and the second metallic layer comprise a same metal. The method further incudes forming a dielectric hard mask over the second metallic layer, and forming a gate contact plug penetrating through the dielectric hard mask. The gate contact plug contacts a top surface of the second metallic layer.

公开(公告)号：US11916146B2

公开(公告)日：2024-02-27

申请号：US17658708

申请日：2022-04-11

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Chung-Chiang Wu ,  Po-Cheng Chen ,  Kuo-Chan Huang ,  Hung-Chin Chung ,  Hsien-Ming Lee ,  Chien-Hao Chen

IPC: H01L21/28 ,  H01L21/8234 ,  H01L27/088 ,  H01L29/40 ,  H01L29/423 ,  H01L29/49 ,  H01L29/66 ,  H01L29/78

CPC classification number: H01L29/7851 ,  H01L21/823431 ,  H01L27/0886 ,  H01L29/401 ,  H01L29/42372 ,  H01L29/4966 ,  H01L29/66545

Abstract: A device includes a semiconductor fin, and a gate stack on sidewalls and a top surface of the semiconductor fin. The gate stack includes a high-k dielectric layer, a work-function layer overlapping a bottom portion of the high-k dielectric layer, and a blocking layer overlapping a second bottom portion of the work-function layer. A low-resistance metal layer overlaps and contacts the work-function layer and the blocking layer. The low-resistance metal layer has a resistivity value lower than second resistivity values of both of the work-function layer and the blocking layer. A gate spacer contacts a sidewall of the gate stack.

公开(公告)号：US11302818B2

公开(公告)日：2022-04-12

申请号：US16571879

申请日：2019-09-16

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Chung-Chiang Wu ,  Po-Cheng Chen ,  Kuo-Chan Huang ,  Hung-Chin Chung ,  Hsien-Ming Lee ,  Chien-Hao Chen

IPC: H01L29/423 ,  H01L29/78 ,  H01L27/088 ,  H01L21/8234 ,  H01L29/66 ,  H01L29/40 ,  H01L29/49

Abstract: A device includes a semiconductor fin, and a gate stack on sidewalls and a top surface of the semiconductor fin. The gate stack includes a high-k dielectric layer, a work-function layer overlapping a bottom portion of the high-k dielectric layer, and a blocking layer overlapping a second bottom portion of the work-function layer. A low-resistance metal layer overlaps and contacts the work-function layer and the blocking layer. The low-resistance metal layer has a resistivity value lower than second resistivity values of both of the work-function layer and the blocking layer. A gate spacer contacts a sidewall of the gate stack.

公开(公告)号：US20210242081A1

公开(公告)日：2021-08-05

申请号：US16884837

申请日：2020-05-27

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Chung-Chiang Wu ,  Po-Cheng Chen ,  Kuo-Chan Huang ,  Pin-Hsuan Yeh ,  Wei-Chin Lee ,  Hsien-Ming Lee ,  Chien-Hao Chen ,  Chi On Chui

IPC: H01L21/768 ,  H01L29/423 ,  H01L29/78

Abstract: A method includes forming a gate electrode on a semiconductor region, recessing the gate electrode to generate a recess, performing a first deposition process to form a first metallic layer on the gate electrode and in the recess, wherein the first deposition process is performed using a first precursor, and performing a second deposition process to form a second metallic layer on the first metallic layer using a second precursor different from the first precursor. The first metallic layer and the second metallic layer comprise a same metal. The method further incudes forming a dielectric hard mask over the second metallic layer, and forming a gate contact plug penetrating through the dielectric hard mask. The gate contact plug contacts a top surface of the second metallic layer.

公开(公告)号：US20250118707A1

公开(公告)日：2025-04-10

申请号：US18482632

申请日：2023-10-06

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Po-Cheng Chen ,  Chao-Wen Shih ,  Min-Chien Hsiao ,  Kuo-Chiang Ting ,  Yen-Ming Chen

IPC: H01L25/065 ,  H01L23/00 ,  H01L23/31 ,  H01L23/498

Abstract: An integrated circuit package and the method of forming the same are provided. The integrated circuit package may include a first die, a first gap-fill layer along sidewalls of the first die, a first bonding layer on the first die and the first gap-fill layer, and a first die connector in the first bonding layer. The first die connector may be directly over an interface between the first die and the first gap-fill layer.