3-D NONVOLATILE MEMORY DEVICES AND METHODS OF MANUFACTURING THE SAME
    1.
    发明申请
    3-D NONVOLATILE MEMORY DEVICES AND METHODS OF MANUFACTURING THE SAME 有权
    3-D非易失性存储器件及其制造方法

    公开(公告)号:US20130107602A1

    公开(公告)日:2013-05-02

    申请号:US13601531

    申请日:2012-08-31

    摘要: A three-dimensional (3-D) nonvolatile memory device includes a channel layer protruded from a substrate, a plurality of memory cells stacked along the channel layer, a source line coupled to the end of one side of the channel layer, a bit line coupled to the end of the other side of the channel layer, a first junction interposed between the end of one side of the channel layer and the source line and configured to have a P type impurity doped therein, and a second junction interposed between the end of the other side of the channel layer and the bit line and configured to have an N type impurity doped therein.

    摘要翻译: 三维(3-D)非易失性存储器件包括从衬底突出的沟道层,沿着沟道层堆叠的多个存储单元,耦合到沟道层一侧的端部的源极线,位线 耦合到沟道层的另一侧的端部,插入在沟道层的一侧的端部和源极线之间并且被配置为在其中掺杂有P型杂质的第一结,以及插入在端部之间的第二结 的沟道层的另一侧和位线,并且被配置为在其中掺杂有N型杂质。

    3-D nonvolatile memory devices and methods of manufacturing the same
    2.
    发明授权
    3-D nonvolatile memory devices and methods of manufacturing the same 有权
    3-D非易失性存储器件及其制造方法

    公开(公告)号:US09117700B2

    公开(公告)日:2015-08-25

    申请号:US13601531

    申请日:2012-08-31

    摘要: A three-dimensional (3-D) nonvolatile memory device includes a channel layer protruded from a substrate, a plurality of memory cells stacked along the channel layer, a source line coupled to the end of one side of the channel layer, a bit line coupled to the end of the other side of the channel layer, a first junction interposed between the end of one side of the channel layer and the source line and configured to have a P type impurity doped therein, and a second junction interposed between the end of the other side of the channel layer and the bit line and configured to have an N type impurity doped therein.

    摘要翻译: 三维(3-D)非易失性存储器件包括从衬底突出的沟道层,沿着沟道层堆叠的多个存储单元,耦合到沟道层一侧的端部的源极线,位线 耦合到沟道层的另一侧的端部,插入在沟道层的一侧的端部和源极线之间并且被配置为在其中掺杂有P型杂质的第一结,以及插入在端部之间的第二结 的沟道层的另一侧和位线,并且被配置为在其中掺杂有N型杂质。

    Read methods of semiconductor memory device
    3.
    发明授权
    Read methods of semiconductor memory device 有权
    读取半导体存储器件的方法

    公开(公告)号:US09058878B2

    公开(公告)日:2015-06-16

    申请号:US13341303

    申请日:2011-12-30

    IPC分类号: G11C16/04 G11C11/56 G11C16/26

    摘要: A read method of a semiconductor memory device includes performing a read operation on target cells by using a first read voltage, terminating the read operation on the target cells if, as a result of the read operation on the target cells, error correction is feasible, performing a read operation on first cells next to the target cells along a first direction if, as a result of the read operation on the target cells, error correction is unfeasible, performing the read operation again on the target cells by selecting one of a plurality of read voltages in response to a result of the read operation on the first cells and by using the selected read voltage for reading data of the target cells, and terminating the read operation on the target cells if error correction is feasible.

    摘要翻译: 半导体存储器件的读取方法包括通过使用第一读取电压对目标单元执行读取操作,如果作为对目标单元的读取操作的结果,错误校正是可行的,则终止对目标单元的读取操作, 如果作为对目标单元的读取操作的结果,误差校正是不可行的,则对目标单元的旁边的第一单元执行读取操作,通过选择多个目标单元之一对目标单元执行再次操作 的读取电压,并且通过使用所选择的读取电压来读取目标单元的数据,并且如果纠错是可行的,则终止对目标单元的读取操作。

    Nonvolatile memory device and operating method thereof
    4.
    发明授权
    Nonvolatile memory device and operating method thereof 有权
    非易失性存储器件及其操作方法

    公开(公告)号:US09019767B2

    公开(公告)日:2015-04-28

    申请号:US13398397

    申请日:2012-02-16

    摘要: A nonvolatile memory device includes a channel vertically extending from a substrate, a plurality of memory cells stacked along the channel; a source region connected to a first end portion of the channel, and a bit line connected to a second end portion of the channel, wherein the first end portion of the channel that adjoins the source region is formed as an undoped semiconductor layer or a semiconductor layer doped with P-type impurities.

    摘要翻译: 非易失性存储器件包括从衬底垂直延伸的沟道,沿着沟道堆叠的多个存储单元; 连接到所述沟道的第一端部的源极区域和与所述沟道的第二端部连接的位线,其中与所述源极区域相邻的所述沟道的所述第一端部形成为未掺杂的半导体层或半导体 层掺杂有P型杂质。

    Semiconductor memory device and method of operating the same
    5.
    发明授权
    Semiconductor memory device and method of operating the same 有权
    半导体存储器件及其操作方法

    公开(公告)号:US08705287B2

    公开(公告)日:2014-04-22

    申请号:US13282029

    申请日:2011-10-26

    IPC分类号: G11C11/34 G11C16/06

    摘要: A method of operating a semiconductor memory device includes performing a first program operation in order to raise threshold voltages of memory cells, performing a program verification operation for detecting fast program memory cells, each having a threshold voltage risen higher than a first sub-verification voltage from a second sub-verification voltage or lower, by using a target verification voltage and the first sub-verification voltage and the second sub-verification voltage which are sequentially lower than the target verification voltage, and performing a second program operation under a condition that an increment of each of threshold voltages of memory cells, which is lower than the target verification voltage, is greater than an increment of the threshold voltage of each of the fast program memory cells.

    摘要翻译: 一种操作半导体存储器件的方法包括执行第一程序操作以提高存储单元的阈值电压,执行用于检测快速程序存储单元的程序验证操作,每个程序存储单元的阈值电压升高高于第一次验证电压 通过使用目标验证电压和顺序地低于目标验证电压的第一子验证电压和第二子验证电压,从第二子验证电压或更低的次级验证电压进行第二子验证电压,并且在 低于目标验证电压的存储单元的每个阈值电压的增量大于每个快速程序存储单元的阈值电压的增量。

    NONVOLATILE MEMORY DEVICE AND METHOD FOR FABRICATING THE SAME
    9.
    发明申请
    NONVOLATILE MEMORY DEVICE AND METHOD FOR FABRICATING THE SAME 有权
    非易失性存储器件及其制造方法

    公开(公告)号:US20120241840A1

    公开(公告)日:2012-09-27

    申请号:US13402989

    申请日:2012-02-23

    IPC分类号: H01L29/788 H01L21/28

    摘要: A nonvolatile memory device includes a substrate having active regions that are defined by an isolation layer and that have first sidewalls extending upward from the isolation layer, floating gates adjoining the first sidewalls of the active regions with a tunnel dielectric layer interposed between the active regions and the floating gates and extending upward from the substrate, an intergate dielectric layer disposed over the floating gates, and control gates disposed over the intergate dielectric layer.

    摘要翻译: 非易失性存储器件包括具有由隔离层限定的并且具有从隔离层向上延伸的第一侧壁的有源区的衬底,与有源区相邻的浮动栅极与介于有源区之间的隧道介电层和 浮置栅极并从衬底向上延伸,布置在浮置栅极上的隔间介电层以及设置在栅极间介电层上的控制栅极。

    Sensing memory cells
    10.
    发明授权
    Sensing memory cells 有权
    感应记忆体

    公开(公告)号:US08264879B2

    公开(公告)日:2012-09-11

    申请号:US12948469

    申请日:2010-11-17

    申请人: Seiichi Aritome

    发明人: Seiichi Aritome

    IPC分类号: G11C16/04

    摘要: Methods, devices, modules, and systems for operating memory cells are taught. A method for operating memory cells includes programming at least one of the memory cells to one of a number of states. Operating memory cells also includes programming at least another one of the memory cells, which is adjacent to the programmed at least one of the memory cells, to one of a different number of states. Operating memory cells also includes sensing non-erased states of the memory cells using at least one common voltage level.

    摘要翻译: 教授了用于操作存储器单元的方法,设备,模块和系统。 用于操作存储器单元的方法包括将至少一个存储器单元编程为多个状态之一。 操作存储器单元还包括将与编程的至少一个存储器单元相邻的存储单元中的至少另一个存储器编程为不同数量的状态之一。 操作存储单元还包括使用至少一个公共电压电平来感测存储器单元的未擦除状态。