公开(公告)号：US20240234103A1

公开(公告)日：2024-07-11

申请号：US18404423

申请日：2024-01-04

Applicant: Samsung Electronics Co., Ltd.

Inventor： Hyunsu Hwang ,  Unbyoung Kang ,  Jumyong Park ,  Dongjoon Oh ,  Hyunchul Jung ,  Sanghoo Cho

IPC: H01J37/32

CPC classification number: H01J37/32642 ,  H01J37/32715 ,  H01J2237/334

Abstract: A ring assembly is used in a semiconductor wafer etching device in which a plasma gas flow stream line is not uniform and which surrounds a wafer support plate supporting a semiconductor wafer. The ring assembly includes: an edge ring protruding from at least one side of the semiconductor wafer to have an upper surface higher than an upper surface of the semiconductor wafer; and a shadow ring movable up and down above the edge ring and configured to be tilted with respect to the semiconductor wafer.

公开(公告)号：US20240145366A1

公开(公告)日：2024-05-02

申请号：US18141519

申请日：2023-05-01

Applicant: Samsung Electronics Co., Ltd.

Inventor： Dongjoon Oh ,  Jumyong Park ,  Solji Song ,  Hyunchul Jung ,  Sanghoo Cho ,  Hyunsu Hwang

IPC: H01L23/498 ,  H01L21/3213 ,  H01L21/768 ,  H01L23/00 ,  H01L25/065

CPC classification number: H01L23/49827 ,  H01L21/32134 ,  H01L21/32136 ,  H01L21/76898 ,  H01L24/08 ,  H01L24/09 ,  H01L24/27 ,  H01L24/32 ,  H01L24/80 ,  H01L25/0657 ,  H01L2224/08148 ,  H01L2224/08221 ,  H01L2224/0903 ,  H01L2224/09181 ,  H01L2224/27416 ,  H01L2224/27444 ,  H01L2224/32145 ,  H01L2224/32221 ,  H01L2224/80895 ,  H01L2225/06541 ,  H01L2924/182

Abstract: A method of manufacturing a semiconductor package including forming a first semiconductor chip including a first substrate having a first and second surfaces and forming a second semiconductor chip including a second substrate having third and fourth surfaces. Arranging the second semiconductor chip on the first semiconductor chip such that bonding pads that are exposed from the front surface of the second semiconductor chip are bonded to conductive pads that are exposed from the rear surface of the first semiconductor chip. Forming a first through via having a first diameter and that penetrates the first substrate. Forming an insulating layer that exposes a first end of the first through via on the second surface of the first substrate, etching the first end of the first through via to a first depth, and applying a conductive material to the first end to form the conductive pad having a second diameter.

公开(公告)号：US20240237349A1

公开(公告)日：2024-07-11

申请号：US18464348

申请日：2023-09-11

Applicant: Samsung Electronics Co., Ltd.

Inventor： Hyunsu Hwang ,  Un-Byoung Kang ,  Jumyong Park ,  Dongjoon Oh ,  Hyunchul Jung ,  Sanghoo Cho

IPC: H10B43/27 ,  G11C16/04 ,  H01L23/528 ,  H01L25/065 ,  H10B43/10 ,  H10B43/35 ,  H10B43/40 ,  H10B80/00

CPC classification number: H10B43/27 ,  G11C16/0483 ,  H01L23/5283 ,  H01L25/0652 ,  H10B43/10 ,  H10B43/35 ,  H10B43/40 ,  H10B80/00 ,  H01L2225/06506

Abstract: A three-dimensional semiconductor memory device may include a bottom structure and a top structure thereon. The bottom structure may include a semiconductor substrate including a cell array region and a connection region extending therefrom, and a first stack including first gate electrodes and first interlayer insulating layers alternately stacked on the semiconductor substrate. The top structure may include a second stack including second gate electrodes and second interlayer insulating layers alternately stacked on the first stack. Respective lengths of the first gate electrodes in a second direction may decrease as a distance in a first direction increases, and respective lengths of the second gate electrodes in the second direction may increase as a distance in the first direction increases. The first direction may be perpendicular to a bottom surface of the semiconductor substrate, and the second direction may be parallel to the bottom surface of the semiconductor substrate.

公开(公告)号：US20240162104A1

公开(公告)日：2024-05-16

申请号：US18462010

申请日：2023-09-06

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Hyunsu Hwang ,  Jumyong Park ,  Solji Song ,  Dongjoon Oh ,  Hyunchul Jung ,  Sanghoo Cho

IPC: H01L23/31 ,  H01L21/78 ,  H01L23/00 ,  H01L23/522

CPC classification number: H01L23/3107 ,  H01L21/78 ,  H01L23/5226 ,  H01L24/08 ,  H01L2224/08145

Abstract: A semiconductor device may include a substrate, one or more front pads disposed on a front surface of the substrate, and a circuit layer including an insulating layer and at least one interconnection electrically connected to the one or more front pads. In some embodiments, the circuit layer may be disposed between the one or more front pads and the substrate. In some embodiments, a side surface of the circuit layer may include a burr that protrudes a height that is below a level of a front surface of the circuit layer. Additionally or alternatively, the burr may form a step portion in the circuit layer.