公开(公告)号：US09865575B2

公开(公告)日：2018-01-09

申请号：US15202349

申请日：2016-07-05

Applicant: STATS ChipPAC Pte. Ltd.

Inventor： HeeJo Chi ,  HanGil Shin ,  KyungMoon Kim

IPC: H01L25/10 ,  H01L23/498 ,  H01L23/538 ,  H01L23/31 ,  H01L21/56 ,  H01L23/00

CPC classification number: H01L25/105 ,  H01L21/563 ,  H01L23/3128 ,  H01L23/49816 ,  H01L23/49822 ,  H01L23/49827 ,  H01L23/5389 ,  H01L24/13 ,  H01L24/14 ,  H01L24/16 ,  H01L24/17 ,  H01L24/29 ,  H01L24/32 ,  H01L24/48 ,  H01L24/83 ,  H01L2224/05611 ,  H01L2224/05624 ,  H01L2224/05639 ,  H01L2224/05644 ,  H01L2224/05647 ,  H01L2224/05655 ,  H01L2224/131 ,  H01L2224/13147 ,  H01L2224/16225 ,  H01L2224/16227 ,  H01L2224/2919 ,  H01L2224/32225 ,  H01L2224/48225 ,  H01L2224/73204 ,  H01L2224/73265 ,  H01L2224/831 ,  H01L2224/8385 ,  H01L2225/1023 ,  H01L2225/1041 ,  H01L2225/1058 ,  H01L2924/00014 ,  H01L2924/01322 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/13091 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/18161 ,  H01L2924/00 ,  H01L2924/014 ,  H01L2924/0665 ,  H01L2924/00012 ,  H01L2224/45099 ,  H01L2224/45015 ,  H01L2924/207

Abstract: Methods of forming conductive and insulating layers for semiconductor devices and packages. Substrate is provided with integrated circuit device and interconnect structure mounted thereon, the interconnect structure adjacent the integrated circuit device. The integrated circuit device and portions of the interconnect structure can be covered with an encapsulation exposing a portion of the interconnect structure. Conductive material is formed over the exposed portion of the interconnect structure by a depositing process followed by a heating process to alter the chemical properties of the conductive material. Optionally, a dispersing process may be incorporated.

公开(公告)号：US20180261551A1

公开(公告)日：2018-09-13

申请号：US15456972

申请日：2017-03-13

Applicant: STATS ChipPAC Pte. Ltd.

Inventor： Goo Lee ,  KyungMoon Kim ,  SooSan Park ,  KeoChang Lee

IPC: H01L23/552 ,  H01L21/56 ,  H01L21/3105 ,  H01L23/31 ,  H01L25/16 ,  H01L25/065 ,  H01L25/00 ,  H01L23/053 ,  H01L23/538 ,  H01L23/00

CPC classification number: H01L23/552 ,  H01L21/56 ,  H01L23/16 ,  H01L23/3128 ,  H01L23/49816 ,  H01L23/5383 ,  H01L23/5384 ,  H01L24/17 ,  H01L24/32 ,  H01L24/49 ,  H01L24/73 ,  H01L25/0655 ,  H01L25/16 ,  H01L25/50 ,  H01L2224/0401 ,  H01L2224/05111 ,  H01L2224/05124 ,  H01L2224/05139 ,  H01L2224/05144 ,  H01L2224/05147 ,  H01L2224/05155 ,  H01L2224/11334 ,  H01L2224/1146 ,  H01L2224/13023 ,  H01L2224/131 ,  H01L2224/13111 ,  H01L2224/13113 ,  H01L2224/13116 ,  H01L2224/13124 ,  H01L2224/13139 ,  H01L2224/13144 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/16235 ,  H01L2224/16238 ,  H01L2224/2919 ,  H01L2224/48091 ,  H01L2224/48179 ,  H01L2224/73265 ,  H01L2224/81815 ,  H01L2924/00014 ,  H01L2924/1203 ,  H01L2924/1304 ,  H01L2924/1421 ,  H01L2924/19011 ,  H01L2924/19041 ,  H01L2924/19042 ,  H01L2924/19043 ,  H01L2924/3025 ,  H01L2924/014 ,  H01L2224/45099

Abstract: A semiconductor device has a partition fence disposed between a first attach area and a second attach area on a substrate. A first electrical component is disposed over the first attach area. A second electrical component is disposed over the second attach area. The partition fence extends above and along a length of the first electrical component and second electrical component. An encapsulant is deposited over the substrate, first electrical component, second electrical component, and partition fence. A portion of the encapsulant is removed to expose a surface of the partition fence and planarizing the encapsulant. A shielding layer is formed over the encapsulant and in contact with the surface of the partition fence. The combination of the partition fence and shielding layer compartmentalize the first electrical component and second electrical component for physical and electrical isolation to reduce the influence of EMI, RFI, and other inter-device interference.

公开(公告)号：US20160329310A1

公开(公告)日：2016-11-10

申请号：US15202349

申请日：2016-07-05

Applicant: STATS ChipPAC Pte. Ltd.

Inventor： HeeJo Chi ,  HanGil Shin ,  KyungMoon Kim

IPC: H01L25/10 ,  H01L23/538 ,  H01L23/31 ,  H01L21/56 ,  H01L23/00 ,  H01L23/498

CPC classification number: H01L25/105 ,  H01L21/563 ,  H01L23/3128 ,  H01L23/49816 ,  H01L23/49822 ,  H01L23/49827 ,  H01L23/5389 ,  H01L24/13 ,  H01L24/14 ,  H01L24/16 ,  H01L24/17 ,  H01L24/29 ,  H01L24/32 ,  H01L24/48 ,  H01L24/83 ,  H01L2224/05611 ,  H01L2224/05624 ,  H01L2224/05639 ,  H01L2224/05644 ,  H01L2224/05647 ,  H01L2224/05655 ,  H01L2224/131 ,  H01L2224/13147 ,  H01L2224/16225 ,  H01L2224/16227 ,  H01L2224/2919 ,  H01L2224/32225 ,  H01L2224/48225 ,  H01L2224/73204 ,  H01L2224/73265 ,  H01L2224/831 ,  H01L2224/8385 ,  H01L2225/1023 ,  H01L2225/1041 ,  H01L2225/1058 ,  H01L2924/00014 ,  H01L2924/01322 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/13091 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/18161 ,  H01L2924/00 ,  H01L2924/014 ,  H01L2924/0665 ,  H01L2924/00012 ,  H01L2224/45099 ,  H01L2224/45015 ,  H01L2924/207

Abstract: Methods of forming conductive and insulating layers for semiconductor devices and packages. Substrate is provided with integrated circuit device and interconnect structure mounted thereon, the interconnect structure adjacent the integrated circuit device. The integrated circuit device and portions of the interconnect structure can be covered with an encapsulation exposing a portion of the interconnect structure. Conductive material is formed over the exposed portion of the interconnect structure by a depositing process followed by a heating process to alter the chemical properties of the conductive material. Optionally, a dispersing process may be incorporated.

公开(公告)号：US10418332B2

公开(公告)日：2019-09-17

申请号：US15456972

申请日：2017-03-13

Applicant: STATS ChipPAC Pte. Ltd.

Inventor： Goo Lee ,  KyungMoon Kim ,  SooSan Park ,  KeoChang Lee

IPC: H01L23/552 ,  H01L21/56 ,  H01L25/00 ,  H01L23/00 ,  H01L25/16 ,  H01L25/065 ,  H01L23/538 ,  H01L23/16 ,  H01L23/31

Abstract: A semiconductor device has a partition fence disposed between a first attach area and a second attach area on a substrate. A first electrical component is disposed over the first attach area. A second electrical component is disposed over the second attach area. The partition fence extends above and along a length of the first electrical component and second electrical component. An encapsulant is deposited over the substrate, first electrical component, second electrical component, and partition fence. A portion of the encapsulant is removed to expose a surface of the partition fence and planarizing the encapsulant. A shielding layer is formed over the encapsulant and in contact with the surface of the partition fence. The combination of the partition fence and shielding layer compartmentalize the first electrical component and second electrical component for physical and electrical isolation to reduce the influence of EMI, RFI, and other inter-device interference.