知搜-全球专利检索

  1. Login
  2. Sign Up

Search Results

12 records (took 0.015 seconds)

    Optical phase measurement system and method
    1.
    发明授权
    Optical phase measurement system and method 有权

    公开(公告)号：US10663408B2

    公开(公告)日：2020-05-26

    申请号：US16524296

    申请日：2019-07-29

    Applicant: NOVA MEASURING INSTRUMENTS LTD.

    Inventor： Gilad Barak ,  Dror Shafir ,  Yanir Hainick ,  Shahar Gov

    IPC: G01N21/956 ,  G03F7/20 ,  G01N21/95

    Abstract: A method for use in optical measurements on patterned structures, the method including performing a number of optical measurements on a structure with a measurement spot configured to provide detection of light reflected from an illuminating spot at least partially covering at least two different regions of the structure, the measurements including detecting light reflected from the at least part of the at least two different regions within the measurement spot, the detected light including interference of at least two complex electric fields reflected from the at least part of the at least two different regions, and being therefore indicative of a phase response of the structure, carrying information about properties of the structure.

    Method and system for optical metrology in patterned structures
    2.
    发明授权
    Method and system for optical metrology in patterned structures 有权

    公开(公告)号：US10274435B2

    公开(公告)日：2019-04-30

    申请号：US15523896

    申请日：2015-11-02

    Applicant: NOVA MEASURING INSTRUMENTS LTD.

    Inventor： Boris Levant ,  Yanir Hainick ,  Vladimir Machavariani ,  Roy Koret ,  Gilad Barak

    IPC: G01N21/956 ,  G01B11/02 ,  G01N21/95

    Abstract: A data analysis method and system are presented for use in determining one or more parameters of a patterned structure located on top of an underneath layered structure. According to this technique, input data is provided which includes first measured data PMD being a function ƒ of spectral intensity Iλ and phase φ, PMD=ƒ(Iλ;φ), corresponding to a complex spectral response of the underneath layered structure, and second measured data Smeas indicative of specular reflection spectral response of a sample formed by the patterned structure and the underneath layered structure. Also provided is a general function F describing a relation between a theoretical optical response Stheor of the sample and a modeled optical response Smodel of the patterned structure and the complex spectral response PMD of the underneath layered structure, such that Stheor=F(Smodel; PMD). The general function is then utilized for comparing the second measured data Smeas and the theoretical optical response Stheor, and determining parameter(s) of interest of the top structure.

    Optical phase measurement method and system
    3.
    发明授权
    Optical phase measurement method and system 有权

    公开(公告)号：US10365231B2

    公开(公告)日：2019-07-30

    申请号：US15866768

    申请日：2018-01-10

    Applicant: NOVA MEASURING INSTRUMENTS LTD.

    Inventor： Gilad Barak ,  Dror Shafir ,  Yanir Hainick ,  Shahar Gov

    IPC: G01N21/956 ,  G03F7/20 ,  G01N21/95

    Abstract: A method and system are presented for use in optical measurements on patterned structures. The method comprises performing a number of optical measurements on a structure with a measurement spot configured to provide detection of light reflected from an illuminating spot at least partially covering at least two different regions of the structure. The measurements include detection of light reflected from said at least part of the at least two different regions comprising interference of at least two complex electric fields reflected from said at least part of the at least two different regions, and being therefore indicative of a phase response of the structure, carrying information about properties of the structure.

    Method and system for optical metrology in patterned structures
    4.
    发明授权
    Method and system for optical metrology in patterned structures 有权

    公开(公告)号：US10761036B2

    公开(公告)日：2020-09-01

    申请号：US16398297

    申请日：2019-04-30

    Applicant: NOVA MEASURING INSTRUMENTS LTD.

    Inventor： Boris Levant ,  Yanir Hainick ,  Vladimir Machavariani ,  Roy Koret ,  Gilad Barak

    IPC: G01N21/956 ,  G01B11/02 ,  G03F7/20 ,  G01N21/95

    Abstract: Determining parameters of a patterned structure located on top of an underneath layered structure, where input data is provided which includes first measured data PMD being a function ƒ of spectral intensity Iλ and phase ϕ, PMD=ƒ(Iλ; ϕ), corresponding to a complex spectral response of the underneath layered structure, and second measured data Smeas indicative of specular reflection spectral response of a sample formed by the patterned structure and the underneath layered structure, and where a general function F is also provided describing a relation between a theoretical optical response Stheor of the sample and a modeled optical response Smodel of the patterned structure and the complex spectral response PMD of the underneath layered structure, such that Stheor=F(Smodel; PMD), where the general function is then utilized for comparing the second measured data Smeas and the theoretical optical response Stheor, and determining parameter(s) of interest of the top structure.

    Optical phase measurement method and system
    5.
    发明授权
    Optical phase measurement method and system 有权

    公开(公告)号：US10161885B2

    公开(公告)日：2018-12-25

    申请号：US15300768

    申请日：2015-04-12

    Applicant: Nova Measuring Instruments Ltd.

    Inventor： Gilad Barak ,  Danny Grossman ,  Dror Shafir ,  Yoav Berlatzky ,  Yanir Hainick

    IPC: G01N21/956 ,  G01N9/02 ,  G01B11/06 ,  G01N21/88 ,  G01B9/02

    Abstract: A measurement system for use in measuring parameters of a patterned sample is presented. The system comprises: a broadband light source; an optical system configured as an interferometric system; a detection unit; and a control unit. The interferometric system defines illumination and detection channels having a sample arm and a reference arm comprising a reference reflector, and is configured for inducing an optical path difference between the sample and reference arms; the detection unit comprises a configured and operable for detecting a combined light beam formed by a light beam reflected from said reflector and a light beam propagating from a sample's support, and generating measured data indicative of spectral interference pattern formed by at least two spectral interference signatures. The control unit is configured and operable for receiving the measured data and applying a model-based processing to the spectral interference pattern for determining one or more parameters of the pattern in the sample.

    Raman spectroscopy based measurements in patterned structures
    6.
    发明授权
    Raman spectroscopy based measurements in patterned structures 有权

    公开(公告)号：US10564106B2

    公开(公告)日：2020-02-18

    申请号：US16062114

    申请日：2016-12-15

    Applicant: NOVA MEASURING INSTRUMENTS LTD.

    Inventor： Gilad Barak ,  Yanir Hainick ,  Yonatan Oren ,  Vladimir Machavariani

    IPC: G01N21/65 ,  G01B11/06 ,  G01N21/95 ,  G03F7/20 ,  H01L21/66 ,  G01L1/24

    Abstract: A method and system are presented for use in measuring one or more characteristics of patterned structures. The method comprises: providing measured data comprising data indicative of at least one Raman spectrum obtained from a patterned structure under measurements using at least one selected optical measurement scheme each with a predetermined configuration of at least one of illuminating and collected light conditions corresponding to the characteristic(s) to be measured; processing the measured data, and determining, for each of the at least one Raman spectrum, a distribution of Raman-contribution efficiency (RCE) within at least a part of the structure under measurements, being dependent on characteristics of the structure and the predetermined configuration of the at least one of illuminating and collected light conditions in the respective optical measurement scheme; analyzing the distribution of Raman-contribution efficiency and determining the characteristic(s) of the structure.

    Optical phase measurement method and system
    8.
    发明授权
    Optical phase measurement method and system 有权

    公开(公告)号：US09897553B2

    公开(公告)日：2018-02-20

    申请号：US14769170

    申请日：2014-02-20

    Applicant: NOVA MEASURING INSTRUMENTS LTD.

    Inventor： Gilad Barak ,  Dror Shafir ,  Yanir Hainick ,  Shahar Gov

    IPC: G01B11/02 ,  G01N21/956 ,  G01N21/95 ,  G03F7/20

    CPC classification number: G01N21/956 ,  G01B2210/56 ,  G01N21/9501 ,  G03F7/70625

    Abstract: A method and system are presented for use in optical measurements on patterned structures. The method comprises performing a number of optical measurements on a structure with a measurement spot configured to provide detection of light reflected from an illuminating spot at least partially covering at least two different regions of the structure. The measurements include detection of light reflected from said at least part of the at least two different regions comprising interference of at least two complex electric fields reflected from said at least part of the at least two different regions, and being therefore indicative of a phase response of the structure, carrying information about properties of the structure.

    OPTICAL METHOD AND SYSTEM FOR MEASURING ISOLATED FEATURES OF A STRUCTURE
    9.
    发明申请
    OPTICAL METHOD AND SYSTEM FOR MEASURING ISOLATED FEATURES OF A STRUCTURE 审中-公开
    用于测量结构隔离特征的光学方法和系统

    公开(公告)号：US20150212012A1

    公开(公告)日：2015-07-30

    申请号：US14416723

    申请日：2013-07-24

    Applicant: NOVA MEASURING INSTRUMENTS LTD.

    Inventor： Gilad Barak ,  Yanir Hainick ,  Dror Shafir

    IPC: G01N21/95 ,  G01N21/88

    CPC classification number: G01N21/9501 ,  G01N21/8806 ,  G01N2021/8848 ,  G01N2201/061 ,  G01N2201/0683 ,  G01N2201/12 ,  G02B21/0016 ,  G02B21/002 ,  G02B21/0092 ,  G02B27/46

    Abstract: An optical method and system are presented for use in measurement of isolated features of a structure. According to this technique, Back Focal Plane Microscopy (BFM) measurements are applied to a structure and measured data indicative thereof is obtained, wherein the BFM measurements utilize dark-field detection mode while applying pinhole masking to incident light propagating through an illumination channel towards the structure, the measured data being thereby indicative of a scattering matrix characterizing scattering properties of the structure, enabling identification of one or more isolated features of the structure.

    Abstract translation: 提出了一种光学方法和系统，用于测量结构的隔离特征。 根据该技术，将后焦距平面显微镜（BFM）测量应用于结构，并且获得表示其的测量数据，其中BFM测量利用暗场检测模式，同时对通过照明通道传播的入射光施加针孔掩蔽 结构，因此所测量的数据表示表征结构的散射特性的散射矩阵，使得能够识别结构的一个或多个隔离特征。

    Optical phase measurement method and system
    10.
    发明授权
    Optical phase measurement method and system 有权

    公开(公告)号：US11029258B2

    公开(公告)日：2021-06-08

    申请号：US16231718

    申请日：2018-12-24

    Applicant: NOVA MEASURING INSTRUMENTS LTD.

    Inventor： Gilad Barak ,  Danny Grossman ,  Dror Shafir ,  Yoav Berlatzky ,  Yanir Hainick

    IPC: G01N21/956 ,  G01B9/02 ,  G01B11/06 ,  G01N21/88

    Abstract: A measurement system for use in measuring parameters of a patterned sample, the system including a broadband light source, an optical system configured as an interferometric system, a detection unit, and a control unit, where the interferometric system defines illumination and detection channels having a sample arm and a reference arm having a reference reflector, and is configured for inducing an optical path difference between the sample and reference arms, the detection unit for detecting a combined light beam formed by a light beam reflected from the reflector and a light beam propagating from a sample's support, and generating measured data indicative of spectral interference pattern formed by spectral interference signatures, and the control unit for receiving the measured data and applying a model-based processing to the spectral interference pattern for determining one or more parameters of the pattern in the sample.

Patent Agency Ranking