-
公开(公告)号：US09476837B2
公开(公告)日：2016-10-25
申请号：US14785896
申请日：2014-04-22
Applicant: NOVA MEASURING INSTRUMENTS LTD.
Inventor： Danny Grossman , Guy Selickter
IPC: G01N21/00 , G01N21/88 , G01N21/956
CPC classification number: G01N21/8806 , G01N21/956 , G01N2021/8848
Abstract: A control system and method are provided for use in managing optical measurements on target structures. The control system comprises: data input utility for receiving input data indicative of a size of a target structure to be measured and input data indicative of illumination and collection channels of an optical measurement system; data processing utility for analyzing the input data, and an interplay of Point Spread Functions (PSFs) of the illumination and collection channels, and determining data indicative of optimal tailoring of apertures to be used in the optical measurement system for optimizing ensquared energy for measurements on the given target structure, the optimal tailoring comprising at least one of the following: an optimal ratio between numerical apertures of the illumination and collection channels; and an optimal orientation offset of physical apertures in the illumination and collection channels.
Abstract translation: 提供了一种用于管理目标结构上的光学测量的控制系统和方法。 控制系统包括：用于接收表示要测量的目标结构的大小的输入数据的数据输入实用程序和指示光学测量系统的照明和收集通道的输入数据; 用于分析输入数据的数据处理实用程序，以及照明和采集通道的点扩散函数（PSF）的相互作用，以及确定指示在光学测量系统中使用的孔的最佳定制的数据，以优化用于测量的测量能量 给定的目标结构，最佳剪裁包括以下中的至少一个：照明和收集通道的数值孔径之间的最佳比率; 以及照明和收集通道中物理孔径的最佳取向偏移。
-
公开(公告)号：US11029258B2
公开(公告)日：2021-06-08
申请号：US16231718
申请日：2018-12-24
Applicant: NOVA MEASURING INSTRUMENTS LTD.
Inventor： Gilad Barak , Danny Grossman , Dror Shafir , Yoav Berlatzky , Yanir Hainick
IPC: G01N21/956 , G01B9/02 , G01B11/06 , G01N21/88
Abstract: A measurement system for use in measuring parameters of a patterned sample, the system including a broadband light source, an optical system configured as an interferometric system, a detection unit, and a control unit, where the interferometric system defines illumination and detection channels having a sample arm and a reference arm having a reference reflector, and is configured for inducing an optical path difference between the sample and reference arms, the detection unit for detecting a combined light beam formed by a light beam reflected from the reflector and a light beam propagating from a sample's support, and generating measured data indicative of spectral interference pattern formed by spectral interference signatures, and the control unit for receiving the measured data and applying a model-based processing to the spectral interference pattern for determining one or more parameters of the pattern in the sample.
-
Patent Agency Ranking
公开(公告)号：US10739277B2
公开(公告)日：2020-08-11
申请号：US16094547
申请日：2016-04-21
Applicant: NOVA MEASURING INSTRUMENTS LTD.
Inventor： Yoav Berlatzky , Valery Deich , Dror Shafir , Danny Grossman
IPC: G01N21/956 , G01N21/88 , G01N21/95 , G01B9/02
Abstract: A measurement system is presented for use in metrology measurements on patterned samples. The system comprises: at least one light source device configured to generate broadband light, at least one detection device configured to provide spectral information of detected light, and an optical system. The optical system comprises at least an oblique channel system for directing incident light generated by the light source(s) along an oblique illumination channel onto a measurement plane, on which a sample is to be located, and directing broadband light specularly reflected from the sample along a collection channel to the detection device(s). The optical system further comprises an interferometric unit comprising a beam splitting/combining device and a reference reflector device. The beam splitting/combining device is accommodated in the illumination and collection channels and divides light propagating in the illumination channel into sample and reference light beams propagating in sample and reference paths, and combines reflected reference and sample paths into the collection channel to thereby create a spectral interference pattern on a detection plane.
-
公开(公告)号：US10365163B2
公开(公告)日：2019-07-30
申请号：US16053210
申请日：2018-08-02
Applicant: NOVA MEASURING INSTRUMENTS LTD.
Inventor： Gilad Barak , Dror Shafir , Danny Grossman
Abstract: A metrology system is presented for measuring parameters of a structure. The system comprises: an optical system and a control unit. The optical system is configured for detecting light reflection of incident radiation from the structure and generating measured data indicative of angular phase of the detected light components corresponding to reflections of illuminating light components having different angles of incidence. The control unit is configured for receiving and processing the measured data and generating a corresponding phase map indicative of the phase variation along at least two dimensions, and analyzing the phase map using modeled data for determining one or more parameters of the structure.
-
公开(公告)号：US10161885B2
公开(公告)日：2018-12-25
申请号：US15300768
申请日：2015-04-12
Applicant: Nova Measuring Instruments Ltd.
Inventor： Gilad Barak , Danny Grossman , Dror Shafir , Yoav Berlatzky , Yanir Hainick
IPC: G01N21/956 , G01N9/02 , G01B11/06 , G01N21/88 , G01B9/02
Abstract: A measurement system for use in measuring parameters of a patterned sample is presented. The system comprises: a broadband light source; an optical system configured as an interferometric system; a detection unit; and a control unit. The interferometric system defines illumination and detection channels having a sample arm and a reference arm comprising a reference reflector, and is configured for inducing an optical path difference between the sample and reference arms; the detection unit comprises a configured and operable for detecting a combined light beam formed by a light beam reflected from said reflector and a light beam propagating from a sample's support, and generating measured data indicative of spectral interference pattern formed by at least two spectral interference signatures. The control unit is configured and operable for receiving the measured data and applying a model-based processing to the spectral interference pattern for determining one or more parameters of the pattern in the sample.
-
公开(公告)号：US10041838B2
公开(公告)日：2018-08-07
申请号：US15120847
申请日：2015-02-23
Applicant: NOVA MEASURING INSTRUMENTS LTD.
Inventor： Gilad Barak , Dror Shafir , Danny Grossman
Abstract: A metrology system is presented for measuring parameters of a structure. The system comprises: an optical system and a control unit. The optical system is configured for detecting light reflection of incident radiation from the structure and generating measured data indicative of angular phase of the detected light components corresponding to reflections of illuminating light components having different angles of incidence. The control unit is configured for receiving and processing the measured data and generating a corresponding phase map indicative of the phase variation along at least two dimensions, and analyzing the phase map using modeled data for determining one or more parameters of the structure.
-
公开(公告)号：US09927370B2
公开(公告)日：2018-03-27
申请号：US15285892
申请日：2016-10-05
Applicant: NOVA MEASURING INSTRUMENTS LTD.
Inventor： Danny Grossman , Guy Selickter
IPC: G01N21/00 , G01N21/88 , G01N21/956
CPC classification number: G01N21/8806 , G01N21/956 , G01N2021/8848
Abstract: A control system and method are provided for use in managing optical measurements on target structures. The control system comprises: data input utility for receiving input data indicative of a size of a target structure to be measured and input data indicative of illumination and collection channels of an optical measurement system; data processing utility for analyzing the input data, and an interplay of Point Spread Functions (PSFs) of the illumination and collection channels, and determining data indicative of optional tailoring of apertures to be used in the optical measurement system for optimizing ensquared energy for measurements on the given target structure, the optimal tailoring composing at least one of the following: an optimal ratio between numerical apertures of the illumination and collection channels; and an optimal orientation offset of physical apertures in the illumination and collection channels.
-
-
-
-
-
-
Search Results
7
records
(took 0.022 seconds)
