公开(公告)号：US20250076208A1

公开(公告)日：2025-03-06

申请号：US18822901

申请日：2024-09-03

Applicant: KLA Corporation

Inventor： Amnon Manassen ,  Kevin Peterlinz ,  Andrew V. Hill ,  Shankar Krishnan ,  Yonatan Vaknin ,  Ido Dolev ,  Suryanarayanan Ganesan ,  Chao Chang ,  Jongjin Kim ,  David Zimdars

IPC: G01N21/88 ,  G01N21/95 ,  G01N21/956

Abstract: A metrology system may include a dual frequency comb source providing a first comb beam with a first repetition rate and a second comb beam with a second repetition rate, a beamsplitter to generate one or more dual frequency comb illumination beams from the first comb beam and the second comb beam, and a beam combiner to form a dual frequency comb illumination beam from the first comb beam and the second comb beam. The system may further include an illumination sub-system to illuminate a sample with the dual frequency comb illumination beam through an objective lens, a collection sub-system to collect sample light from the sample with the objective lens, and a detector to capture a radio-frequency signal based on the sample light. The system may further extract spectral measurement data associated with the sample from the radio-frequency signal and generate metrology measurements based on the spectral measurement data.

公开(公告)号：US20240280484A1

公开(公告)日：2024-08-22

申请号：US18467371

申请日：2023-09-14

Applicant: KLA Corporation

Inventor： David Y. Wang ,  Kevin Peterlinz

IPC: G01N21/55 ,  G01B11/06 ,  G01N21/21

CPC classification number: G01N21/55 ,  G01B11/06 ,  G01N21/21 ,  H01L22/12

Abstract: The system includes a light source configured to emit light at one or more wavelengths, one or more angles of incidence (AOI), and one or more azimuths; a polarization assembly configured to produce one or more polarization states of the light; a main objective configured to focus the light in the one or more polarization states onto a target that reflects the light; an analyzer assembly configured to analyze one or more polarization states of the light reflected from the target; a detector configured to detect the light reflected from the target and generate an output signal based on the detected light; and a processor configured to generate a measurement of the target based on the output signal produced at the one or more polarization states, the one or more wavelengths, the one or more AOIs, and the one or more azimuths.

公开(公告)号：US11913874B2

公开(公告)日：2024-02-27

申请号：US17222330

申请日：2021-04-05

Applicant: KLA Corporation

Inventor： Andrei V. Shchegrov ,  Lawrence D. Rotter ,  David Y. Wang ,  Andrei Veldman ,  Kevin Peterlinz ,  Gregory Brady ,  Derrick A. Shaughnessy

IPC: G01N21/21 ,  G03F7/00 ,  G01B11/06 ,  G01N21/47 ,  G01N21/55

CPC classification number: G01N21/211 ,  G01B11/0616 ,  G01N21/4738 ,  G01N21/55 ,  G03F7/70608 ,  G03F7/70625 ,  G03F7/70633 ,  G01N2021/213

Abstract: The system includes a modulatable illumination source configured to illuminate a surface of a sample disposed on a sample stage, a detector configured to detect illumination emanating from a surface of the sample, illumination optics configured to direct illumination from the modulatable illumination source to the surface of the sample, collection optics configured to direct illumination from the surface of the sample to the detector, and a modulation control system communicatively coupled to the modulatable illumination source, wherein the modulation control system is configured to modulate a drive current of the modulatable illumination source at a selected modulation frequency suitable for generating illumination having a selected coherence feature length. In addition, the present invention includes the time-sequential interleaving of outputs of multiple light sources to generate periodic pulse trains for use in multi-wavelength time-sequential optical metrology.

公开(公告)号：US20250146893A1

公开(公告)日：2025-05-08

申请号：US18936993

申请日：2024-11-04

Applicant: KLA CORPORATION

Inventor： Houssam Chouaib ,  Zhengquan Tan ,  Shova Subedi ,  Shankar Krishnan ,  David Y. Wang ,  Oleg Shulepov ,  Kevin Peterlinz ,  Natalia Malkova ,  Dawei Hu ,  Carlos Ygartua ,  Isvar Cordova ,  Eric Cheek ,  Roman Sappey ,  Anderson Chou

IPC: G01L1/24 ,  G01B11/06 ,  G01B11/24

Abstract: A workpiece is measured using multiple-pass spectroscopic ellipsometry and multi-wavelength Raman spectroscopy, which may be performed in the same system. These measurements are combined to form combined measured data. A stress measurement of the workpiece is determined using the combined measured data. The stress measurement can be determined using a model or a machine learning algorithm.

公开(公告)号：US20210223166A1

公开(公告)日：2021-07-22

申请号：US17222330

申请日：2021-04-05

Applicant: KLA Corporation

Inventor： Andrei V. Shchegrov ,  Lawrence D. Rotter ,  David Y. Wang ,  Andrei Veldman ,  Kevin Peterlinz ,  Gregory Brady ,  Derrick A. Shaughnessy

IPC: G01N21/21 ,  G03F7/20 ,  G01B11/06 ,  G01N21/47 ,  G01N21/55

Abstract: The system includes a modulatable illumination source configured to illuminate a surface of a sample disposed on a sample stage, a detector configured to detect illumination emanating from a surface of the sample, illumination optics configured to direct illumination from the modulatable illumination source to the surface of the sample, collection optics configured to direct illumination from the surface of the sample to the detector, and a modulation control system communicatively coupled to the modulatable illumination source, wherein the modulation control system is configured to modulate a drive current of the modulatable illumination source at a selected modulation frequency suitable for generating illumination having a selected coherence feature length. In addition, the present invention includes the time-sequential interleaving of outputs of multiple light sources to generate periodic pulse trains for use in multi-wavelength time-sequential optical metrology.