-
公开(公告)号：US20250137920A1
公开(公告)日：2025-05-01
申请号：US18919048
申请日：2024-10-17
Applicant: KLA Corporation
Inventor： Amnon Manassen , Peter Paquet , Yingpin Wu , Fang-Jyun Yeh , Suryanarayanan Ganesan , Jordan Pio , Shankar Krishnan , Taher Kagalwala , Derrick A. Shaughnessy , Yan Zhang , Stilian Pandev , Min-Yeong Moon
Abstract: A metrology system may include a spectroscopic metrology sub-system and a controller, the controller including one or more processors configured to execute program instructions configured to cause the one or more processors to: generate a tool-induced shift (TIS) model of a training sample by the metrology sub-system comprising: receiving training data from metrology measurements of the training sample, the training data comprising spectral data associated with at least one off-diagonal Mueller matrix element generated by one or more first measurements of the training sample at a first azimuthal angle and one or more second measurements of the training sample at a second azimuthal angle, deriving overlay spectra data and TIS spectra data from the training data, decomposing the overlay spectra data and the TIS spectra data, and inferring a TIS signature for the training sample; and to remove the TIS signature from a test sample.
-
Patent Agency Ranking
公开(公告)号：US20250005435A1
公开(公告)日：2025-01-02
申请号：US18217290
申请日：2023-06-30
Applicant: KLA Corporation
Inventor： Houssam Chouaib , Zhaxylyk Kudyshev , Chao Chang , Derrick A. Shaughnessy
IPC: G06N20/00
Abstract: A system may include a controller including processors configured to execute program instructions causing the processors to implement a measurement recipe by: generating a transformation model for transforming full loop optical measurement data to short loop optical measurement data, wherein the short loop optical measurement data includes optical measurement data of periodic memory array structures, wherein the full loop optical measurement data includes optical measurement data of complementary metal-oxide-semiconductor (CMOS) under array (CuA) devices, the CuA devices including CMOS structures beneath duplicates of the periodic memory array structures; generating a measurement model for determining measurements of the CuA devices; receiving full loop optical measurement data for CuA devices test samples; converting the full loop optical measurement data to short loop optical measurement data using the transformation model; and determining values of the measurements of the periodic memory array structures on the test samples using the measurement model.
-
公开(公告)号：US20210223166A1
公开(公告)日：2021-07-22
申请号：US17222330
申请日：2021-04-05
Applicant: KLA Corporation
Inventor： Andrei V. Shchegrov , Lawrence D. Rotter , David Y. Wang , Andrei Veldman , Kevin Peterlinz , Gregory Brady , Derrick A. Shaughnessy
Abstract: The system includes a modulatable illumination source configured to illuminate a surface of a sample disposed on a sample stage, a detector configured to detect illumination emanating from a surface of the sample, illumination optics configured to direct illumination from the modulatable illumination source to the surface of the sample, collection optics configured to direct illumination from the surface of the sample to the detector, and a modulation control system communicatively coupled to the modulatable illumination source, wherein the modulation control system is configured to modulate a drive current of the modulatable illumination source at a selected modulation frequency suitable for generating illumination having a selected coherence feature length. In addition, the present invention includes the time-sequential interleaving of outputs of multiple light sources to generate periodic pulse trains for use in multi-wavelength time-sequential optical metrology.
-
公开(公告)号：US20250004384A1
公开(公告)日：2025-01-02
申请号：US18217199
申请日：2023-06-30
Applicant: KLA Corporation
Inventor： Zhaxylyk Kudyshev , Chao Chang , Derrick A. Shaughnessy , Houssam Chouaib
Abstract: A system, may include a controller configured to cause the processors to implement a measurement recipe by: receiving optical measurement data for training samples after a first process step for fabricating complementary metal-oxide-semiconductor (CMOS) under array (CuA) devices, wherein the CuA devices include first structures with a non-uniform spatial distribution; classifying the first structures into spatially-continuous regions based on unsupervised clustering; receiving optical measurement data for the training samples after a second process step, wherein the CuA devices after the second process step include periodic second structures above the first structures; developing effective medium models for the first structures; developing measurement models for determining measurements of the CuA devices; receiving optical measurement data for test samples after the second process step; and generating values of the metrology measurements of the second structures based on the optical measurement data for the test samples and the measurement models.
-
公开(公告)号：US20250004047A1
公开(公告)日：2025-01-02
申请号：US18217236
申请日：2023-06-30
Applicant: KLA Corporation
Inventor： Houssam Chouaib , Zhaxylyk Kudyshev , Chao Chang , Derrick A. Shaughnessy
IPC: G01R31/302
Abstract: A system may include a controller including one or more processors configured to execute program instructions causing the one or more processors to implement a measurement recipe by: receiving optical measurement data for training samples including complementary metal-oxide-semiconductor (CMOS) under array (CuA) devices, wherein the CuA devices include CMOS structures disposed beneath periodic memory array structures; developing a first measurement model for determining measurements of the CuA devices based on the optical measurement data, wherein the CMOS structures are modeled as a CMOS effective medium in the first measurement model; receiving reference data for the training samples; updating the first measurement model to a second measurement model that includes the values of dispersion parameters of the CMOS effective medium; receiving optical measurement data for test samples including CuA devices; and generating values of the one or more metrology measurements of the CuA devices based on the second measurement model.
-
公开(公告)号：US11913874B2
公开(公告)日：2024-02-27
申请号：US17222330
申请日：2021-04-05
Applicant: KLA Corporation
Inventor： Andrei V. Shchegrov , Lawrence D. Rotter , David Y. Wang , Andrei Veldman , Kevin Peterlinz , Gregory Brady , Derrick A. Shaughnessy
CPC classification number: G01N21/211 , G01B11/0616 , G01N21/4738 , G01N21/55 , G03F7/70608 , G03F7/70625 , G03F7/70633 , G01N2021/213
Abstract: The system includes a modulatable illumination source configured to illuminate a surface of a sample disposed on a sample stage, a detector configured to detect illumination emanating from a surface of the sample, illumination optics configured to direct illumination from the modulatable illumination source to the surface of the sample, collection optics configured to direct illumination from the surface of the sample to the detector, and a modulation control system communicatively coupled to the modulatable illumination source, wherein the modulation control system is configured to modulate a drive current of the modulatable illumination source at a selected modulation frequency suitable for generating illumination having a selected coherence feature length. In addition, the present invention includes the time-sequential interleaving of outputs of multiple light sources to generate periodic pulse trains for use in multi-wavelength time-sequential optical metrology.
-
-
-
-
-
Search Results
6
records
(took 0.012 seconds)
