公开(公告)号：US20240093985A1

公开(公告)日：2024-03-21

申请号：US17946935

申请日：2022-09-16

Applicant: KLA Corporation

Inventor： Nimrod Shuall ,  Jordan Pio ,  Frank Laske ,  Stefan Eyring ,  Ohad Bachar

IPC: G01B11/27 ,  G01B15/00

CPC classification number: G01B11/27 ,  G01B15/00

Abstract: Systems and methods for acquiring measurements of structures of a bonded sample are disclosed. Such systems and methods may include determining a first registration measurement of a first registration structure and a first interface target structure of a first sample, and a second registration measurement of a second sample prior to coupling the samples together. Such systems and methods may include, after such a coupling of the samples, determining a third registration measurement of the coupled sample at least partially by measuring the first registration structure through the top face of the first sample. Such systems and methods may include acquiring an overlay measurement based on the first registration measurement, the second registration measurement, and the third registration measurement. Such systems and methods may include adjusting an inter-sample coupling recipe based on the overlay measurement, where the inter-sample coupling recipe may include a final bonding recipe.

公开(公告)号：US20250137920A1

公开(公告)日：2025-05-01

申请号：US18919048

申请日：2024-10-17

Applicant: KLA Corporation

Inventor： Amnon Manassen ,  Peter Paquet ,  Yingpin Wu ,  Fang-Jyun Yeh ,  Suryanarayanan Ganesan ,  Jordan Pio ,  Shankar Krishnan ,  Taher Kagalwala ,  Derrick A. Shaughnessy ,  Yan Zhang ,  Stilian Pandev ,  Min-Yeong Moon

IPC: G01N21/21 ,  G01N21/95

Abstract: A metrology system may include a spectroscopic metrology sub-system and a controller, the controller including one or more processors configured to execute program instructions configured to cause the one or more processors to: generate a tool-induced shift (TIS) model of a training sample by the metrology sub-system comprising: receiving training data from metrology measurements of the training sample, the training data comprising spectral data associated with at least one off-diagonal Mueller matrix element generated by one or more first measurements of the training sample at a first azimuthal angle and one or more second measurements of the training sample at a second azimuthal angle, deriving overlay spectra data and TIS spectra data from the training data, decomposing the overlay spectra data and the TIS spectra data, and inferring a TIS signature for the training sample; and to remove the TIS signature from a test sample.

公开(公告)号：US20240337952A1

公开(公告)日：2024-10-10

申请号：US18372444

申请日：2023-09-25

Applicant: KLA Corporation

Inventor： Itay Gdor ,  Yonatan Vaknin ,  Nireekshan K. Reddy ,  Alon Alexander Volfman ,  Iftach Galon ,  Jordan Pio ,  Yuval Lubashevsky ,  Nickolai Isakovitch ,  Andrew V. Hill ,  Oren Lahav ,  Daria Negri ,  Vladimir Levinski

IPC: G03F7/00

CPC classification number: G03F7/70633 ,  G03F7/7015

Abstract: A method may include receiving time-varying interference signals from two or more photodetectors associated with a first exposure structure and a second exposure structure in one or more cells as an overlay target is scanned in accordance with a metrology recipe, where the first exposure structure and the second exposure structure form a side-by-side grating, where the side-by-side grating includes one or more diffraction gratings, where at least one diffraction grating is a non-overlapping side-by-side grating, where the first exposure structure is arranged adjacent to the second exposure structure, where the side-by-side grating is periodic along the scan direction. The method may further include determining an overlay error between one of the first exposure structure and the second exposure structure of the sample based on the time-varying interference signals, where the time-varying interference signals corresponding to the non-overlapping first exposure structure and second exposure structure are synchronized.

公开(公告)号：US20240302751A1

公开(公告)日：2024-09-12

申请号：US18230542

申请日：2023-08-04

Applicant: KLA Corporation

Inventor： Jordan Pio ,  Yuval Lubashevsky ,  Itay Gdor ,  Nickolai Isakovitch

IPC: G03F7/00 ,  G03F9/00

CPC classification number: G03F7/70633 ,  G03F7/70625 ,  G03F9/7088

Abstract: An overlay metrology target includes a multi-layer grating structure formed as an overlapping grating structure with different pitches on three or more layers of a sample. The three or more layers of the sample may include at least a first layer, a second layer, and a third layer, where the overlapping grating structure is periodic along at least one of the scan direction or a direction orthogonal to the scan direction. The multi-layer grating structure may include a first-layer grating on the first layer with a first pitch, a second-layer grating on the second layer with a second pitch, and a third-layer grating on the third layer with a third pitch.