Controlling angle of incidence of multiple-beam optical metrology tools
    1.
    发明授权
    Controlling angle of incidence of multiple-beam optical metrology tools 有权
    控制多光束光学测量工具的入射角

    公开(公告)号:US08030632B2

    公开(公告)日:2011-10-04

    申请号:US12414637

    申请日:2009-03-30

    Abstract: Provided is a method of controlling multiple beams directed to a structure in a workpiece, the method comprising generating a first illumination beam with a first light source and a second illumination beam with a second light source, projecting the first and second illumination beams onto a separate illumination secondary mirror, reflecting the first and second illumination beams onto an illumination primary mirror, the reflected first and second illumination beams projected onto the structure at a first and second angle of incidence respectively, the reflected first and second illumination beams generating a first and second detection beams respectively. The separate illumination secondary mirror is positioned relative to the illumination primary mirror so as make the first angle of incidence substantially the same or close to a calculated optimum first angle of incidence and make the second angle of incidence substantially the same or close to a calculated optimum second angle of incidence. The first and second detection beams are diffracted off the structure at the corresponding angle of incidence to a detection primary mirror, reflected onto a separate secondary detection mirror and other optical components on the detection path, and onto spectroscopic detectors.

    Abstract translation: 提供了一种控制指向工件中的结构的多个光束的方法,该方法包括利用第一光源生成具有第一光源的第一照明光束和具有第二光源的第二照明光束,将第一和第二照明光束投射到单独的 分别将第一和第二照明光束反射到照明主反射镜上,反射的第一和第二照明光束分别以第一和第二入射角投射到结构上,反射的第一和第二照明光束产生第一和第二照明光束 检测光束。 分离的照明次级反射镜相对于照明主反射镜定位,使得第一入射角基本上相同或接近于计算出的最佳第一入射角,并使第二入射角基本上相同或接近于计算的最佳 第二个入射角。 第一和第二检测光束以与检测主反射镜相对应的入射角度从结构衍射,反射到检测路径上的单独的次级检测镜和其它光学部件上,并被分布在光谱检测器上。

    Aperture to reduce sensitivity to sample tilt in small spotsize reflectometers
    2.
    发明申请
    Aperture to reduce sensitivity to sample tilt in small spotsize reflectometers 失效
    光圈以减小小点状反射计中样品倾斜的灵敏度

    公开(公告)号:US20050225767A1

    公开(公告)日:2005-10-13

    申请号:US10820903

    申请日:2004-04-08

    Applicant: Adam Norton

    Inventor: Adam Norton

    CPC classification number: G01N21/8806 G01N21/55 G01N21/9501 G01N2201/0642

    Abstract: An aperture for reducing tilt sensitivity in normal incidence optical metrology is formed to include one or more holes. The aperture is positioned to partially occlude one-half of the pupil of a normal incidence objective. A probe beam is projected to fill the pupil of the objective. The portion of the incident probe beam that passes through the aperture is reduced in cross-sectional profile. As a result, after reflection by the sample, that portion of the probe beam underfills the non-occluded portion of the pupil. The portion of the incident probe beam that passes through the non-occluded portion of the pupil overfills the occluded pupil upon reflect by the sample. The combination of underfilling and overfilling reduces the sensitivity of the objective to tilting of the sample.

    Abstract translation: 形成用于降低正常入射光学测量中的倾斜灵敏度的孔,以包括一个或多个孔。 孔径定位成部分地遮挡法向入射物镜的瞳孔的一半。 投影探测光束以填充物镜的光瞳。 穿过孔的入射探针光束的部分在横截面轮廓上减小。 结果,在样品反射之后,探测光束的该部分底部填充瞳孔的未遮挡部分。 入射探测光束穿过瞳孔的未遮挡部分的部分,在被样品反射时,超过填充的瞳孔。 填充和过度填充的组合降低了物镜倾斜样品的灵敏度。

    Optimizing sensitivity of optical metrology measurements
    3.
    发明授权
    Optimizing sensitivity of optical metrology measurements 有权
    优化光学测量测量的灵敏度

    公开(公告)号:US07961306B2

    公开(公告)日:2011-06-14

    申请号:US12414462

    申请日:2009-03-30

    CPC classification number: G01B11/24 G01B21/042 G03F7/70625

    Abstract: Provided is a method of optimizing sensitivity of measurements of an optical metrology tool using two or more illumination beams directed to a structure on a workpiece comprising selecting target structures for measurement, obtaining diffraction signals off the selected structures as a function of angle of incidence for each illumination beam, determining a selected angle of incidence for each of the two or more illumination beams, setting sensitivity objectives for optical metrology measurements, developing a design for the optical metrology tool to achieve the corresponding selected angle of incidence of the two or more illumination beams, obtaining sensitivity data using the optical metrology tool, and if the sensitivity objectives are not met, adjusting the selection of target structures, the selected angle of incidence of the two or more illumination beams, the sensitivity objectives, and/or the design of the optical metrology tool, and iterating the developing of the design, obtaining sensitivity data, and comparing sensitivity data to sensitivity objectives until the sensitivity objectives are met.

    Abstract translation: 提供了一种使用指向工件上的结构的两个或更多个照明光束来优化光学测量工具的测量灵敏度的方法,包括选择用于测量的目标结构,从所选结构获得衍射信号作为每个的入射角的函数 照明光束,确定两个或更多个照明光束中的每一个的选定入射角,设置用于光学测量测量的灵敏度目标,开发用于光学测量工具的设计,以实现两个或更多个照明光束的相应选择的入射角 使用光学测量工具获得灵敏度数据,并且如果不满足灵敏度目标,则调整目标结构的选择,所选择的两个或多个照明光束的入射角,灵敏度目标和/或设计 光学计量工具,并重复设计的发展 引入灵敏度数据,并将灵敏度数据与敏感度目标进行比较,直到满足敏感性目标。

    CONTROLLING ANGLE OF INCIDENCE OF MULTIPLE- BEAM OPTICAL METROLOGY TOOLS
    4.
    发明申请
    CONTROLLING ANGLE OF INCIDENCE OF MULTIPLE- BEAM OPTICAL METROLOGY TOOLS 有权
    控制多光束光学工具的发生角度

    公开(公告)号:US20100243860A1

    公开(公告)日:2010-09-30

    申请号:US12414637

    申请日:2009-03-30

    Abstract: Provided is a method of controlling multiple beams directed to a structure in a workpiece, the method comprising generating a first illumination beam with a first light source and a second illumination beam with a second light source, projecting the first and second illumination beams onto a separate illumination secondary mirror, reflecting the first and second illumination beams onto an illumination primary mirror, the reflected first and second illumination beams projected onto the structure at a first and second angle of incidence respectively, the reflected first and second illumination beams generating a first and second detection beams respectively. The separate illumination secondary mirror is positioned relative to the illumination primary mirror so as make the first angle of incidence substantially the same or close to a calculated optimum first angle of incidence and make the second angle of incidence substantially the same or close to a calculated optimum second angle of incidence. The first and second detection beams are diffracted off the structure at the corresponding angle of incidence to a detection primary mirror, reflected onto a separate secondary detection mirror and other optical components on the detection path, and onto spectroscopic detectors.

    Abstract translation: 提供了一种控制指向工件中的结构的多个光束的方法,该方法包括利用第一光源生成具有第一光源的第一照明光束和具有第二光源的第二照明光束,将第一和第二照明光束投射到单独的 分别将第一和第二照明光束反射到照明主反射镜上,反射的第一和第二照明光束分别以第一和第二入射角投射到结构上,反射的第一和第二照明光束产生第一和第二照明光束 检测光束。 分离的照明次级反射镜相对于照明主反射镜定位,使得第一入射角基本上相同或接近于计算出的最佳第一入射角,并使第二入射角基本上相同或接近于计算的最佳 第二个入射角。 第一和第二检测光束以与检测主反射镜相对应的入射角度从结构衍射,反射到检测路径上的单独的次级检测镜和其它光学部件上,并被分布在光谱检测器上。

    Polarimetric scatterometry methods for critical dimension measurements of periodic structures
    5.
    发明申请
    Polarimetric scatterometry methods for critical dimension measurements of periodic structures 有权
    周期性结构关键尺寸测量的极化散射法

    公开(公告)号:US20080037015A1

    公开(公告)日:2008-02-14

    申请号:US11903238

    申请日:2007-09-21

    Abstract: An optical measurement system for evaluating a sample has a motor-driven rotating mechanism coupled to an azimuthally rotatable measurement head, allowing the optics to rotate with respect to the sample. A polarimetric scatterometer, having optics directing a polarized illumination beam at non-normal incidence onto a periodic structure on a sample, can measure optical properties of the periodic structure. An E-O modulator in the illumination path can modulate the polarization. The head optics collect light reflected from the periodic structure and feed that light to a spectrometer for measurement. A beamsplitter in the collection path can ensure both S and P polarization from the sample are separately measured. The measurement head can be mounted for rotation of the plane of incidence to different azimuthal directions relative to the periodic structures. The instrument can be integrated within a wafer process tool in which wafers may be provided at arbitrary orientation.

    Abstract translation: 用于评估样品的光学测量系统具有耦合到方位角可旋转测量头的电动机旋转机构,允许光学器件相对于样品旋转。 具有将非正常入射的偏振照明光束引导到样品上的周期性结构上的光学偏振散射仪可以测量周期性结构的光学性质。 照明路径中的E-O调制器可以调制偏振。 头部光学器件收集从周期性结构反射的光并将光馈送到光谱仪进行测量。 收集路径中的分束器可以确保来自样品的S和P极化分别测量。 测量头可以安装成相对于周期性结构使入射平面旋转到不同的方位角方向。 仪器可以集成在晶片工艺工具中,其中可以以任意取向提供晶片。

    System for measuring polarimetric spectrum and other properties of a sample
    6.
    发明授权
    System for measuring polarimetric spectrum and other properties of a sample 有权
    用于测量样品的偏振光谱和其他性质的系统

    公开(公告)号:US06184984B2

    公开(公告)日:2001-02-06

    申请号:US09246922

    申请日:1999-02-09

    CPC classification number: G01J4/02 G01J3/447 G01N21/21

    Abstract: A polarized sample beam of broadband radiation is focused onto the surface of a sample and the radiation modified by the sample is collected by means of a mirror system in different planes of incidence. The sample beam focused to the sample has a multitude of polarization states. The modified radiation is analyzed with respect to a polarization plane to provide a polarimetric spectrum. Thickness and refractive information may then be derived from the spectrum. Preferably the polarization of the sample beam is altered only by the focusing and the sample, and the analyzing is done with respect to a fixed polarization plane. In the preferred embodiment, the focusing of the sample beam and the collection of the modified radiation are repeated employing two different apertures to detect the presence or absence of a birefringence axis in the sample. In another preferred embodiment, the above-described technique may be combined with ellipsometry for determining the thicknesses and refractive indices of thin films.

    Abstract translation: 将宽带辐射的极化样品束聚焦到样品的表面上,并且通过不同入射平面的反射镜系统收集由样品改性的辐射。 聚焦到样品的样品束具有许多极化状态。 相对于偏振平面分析修改的辐射以提供偏振光谱。 然后可以从光谱导出厚度和折射信息。 优选地,样品光束的偏振仅由聚焦和样品改变,并且相对于固定的偏振平面进行分析。 在优选实施例中,使用两个不同的孔来重复样品束的聚焦和修改的辐射的收集,以检测样品中双折射轴的存在或不存在。 在另一个优选实施例中,上述技术可以与用于确定薄膜的厚度和折射率的椭偏仪组合。

    Ergonomic vertical vision redirection
    7.
    发明授权
    Ergonomic vertical vision redirection 有权
    人体工学垂直视觉重定向

    公开(公告)号:US08917459B2

    公开(公告)日:2014-12-23

    申请号:US13479129

    申请日:2012-05-23

    Abstract: An ergonomic vertical redirection vision system comprises glasses or goggles with lenses modified to include a fresnel prism that vertically redirects light. The curved fresnel prism is a novel curved refractive element with unique advantages compared to a flat fresnel prism. The curved fresnel prism may be achromatized by the addition of an appropriate diffractive surface thereby creating a hybrid achromat or diffractive/refractive optical element (DROE). Looking through the modified eyewear will redirect the user's visual field up or down, depending on the configuration. Upward vision redirection improves ergonomics and aerodynamics for several sports including bicycle riding, swimming, downhill ski racing, and motorcycle racing. Downward vision redirection improves the ergonomics of reading a book, working on a laptop or pad computer, or taking notes in a class.

    Abstract translation: 符合人体工程学的垂直重定向视觉系统包括眼镜或护目镜,镜片被修改为包括使光线垂直重定向的菲涅耳棱镜。 弯曲的菲涅耳棱镜是一种新颖的弯曲折射元件,与平坦的菲涅尔棱镜相比具有独特的优势。 弯曲的菲涅尔棱镜可以通过添加适当的衍射面而被消色差,从而产生混合的消色差或衍射/折射光学元件(DROE)。 查看修改后的眼镜会根据配置重定向用户的视野。 向上的视觉重定向改善了人体工程学和空气动力学,包括骑自行车,游泳,下坡滑雪赛车和摩托车赛车等多项运动。 向下视力重定向提高了阅读书籍,在笔记本电脑或平板电脑上工作或在课堂上进行笔记的人体工程学。

    CALIBRATION METHOD FOR OPTICAL METROLOGY
    9.
    发明申请
    CALIBRATION METHOD FOR OPTICAL METROLOGY 有权
    光学计量学校准方法

    公开(公告)号:US20100201981A1

    公开(公告)日:2010-08-12

    申请号:US12369947

    申请日:2009-02-12

    Abstract: A zoned order sorting filter for a spectrometer in a semiconductor metrology system is disclosed with reduced light dispersion at the zone joints. The order sorting filter comprises optically-transparent layers deposited underneath, or on top of thin-film filter stacks of the order sorting filter zones, wherein the thicknesses of the optically-transparent layers are adjusted such that the total optical lengths traversed by light at a zone joint are substantially equal in zones adjacent the zone joint. A method for wavelength to detector array pixel location calibration of spectrometers is also disclosed, capable of accurately representing the highly localized nonlinearities of the calibration curve in the vicinity of zone joints of an order sorting filter.

    Abstract translation: 公开了一种用于半导体测量系统中的光谱仪的分区排序分选过滤器,其中在区域关节处的光散射减小。 订单分选过滤器包括沉积在下面的光学透明层,或者在分级过滤器区域的薄膜过滤器堆叠的顶部,其中调整光学透明层的厚度,使得在光 区域接头在邻近区域接头的区域中基本相等。 还公开了一种用于波长到检测器阵列像素位置校准的光谱仪的方法,其能够精确地表示在订单分选滤波器的区域接头附近的校准曲线的高度局部化的非线性。

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