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公开(公告)号：US09823572B2
公开(公告)日：2017-11-21
申请号：US14900110
申请日：2014-06-17
Applicant: ASML Netherlands B.V.
Inventor： Andrey Alexandrovich Nikipelov , Olav Waldemar Vladimir Frijns , Gosse Charles De Vries , Erik Roelof Loopstra , Vadim Yevgenyevich Banine , Pieter Willem Herman De Jager , Rilpho Ludovicus Donker , Han-Kwang Nienhuys , Borgert Kruizinga , Wouter Joep Engelen , Otger Jan Luiten , Johannes Antonius Gerardus Akkermans , Leonardus Adrianus Gerardus Grimminck , Vladimir Litvinenko
IPC: G03B27/42 , G03B27/58 , G03F7/20 , H01S3/09 , G01J1/04 , G02B1/06 , G02B5/20 , G21K1/10 , G02B26/02 , G01J1/26 , G01J1/42 , H05H7/04 , H01S3/00
CPC classification number: G03F7/70033 , G01J1/0407 , G01J1/0418 , G01J1/26 , G01J1/429 , G02B1/06 , G02B5/205 , G02B26/023 , G03F7/70008 , G03F7/7055 , G03F7/70558 , G03F7/7085 , G21K1/10 , H01S3/005 , H01S3/0085 , H01S3/0903 , H05H7/04
Abstract: A method of patterning lithographic substrates that includes using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates. The method further includes reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly, and applying variable attenuation to EUV radiation that has been output by the free electron laser in order to further control the power of EUV radiation delivered to the lithographic apparatus.
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公开(公告)号：US11009800B2
公开(公告)日：2021-05-18
申请号：US16071380
申请日：2017-01-26
Applicant: ASML NETHERLANDS B.V.
Inventor： Han-Kwang Nienhuys , Güneş Nakiboğlu , Rita Marguerite Albin Lambertine Petit , Hermen Folken Pen , Remco Yuri Van De Moesdijk , Frank Johannes Jacobus Van Boxtel , Borgert Kruizinga
Abstract: A measurement system to determine a deformation of an object having a front surface, a back surface and a pattern. The measurement system includes a processor system and an interferometer system. The interferometer system has a radiation source and a detector system. The source is configured to emit, to each of a plurality of locations on the object, measurement beams in order to generate, at each of the respective plurality of locations, reflected measurement beams off the front and back surfaces of the object respectively. The detector system is configured to receive the respective reflected measurement beams and output signals representative of the received reflected measurement beams to the processor system. The processor system is configured to receive the signals; determine, based on the signals as received, a characteristic of the object; and determine a deformation of the pattern based on the characteristic.
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公开(公告)号：US10580545B2
公开(公告)日：2020-03-03
申请号：US14917623
申请日：2014-09-24
Applicant: ASML Netherlands B.V.
Inventor： Vadim Yevgenyevich Banine , Petrus Rutgerus Bartraij , Ramon Pascal Van Gorkom , Lucas Johannes Peter Ament , Pieter Willem Herman De Jager , Gosse Charles De Vries , Rilpho Ludovicus Donker , Wouter Joep Engelen , Olav Waldemar Vladimir Frijns , Leonardus Adrianus Gerardus Grimminck , Andelko Katalenic , Erik Roelof Loopstra , Han-Kwang Nienhuys , Andrey Alexandrovich Nikipelov , Michael Jozef Mathijs Renkens , Franciscus Johannes Joseph Janssen , Borgert Kruizinga
Abstract: A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools.
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公开(公告)号：US20200379360A1
公开(公告)日：2020-12-03
申请号：US16071380
申请日：2017-01-26
Applicant: ASML NETHERLANDS B.V.
Inventor： Han-Kwang Nienhuys , Gunes Nakiboglu , Rita Marguerite Albin Lambertine Petit , Hermen Folken Pen , Remco Yuri Van de Moesdijk , Frank Johannes Jacobus Van Boxtel , Borgert Kruizinga
Abstract: A measurement system to determine a deformation of an object having a front surface, a back surface and a pattern. The measurement system includes a processor system and an interferometer system. The interferometer system has a radiation source and a detector system. The source is configured to emit, to each of a plurality of locations on the object, measurement beams in order to generate, at each of the respective plurality of locations, reflected measurement beams off the front and back surfaces of the object respectively. The detector system is configured to receive the respective reflected measurement beams and output signals representative of the received reflected measurement beams to the processor system. The processor system is configured to receive the signals; determine, based on the signals as received, a characteristic of the object; and determine a deformation of the pattern based on the characteristic.
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