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    Lithographic Method and Apparatus
    2.
    发明申请
    Lithographic Method and Apparatus 审中-公开

    公开(公告)号：US20180224751A1

    公开(公告)日：2018-08-09

    申请号：US15750020

    申请日：2016-07-25

    Applicant: ASML Netherlands B.V

    Inventor： Robbert Jan VOOGD ,  Wilhelmus Jacobus Maria ROOIJAKKERS

    IPC: G03F7/20

    CPC classification number: G03F7/70191 ,  G03F7/70075 ,  G03F7/70116 ,  G03F7/70508 ,  G03F7/70525 ,  G03F7/70566 ,  G03F7/70591 ,  G03F7/70716 ,  G03F7/7085

    Abstract: An illumination system (IL) for a lithographic apparatus comprising a polarization adjustment apparatus (15) arranged to receive linearly polarized radiation, the polarization adjustment apparatus comprising regions which are configured to rotate the polarization orientation by different amounts, a directing apparatus (6) operable to direct the radiation through one or more regions of the polarization adjustment apparatus, a controller (CN) configured to control the directing apparatus so as to control which of the one or more regions of the polarization adjustment apparatus radiation is directed through, wherein the controller is configured to limit which of the regions radiation is directed through to one or more regions which rotate the orientation of the linear polarization by substantially the same amount, and a diffuser configured to receive radiation output from the polarization adjustment apparatus and increase a range of angles at which the radiation propagates whilst substantially conserving the polarization state of the radiation.

    FILTER, METHOD OF FORMATION THEREOF, AND IMAGE SENSOR
    4.
    发明申请
    FILTER, METHOD OF FORMATION THEREOF, AND IMAGE SENSOR 审中-公开

    公开(公告)号：US20180299792A1

    公开(公告)日：2018-10-18

    申请号：US15569384

    申请日：2016-05-04

    Applicant: ASML Netherlands B.V.

    Inventor： Jelte Rients BEARDA ,  Joost André KLUGKIST ,  Robbert Jan VOOGD ,  Guido HERGENHAN ,  Meik PANITZ ,  Jochen TAUBERT

    IPC: G03F7/20 ,  G02B5/20 ,  F21V9/32 ,  H04N5/225

    Abstract: A method of forming a radiation filter for a lithographic system, the method including forming at least one structure in or on a filter body, wherein the at least one structure provides a filtering effect and least one of a), b), c) or d): a) the at least one structure includes a plurality of transmissive, reflective, absorbing or fluorescent structures, and the method includes providing a desired distribution of the structures to provide a desired filtering effect; b) forming the at least one structure includes forming at least one transmissive, absorbing, reflective or fluorescent layer that has a variable thickness; c) forming the at least one structure includes altering at least one optical property to provide a variation of the optical property with position; d) the at least one structure includes a fluorescent layer that provides variation of at least one fluorescence property with position and/or angle of incidence.

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