发明申请
- 专利标题： LITHOGRAPHIC APPARATUS AND METHOD
- 专利标题（中）： LITHOGRAPHIC设备和方法
-
申请号： US15078814申请日： 2016-03-23
-
公开(公告)号： US20160202618A1公开(公告)日： 2016-07-14
- 发明人: Thibault Simon Mathieu LAURENT , Gerardus Adrianus Antonius Maria KUSTERS , Bastiaan Andreas Wilhelmus Hubertus KNARREN , Raymond Wilhelmus Louis LAFARRE , Koen STEFFENS , Takeshi KANEKO , Robbert Jan VOOGD , Gregory Martin Mason CORCORAN , Ruud Hendrikus Martinus Johannes BLOKS , Johan Gertrudis Cornelis KUNNEN , Ramin BADIE
- 申请人： ASML NETHERLANDS B.V.
- 申请人地址： NL Veldhoven
- 专利权人： ASML NETHERLANDS B.V.
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven
- 主分类号： G03F7/20
- IPC分类号： G03F7/20
摘要：
A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.
公开/授权文献
- US09823589B2 Lithographic apparatus and method 公开/授权日：2017-11-21
信息查询
IPC分类:
