公开(公告)号：US20190094707A1

公开(公告)日：2019-03-28

申请号：US16203693

申请日：2018-11-29

申请人： ASML NETHERLANDS B.V.

发明人： Takeshi KANEKO ,  Kornelis Tijmen Hoekerd

IPC分类号： G03F7/20

摘要： An apparatus and method for cleaning a contaminated surface of a lithographic apparatus are provided. A liquid confinement structure comprises at least two openings used to supply and extract liquid to a gap below the structure. The direction of flow between the openings can be switched. Liquid may be supplied to the gap radially outward of an opening adapted for dual flow. Supply and extraction lines to respectively supply liquid to and extract liquid from the liquid confinement structure have an inner surface that is resistant to corrosion by an organic liquid. A corrosive cleaning fluid can be used to clean photo resist contamination.

公开(公告)号：US20170255107A1

公开(公告)日：2017-09-07

申请号：US15589674

申请日：2017-05-08

申请人： ASML NETHERLANDS B.V.

发明人： Takeshi KANEKO ,  Kornelis Tijmen HOEKERD

IPC分类号： G03F7/20 ,  H01L21/02

CPC分类号： G03F7/70341 ,  G03F7/70925 ,  G03F7/7095 ,  G03F7/70975

摘要： An apparatus and method for cleaning a contaminated surface of a lithographic apparatus are provided. A liquid confinement structure comprises at least two openings used to supply and extract liquid to a gap below the structure. The direction of flow between the openings can be switched. Liquid may be supplied to the gap radially outward of an opening adapted for dual flow. Supply and extraction lines to respectively supply liquid to and extract liquid from the liquid confinement structure have an inner surface that is resistant to corrosion by an organic liquid. A corrosive cleaning fluid can be used to clean photo resist contamination.

公开(公告)号：US20160209760A1

公开(公告)日：2016-07-21

申请号：US15018582

申请日：2016-02-08

申请人： ASML NETHERLANDS B.V.

发明人： Takeshi KANEKO ,  Kornelis Tijmen HOEKERD

IPC分类号： G03F7/20

CPC分类号： G03F7/70341 ,  G03F7/70925 ,  G03F7/7095 ,  G03F7/70975

摘要： An apparatus and method for cleaning a contaminated surface of a lithographic apparatus are provided. A liquid confinement structure comprises at least two openings used to supply and extract liquid to a gap below the structure. The direction of flow between the openings can be switched. Liquid may be supplied to the gap radially outward of an opening adapted for dual flow. Supply and extraction lines to respectively supply liquid to and extract liquid from the liquid confinement structure have an inner surface that is resistant to corrosion by an organic liquid. A corrosive cleaning fluid can be used to clean photo resist contamination.

摘要翻译： 提供了一种用于清洁光刻设备的污染表面的设备和方法。 液体限制结构包括用于向结构下方的间隙供应和提取液体的至少两个开口。 可以切换开口之间的流动方向。 液体可以被供应到适于双流的开口的径向向外的间隙。 供应和提取线分别从液体限制结构提供液体和从液体中提取液体具有耐有机液体腐蚀的内表面。 腐蚀性清洁液可用于清洁光刻胶污染物。

公开(公告)号：US20190171113A1

公开(公告)日：2019-06-06

申请号：US16270958

申请日：2019-02-08

申请人： ASML NETHERLANDS B.V.

发明人： Thibault Simon Mathieu LAURENT ,  Gerardus Adrianus Antonius Maria KUSTERS ,  Bastiaan Andreas Wilhelmus Hubertus KNARREN ,  Raymond Wilhelmus Louis LAFARRE ,  Koen STEFFENS ,  Takeshi KANEKO ,  Robbert Jan VOOGD ,  Gregory Martin Mason CORCORAN ,  Ruud Hendrikus Martinus Johannes BLOKS ,  Johan Gertrudis Cornelis KUNNEN ,  Ramin BADIE

IPC分类号： G03F7/20

CPC分类号： G03F7/70483 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70775 ,  G03F7/70875

摘要： A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.

公开(公告)号：US20190243256A1

公开(公告)日：2019-08-08

申请号：US16271303

申请日：2019-02-08

申请人： ASML NETHERLANDS B.V.

发明人： Takeshi KANEKO ,  Joost Jeroen OTTENS ,  Raymond Wilhelmus Louis LAFARRE

IPC分类号： G03F7/20

CPC分类号： G03F7/70716 ,  G03F7/70341 ,  G03F7/70775

摘要： A table for a lithographic apparatus, the table having an encoder plate located on the table, a gap between the encoder plate and a top surface of the table, the gap located radially inward of the encoder plate relative to the periphery of the table, and a fluid extraction system with an opening in the surface of the gap to extract liquid from the gap.

公开(公告)号：US20170052459A1

公开(公告)日：2017-02-23

申请号：US15344994

申请日：2016-11-07

申请人： ASML NETHERLANDS B.V.

发明人： Takeshi KANEKO ,  Joost Jeroen Ottens ,  Raymond Wilhelmus Louis Lafarre

IPC分类号： G03F7/20

CPC分类号： G03F7/70716 ,  G03F7/70341 ,  G03F7/70775

摘要： A table for a lithographic apparatus, the table having an encoder plate located on the table, a gap between the encoder plate and a top surface of the table, the gap located radially inward of the encoder plate relative to the periphery of the table, and a fluid extraction system with an opening in the surface of the gap to extract liquid from the gap.

摘要翻译： 一种用于光刻设备的工作台，具有位于工作台上的编码器板的工作台，编码器板和工作台的顶表面之间的间隙，位于编码器板相对于工作台周边的径向内侧的间隙，以及 一种在间隙表面上具有开口以从间隙提取液体的流体提取系统。

公开(公告)号：US20160202618A1

公开(公告)日：2016-07-14

申请号：US15078814

申请日：2016-03-23

申请人： ASML NETHERLANDS B.V.

发明人： Thibault Simon Mathieu LAURENT ,  Gerardus Adrianus Antonius Maria KUSTERS ,  Bastiaan Andreas Wilhelmus Hubertus KNARREN ,  Raymond Wilhelmus Louis LAFARRE ,  Koen STEFFENS ,  Takeshi KANEKO ,  Robbert Jan VOOGD ,  Gregory Martin Mason CORCORAN ,  Ruud Hendrikus Martinus Johannes BLOKS ,  Johan Gertrudis Cornelis KUNNEN ,  Ramin BADIE

IPC分类号： G03F7/20

CPC分类号： G03F7/70483 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70716 ,  G03F7/70775 ,  G03F7/70875

摘要： A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.

摘要翻译： 一种用于支撑衬底支撑区域上的衬底的衬底台，所述衬底台具有至少在衬底支撑区域下方的传热流体通道，以及多个加热器和/或冷却器，以热控制通道中的传热流体 位于基板支撑区域下方的位置。