公开(公告)号：US12298257B2

公开(公告)日：2025-05-13

申请号：US18012801

申请日：2021-06-09

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Ilse Van Weperen ,  Arjan Johannes Anton Beukman ,  Mohamed Swillam ,  Justin Lloyd Kreuzer ,  Stephen Roux

IPC: G01N21/956

Abstract: Systems, apparatuses, and methods are provided for detecting a particle on a substrate surface. An example method can include receiving, by a grating structure, coherent radiation from a radiation source. The method can further include generating, by the grating structure, a focused coherent radiation beam based on the coherent radiation. The method can further include transmitting, by the grating structure, the focused coherent radiation beam toward a region of a surface of a substrate. The method can further include receiving, by the grating structure, photons scattered from the region in response to illuminating the region with the focused coherent radiation beam. The method can further include measuring, by a photodetector, the photons received by the grating structure. The method can further include generating, by the photodetector and based on the measured photons, an electronic signal for detecting a particle located in the region of the surface of the substrate.

公开(公告)号：US12287591B2

公开(公告)日：2025-04-29

申请号：US18269191

申请日：2021-12-02

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Arjan Johannes Anton Beukman ,  Sebastianus Adrianus Goorden ,  Stephen Roux ,  Sergei Sokolov ,  Filippo Alpeggiani

IPC: G03F7/00 ,  G03F9/00

Abstract: A method includes irradiating a target structure with sequential illumination shots, directing scattered beams from the target structure towards an imaging detector, generating a detection signal using the imaging detector, and determining a property of the target structure based on at least the detection signal. An integration time for each illumination shot of the sequential illumination shots is selected so to reduce a low frequency error.

公开(公告)号：US12066762B2

公开(公告)日：2024-08-20

申请号：US17637942

申请日：2020-08-05

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Mohamed Swillam ,  Stephen Roux ,  Tamer Mohamed Tawfik Ahmed Mohamed Elazhary ,  Arie Jeffrey Den Boef

IPC: G03F7/20 ,  G02B6/122 ,  G02B26/08 ,  G03F7/00

CPC classification number: G03F7/70633 ,  G02B6/1225 ,  G02B26/0833

Abstract: A sensor apparatus includes a sensor chip, an illumination system, a first optical system, a second optical system, and a detector system. The illumination system is coupled to the sensor chip and transmits an illumination beam along an illumination path. The first optical system is coupled to the sensor chip and includes a first integrated optic to configure and transmit the illumination beam toward a diffraction target on a substrate, disposed adjacent to the sensor chip, and generate a signal beam including diffraction order sub-beams generated from the diffraction target. The second optical system is coupled to the sensor chip and includes a second integrated optic to collect and transmit the signal beam from a first side to a second side of the sensor chip. The detector system is configured to measure a characteristic of the diffraction target based on the signal beam transmitted by the second optical system.

公开(公告)号：US11009803B2

公开(公告)日：2021-05-18

申请号：US16587483

申请日：2019-09-30

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Matthias Kruizinga ,  Maarten Mathijs Marinus Jansen ,  Jorge Manuel Azeredo Lima ,  Erik Willem Bogaart ,  Derk Servatius Gertruda Brouns ,  Marc Bruijn ,  Richard Joseph Bruls ,  Jeroen Dekkers ,  Paul Janssen ,  Mohammad Reza Kamali ,  Ronald Harm Gunther Kramer ,  Robert Gabriël Maria Lansbergen ,  Martinus Hendrikus Antonius Leenders ,  Matthew Lipson ,  Erik Roelof Loopstra ,  Joseph H. Lyons ,  Stephen Roux ,  Gerrit Van Den Bosch ,  Sander Van Den Heijkant ,  Sandra Van Der Graaf ,  Frits Van Der Meulen ,  Jérôme François Sylvain Virgile Van Loo ,  Beatrijs Louise Marie-Joseph Katrien Verbrugge

IPC: G03F1/64 ,  G03F7/20

Abstract: A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.

公开(公告)号：US20150212425A1

公开(公告)日：2015-07-30

申请号：US14430021

申请日：2013-08-27

Applicant: ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

Inventor： Michael Andrew Chieda ,  Stephen Roux ,  Teun Peterus Adrianus De Wilt ,  Igor Matheus Petronella Aarts

IPC: G03F7/20 ,  G01B11/25 ,  G01D5/347

CPC classification number: G03F7/70191 ,  G01B11/2513 ,  G01D5/347 ,  G03F7/70716 ,  G03F7/70783 ,  G03F7/7085

Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam, a support constructed to hold a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. The lithographic apparatus further includes an encoder head designed to scan over a surface of the patterning device to determine a distortion in a first direction along a length of the patterning device and a distortion in a second direction substantially perpendicular to the surface of the patterning device.

Abstract translation: 光刻设备包括配置成调节辐射束的照明系统，构造成保持图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束，衬底 被构造成保持衬底的工作台以及配置成将图案化的辐射束投影到衬底的目标部分上的投影系统。 光刻设备还包括编码器头，其设计成在图案形成装置的表面上扫描以确定沿着图案形成装置的长度的第一方向的变形和基本上垂直于图案形成装置的表面的第二方向的变形。

公开(公告)号：US10558129B2

公开(公告)日：2020-02-11

申请号：US15526654

申请日：2015-11-16

Applicant: ASML Netherlands B.V.

Inventor： Matthias Kruizinga ,  Maarten Mathijs Marinus Jansen ,  Jorge Manuel Azeredo Lima ,  Erik Willem Bogaart ,  Derk Servatius Gertruda Brouns ,  Marc Bruijn ,  Richard Joseph Bruls ,  Jeroen Dekkers ,  Paul Janssen ,  Mohammad Reza Kamali ,  Ronald Harm Gunther Kramer ,  Robert Gabriël Maria Lansbergen ,  Martinus Hendrikus Antonius Leenders ,  Matthew Lipson ,  Erik Roelof Loopstra ,  Joseph H. Lyons ,  Stephen Roux ,  Gerrit Van Den Bosch ,  Sander Van Den Heijkant ,  Sandra Van Der Graaf ,  Frits Van Der Meulen ,  Jérôme François Sylvain Virgile Van Loo ,  Beatrijs Louise Marie-Joseph Katrien Verbrugge

IPC: G03F7/20 ,  G03F1/64 ,  G03F1/22

Abstract: A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.

公开(公告)号：US11994808B2

公开(公告)日：2024-05-28

申请号：US17029845

申请日：2020-09-23

Applicant: ASML Holding N.V.

Inventor： Mohamed Swillam ,  Tamer Mohamed Tawfik Ahmed Elazhary ,  Stephen Roux ,  Yuxiang Lin ,  Justin Lloyd Kreuzer

IPC: G03F7/00 ,  G01B11/14 ,  G01B11/27 ,  G02B6/12 ,  G02B6/293 ,  H01L21/67

CPC classification number: G03F7/70633 ,  G01B11/14 ,  G01B11/272 ,  G02B6/12007 ,  G03F7/70575 ,  G03F7/70616 ,  G03F7/7085 ,  G01B2210/56 ,  G02B6/29301 ,  G02B6/29395 ,  G03F7/70608 ,  H01L21/67259

Abstract: A system includes a radiation source, first and second phased arrays, and a detector. The first and second phased arrays include optical elements, a plurality of ports, waveguides, and phase modulators. The optical elements radiate radiation waves. The waveguides guide radiation from a port of the plurality of ports to the optical elements. Phase modulators adjust phases of the radiation waves. One or both of the first and second phased arrays form a first beam and/or a second beam of radiation directed toward a target structure based on the port coupled to the radiation source. The detector receives radiation scattered by the target structure and generates a measurement signal based on the received radiation.

公开(公告)号：US11500298B2

公开(公告)日：2022-11-15

申请号：US17415715

申请日：2019-12-12

Applicant: ASML Holding N.V.

Inventor： Eric Justin Monkman ,  Michael Andrew Chieda ,  Stephen Roux ,  Victor Antonio Perez-Falcon

IPC: G03F7/20

Abstract: An apparatus for reticle sub-field thermal control in a lithography system is disclosed. The apparatus includes a clamp configured to fix an object. The clamp includes a plurality of gas distribution features that are spatially arranged in a pattern. The apparatus further includes a gas pressure controller configured to individually control a gas flow rate through each of the plurality of gas distribution features to spatially modulate a gas pressure distribution in a space between the clamp and the object. The gas distribution features include a plurality of trenches or holes arranged in an array form.

公开(公告)号：US20210095957A1

公开(公告)日：2021-04-01

申请号：US17029845

申请日：2020-09-23

Applicant: ASML Holding N.V.

Inventor： Mohamed SWILLAM ,  Tamer Mohamed Tawfik Ahmed Mohamed Elazhary ,  Stephen Roux ,  Yuxiang Lin ,  Justin Lloyd Kreuzer

IPC: G01B11/27 ,  G02B6/12 ,  H01L21/67 ,  G03F7/20

Abstract: A system includes a radiation source, first and second phased arrays, and a detector. The first and second phased arrays include optical elements, a plurality of ports, waveguides, and phase modulators. The optical elements radiate radiation waves. The waveguides guide radiation from a port of the plurality of ports to the optical elements. Phase modulators adjust phases of the radiation waves. One or both of the first and second phased arrays form a first beam and/or a second beam of radiation directed toward a target structure based on the port coupled to the radiation source. The detector receives radiation scattered by the target structure and generates a measurement signal based on the received radiation.

公开(公告)号：US12135505B2

公开(公告)日：2024-11-05

申请号：US18016225

申请日：2021-06-29

Applicant: ASML Holding N.V.

Inventor： Mohamed Swillam ,  Justin Lloyd Kreuzer ,  Stephen Roux

IPC: G03F7/00

Abstract: A metrology system comprises a radiation source, an optical element, first and second detectors, an integrated optical device comprising a multimode waveguide, and a processor. The radiation source generates radiation. The optical element directs radiation toward a target to generate scattered radiation from the target. The first detector receives a first portion of the scattered radiation and generates a first detection signal based on the received first portion. The multimode waveguide interferes a second portion of the scattered radiation using modes of the multimode waveguide. The second detector receives the interfered second portion and generates a second detection signal based on the received interfered second portion. The processor receives the first and second detection signals. The processor analyzes the received first portion, the received interfered second portion, and a propagation property of the multimode waveguide. The processor determines the property of the target based on the analysis.