知搜-全球专利检索

  1. Login
  2. Sign Up

Search Results

6 records (took 0.015 seconds)

    Monolithic particle inspection device
    1.
    发明授权
    Monolithic particle inspection device 有权

    公开(公告)号：US12298257B2

    公开(公告)日：2025-05-13

    申请号：US18012801

    申请日：2021-06-09

    Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

    Inventor： Ilse Van Weperen ,  Arjan Johannes Anton Beukman ,  Mohamed Swillam ,  Justin Lloyd Kreuzer ,  Stephen Roux

    IPC: G01N21/956

    Abstract: Systems, apparatuses, and methods are provided for detecting a particle on a substrate surface. An example method can include receiving, by a grating structure, coherent radiation from a radiation source. The method can further include generating, by the grating structure, a focused coherent radiation beam based on the coherent radiation. The method can further include transmitting, by the grating structure, the focused coherent radiation beam toward a region of a surface of a substrate. The method can further include receiving, by the grating structure, photons scattered from the region in response to illuminating the region with the focused coherent radiation beam. The method can further include measuring, by a photodetector, the photons received by the grating structure. The method can further include generating, by the photodetector and based on the measured photons, an electronic signal for detecting a particle located in the region of the surface of the substrate.

    On chip sensor for wafer overlay measurement
    4.
    发明授权
    On chip sensor for wafer overlay measurement 有权

    公开(公告)号：US12066762B2

    公开(公告)日：2024-08-20

    申请号：US17637942

    申请日：2020-08-05

    Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

    Inventor： Mohamed Swillam ,  Stephen Roux ,  Tamer Mohamed Tawfik Ahmed Mohamed Elazhary ,  Arie Jeffrey Den Boef

    IPC: G03F7/20 ,  G02B6/122 ,  G02B26/08 ,  G03F7/00

    CPC classification number: G03F7/70633 ,  G02B6/1225 ,  G02B26/0833

    Abstract: A sensor apparatus includes a sensor chip, an illumination system, a first optical system, a second optical system, and a detector system. The illumination system is coupled to the sensor chip and transmits an illumination beam along an illumination path. The first optical system is coupled to the sensor chip and includes a first integrated optic to configure and transmit the illumination beam toward a diffraction target on a substrate, disposed adjacent to the sensor chip, and generate a signal beam including diffraction order sub-beams generated from the diffraction target. The second optical system is coupled to the sensor chip and includes a second integrated optic to collect and transmit the signal beam from a first side to a second side of the sensor chip. The detector system is configured to measure a characteristic of the diffraction target based on the signal beam transmitted by the second optical system.

    Quantitative Reticle Distortion Measurement System
    6.
    发明申请
    Quantitative Reticle Distortion Measurement System 审中-公开
    定量光罩畸变测量系统

    公开(公告)号：US20150212425A1

    公开(公告)日：2015-07-30

    申请号：US14430021

    申请日：2013-08-27

    Applicant: ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

    Inventor： Michael Andrew Chieda ,  Stephen Roux ,  Teun Peterus Adrianus De Wilt ,  Igor Matheus Petronella Aarts

    IPC: G03F7/20 ,  G01B11/25 ,  G01D5/347

    CPC classification number: G03F7/70191 ,  G01B11/2513 ,  G01D5/347 ,  G03F7/70716 ,  G03F7/70783 ,  G03F7/7085

    Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam, a support constructed to hold a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. The lithographic apparatus further includes an encoder head designed to scan over a surface of the patterning device to determine a distortion in a first direction along a length of the patterning device and a distortion in a second direction substantially perpendicular to the surface of the patterning device.

    Abstract translation: 光刻设备包括配置成调节辐射束的照明系统，构造成保持图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束，衬底 被构造成保持衬底的工作台以及配置成将图案化的辐射束投影到衬底的目标部分上的投影系统。 光刻设备还包括编码器头，其设计成在图案形成装置的表面上扫描以确定沿着图案形成装置的长度的第一方向的变形和基本上垂直于图案形成装置的表面的第二方向的变形。

Patent Agency Ranking