公开(公告)号：US10558129B2

公开(公告)日：2020-02-11

申请号：US15526654

申请日：2015-11-16

申请人： ASML Netherlands B.V.

发明人： Matthias Kruizinga ,  Maarten Mathijs Marinus Jansen ,  Jorge Manuel Azeredo Lima ,  Erik Willem Bogaart ,  Derk Servatius Gertruda Brouns ,  Marc Bruijn ,  Richard Joseph Bruls ,  Jeroen Dekkers ,  Paul Janssen ,  Mohammad Reza Kamali ,  Ronald Harm Gunther Kramer ,  Robert Gabriël Maria Lansbergen ,  Martinus Hendrikus Antonius Leenders ,  Matthew Lipson ,  Erik Roelof Loopstra ,  Joseph H. Lyons ,  Stephen Roux ,  Gerrit Van Den Bosch ,  Sander Van Den Heijkant ,  Sandra Van Der Graaf ,  Frits Van Der Meulen ,  Jérôme François Sylvain Virgile Van Loo ,  Beatrijs Louise Marie-Joseph Katrien Verbrugge

IPC分类号： G03F7/20 ,  G03F1/64 ,  G03F1/22

摘要： A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.

公开(公告)号：US12066762B2

公开(公告)日：2024-08-20

申请号：US17637942

申请日：2020-08-05

申请人： ASML Holding N.V. ,  ASML Netherlands B.V.

发明人： Mohamed Swillam ,  Stephen Roux ,  Tamer Mohamed Tawfik Ahmed Mohamed Elazhary ,  Arie Jeffrey Den Boef

IPC分类号： G03F7/20 ,  G02B6/122 ,  G02B26/08 ,  G03F7/00

CPC分类号： G03F7/70633 ,  G02B6/1225 ,  G02B26/0833

摘要： A sensor apparatus includes a sensor chip, an illumination system, a first optical system, a second optical system, and a detector system. The illumination system is coupled to the sensor chip and transmits an illumination beam along an illumination path. The first optical system is coupled to the sensor chip and includes a first integrated optic to configure and transmit the illumination beam toward a diffraction target on a substrate, disposed adjacent to the sensor chip, and generate a signal beam including diffraction order sub-beams generated from the diffraction target. The second optical system is coupled to the sensor chip and includes a second integrated optic to collect and transmit the signal beam from a first side to a second side of the sensor chip. The detector system is configured to measure a characteristic of the diffraction target based on the signal beam transmitted by the second optical system.

公开(公告)号：US11009803B2

公开(公告)日：2021-05-18

申请号：US16587483

申请日：2019-09-30

申请人： ASML Netherlands B.V. ,  ASML Holding N.V.

发明人： Matthias Kruizinga ,  Maarten Mathijs Marinus Jansen ,  Jorge Manuel Azeredo Lima ,  Erik Willem Bogaart ,  Derk Servatius Gertruda Brouns ,  Marc Bruijn ,  Richard Joseph Bruls ,  Jeroen Dekkers ,  Paul Janssen ,  Mohammad Reza Kamali ,  Ronald Harm Gunther Kramer ,  Robert Gabriël Maria Lansbergen ,  Martinus Hendrikus Antonius Leenders ,  Matthew Lipson ,  Erik Roelof Loopstra ,  Joseph H. Lyons ,  Stephen Roux ,  Gerrit Van Den Bosch ,  Sander Van Den Heijkant ,  Sandra Van Der Graaf ,  Frits Van Der Meulen ,  Jérôme François Sylvain Virgile Van Loo ,  Beatrijs Louise Marie-Joseph Katrien Verbrugge

IPC分类号： G03F1/64 ,  G03F7/20

摘要： A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.

公开(公告)号：US20150212425A1

公开(公告)日：2015-07-30

申请号：US14430021

申请日：2013-08-27

申请人： ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

发明人： Michael Andrew Chieda ,  Stephen Roux ,  Teun Peterus Adrianus De Wilt ,  Igor Matheus Petronella Aarts

IPC分类号： G03F7/20 ,  G01B11/25 ,  G01D5/347

CPC分类号： G03F7/70191 ,  G01B11/2513 ,  G01D5/347 ,  G03F7/70716 ,  G03F7/70783 ,  G03F7/7085

摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam, a support constructed to hold a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. The lithographic apparatus further includes an encoder head designed to scan over a surface of the patterning device to determine a distortion in a first direction along a length of the patterning device and a distortion in a second direction substantially perpendicular to the surface of the patterning device.

摘要翻译： 光刻设备包括配置成调节辐射束的照明系统，构造成保持图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束，衬底 被构造成保持衬底的工作台以及配置成将图案化的辐射束投影到衬底的目标部分上的投影系统。 光刻设备还包括编码器头，其设计成在图案形成装置的表面上扫描以确定沿着图案形成装置的长度的第一方向的变形和基本上垂直于图案形成装置的表面的第二方向的变形。