Invention Publication
- Patent Title: Layout pattern of static random access memory and the forming method thereof
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Application No.: US18071658Application Date: 2022-11-30
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Publication No.: US20240161818A1Publication Date: 2024-05-16
- Inventor: Chun-Hsien Huang , Yu-Tse Kuo , Shu-Ru Wang , Li-Ping Huang , Yu-Fang Chen , Chun-Yen Tseng , Tzu-Feng Chang , Chun-Chieh Chang
- Applicant: UNITED MICROELECTRONICS CORP.
- Applicant Address: TW Hsin-Chu City
- Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee Address: TW Hsin-Chu City
- Priority: TW 1142911 2022.11.10
- Main IPC: G11C11/412
- IPC: G11C11/412 ; H01L29/66 ; H01L29/78 ; H10B10/00

Abstract:
The invention provides a layout pattern of static random access memory (SRAM), which at least comprises a plurality of gate structures located on a substrate and spanning the plurality of fin structures to form a plurality of transistors distributed on the substrate, wherein the plurality of transistors comprise two pull-up transistors (PU), two pull-down transistors (PD) to form a latch circuit, and two access transistors (PG) connected to the latch circuit. In each SRAM memory cell, the fin structure included in the pull-up transistor (PU) is defined as a PU fin structure, the fin structure included in the pull-down transistor (PD) is defined as a PD fin structure, and the fin structure included in the access transistor (PG) is defined as a PG fin structure, wherein a width of the PD fin structure is wider than a width of the PG fin structure.
Public/Granted literature
- US12224001B2 Layout pattern of static random access memory and the forming method thereof Public/Granted day:2025-02-11
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