Invention Grant
- Patent Title: Defect observation apparatus
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Application No.: US15386262Application Date: 2016-12-21
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Publication No.: US10593062B2Publication Date: 2020-03-17
- Inventor: Yuko Otani , Kazuo Aoki , Yohei Minekawa
- Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
- Applicant Address: JP Tokyo
- Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
- Current Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Miles & Stockbridge, P.C.
- Priority: JP2016-034706 20160225
- Main IPC: G06T7/80
- IPC: G06T7/80 ; H04N5/232 ; H04N5/225 ; G02B21/12 ; G03F7/20 ; G06T7/73 ; G01N21/95 ; G01N21/956 ; G01N23/2251 ; G02B21/00 ; G02B21/06 ; G02B21/36 ; G06K9/62 ; G06T7/00 ; H04N5/235 ; H04N7/18

Abstract:
A defect observation apparatus includes a storage unit configured to store defect information about defects detected by an external inspection apparatus; a first imaging unit configured to capture an image of a defect using a first imaging condition and a second imaging condition; a control unit configured to correct positional information on the defect using the image captured with the first imaging unit; and a second imaging unit configured to capture an image of the defect based on the corrected positional information.
Public/Granted literature
- US20170249753A1 DEFECT OBSERVATION APPARATUS Public/Granted day:2017-08-31
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