公开(公告)号：US20170328842A1

公开(公告)日：2017-11-16

申请号：US15522143

申请日：2015-12-01

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Yuko Otani ,  Yuji Takagi ,  Hideki Nakayama

IPC: G01N21/956 ,  G01N23/225

CPC classification number: G01N21/95607 ,  G01N21/8851 ,  G01N21/956 ,  G01N21/95623 ,  G01N23/2251 ,  G01N2021/8861 ,  G01N2021/8867 ,  G01N2021/95615 ,  H01L22/12 ,  H01L22/20

Abstract: Provided are a defect observation method and a defect observation device which detect a defect from an image obtained by imaging the defect on a sample with an optical microscope by using positional information of the defect on the sample detected by a different inspection device to correct the positional information of the defect and observe in detail the defect on the sample with a scanning electron microscope using the corrected positional information. The defect observation method includes detecting the defect from the image to correct the positional information of the defect, switching a spatially-distributed optical element of a detection optical system of the optical microscope according to the defect to be detected, and changing an image acquisition condition for acquiring the image and an image processing condition for detecting the defect from the image according to a type of the switched spatially-distributed optical element.

公开(公告)号：US20150003722A1

公开(公告)日：2015-01-01

申请号：US14367186

申请日：2012-10-22

Applicant: Hitachi High-Technologies Corporation

Inventor： Yuko Otani ,  Toshifumi Honda ,  Shunichi Matsumoto

IPC: G06T7/00

CPC classification number: G06T7/0012 ,  G01N21/9501 ,  G01N21/956 ,  G02B21/0004 ,  G06T2207/30141

Abstract: The present invention is detection of a defect signal which is small enough to be buried in a background noise, by a method that includes detecting a defect on a specimen which is detected by another inspection device by using a detection device equipped with an optical microscope, amending positional information of the defect, observing the defect by using an SEM, wherein the detecting the defect is carried out such that forming stationary waves on the specimen by irradiating the specimen with two illumination lights having the same wavelength from the opposite directions on the same incidence plane at the same incidence angle and cause the two illuminating light to interfere; removing scattered components generated by minute irregularities on the specimen surface by a spatial filter, detecting an image formed by the scattered light not removed by the spatial filter; and processing the detected image to detect the defect.

Abstract translation: 本发明是通过使用配备有光学显微镜的检测装置检测由其他检查装置检测到的样本上的缺陷的方法来检测足够小以埋入背景噪声的缺陷信号， 修正缺陷的位置信息，通过使用SEM观察缺陷，其中执行检测缺陷，使得通过用相同方向的相同波长的两个具有相同波长的照明光照射样本在样本上形成静止波 入射平面处于相同的入射角并导致两个照明光干涉; 通过空间滤波器去除由样品表面上的微小不规则产生的散射分量，检测由空间滤波器未被去除的散射光形成的图像; 并处理检测到的图像以检测缺陷。

公开(公告)号：US10436576B2

公开(公告)日：2019-10-08

申请号：US15126391

申请日：2015-03-19

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Yohei Minekawa ,  Yuko Otani ,  Yuji Takagi

IPC: G01B11/14 ,  G02B21/36 ,  G02B21/10 ,  G02B21/00 ,  G01N23/2251 ,  G01N23/2204 ,  G01B11/30 ,  G01N21/956 ,  G01N21/95 ,  G02B5/30 ,  G01N21/88

Abstract: To review minute defects that were buried in roughness scattered light with an observation device provided with a dark-field microscope, a scanning electron microscope (SEM), and a control unit, the present invention configures the dark-field microscope by installing a filter for blocking a portion of the scattered light, an imaging lens for focusing the scattered light that has passed through the filter, and a detector for dividing the image of the scattered light focused by the imaging lens into the polarization directions converted by a wavelength plate and detecting the resulting images, and the control has a calculation unit for determining the position of a defect candidate detected by another inspection device using the plurality of images separated into polarization directions and detected by the detector.

公开(公告)号：US10267745B2

公开(公告)日：2019-04-23

申请号：US15673582

申请日：2017-08-10

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Yuko Otani ,  Takehiro Tachizaki ,  Masahiro Watanabe ,  Shunichi Matsumoto

IPC: G01N21/00 ,  G01N21/88 ,  G01N21/21 ,  G01N21/95 ,  G01N21/47 ,  G01N21/94 ,  G01N21/956

Abstract: The disclosed device, which, using an electron microscope or the like, minutely observes defects detected by an optical appearance-inspecting device or an optical defect-inspecting device, can reliably insert a defect to be observed into the field of an electron microscope or the like, and can be a device of smaller scale. The electron microscope, which observes defects detected by an optical appearance-inspecting device or an optical defect-inspecting device, has a configuration incorporating an optimal microscope that re-detects defects, and a spatial filter and a distribution polarization element are inserted at the pupil plane when making dark-field observations using this optical microscope. The electron microscope, which observes defects detected by an optical appearance-inspecting device or an optical defect-inspecting device, has a configuration incorporating an optimal microscope that re-detects defects, and a distribution filter is inserted at the pupil plane when making dark-field observations using this optical microscope.

公开(公告)号：US09733194B2

公开(公告)日：2017-08-15

申请号：US14799741

申请日：2015-07-15

Applicant: Hitachi High-Technologies Corporation ,  The University of Tokyo

Inventor： Yuko Otani ,  Shunji Maeda ,  Yuta Urano ,  Toshifumi Honda ,  Takehiro Hirai ,  Satoru Takahashi ,  Kiyoshi Takamasu

IPC: G01N21/00 ,  G01N21/88 ,  G01N21/95 ,  G01N21/956

CPC classification number: G01N21/8806 ,  G01N21/8851 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/8822 ,  G01N2021/8848 ,  G01N2021/8867

Abstract: A method for reviewing a defect including a light capturing step that illuminates a sample with light under plural optical conditions, while varying only at least one of illumination conditions, sample conditions, or detection conditions, and detects plural lights scattering from the sample; a signal obtaining step that obtains plural signals based on the lights detected; and a processing step that discriminates a defect from noise according to a waveform characteristic quantity, an image characteristic quantity, or a value characteristic quantity created using the signals and derives the coordinates of defect.

公开(公告)号：US10401300B2

公开(公告)日：2019-09-03

申请号：US15317065

申请日：2015-05-27

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Yuko Otani ,  Yuta Urano ,  Toshifumi Honda

IPC: G01B21/00 ,  G01N21/88 ,  G01B11/30 ,  G01N21/956 ,  G01B11/06 ,  G01N21/95 ,  G01N23/2251 ,  G02B21/00 ,  G02B21/10 ,  G02B21/26 ,  G02B27/09 ,  G02B27/58 ,  G01B15/08 ,  G01B11/25 ,  G03F7/20

Abstract: A defect observation method for observing a defect on a sample detected by another inspection device with a scanning electron microscope including the steps of: optically detecting the defect using the position information for the defect: illuminating the sample including the defect with an illumination intensity pattern having periodic intensity variation in two dimensions by irradiating a plurality of illumination light beams onto the surface of the sample while phase modulating the light beams in a single direction and successively moving the light beams in small movements in a direction different from the single direction, imaging the surface of the sample that is illuminated by the illumination intensity pattern having periodic intensity variation in two dimensions and includes the defect detected by the other inspection device, and detecting the defect detected by the other inspection device from the image obtained through the imaging of the surface of the sample.

公开(公告)号：US09759666B2

公开(公告)日：2017-09-12

申请号：US14942124

申请日：2015-11-16

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Yuko Otani ,  Takehiro Tachizaki ,  Masahiro Watanabe ,  Shunichi Matsumoto

IPC: G01N21/00 ,  G01N21/88 ,  G01N21/21 ,  G01N21/95 ,  G01N21/47 ,  G01N21/94 ,  G01N21/956

CPC classification number: G01N21/8806 ,  G01N21/21 ,  G01N21/47 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/95607 ,  G01N21/95623 ,  G01N2021/8822 ,  G01N2021/8848 ,  G01N2201/06113 ,  G01N2201/063

Abstract: The disclosed device, which, using an electron microscope or the like, minutely observes defects detected by an optical appearance-inspecting device or an optical defect-inspecting device, can reliably insert a defect to be observed into the field of an electron microscope or the like, and can be a device of smaller scale. The electron microscope, which observes defects detected by an optical appearance-inspecting device or an optical defect-inspecting device, has a configuration incorporating an optimal microscope that re-detects defects, and a spatial filter and a distribution polarization element are inserted at the pupil plane when making dark-field observations using this optical microscope. The electron microscope, which observes defects detected by an optical appearance-inspecting device or an optical defect-inspecting device, has a configuration incorporating an optimal microscope that re-detects defects, and a distribution filter is inserted at the pupil plane when making dark-field observations using this optical microscope.

公开(公告)号：US09436990B2

公开(公告)日：2016-09-06

申请号：US14367186

申请日：2012-10-22

Applicant: Hitachi High-Technologies Corporation

Inventor： Yuko Otani ,  Toshifumi Honda ,  Shunichi Matsumoto

IPC: G06K9/62 ,  G06T7/00 ,  G01N21/956 ,  G01N21/95 ,  G02B21/00

CPC classification number: G06T7/0012 ,  G01N21/9501 ,  G01N21/956 ,  G02B21/0004 ,  G06T2207/30141

Abstract: The present invention is detection of a defect signal which is small enough to be buried in a background noise, by a method that includes detecting a defect on a specimen which is detected by another inspection device by using a detection device equipped with an optical microscope, amending positional information of the defect, observing the defect by using an SEM, wherein the detecting the defect is carried out such that forming stationary waves on the specimen by irradiating the specimen with two illumination lights having the same wavelength from the opposite directions on the same incidence plane at the same incidence angle and cause the two illuminating light to interfere; removing scattered components generated by minute irregularities on the specimen surface by a spatial filter, detecting an image formed by the scattered light not removed by the spatial filter; and processing the detected image to detect the defect.

Abstract translation: 本发明是通过使用配备有光学显微镜的检测装置检测由其他检查装置检测到的样本上的缺陷的方法来检测足够小以埋入背景噪声的缺陷信号， 修正缺陷的位置信息，通过使用SEM观察缺陷，其中执行检测缺陷，使得通过用相同方向的相同波长的两个具有相同波长的照明光照射样本，在样品上形成静止波 入射平面处于相同的入射角并导致两个照明光干涉; 通过空间滤波器去除由样品表面上的微小不规则产生的散射分量，检测由空间滤波器未被去除的散射光形成的图像; 并处理检测到的图像以检测缺陷。

公开(公告)号：US20160018340A1

公开(公告)日：2016-01-21

申请号：US14799741

申请日：2015-07-15

Applicant: Hitachi High-Technologies Corporation ,  The University of Tokyo

Inventor： Yuko Otani ,  Shunji Maeda ,  Yuta Urano ,  Toshifumi Honda ,  Takehiro Hirai ,  Satoru Takahashi ,  Kiyoshi Takamasu

IPC: G01N21/88 ,  G01N21/95

CPC classification number: G01N21/8806 ,  G01N21/8851 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/8822 ,  G01N2021/8848 ,  G01N2021/8867

Abstract: detect a fine defect in reviewing To review a fine defect detected by another inspection apparatus, there is disclosed a method for reviewing a defect including a light capturing step that illuminates a sample with light under plural optical conditions, while varying only at least one of illumination conditions, sample conditions, or detection conditions, and detects plural lights scattering from the sample; a signal obtaining step that obtains plural signals based on the lights detected; and a processing step that discriminates a defect from noise according to a waveform characteristic quantity, an image characteristic quantity, or a value characteristic quantity created using the signals and derives the coordinates of defect.

Abstract translation: 检查检查中的细小缺陷为了检查由另一检查装置检测到的细小缺陷，公开了一种检查缺陷的方法，所述缺陷包括在多个光学条件下用光照亮样品的光捕获步骤，同时只改变照明中的至少一种 条件，样品条件或检测条件，并且检测从样品散射的多个光; 信号获取步骤，基于检测到的光获取多个信号; 以及根据使用该信号产生的波形特征量，图像特征量或值特征量来识别缺陷与噪声的处理步骤，并且导出缺陷坐标。

公开(公告)号：US09683946B2

公开(公告)日：2017-06-20

申请号：US14441742

申请日：2013-11-05

Applicant: Hitachi High-Technologies Corporation

Inventor： Yuko Otani ,  Taketo Ueno ,  Hideki Nakayama ,  Toshifumi Honda

IPC: G01N21/95

CPC classification number: G01N21/9501

Abstract: The present invention is suppressing the elongating phenomenon in the dark field image of defects in detecting a minute defect by using a dark field microscope. Provided is a method for detecting defects in which scattered light generated from the sample, is concentrated to form an image and is captured and processed to extract a defect to find the positional information of the defect, and the positional information is output, wherein an image of the scattered light that suppresses the occurrence of the elongating phenomenon is formed for which partial shielding of a component of the forward scattered light, that passes through a region near the outer edge of the field of view of the objective lens, and the positional information for the defect is found from a luminance signal for a defect that is extracted from a captured scattered light image that suppresses the occurrence of the elongating phenomenon.