公开(公告)号：US11131934B2

公开(公告)日：2021-09-28

申请号：US16666952

申请日：2019-10-29

申请人： Waymo LLC

发明人： James Dunphy ,  David Hutchison

IPC分类号： G03B27/72 ,  G03F7/20 ,  G02B6/42

摘要： The present disclosure relates to systems and methods relating to the fabrication of light guide elements. An example system includes an optical component configured to direct light emitted by a light source to illuminate a photoresist material at one or more desired angles so as to expose an angled structure in the photoresist material. The photoresist material overlays at least a portion of a first surface of a substrate. The optical component includes a container containing a light-coupling material that is selected based in part on the one or more desired angles. The system also includes a reflective surface arranged to reflect at least a first portion of the emitted light to illuminate the photoresist material at the one or more desired angles.

公开(公告)号：US11086029B2

公开(公告)日：2021-08-10

申请号：US16160901

申请日：2018-10-15

申请人： Fraunhofer-Gesellschaft zur Foerderung der angewandten Forschung e.V.

发明人： Rolf Behrendt ,  Wolfgang Groeger ,  Peter Schmitt ,  Andreas Jobst ,  Guenther Kostka

IPC分类号： G01T1/20 ,  G03B27/72 ,  G01N23/046 ,  H04N5/32 ,  G03B42/02 ,  G01N23/04 ,  G21F3/00

摘要： Embodiments provide image capturing apparatuses having a screen, a plurality of mirrors and a plurality of cameras. The plurality of mirrors and the plurality of cameras is arranged such that the plurality of cameras capture a portion of the screen via a respective one of the plurality of mirrors, wherein the plurality of cameras is arranged obliquely with respect to the screen.

公开(公告)号：US11042095B2

公开(公告)日：2021-06-22

申请号：US16334347

申请日：2017-09-18

申请人： Kulicke & Soffa Liteq B.V.

发明人： Adrianus Johannes Petrus Maria Vermeer ,  Mikhail Yurievich Loktev ,  Derk Andre Kort

IPC分类号： G03B27/72 ,  G03F7/20 ,  G02B27/09

摘要： A correction mask for an optical beam homogenizer includes a lens array. The correction mask is configured to provide a shaped initial beam profile. A subset of a plurality of optical paths between the incoming light beam and the illumination plane is at least partially blocked by the correction mask to provide a further homogenized beam profile having a further reduced light intensity variance with respect to an initial homogenized beam profile. The mask includes a plurality of submasks arranged according to a mask grid layout matching the lens grid layout of the lens array. Each one of the submasks is designed with a specific submask pattern to shape the respective subarea of the initial beam profile passing a specific one of the lenslets.

公开(公告)号：US10678151B2

公开(公告)日：2020-06-09

申请号：US16284143

申请日：2019-02-25

申请人： Carl Zeiss SMT GmbH

发明人： Markus Holz ,  Jan Horn ,  Klaus Syrowatka

IPC分类号： G03B27/54 ,  G03B27/72 ,  G03F7/20

摘要： A control device for an assembly having a plurality of sensors and/or actuators includes at least one first control unit which is designed to be vacuum-suitable, has a distributor for splitting and/or combining signals and has a converter for converting digital signals into analog signals and/or analog signals into digital signals.

公开(公告)号：US10520824B2

公开(公告)日：2019-12-31

申请号：US16078699

申请日：2017-02-07

申请人： ASML Netherlands B.V. ,  ASML Holding N.V.

发明人： Ronald Franciscus Herman Hugers ,  Parag Vinayak Kelkar ,  Paulus Antonius Andreas Teunissen

IPC分类号： G03B27/72 ,  G03F7/20 ,  G02B27/14 ,  G03F9/00 ,  G01B11/06 ,  G02B27/10

摘要： A light combiner (500) for use in a metrology tool includes a plurality of light sources (LED 1, LED 2, LED 3, LED 4, LED 5), a first filter (502), and a second filter (504). The first filter is designed to substantially reflect light generated from a first source of the plurality of light sources, and to substantially transmit light generated from a second source of the plurality of light sources. The second filter is designed to substantially reflect light generated from the first source and the second source of the plurality of light sources, and to substantially transmit light generated from a third source of the plurality of light sources. An angle of incidence of the light generated from the first source on a surface of the first filter is less than 30 degrees.

公开(公告)号：US20180373137A1

公开(公告)日：2018-12-27

申请号：US16047027

申请日：2018-07-27

申请人： FUJIFILM Corporation

发明人： Takeshi FUJII

IPC分类号： G03C3/00 ,  G03B17/52 ,  G03D5/06 ,  H04N5/225 ,  G03B27/72

摘要： In a case that accommodates an instant film, an exposure opening portion, a discharge port, and a claw opening portion are provided. The exposure opening portion is light-shielded by a film cover that is disposed to overlap the instant film. The film cover includes a notched portion connected to the claw opening portion. In a case where the film cover is not removed in use, a claw inserted through the claw opening portion is moved within a range of the notched portion. In a case where the film cover is removed in use, the claw is moved within a range that exceeds the range of the notched portion.

公开(公告)号：US10044160B2

公开(公告)日：2018-08-07

申请号：US15238064

申请日：2016-08-16

申请人： NIKON CORPORATION

发明人： Naoto Inaba ,  Akira Tokuhisa

IPC分类号： G03B27/72 ,  H01S3/00 ,  G03F7/20

摘要： A pulsed light generating method for generating a pulsed light by cutting out a laser light outputted from a laser light source with an intensity modulation type electro optic modulator, wherein: the electro optic modulator is driven by use of a drive signal that changes a voltage applied to the electro optic modulator between a voltage lower than a reference voltage and a voltage higher than the reference voltage, the reference voltage being a voltage applied to the electro optic modulator at which a transmittance of the laser light transmitting through the electro optic modulator is local maximum.

公开(公告)号：US10012870B2

公开(公告)日：2018-07-03

申请号：US15222228

申请日：2016-07-28

申请人： BOE TECHNOLOGY GROUP CO., LTD. ,  BEIJING BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.

发明人： Hongpeng Li

IPC分类号： G02F1/1337 ,  G03B27/32 ,  G03B27/54 ,  G03B27/72 ,  G02F1/1339 ,  G02F1/161 ,  B05D3/02 ,  B05D3/06 ,  B05D3/12 ,  G02F1/13 ,  G03F7/20

CPC分类号： G02F1/133788 ,  B05D3/0254 ,  B05D3/065 ,  B05D3/12 ,  G02F1/1303 ,  G02F1/133784 ,  G02F1/1339 ,  G02F1/161 ,  G03F7/7035

摘要： This disclosure discloses an alignment device and a method of manufacturing an alignment film, and a display substrate. The alignment device comprises a first exposure chamber that contains a first light box and a light-shielding plate for blocking light emitted from the first light box from irradiating the alignment region of the alignment film. The light emitted from the first light box is used to irradiate a non-alignment region so as to eliminate the alignment film in the non-alignment region.

公开(公告)号：US09964856B2

公开(公告)日：2018-05-08

申请号：US14528275

申请日：2014-10-30

申请人： Carl Zeiss SMT GmbH

发明人： Manfred Maul

IPC分类号： G03B27/72 ,  G03F7/20 ,  G02B17/00 ,  G02B26/08

CPC分类号： G03F7/7015 ,  G02B17/002 ,  G02B26/0816 ,  G03F7/70075 ,  G03F7/70091 ,  G03F7/70116 ,  G03F7/70191 ,  G03F7/702 ,  G03F7/70566

摘要： An illumination optical unit for projection lithography illuminates an object field with illumination light. The illumination optical unit has a collector for collecting the emission of a light source for the illumination light. The collector is arranged such that it transfers the illumination light from the light source into an intermediate focus. The illumination optical unit furthermore has a field facet mirror and a pupil facet mirror, each having a plurality of facets. The field facets are imaged into the object field by a transfer optical unit. The illumination optical unit additionally has an individual-mirror array having individual mirrors tiltable in a manner driven individually. The array is arranged upstream of the field facet mirror and downstream of the intermediate focus in an illumination beam path.

公开(公告)号：US09952517B2

公开(公告)日：2018-04-24

申请号：US14753642

申请日：2015-06-29

申请人： ASML Netherlands B.V.

发明人： Alok Verma ,  Hugo Augustinus Joseph Cramer

IPC分类号： G03B27/72 ,  G03F7/20 ,  G01N21/47

CPC分类号： G03F7/70558 ,  G01N21/4738 ,  G01N21/4785 ,  G01N2021/4735 ,  G03F7/70625 ,  G03F7/70683 ,  G03F7/7085

摘要： A method of determining exposure dose of a lithographic apparatus used in a lithographic process on a substrate, the method comprising the steps: (a) receiving a substrate comprising first and second structures produced using the lithographic process; (b) detecting scattered radiation while illuminating the first structure with radiation to obtain a first scatterometer signal; (c) detecting scattered radiation while illuminating the second structure with radiation to obtain a second scatterometer signal; (d) using the first and second scatterometer signals to determine an exposure dose value used to produce said first and second structures wherein the first structure has a first periodic characteristic with spatial characteristics and yet at least another second periodic characteristic with spatial characteristics designed to be affected by the exposure dose and the second structure has a first periodic characteristic with spatial characteristics and yet at least another second periodic characteristic with spatial characteristics designed to be affected by the exposure dose wherein the exposure dose affects the exposure dose affected spatial characteristics of the first and second structures in a different manner.