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    Detector that detects relative positions of marks while blocking non-interference light
    1.
    发明授权
    Detector that detects relative positions of marks while blocking non-interference light 有权

    公开(公告)号：US12098913B2

    公开(公告)日：2024-09-24

    申请号：US17321731

    申请日：2021-05-17

    申请人： CANON KABUSHIKI KAISHA

    发明人： Takamitsu Komaki ,  Yasuyuki Unno ,  Tooru Kawashima

    IPC分类号： G01B11/14 ,  G01B9/02001 ,  G03F7/00

    CPC分类号： G01B11/14 ,  G01B9/02011 ,  G03F7/0002 ,  G03F7/0005

    摘要： A detector that detects relative positions of a first object and a second object in directions different from each other on a predetermined plane, includes an illumination optical system configured to illuminate a first mark provided on the first object and a second mark provided on the second object, and a detection optical system configured to detect interference light of diffracted lights from the first mark and the second mark illuminated by the illumination optical system. A light intensity distribution is formed, on a pupil plane of the illumination optical system, to illuminate the first mark and the second mark from a direction tilted with respect to a normal of the predetermined plane. A pupil plane of the detection optical system allows the interference light to pass through and block at least a part light other than the interference light.

    Optically determining electrical contact between metallic features in different layers in a structure
    2.
    发明授权
    Optically determining electrical contact between metallic features in different layers in a structure 有权

    公开(公告)号：US12092964B2

    公开(公告)日：2024-09-17

    申请号：US17782771

    申请日：2020-11-20

    申请人： ASML NETHERLANDS B.V.

    发明人： Shakeeb Bin Hasan ,  Benoit Herve Gaury

    IPC分类号： G03F7/00 ,  G01B11/14 ,  G01N21/552

    CPC分类号： G03F7/70633 ,  G01B11/14 ,  G01N21/553 ,  G03F7/70625

    摘要： Optically determining whether metallic features in different layers in a structure are in electrical contact with each other. When the metallic features include different metals and/or have different dimensions, which cause one or more resonances in reflected radiation to be detected, the metallic features in the different layers are determined to be in contact or out of contact with each other based on the spectral positions of the one or more resonances. When the metallic features are formed from the same metal and have the same dimensions, the metallic features in the different layers are determined to be in contact with each other responsive to detection of a single resonance associated with the metallic features and out of contact with each other responsive to detection of two or more resonances associated with the metallic features.

    Apparatuses and methods for diffraction base overlay measurements
    4.
    发明授权
    Apparatuses and methods for diffraction base overlay measurements 有权

    公开(公告)号：US12044982B2

    公开(公告)日：2024-07-23

    申请号：US17541079

    申请日：2021-12-02

    申请人： MICRON TECHNOLOGY, INC.

    发明人： Masazumi Matsunobu

    IPC分类号： G03F7/00 ,  G01B11/14 ,  H01L23/544

    CPC分类号： G03F7/70633 ,  G01B11/14 ,  G03F7/70683 ,  H01L23/544

    摘要： Apparatuses and methods of overlay measurement are disclosed. An example apparatus includes first and second layers. The first layer includes a first alignment pattern that includes a first line extending in a first direction. The first line includes first, second and third segments. The second layer above the first layer includes a second alignment pattern including: a second line extending in the first direction above the first segment and having a first offset from the first segment in a second direction perpendicular to the first direction; a third line extending in the first direction above the second segment and having a second offset from the second segment in the second direction; and a fourth line extending in the first direction above the third segment and having a third offset from the third segment in the second direction. The first, second and third offsets are different from one another.

    CELL WINDING CALIBRATION METHOD, APPARATUS, AND DEVICE, AND CELL WINDING SYSTEM
    5.
    发明公开
    CELL WINDING CALIBRATION METHOD, APPARATUS, AND DEVICE, AND CELL WINDING SYSTEM 审中-公开

    公开(公告)号：US20240240935A1

    公开(公告)日：2024-07-18

    申请号：US18620924

    申请日：2024-03-28

    申请人： CONTEMPORARY AMPEREX TECHNOLOGY CO., LIMITED

    发明人： Xiaowei ZHANG ,  Zhiwen WANG ,  Wei ZHANG ,  Yuqian WEN ,  Minghao TANG ,  Shengwu ZHANG

    IPC分类号： G01B11/14 ,  H01M10/04

    CPC分类号： G01B11/14 ,  H01M10/0409 ,  H01M10/0431

    摘要： A cell winding calibration method includes: obtaining a first reference distance between first and second reference lines; obtaining a reference number of pixels included in the first reference distance, and determining, based on the first reference distance and the reference number of pixels included in the first reference distance, an actual distance corresponding to a single pixel; obtaining an actual number of pixels included in a distance between an edge of a winding substrate and the first or second reference line, and determining real-time position information of the edge of the winding substrate based on the actual number of pixels included in the distance between the edge of the winding substrate and the first or second reference line and the actual distance corresponding to a single pixel; and calibrating the winding substrate based on the real-time position information of the edge of the winding substrate.

    CONTROL SYSTEM
    7.
    发明公开
    CONTROL SYSTEM 审中-公开

    公开(公告)号：US20240219063A1

    公开(公告)日：2024-07-04

    申请号：US18608693

    申请日：2024-03-18

    申请人： DAIKIN INDUSTRIES, LTD.

    发明人： Takayuki KIKUCHI ,  Yosuke IMAI ,  Chie EMURA

    IPC分类号： F24F11/79 ,  F24F120/12 ,  G01B11/14

    CPC分类号： F24F11/79 ,  G01B11/14 ,  F24F2120/12

    摘要： A control system includes an imaging unit that acquires an image of a plane including a target, an actuator that provides physical action to the target, and a control unit that controls the actuator. The control unit includes a setting unit that uses a relationship between four or more different position coordinates on the plane and directions of the actuator corresponding to the four or more different position coordinates to set a transformation characteristic of transformation of any position coordinates on the plane into a direction of the actuator. The control unit includes an adjustment unit that uses position coordinates of the target on the plane and the transformation characteristic to adjust the direction of the actuator so that the physical action is provided to the target.