摘要:
The invention provides a negative resist composition including, as a base resin, a polymer that contains at least a repeating unit “a” having a cyclopentadienyl complex and is represented by the following general formula (1). There can be a negative resist composition, especially a chemically amplified negative resist composition that has a higher resolution than conventional hydroxystyrene-based and novolak-based negative resist compositions, a good pattern configuration after exposure, and further excellent etching resistance, and a patterning process using the same.
摘要:
Embodiments of the present invention include a branched aromatic ionomer, and a process of making it, by co-polymerizing a first monomer comprising an aromatic moiety and an unsaturated alkyl moiety and a second monomer represented by the general formula: [R-AZ]y-MX wherein R is a hydrocarbon chain having from 2 to 40 carbons and at least one polymerizable unsaturation; A is an anionic group; M is a cationic group; Z is −1 or −2; X is +1, +2, +3, +4, or +5; and y is an integer having a value of from 1 to 4. The branched aromatic ionomer has a melt flow index ranging from 1.0 g/10 min. to 13 g/10 min. Optionally the melt flow index ranges from 1.3 g/10 min. to 1.9 g/10 min.
摘要:
The invention relates to copolymers that can be obtained by the polymerization of monomers (A), (B), (C) and (D), where (A) is a monomer of formula (I) wherein A is C2-C4 alkylene and B is a C2-C4 alkylene different from A, R is hydrogen or methyl, m is a number between 1 and 500, and n is a number between 1 and 500, the sum of m+n being equal to between 2 and 1000; (B) is a monomer of formula (II) wherein D is C3 alkylene, R is hydrogen or methyl, and o is a number between 2 and 500; (C) is an ethylenically unsaturated monomer containing an aromatic group; and (D) is an ethylenically unsaturated monomer containing an alkyl radical.
摘要:
The present disclosure relates to compositions comprising a copolymer that includes a first monomer and a second monomer that is different from the first monomer, wherein both the first and second monomer are selected from the group consisting of 3-sulfopropyl acrylate potassium salt, sodium acrylate, N-(tris(hydroxyl methyl)methyl)acrylamide, and 2-acrylamideo-2-methyl-1-propane sulfonic acid. The present disclosure further relates to methods for preparing the copolymer compositions and shaped articles comprising the copolymers.
摘要:
Polymerizable diazonium salts having redox properties and absorption in the visible range, a process for preparing them and uses thereof are disclosed. The salts have the general formula: [XX+LnDdEm(N2+)p][(B−)p+x] in which: X is chosen from transition metals, preferably X is chosen from ruthenium (Ru), osmium (Os), iron (Fe), cobalt (Co) and iridium (Ir), x is an integer ranging from 1 to 5 inclusive, L is a ligand chosen from pyridine, bipyridine, terpyridine, phenanthroline and phenylpyridine groups, and mixtures thereof, n is an integer ranging from 1 to 5 inclusive, D is a saturated or unsaturated, C1-C5 alkyl spacer compound, d=0 or 1, E is an aromatic or polyaromatic spacer compound that can contain one or more heteroatoms, m is an integer ranging from 0 to 5 inclusive, p is an integer, and B is a counterion.
摘要:
The present invention relates to metal-containing compositions with refractive indices of at least 1.5 comprising a metal-containing precursor unit (MU), a prepolymer unit (PU), and a catalyst or an initiator capable of inducing a combining reaction of ethylenically unsaturated functional groups of the metal-containing precursor unit and reactive functional groups of the prepolymer unit. In another embodiment, the composition comprises MU and a catalyst or initiator capable of inducing a combining reaction of the metal-containing precursor units. Both MU and PU contain additional functional groups, which may be selected to impart compatibility with each other and to produce optically clear films. The metal-containing compositions can be used to produce films or articles having a transmittance of at least 90% and index of refraction in the range of 1.5 to 1.8 in the 400-700 nm range of light and 1.5 to 2.4 in the 150-400 nm range of light.
摘要:
Disclosed herein is a dendrimer, in which metallocene, which is an oxidation-reduction material, is located at a core, and a conjugated dendron is connected to the metallocene core by a linker compound, an organic active layer having the dendrimer, an organic memory device having the organic active layer and a method of manufacturing the organic active layer and the organic memory device. The organic memory device manufactured using a dendrimer having a metallocene core of example embodiments may have a shorter switching time, decreased operation voltage, decreased manufacturing cost and increased reliability, thereby realizing a highly-integrated large-capacity memory device.
摘要:
A process of synthesizing hyperbranched polytriazoles, linear and hyperbranched poly(aroyltriazoles) by Huisgen 1,3-dipolar cycloaddition. The polytriazoles were prepared by A2+B3 method to avoid self-polymerization during monomer preparation and storage. The polymers are light emissive and can be crosslinked to generate well-resolution photopatterns upon UV irradiation. White light emission patterns were observed with fluorescence microscopy. The high molecular weight poly(aroyltriazoles) (up to 26000 Da) are prepared in high yields (up to 92.0%) and with high regioselectivity (the ratio of 1,4- and 1,5-disubstituted 1,2,3-triazole is equal or larger than 9:1). The polycyclomerization is not moisture or oxygen sensitive and therefore, no special precautions are necessary before and during the reaction. All the polymers are processible, easily film-forming, and curable into thermosets by heat or irradiation. The hyperbranched polymers can act as fluorescent adhesive materials with large tensile strength.
摘要翻译:通过Huisgen 1,3-偶极环加成合成超支化聚三唑,线性和超支化聚(芳酰基三唑)的方法。 聚三唑通过A 2 N + B 3 N 3方法制备,以避免单体制备和储存期间的自聚合。 聚合物是发光的并且可以交联以在UV照射时产生良好分辨率的光图案。 用荧光显微镜观察白光发射模式。 高分子量聚(芳基三唑)(高达26000Da)以高产率(高达92.0%)和高分辨率选择性(1,4和1,5-二取代的1,2,3-三唑的比例 等于或大于9:1)。 多重环化不是水分或氧气敏感的,因此在反应之前和期间都不需要特别的预防措施。 所有的聚合物都是可加工的,易成膜的,并且通过热或照射可固化成热固性材料。 超支化聚合物可以作为具有大拉伸强度的荧光粘合剂材料。
摘要:
Dental material containing a cluster according to the general formula [(M1)a(M2)bOc(OH)d(OR)e(L-Sp-Z)f] (I) in which M1, M2, independently of each other, stand in each case for a metal atom of the IIIrd or Vth main groups or the Ist to VIIIth sub-groups of the periodic table; R is an alkyl group with 1 to 6 carbon atoms; L is a co-ordinating group with 2 to 6 complexing centres; Sp is a spacer group or is absent; Z is a polymerizable group; c is a number from 1 to 30; d, e, independently of each other, are in each case a number from 1 to 30; f is a number from 2 to 30, any charge of the cluster (I) present being equalized by counterions.
摘要:
A process is described for the preparation of latices based on polychloroprene, comprising the polymerization of chloroprene in the presence of a first latex essentially consisting of polymeric particles produced in a first polymerization of a composition of monomers comprising (a) alpha-, beta-unsaturated carboxylic acids and/or derivatives thereof, (b) vinyl aromatic compounds, (c) conjugated dienes; said first latex having a content of alpha-, beta-unsaturated carboxylic acids, expressed as parts of alpha-, beta-unsaturated carboxylic acids per 100 grams of polymeric particles, ranging from 1 to 15%, thus obtaining a final latex, the solid particles of said final latex having an quantity of chloroprene ranging from 50 to 95% by weight, preferably from 80 to 95% by weight.