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    Solvents and photoresists compositions for short wavelength imaging
    2.
    发明申请
    Solvents and photoresists compositions for short wavelength imaging 审中-公开
    用于短波长成像的溶剂和光致抗蚀剂组合物

    公开(公告)号：US20040209188A1

    公开(公告)日：2004-10-21

    申请号：US10847679

    申请日：2004-05-17

    Applicant: Shipley Company, L.L.C.

    Inventor： Charles R. Szmanda ,  Anthony Zampini

    IPC: G03C001/76

    CPC classification number: H05K3/381 ,  C08J7/02 ,  C23C18/2006 ,  C23C18/24 ,  G03F7/0046 ,  G03F7/0048 ,  G03F7/0392 ,  G03F7/0395 ,  G03F7/0397 ,  H05K3/0055 ,  Y10S430/113

    Abstract: New photoresists are provides that are suitable for short wavelength imaging, particularly sub-170 nm such as 157 nm. Resists of the invention comprise a fluorine-containing polymer, a photoactive component, and a solvent component. Preferred solvents for use on the resists of the invention can maintain the resist components in solution and include one or more preferably two or more (i.e. blends) of solvents. In particularly preferred solvent blends of the invention, each blend member evaporates at substantially equal rates, whereby the resist composition maintains a substantially constant concentration of each blend member.

    Abstract translation: 提供适用于短波长成像的新型光致抗蚀剂，特别是亚170nm，例如157nm。 本发明的抗菌剂包括含氟聚合物，光敏组分和溶剂组分。 用于本发明抗蚀剂的优选溶剂可以将抗蚀剂组分保持在溶液中，并且包括溶剂的一种或多种（即共混物）。 在本发明的特别优选的溶剂共混物中，每个共混构件以基本上相等的速率蒸发，由此抗蚀剂组合物保持每个共混构件的基本恒定的浓度。

    Photoresist formulation for high aspect ratio plating
    3.
    发明申请
    Photoresist formulation for high aspect ratio plating 审中-公开
    用于高纵横比电镀的光刻胶配方

    公开(公告)号：US20030138731A1

    公开(公告)日：2003-07-24

    申请号：US10027437

    申请日：2001-12-21

    Inventor： Treliant Fang

    IPC: G03F007/075 ,  G03F007/004 ,  G03F007/085

    CPC classification number: G03F7/0385 ,  G03F7/0751 ,  G03F7/085 ,  Y10S430/113 ,  Y10S430/128 ,  Y10S430/155

    Abstract: SU-8 photoresist compositions are modified to improve their adhesion properties by adding 1% to 6% of an adhesion promoter selected from the group consisting of glycidoxypropanetrimethoxysilane, mercatopropyltrimethoxysilane, and aminopropyltrimethoxysilane. SU-8 photoresist compositions are modified to improve their resistance to cracking and film stress by adding 0.5% to 3% of a plasticizer selected from the group consisting of dialkylphthalates, dialkylmalonates, dialkylsebacates, dialkyladipates, and diglycidyl hexahydrophthalates. The improvements can be obtained simultaneously by adding both the adhesion promoter and the plasticizer to SU-8 photoresist compositions.

    Abstract translation: 通过添加1％至6％的选自缩水甘油氧基丙基三甲氧基硅烷，仲丙基三甲氧基硅烷和氨基丙基三甲氧基硅烷的粘合促进剂来改性SU-8光致抗蚀剂组合物以改善其粘合性能。 通过加入0.5％至3％的选自二烷基邻苯二甲酸酯，二烷基丙二酸酯，癸二酸二烷基酯，己二酸二烷基酯和六氢化邻苯二甲酸二缩水甘油酯的增塑剂，改性SU-8光致抗蚀剂组合物以提高其抗裂纹和薄膜应力。 通过向SU-8光致抗蚀剂组合物中加入粘合促进剂和增塑剂可以同时获得改进。

    Photopolymer process and composition employing a photooxidizable component capable of forming endoperoxides
    7.
    发明授权
    Photopolymer process and composition employing a photooxidizable component capable of forming endoperoxides 失效
    使用能够形成内过氧化物的光氧化组分的光聚合物工艺和组合物

    公开(公告)号：US4666824A

    公开(公告)日：1987-05-19

    申请号：US712049

    申请日：1985-03-15

    Applicant: Wayne R. Messer

    Inventor： Wayne R. Messer

    IPC: C08F2/50 ,  G03F7/027 ,  G03F7/031 ,  G03C5/16 ,  G03C1/68 ,  G03F7/26

    CPC classification number: C08F2/50 ,  G03F7/027 ,  G03F7/031 ,  Y10S430/113 ,  Y10S430/116

    Abstract: The photosensitive composition of this invention contains (1) an ethylenically unsaturated component capable of forming a high polymer by addition polymerization or crosslinking, (2) a cyclic cisoid conjugated diene as a photooxidizable component capable of reacting with singlet oxygen to form an endoperoxide, and (3) a photooxygenation sensitizer. A process for preparing a photosensitive element, such as a relief printing plate, embodying a layer of such a composition is described.

    Abstract translation: 本发明的感光性组合物含有（1）能够通过加成聚合或交联形成高分子的烯键式不饱和成分，（2）作为能与单线态氧反应形成内过氧化物的光可氧化成分的环状顺式多元共轭二烯，以及 （3）光氧化敏化剂。 描述了制备具有这种组合物层的感光元件如凸版印刷版的方法。

    Photosensitive negative-working toning process
    8.
    发明授权
    Photosensitive negative-working toning process 失效
    感光负性调色过程

    公开(公告)号：US4294909A

    公开(公告)日：1981-10-13

    申请号：US106401

    申请日：1979-12-26

    Applicant: Ross A. Lee

    Inventor： Ross A. Lee

    IPC: G03C5/56 ,  G03F3/10 ,  G03F7/004 ,  G03F7/28 ,  G03C5/04

    CPC classification number: G03F7/28 ,  G03F3/103 ,  G03F7/0045 ,  Y10S430/109 ,  Y10S430/11 ,  Y10S430/111 ,  Y10S430/112 ,  Y10S430/113 ,  Y10S430/127 ,  Y10S522/904

    Abstract: A photosensitive element which comprises a support bearing a layer of negative-working tonable photoimaging composition comprising at least one organic polymeric binder (a), a photosensitizer (b) which generates an acid upon absorption of actinic radiation, and at least one compound taken from the group of ##STR1## as defined, binder (a) being plasticized by the decomposition product of either compound (c) or (d) or the combination thereof. The photosensitive element is useful in making color proofs.

    Abstract translation: 一种感光元件，其包括承载一层负性可调色光成像组合物的载体，该层包含至少一种有机聚合物粘合剂（a），在吸收光化辐射时产生酸的光敏剂（b）和至少一种从 化合物（c）或（d）的分解产物或其组合使粘合剂（a）增塑的成像组（c）（d）。 感光元件可用于制作色彩。

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